公开(公告)号：US11495441B2

公开(公告)日：2022-11-08

申请号：US17084103

申请日：2020-10-29

Applicant: Lam Research Corporation

Inventor： Jon McChesney ,  Saravanapriyan Sriraman ,  Richard A. Marsh ,  Alexander Miller Paterson ,  John Holland

IPC: H01J37/32

Abstract: In one embodiment, a plasma processing device may include a dielectric window, a vacuum chamber, an energy source, and at least one air amplifier. The dielectric window may include a plasma exposed surface and an air exposed surface. The vacuum chamber and the plasma exposed surface of the dielectric window can cooperate to enclose a plasma processing gas. The energy source can transmit electromagnetic energy through the dielectric window and form an elevated temperature region in the dielectric window. The at least one air amplifier can be in fluid communication with the dielectric window. The at least one air amplifier can operate at a back pressure of at least about 1 in-H2O and can provide at least about 30 cfm of air.

公开(公告)号：US20220199365A1

公开(公告)日：2022-06-23

申请号：US17606686

申请日：2020-04-24

Applicant: Lam Research Corporation

Inventor： Maolin Long ,  Yuhou Wang ,  Alexander Miller Paterson

IPC: H01J37/32

Abstract: A direct drive system for providing RF power to a substrate processing system includes a direct drive enclosure including a first direct drive circuit located in the direct drive enclosure and operating at a first frequency and a first connector connected to the first direct drive circuit. A junction box is arranged adjacent to the direct drive enclosure and includes a first capacitive circuit connected to the first direct drive circuit; a second connector located on one side of the junction box, connected to one terminal of the first capacitive circuit and mating with the first connector of the direct drive enclosure; third and fourth connectors connected to another terminal of the first capacitive circuit; and a coil enclosure arranged adjacent to the junction box and including first and second coils and fifth and sixth connectors mating with the third and fourth connectors of the junction box.

公开(公告)号：US20240404804A1

公开(公告)日：2024-12-05

申请号：US18689017

申请日：2022-09-13

Applicant: Lam Research Corporation

Inventor： Alexander Miller Paterson ,  Daniel Guzman ,  William T. Hart ,  Cristian Siladie ,  Michael John Martin ,  Yuhou Wang ,  Michael Drymon ,  John Drewery ,  Robert Griffith O'Neill ,  Luc Albarede ,  Neil Simon Ocampo

IPC: H01J37/32 ,  H01J37/34

Abstract: A radiofrequency calibration system for a direct-drive radiofrequency power supply includes a reference box that includes a reference circuit for converting a non-reference input impedance to a reference output impedance. The reference box has an input connector electrically connected to a radiofrequency output coupling of the direct-drive radiofrequency power supply. A radiofrequency power meter has a radiofrequency power input electrically connected to an output connector of the reference box. The radiofrequency power meter has an input impedance and an output impedance that substantially match the reference output impedance of the reference box. A cable has a first end electrically connected to a radiofrequency power output of the radiofrequency power meter and a second end connected to a test load that has an impedance that substantially matches the reference output impedance of the reference box. A controller is connected in data communication with a data interface of the radiofrequency power meter.

公开(公告)号：US12046450B2

公开(公告)日：2024-07-23

申请号：US18012212

申请日：2021-09-24

Applicant: Lam Research Corporation

Inventor： Ying Wu ,  John Stephen Drewery ,  Alexander Miller Paterson ,  Xiang Zhou ,  Zhuoxian Wang ,  Yoshie Kimura

IPC: H01J37/32

CPC classification number: H01J37/32146 ,  H01J37/32174 ,  H01J37/32091 ,  H01J37/321 ,  H01J2237/334

Abstract: Systems and methods for synchronization of radio frequency (RF) generators are described. One of the methods includes receiving, by a first RF generator, a first recipe set, which includes information regarding a first plurality of pulse blocks for operating the first RF generator. The method further includes receiving, by a second RF generator, a second recipe set, which includes information regarding a second plurality of pulse blocks for operating a second RF generator. Upon receiving a digital pulsed signal, the method includes executing the first recipe set and executing the second recipe set. The method further includes outputting a first one of the pulse blocks of the first plurality based on the first recipe set in synchronization with a synchronization signal. The method includes outputting a first one of the pulse blocks of the second plurality based on the second recipe set in synchronization with the synchronization signal.

公开(公告)号：US11887819B2

公开(公告)日：2024-01-30

申请号：US17960576

申请日：2022-10-05

Applicant: Lam Research Corporation

Inventor： Jon McChesney ,  Saravanapriyan Sriraman ,  Richard A. Marsh ,  Alexander Miller Paterson ,  John Holland

IPC: H01J37/32

CPC classification number: H01J37/32522 ,  H01J37/32082 ,  H01J37/32119 ,  H01J37/32238

Abstract: In one embodiment, a plasma processing device may include a dielectric window, a vacuum chamber, an energy source, and at least one air amplifier. The dielectric window may include a plasma exposed surface and an air exposed surface. The vacuum chamber and the plasma exposed surface of the dielectric window can cooperate to enclose a plasma processing gas. The energy source can transmit electromagnetic energy through the dielectric window and form an elevated temperature region in the dielectric window. The at least one air amplifier can be in fluid communication with the dielectric window. The at least one air amplifier can operate at a back pressure of at least about 1 in-H2O and can provide at least about 30 cfm of air.

公开(公告)号：US20230274913A1

公开(公告)日：2023-08-31

申请号：US18012212

申请日：2021-09-24

Applicant: Lam Research Corporation

Inventor： Ying Wu ,  John Stephen Drewery ,  Alexander Miller Paterson ,  Xiang Zhou ,  Zhuoxian Wang ,  Yoshie Kimura

IPC: H01J37/32

CPC classification number: H01J37/32146 ,  H01J2237/334 ,  H01J37/32091 ,  H01J37/321

Abstract: Systems and methods for synchronization of radio frequency (RF) generators are described. One of the methods includes receiving, by a first RF generator, a first recipe set, which includes information regarding a first plurality of pulse blocks for operating the first RF generator. The method further includes receiving, by a second RF generator, a second recipe set, which includes information regarding a second plurality of pulse blocks for operating a second RF generator. Upon receiving a digital pulsed signal, the method includes executing the first recipe set and executing the second recipe set. The method further includes outputting a first one of the pulse blocks of the first plurality based on the first recipe set in synchronization with a synchronization signal. The method includes outputting a first one of the pulse blocks of the second plurality based on the second recipe set in synchronization with the synchronization signal.

公开(公告)号：US20230245873A1

公开(公告)日：2023-08-03

申请号：US18009575

申请日：2021-06-10

Applicant: Lam Research Corporation

Inventor： Maolin Long ,  Yuhou Wang ,  Michael John Martin ,  Alexander Miller Paterson

IPC: H01J37/32 ,  G01R27/08

CPC classification number: H01J37/32935 ,  H01J37/32082 ,  G01R27/08 ,  H02J50/20

Abstract: A direct drive system for providing RF power to a component of a substrate processing system includes a direct drive circuit including a switch and configured to supply RF power to the component. A switch protection module is configured to monitor a load current and a load voltage in a processing chamber, calculate load resistance based on the load current and the load voltage, compare the load resistance to a first predetermined load resistance, and adjust at least one of an RF power limit and an RF current limit of the direct drive circuit based on the comparison.

公开(公告)号：US20230230805A1

公开(公告)日：2023-07-20

申请号：US18009978

申请日：2021-10-15

Applicant: Lam Research Corporation

Inventor： John Stephen Drewery ,  Ying Wu ,  Alexander Miller Paterson ,  Luc Albarede

IPC: H01J37/32

CPC classification number: H01J37/32174 ,  H01J37/32146

Abstract: Systems and methods for synchronization of radio frequency (RF) pulsing schemes and of sensor data collection are described. One of the methods includes receiving, by an RF generator, a first set of one or more variable levels and one or more duty cycles of an RF signal. The method further includes receiving, by the RF generator from a pulse controller, a synchronization signal having a plurality of pulses. The method also includes generating, during a clock cycle of a clock signal, multiple instances of a first plurality of states of the RF signal in synchronization with the plurality of pulses of the synchronization signal. Each of the first plurality of states of the RF signal has a corresponding one of the one or more variable levels of the first set and a corresponding one of the one or more duty cycles of the first set.

公开(公告)号：US20210327689A1

公开(公告)日：2021-10-21

申请号：US17363870

申请日：2021-06-30

Applicant: Lam Research Corporation

Inventor： Maolin Long ,  Neema Rastgar ,  Alexander Miller Paterson ,  Mark Merrill

IPC: H01J37/32 ,  H01L21/67

Abstract: A substrate processing system includes a processing chamber including a substrate support to support a substrate. A coil includes at least one terminal. An RF source configured to supply RF power to the coil. A dielectric window is arranged on one surface of the processing chamber adjacent to the coil. A contamination reducer includes a first plate that is arranged between the at least one terminal of the coil and the dielectric window.

公开(公告)号：US11011351B2

公开(公告)日：2021-05-18

申请号：US16035423

申请日：2018-07-13

Applicant: Lam Research Corporation

Inventor： Juline Shoeb ,  Alexander Miller Paterson ,  Ying Wu

IPC: H01L21/3065 ,  H01J37/32 ,  H01L21/67

Abstract: Systems and methods for generating monoenergetic ions are described. A duty cycle of a high parameter level of a multistate parameter signal is maintained and a difference between the high parameter level and a low parameter level of the multistate parameter signal is maintained to generate monoenergetic ions. The monoenergetic ions are used to etch a top material layer of a substrate at a rate that is self-limiting without substantially etching a bottom material layer of the substrate.