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21.发明授权Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby 有权光学元件，包括这种光学元件的光刻设备，器件制造方法以及由此制造的器件公开(公告)号：US08345223B2
公开(公告)日：2013-01-01
申请号：US12919741
申请日：2009-02-24
申请人： Wouter Anthon Soer , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Maarten Marinus Johannes Wilhelmus Van Herpen , Andrei Mikhailovich Yakunin
发明人： Wouter Anthon Soer , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Maarten Marinus Johannes Wilhelmus Van Herpen , Andrei Mikhailovich Yakunin
CPC分类号： G02B5/208 , B82Y10/00 , G02B5/0891 , G02B5/22 , G02B5/26 , G03F7/70191 , G03F7/702 , G03F7/70575 , G03F7/70958 , G21K1/067 , G21K2201/061 , G21K2201/064 , G21K2201/065 , G21K2201/067
摘要： An optical element includes a first layer that includes a first material, and is configured to be substantially reflective for radiation of a first wavelength and substantially transparent for radiation of a second wavelength. The optical element includes a second layer that includes a second material, and is configured to be substantially absorptive or transparent for the radiation of the second wavelength. The optical element includes a third layer that includes a third material between the first layer and the second layer, and is substantially transparent for the radiation of the second wavelength and configured to reduce reflection of the radiation of the second wavelength from a top surface of the second layer facing the first layer. The first layer is located upstream in the optical path of incoming radiation with respect to the second layer in order to improve spectral purity of the radiation of the first wavelength.
摘要翻译： 光学元件包括第一层，其包括第一材料，并且被配置为对于第一波长的辐射基本上是反射的，并且对于第二波长的辐射基本上是透明的。 光学元件包括第二层，其包括第二材料，并且被配置为对于第二波长的辐射是基本吸收或透明的。 光学元件包括第三层，其包括在第一层和第二层之间的第三材料，并且对于第二波长的辐射基本上是透明的，并且被配置为减少第二波长的辐射的反射从第二层的顶表面 第二层面向第一层。 为了提高第一波长的辐射的光谱纯度，第一层相对于第二层位于入射辐射的光路中的上游。
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22.发明申请SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD 审中-公开光谱滤光片，光刻设备和器件制造方法公开(公告)号：US20120182537A1
公开(公告)日：2012-07-19
申请号：US13497735
申请日：2010-08-02
申请人： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer , Martin Jacobus Johan Jak
发明人： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer , Martin Jacobus Johan Jak
CPC分类号： G03F7/70575 , G02B5/201 , G02B5/208
摘要： A spectral purity filter, in particular for use in a lithographic apparatus using EUV radiation for the projection beam, includes a plurality of apertures in a substrate. The apertures are defined by walls having side surfaces that are inclined to the normal to a front surface of the substrate.
摘要翻译： 光谱纯度滤光器，特别是在用于投影光束的EUV辐射的光刻设备中使用的光谱纯度滤光器包括衬底中的多个孔。 孔由具有倾斜到基底正面的法线侧面的壁限定。
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公开(公告)号：US20110226735A1
公开(公告)日：2011-09-22
申请号：US13051441
申请日：2011-03-18
申请人： Sander Frederik Wuister , Vadim Yevgenyevich Banine , Arie Jeffrey Den Boef , Yvonne Wendela Kruijt-Stegeman , Tatyana Viktorovna Rakhimova , Dmitriy Viktorovich Lopaev , Denis Alexandrovich Glushkov , Andrei Mikhailovich Yakunin , Roelof Koole
发明人： Sander Frederik Wuister , Vadim Yevgenyevich Banine , Arie Jeffrey Den Boef , Yvonne Wendela Kruijt-Stegeman , Tatyana Viktorovna Rakhimova , Dmitriy Viktorovich Lopaev , Denis Alexandrovich Glushkov , Andrei Mikhailovich Yakunin , Roelof Koole
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography method is disclosed that includes, after imprinting an imprint lithography template into a layer of imprintable medium to form a pattern in that imprintable medium and fixing that pattern to form a patterned layer of imprintable medium, adding etch resistant material (i.e. a hard mask) to a part of the patterned layer of imprintable medium to reduce a difference between an intended topography and an actual topography of that part of the patterned layer of imprintable medium.
摘要翻译： 公开了一种压印光刻方法，其包括在将压印光刻模板压印到可压印介质层中以在该可压印介质中形成图案并固定该图案以形成可压印介质的图案化层之后，添加耐蚀刻材料（即，硬 掩模）到可压印介质的图案化层的一部分，以减少所期望的形貌与可压印介质的图案化层的该部分的实际形貌之间的差异。
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公开(公告)号：US09897930B2
公开(公告)日：2018-02-20
申请号：US13057583
申请日：2009-07-22
申请人： Leonid Aizikovitch Sjmaenok , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Denis Alexandrovich Glushkov , Andrei Mikhailovich Yakunin
发明人： Leonid Aizikovitch Sjmaenok , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Denis Alexandrovich Glushkov , Andrei Mikhailovich Yakunin
IPC分类号： G03F7/20
CPC分类号： G03F7/70958 , G03F7/70191 , G03F7/702 , G03F7/70308 , G03F7/70575 , G03F7/70916
摘要： A lithographic apparatus includes an optical element that includes an oriented carbon nanotube sheet. The optical element has an element thickness in the range of about 20-500 nm and has a transmission for EUV radiation having a wavelength in the range of about 1-20 nm of at least about 20% under perpendicular irradiation with the EUV radiation.
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公开(公告)号：US09395630B2
公开(公告)日：2016-07-19
申请号：US13704222
申请日：2011-03-17
申请人： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Harmen Klaas Van Der Schoot , Lucas Henricus Johannes Stevens , Maarten Van Kampen
发明人： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Harmen Klaas Van Der Schoot , Lucas Henricus Johannes Stevens , Maarten Van Kampen
IPC分类号： G03F7/20 , B82Y10/00 , B82Y40/00 , C01B31/04 , G02B5/08 , G02B5/20 , G02B27/00 , G03F1/24 , G03F1/62 , G21K1/06 , H01B1/04 , H01B1/24 , G03B27/54
CPC分类号： G03F1/64 , B82Y10/00 , B82Y40/00 , C01B32/20 , G02B5/0816 , G02B5/0891 , G02B5/204 , G02B5/208 , G02B27/0006 , G03B27/54 , G03F1/24 , G03F1/62 , G03F7/70058 , G03F7/702 , G03F7/70916 , G03F7/70958 , G03F7/70983 , G21K1/062 , G21K2201/061 , H01B1/04 , H01B1/24
摘要： A lithographic apparatus includes a radiation source configured to produce a radiation beam, and a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam. A chamber is located between the radiation source and patterning device. The chamber contains at least one optical component configured to reflect the radiation beam, and is configured to permit radiation from the radiation source to pass therethrough. A membrane is configured to permit the passage of the radiation beam, and to prevent the passage of contamination particles through the membrane. A particle trapping structure is configured to permit gas to flow along an indirect path from inside the chamber to outside the chamber. The indirect path is configured to substantially prevent the passage of contamination particles from inside the chamber to outside the chamber.
摘要翻译： 光刻设备包括被配置为产生辐射束的辐射源和被配置为支撑图案形成装置的支撑件。 图案形成装置被配置为使辐射束具有图案以形成图案化的辐射束。 腔室位于辐射源和图案形成装置之间。 所述腔室包括被配置为反射辐射束的至少一个光学部件，并且被配置为允许来自辐射源的辐射通过。 膜被配置为允许辐射束的通过，并且防止污染颗粒通过膜的通过。 颗粒捕获结构被配置为允许气体沿着室内的间接路径流动到室外。 间接路径被配置为基本上防止污染颗粒从腔室内部通到室外。
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公开(公告)号：US09285690B2
公开(公告)日：2016-03-15
申请号：US13002854
申请日：2009-07-16
CPC分类号： G03F7/70958 , B82Y10/00 , G03F7/70575 , G21K1/062
摘要： Embodiments of the invention relate to a mirror (30). The mirror includes a mirroring surface and a profiled coating layer (32a) having an outer surface, wherein one or more wedged elements are formed by the outer surface with respect to the mirroring surface, and wherein the one or more wedged elements having a wedge angle (ø) in a range of approximately 10-200 mrad. The profiled coating layer may have a curved outer surface. The profiled coating layer may be formed from at least one of the following materials: Be, B, C, P, K, Ca, Sc, Br, Rb, Sr, Y, Zr, Ru, Nb, Mo, Ba, La, Ce, Pr, Pa and U.
摘要翻译： 本发明的实施例涉及一种反射镜（30）。 反射镜包括镜面和具有外表面的成型涂层（32a），其中一个或多个楔形元件相对于镜面由外表面形成，并且其中一个或多个楔形元件具有楔角 （ø）在约10-200 mrad的范围内。 成型涂层可以具有弯曲的外表面。 成型涂层可以由以下材料中的至少一种形成：Be，B，C，P，K，Ca，Sc，Br，Rb，Sr，Y，Zr，Ru，Nb，Mo，Ba，La， Ce，Pr，Pa和U.
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公开(公告)号：US20130088699A1
公开(公告)日：2013-04-11
申请号：US13704222
申请日：2011-03-17
申请人： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Harmen Klaas Van Der Schoot , Lucas Henricus Johannes Stevens , Maarten Van Kampen
发明人： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Harmen Klaas Van Der Schoot , Lucas Henricus Johannes Stevens , Maarten Van Kampen
CPC分类号： G03F1/64 , B82Y10/00 , B82Y40/00 , C01B32/20 , G02B5/0816 , G02B5/0891 , G02B5/204 , G02B5/208 , G02B27/0006 , G03B27/54 , G03F1/24 , G03F1/62 , G03F7/70058 , G03F7/702 , G03F7/70916 , G03F7/70958 , G03F7/70983 , G21K1/062 , G21K2201/061 , H01B1/04 , H01B1/24
摘要： A lithographic apparatus includes a radiation source configured to produce a radiation beam, and a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam. A chamber is located between the radiation source and patterning device. The chamber contains at least one optical component configured to reflect the radiation beam, and is configured to permit radiation from the radiation source to pass therethrough. A membrane is configured to permit the passage of the radiation beam, and to prevent the passage of contamination particles through the membrane. A particle trapping structure is configured to permit gas to flow along an indirect path from inside the chamber to outside the chamber. The indirect path is configured to substantially prevent the passage of contamination particles from inside the chamber to outside the chamber.
摘要翻译： 光刻设备包括被配置为产生辐射束的辐射源和被配置为支撑图案形成装置的支撑件。 图案形成装置被配置为使辐射束具有图案以形成图案化的辐射束。 腔室位于辐射源和图案形成装置之间。 所述腔室包括被配置为反射辐射束的至少一个光学部件，并且被配置为允许来自辐射源的辐射通过。 膜被配置为允许辐射束的通过，并且防止污染颗粒通过膜的通过。 颗粒捕获结构被配置为允许气体沿着室内的间接路径流动到室外。 间接路径被配置为基本上防止污染颗粒从腔室内部通到室外。
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公开(公告)号：US20110228243A1
公开(公告)日：2011-09-22
申请号：US13002854
申请日：2009-07-16
CPC分类号： G03F7/70958 , B82Y10/00 , G03F7/70575 , G21K1/062
摘要： Embodiments of the invention relate to a mirror (30). The mirror includes a mirroring surface and a profiled coating layer (32a) having an outer surface, wherein one or more wedged elements are formed by the outer surface with respect to the mirroring surface, and wherein the one or more wedged elements having a wedge angle (ø) in a range of approximately 10-200 mrad. The profiled coating layer may have a curved outer surface. The profiled coating layer may be formed from at least one of the following materials: Be, B, C, P, K, Ca, Sc, Br, Rb, Sr, Y, Zr, Ru, Nb, Mo, Ba, La, Ce, Pr, Pa and U.
摘要翻译： 本发明的实施例涉及一种反射镜（30）。 反射镜包括镜面和具有外表面的成型涂层（32a），其中一个或多个楔形元件相对于镜面由外表面形成，并且其中一个或多个楔形元件具有楔角 （ø）在约10-200 mrad的范围内。 成型涂层可以具有弯曲的外表面。 成形涂层可以由以下材料中的至少一种形成：Be，B，C，P，K，Ca，Sc，Br，Rb，Sr，Y，Zr，Ru，Nb，Mo，Ba，La， Ce，Pr，Pa和U.
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公开(公告)号：US20110043782A1
公开(公告)日：2011-02-24
申请号：US12860603
申请日：2010-08-20
申请人： Wouter Anthon Soer , Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen , Andrei Mikhailovich Yakunin , Martin Jacobus Johan Jak
发明人： Wouter Anthon Soer , Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen , Andrei Mikhailovich Yakunin , Martin Jacobus Johan Jak
CPC分类号： G03B27/72 , G02B27/46 , G03F7/70191 , G03F7/70575
摘要： A spectral purity filter includes a plurality of apertures extending through a member. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation, A first region of the spectral purity filter has a first configuration that results in a first radiation transmission profile for the radiation having the first wavelength and the radiation having the second wavelength, and a second region of the spectral purity filter has a second, different configuration that results in a second, different radiation transmission profile for the radiation having the first wavelength and the radiation having the second wavelength.
摘要翻译： 光谱纯度滤光器包括延伸穿过部件的多个孔。 孔被布置成抑制具有第一波长的辐射并且允许具有第二波长的辐射的至少一部分透射通过孔。 辐射的第二波长比辐射的第一波长短。光谱纯度滤光器的第一区域具有第一配置，其导致具有第一波长的辐射和具有第二波长的辐射的第一辐射透射曲线，以及 光谱纯度滤光器的第二区域具有第二不同的结构，其导致具有第一波长的辐射和具有第二波长的辐射的第二不同的辐射透射分布。
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30.发明授权Grazing incidence reflectors, lithographic apparatus, methods for manufacturing a grazing incidence reflector and methods for manufacturing a device 有权掠入射反射器，光刻设备，用于制造掠入射反射器的方法和用于制造器件的方法公开(公告)号：US09377695B2
公开(公告)日：2016-06-28
申请号：US13983214
申请日：2012-01-18
CPC分类号： G03F7/702 , B82Y10/00 , G02B5/0891 , G03F7/70058 , G21K1/062 , G21K2201/061
摘要： A grazing incidence reflector (300) for EUV radiation includes a first mirror layer (310) and a multilayer mirror structure (320) beneath the first mirror layer. The first mirror layer reflects at least partially EUV radiation incident on the reflector with grazing incidence angles in a first range, and the first mirror layer transmits EUV radiation in a second range of incidence angles, which overlaps and extends beyond the first range of incidence angles. The multilayer mirror structure reflects EUV radiation that is incident on the reflector with grazing incidence angles in a second range that penetrates through the first mirror layer. A grazing incidence reflector can be used in a lithographic apparatus and in manufacturing a device by a lithographic process.
摘要翻译： 用于EUV辐射的掠入射反射器（300）包括第一镜层下面的第一镜层（310）和多层反射镜结构（320）。 第一镜层反射入射在反射器上的至少一部分EUV辐射，其具有在第一范围内的掠入射角，并且第一镜层在与入射角的第一范围重叠并延伸超过入射角的第二范围内传输EUV辐射 。 多层反射镜结构反射入射在反射器上的EUV辐射，其中掠射入射角在穿过第一镜层的第二范围内。 掠入射反射器可以用在光刻设备中并且通过光刻工艺制造器件。
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