公开(公告)号：US20100037460A1

公开(公告)日：2010-02-18

申请号：US12581666

申请日：2009-10-19

申请人： Naozumi Nabeshima ,  Toru Yamane ,  Takumi Suzuki ,  Masahiko Kubota ,  Tamaki Sato ,  Ryoji Kanri ,  Maki Hatta ,  Kazuhiro Asai

发明人： Naozumi Nabeshima ,  Toru Yamane ,  Takumi Suzuki ,  Masahiko Kubota ,  Tamaki Sato ,  Ryoji Kanri ,  Maki Hatta ,  Kazuhiro Asai

IPC分类号： B21D53/76

CPC分类号： B41J2/1404 ,  B41J2/1603 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1639 ,  B41J2/1645 ,  Y10T29/49401

摘要： A liquid discharge head includes a substrate having an energy generating element configured to generate energy required to discharge liquid, a discharge port configured to discharge the liquid and provided in an opposed relationship to the energy generating element, a wall member defining a chamber adapted to store the energy required to discharge liquid the energy being generated by the energy generating element, a discharge portion defining a fluid path connecting the chamber and the discharge port, a supply path facilitating supplying the liquid into the chamber, and a pair of hollow portions provided in the wall member, wherein the hollow portions oppose each other and sandwich at least the entire discharge port in a direction from the discharge port to the substrate, and the hollow portions are independent of the chamber.

摘要翻译： 液体排出头包括具有能量产生元件的基板，该能量产生元件被配置为产生排出液体所需的能量，排出端口，其构造成排出液体并以与该能量产生元件相对的关系提供;壁构件，其限定适于存储的室 由能量产生元件产生的能量排出液体所需的能量，限定连接腔室和排放口的流体路径的排出部分，便于将液体供应到腔室中的供应路径以及设置在腔室中的一对中空部分 所述壁构件，其中所述中空部分彼此相对并且在从所述排出口到所述基板的方向上至少夹着所述排出口的整个排出口，并且所述中空部分与所述室独立。

公开(公告)号：US20070091151A1

公开(公告)日：2007-04-26

申请号：US11549871

申请日：2006-10-16

申请人： Naozumi Nabeshima ,  Toru Yamane ,  Takumi Suzuki ,  Masahiko Kubota ,  Tamaki Sato ,  Ryoji Kanri ,  Maki Hatta ,  Kazuhiro Asai

发明人： Naozumi Nabeshima ,  Toru Yamane ,  Takumi Suzuki ,  Masahiko Kubota ,  Tamaki Sato ,  Ryoji Kanri ,  Maki Hatta ,  Kazuhiro Asai

IPC分类号： B41J2/045

CPC分类号： B41J2/1404 ,  B41J2/1603 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1639 ,  B41J2/1645 ,  Y10T29/49401

摘要： A liquid discharge head includes a substrate having an energy generating element configured to generate energy required to discharge liquid, a discharge port configured to discharge the liquid and provided in an opposed relationship to the energy generating element, a wall member defining a chamber adapted to store the energy required to discharge liquid the energy being generated by the energy generating element, a discharge portion defining a fluid path connecting the chamber and the discharge port, a supply path facilitating supplying the liquid into the chamber, and a pair of hollow portions provided in the wall member, wherein the hollow portions oppose each other and sandwich at least the entire discharge port in a direction from the discharge port to the substrate, and the hollow portions are independent of the chamber.

摘要翻译： 液体排出头包括具有能量产生元件的基板，该能量产生元件被配置为产生排出液体所需的能量，排出端口，其构造成排出液体并以与该能量产生元件相对的关系提供;壁构件，其限定适于存储的室 由能量产生元件产生的能量排出液体所需的能量，限定连接腔室和排放口的流体路径的排出部分，便于将液体供应到腔室中的供应路径以及设置在腔室中的一对中空部分 所述壁构件，其中所述中空部分彼此相对并且在从所述排出口到所述基板的方向上至少夹着所述排出口的整个排出口，并且所述中空部分与所述室独立。

公开(公告)号：US08398212B2

公开(公告)日：2013-03-19

申请号：US12635948

申请日：2009-12-11

申请人： Akihiko Okano ,  Masahiko Kubota ,  Ryoji Kanri ,  Atsushi Hiramoto

发明人： Akihiko Okano ,  Masahiko Kubota ,  Ryoji Kanri ,  Atsushi Hiramoto

IPC分类号： B41J2/05

CPC分类号： B41J2/1404 ,  B41J2/14145 ,  B41J2/1603 ,  B41J2/1628 ,  B41J2/1634

摘要： An ink jet head includes a Si substrate with a surface having a {100} orientation; a passage holding ink on the Si substrate; an ink discharge port which is communicatively connected to the passage and through which ink is ejected; and a supply port which extends through the Si substrate, which is communicatively connected to the passage, and which supplies ink to the passage. The supply port has walls having two {111} planes facing each other.

摘要翻译： 喷墨头包括具有{100}取向的表面的Si衬底; 在Si衬底上保持油墨的通道; 墨水排出口，其连通地连接到通道并通过其喷射墨水; 以及供应端口，其延伸穿过Si衬底，其通信地连接到通道，并且向通道供应墨水。 供应端口具有彼此面对的两个{111}平面的壁。

公开(公告)号：US20090095708A1

公开(公告)日：2009-04-16

申请号：US12251229

申请日：2008-10-14

申请人： Masahiko Kubota ,  Akihiko Okano

发明人： Masahiko Kubota ,  Akihiko Okano

IPC分类号： G11B5/127

CPC分类号： B81C1/00523 ,  B41J2/1603 ,  B41J2/1628 ,  B41J2/1631 ,  B41J2002/14403 ,  B41J2002/14467

摘要： A method for manufacturing a liquid discharge head including a substrate on which supply ports for supplying a liquid are provided, includes forming a first supply port among the supply ports by performing crystal anisotropic etching on the substrate from one surface of the substrate, and forming a plurality of second supply ports among the supply ports by performing dry etching on the substrate using a crystal anisotropic etching method from a surface exposed toward the one surface of the substrate to a rear surface so that the independent second supply ports are respectively opened on the rear surface.

摘要翻译： 一种液体排出头的制造方法，其特征在于，具备：基板，其上设置有用于供给液体的供给口的基板，包括：在所述基板的一个表面上对所述基板进行结晶各向异性蚀刻，形成供给口中的第一供给口， 通过使用晶体各向异性蚀刻方法从从衬底的一个表面暴露的表面到后表面在基板上对基板进行干蚀刻，使得独立的第二供给端口分别在后部分别地开放，从而在供给端口中的多个第二供给口 表面。

公开(公告)号：US08778200B2

公开(公告)日：2014-07-15

申请号：US12251229

申请日：2008-10-14

申请人： Masahiko Kubota ,  Akihiko Okano

发明人： Masahiko Kubota ,  Akihiko Okano

IPC分类号： G01D15/00 ,  G11B5/127 ,  B81C1/00 ,  B41J2/16

CPC分类号： B81C1/00523 ,  B41J2/1603 ,  B41J2/1628 ,  B41J2/1631 ,  B41J2002/14403 ,  B41J2002/14467

摘要： A method for manufacturing a liquid discharge head including a substrate on which supply ports for supplying a liquid are provided, includes forming a first supply port among the supply ports by performing crystal anisotropic etching on the substrate from one surface of the substrate, and forming a plurality of second supply ports among the supply ports by performing dry etching on the substrate using a crystal anisotropic etching method from a surface exposed toward the one surface of the substrate to a rear surface so that the independent second supply ports are respectively opened on the rear surface.

摘要翻译： 一种液体排出头的制造方法，其特征在于，具备：基板，其上设置有用于供给液体的供给口的基板，包括：在所述基板的一个表面上对所述基板进行结晶各向异性蚀刻，形成供给口中的第一供给口， 通过使用晶体各向异性蚀刻方法从从衬底的一个表面暴露的表面到后表面在基板上对基板进行干蚀刻，使得独立的第二供给端口分别在后部分别地开放，从而在供给端口中的多个第二供给口 表面。

公开(公告)号：US08419168B2

公开(公告)日：2013-04-16

申请号：US13218851

申请日：2011-08-26

申请人： Akihiko Okano ,  Masahiko Kubota ,  Ryoji Kanri ,  Yoshiyuki Fukumoto ,  Masafumi Morisue

发明人： Akihiko Okano ,  Masahiko Kubota ,  Ryoji Kanri ,  Yoshiyuki Fukumoto ,  Masafumi Morisue

IPC分类号： B41J2/04

CPC分类号： B41J2/1603 ,  B41J2/1628 ,  B41J2/1631 ,  B41J2/1645 ,  Y10T29/49401

摘要： Provided is a liquid ejection head including a substrate including a liquid supply port and an energy generating element, in which the liquid supply port has at least one groove shape formed in a wall surface thereof, the at least one groove shape extending from a rear surface, which is a surface opposite to a front surface on which the energy generating element is formed, toward the front surface.

摘要翻译： 本发明提供一种液体喷射头，其特征在于，包括：液体供给口和能量产生元件的基板，所述液体供给口和能量产生元件的壁面形成有至少一个槽形状，所述至少一个槽形状从后表面 ，其是形成有能量产生元件的正面的表面朝向前表面。

公开(公告)号：US20110108532A1

公开(公告)日：2011-05-12

申请号：US12907349

申请日：2010-10-19

申请人： Kosuke Kurachi ,  Masahiko Kubota ,  Akihiko Okano ,  Atsushi Hiramoto

发明人： Kosuke Kurachi ,  Masahiko Kubota ,  Akihiko Okano ,  Atsushi Hiramoto

IPC分类号： B23K26/38

CPC分类号： B23K26/18 ,  B23K26/361 ,  B23K26/40 ,  B23K26/53 ,  B23K26/60 ,  B23K2103/50 ,  H01L21/268

摘要： Provided is a laser processing method capable of improving precision of a processing shape and degree of freedom of the processing shape. When a recess portion is formed in a substrate (W) which is an object to be processed, an inner portion of the substrate (W) is scanned with a condensing point (LS1) of modification laser light (L1) which is first laser light to form a modified layer (Wr) which becomes a boundary of a laser processing region (R1) in a position corresponding to a bottom part of the recess portion (modified layer forming step). Next, a surface (Wa) of the substrate (W) is irradiated with condensed processing laser light which is second laser light to remove and process the laser processing region (R1) defined by the modified layer (Wr), to thereby form the recess portion (removing/processing step).

摘要翻译： 提供了能够提高加工形状的精度和加工形状的自由度的激光加工方法。 当在作为被加工物的基板（W）上形成有凹部时，用作为第一激光的变形激光（L1）的聚光点（LS1）扫描基板（W）的内部， 形成在与凹部（修饰层形成工序）的底部对应的位置成为激光加工区域（R1）的边界的改质层（Wr）。 接下来，用作为第二激光的聚光处理用激光照射基板（W）的表面（Wa），以去除并处理由改性层（Wr）限定的激光加工区域（R1），从而形成凹部 部分（去除/处理步骤）。

公开(公告)号：US09023669B2

公开(公告)日：2015-05-05

申请号：US13186740

申请日：2011-07-20

申请人： Atsushi Hiramoto ,  Masahiko Kubota ,  Ryoji Kanri ,  Akihiko Okano ,  Yoshiyuki Fukumoto ,  Atsunori Terasaki

发明人： Atsushi Hiramoto ,  Masahiko Kubota ,  Ryoji Kanri ,  Akihiko Okano ,  Yoshiyuki Fukumoto ,  Atsunori Terasaki

IPC分类号： H01L21/3065 ,  B41J2/16

CPC分类号： B41J2/1603 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2002/14467 ,  H01L21/30655

摘要： A processing method of a silicon substrate including forming a second opening in a bottom portion of a first opening using a patterning mask having a pattern opening by plasma reactive ion etching. The reactive ion etching is performed with a shield structure formed in or on the silicon substrate, the shield structure preventing inside of the first opening from being exposed to the plasma.

摘要翻译： 一种硅衬底的处理方法，包括使用具有通过等离子体反应离子蚀刻的图案开口的图案化掩模在第一开口的底部形成第二开口。 反应离子蚀刻通过形成在硅衬底中或之上的屏蔽结构进行，防止第一开口内部的屏蔽结构暴露于等离子体。

公开(公告)号：US08366951B2

公开(公告)日：2013-02-05

申请号：US12629238

申请日：2009-12-02

申请人： Masafumi Morisue ,  Takumi Suzuki ,  Masahiko Kubota ,  Ryoji Kanri ,  Akihiko Okano ,  Atsushi Hiramoto

发明人： Masafumi Morisue ,  Takumi Suzuki ,  Masahiko Kubota ,  Ryoji Kanri ,  Akihiko Okano ,  Atsushi Hiramoto

IPC分类号： G01D15/00

CPC分类号： B41J2/1404 ,  B41J2/1603 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1634 ,  B41J2/1639 ,  B41J2/1645 ,  B41J2002/14467 ,  Y10T29/494

摘要： A liquid discharge head includes an Si substrate which is provided with an element for generating energy used in discharging a liquid and a liquid supply port which is provided to pass through the Si substrate from a first surface to a rear surface so as to supply a liquid to the element. A method of manufacturing the substrate includes: forming a plurality of concave portions on the rear surface of the Si substrate of which a plane orientation is {100}, the concave portions facing the first surface and aligned in rows along a direction of the Si substrate; and forming a plurality of the liquid supply ports by carrying out a crystal axis anisotropic etching on the Si substrate through the concave portions using an etching liquid of which an etching rate of the {100} plane of the Si substrate is slower than that of the {110} plane of the Si substrate.

摘要翻译： 液体排出头包括：Si基板，其设置有用于产生用于排出液体的能量的元件;以及液体供给口，其被设置成从第一表面到后表面穿过Si基板，以便供应液体 到元素 制造基板的方法包括：在Si基板的后表面上形成多个凹部，其平面取向为{100}，所述凹部面向第一表面并沿着<100> Si衬底; 并且通过使用其中Si衬底的{100}面的蚀刻速率慢于所述Si衬底的蚀刻速率的蚀刻液，通过所述凹部对所述Si衬底进行晶轴各向异性蚀刻来形成多个所述液体供给口 {110}面的Si衬底。

公开(公告)号：US20100149260A1

公开(公告)日：2010-06-17

申请号：US12635948

申请日：2009-12-11

申请人： Akihiko Okano ,  Masahiko Kubota ,  Ryoji Kanri ,  Atsushi Hiramoto

发明人： Akihiko Okano ,  Masahiko Kubota ,  Ryoji Kanri ,  Atsushi Hiramoto

IPC分类号： B41J2/135 ,  G11B5/127

CPC分类号： B41J2/1404 ,  B41J2/14145 ,  B41J2/1603 ,  B41J2/1628 ,  B41J2/1634

摘要： An ink jet head includes a Si substrate with a surface having a {100} orientation; a passage holding ink on the Si substrate; an ink discharge port which is communicatively connected to the passage and through which ink is ejected; and a supply port which extends through the Si substrate, which is communicatively connected to the passage, and which supplies ink to the passage. The supply port has walls having two {111} planes facing each other.

摘要翻译： 喷墨头包括具有{100}取向的表面的Si衬底; 在Si衬底上保持油墨的通道; 墨水排出口，其连通地连接到通道并通过其喷射墨水; 以及供应端口，其延伸穿过Si衬底，其通信地连接到通道，并且向通道供应墨水。 供应端口具有彼此面对的两个{111}平面的壁。