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21.发明申请Method of covering clear aperture of optic during deposition of glue protection layer 审中-公开在胶保护层沉积期间覆盖光学透明孔的方法公开(公告)号：US20080038456A1
公开(公告)日：2008-02-14
申请号：US11826197
申请日：2007-07-12
申请人： Matthew Lipson
发明人： Matthew Lipson
IPC分类号： B05D5/06
CPC分类号： B05D1/322
摘要： A system and method that can be used to cover a portion (e.g., a clear aperture) of an optical element (e.g., a lens) during coating of another portion (e.g., a circumferential portion) of the optical element. This can be done to protect the clear aperture during coating of an adhesive protection layer proximate a circumferential edge of the lens without damaging or altering the clear aperture. The method can include the following steps. An optical element is held so that a first portion of the optical element is covered and a second portion of the optical element is exposed. A first coating is provided on the second portion of the optical element. The optical element is released from being held. A second coating is provided on the optical element. The first and second coatings are removed from the second portion of the optical element.
摘要翻译： 一种可用于在光学元件的另一部分（例如，圆周部分）的涂覆期间覆盖光学元件（例如，透镜）的部分（例如，透明孔径）的系统和方法。 这可以在粘合剂保护层在透镜的周缘边缘附近的涂覆期间保护透明孔径而不损坏或改变透明孔径。 该方法可以包括以下步骤。 保持光学元件使得光学元件的第一部分被覆盖，并且光学元件的第二部分被暴露。 第一涂层设置在光学元件的第二部分上。 光学元件被释放而不被保持。 在光学元件上设置第二涂层。 从光学元件的第二部分去除第一和第二涂层。
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公开(公告)号：US20060072088A1
公开(公告)日：2006-04-06
申请号：US10957751
申请日：2004-10-05
申请人： Matthew Lipson , Marcel Mathijs Dierichs , Sjoerd Nicolaas Donders , Johannes Catharinus Mulkens , Bob Streefkerk , Ronald Wilklow , Roel De Jonge
发明人： Matthew Lipson , Marcel Mathijs Dierichs , Sjoerd Nicolaas Donders , Johannes Catharinus Mulkens , Bob Streefkerk , Ronald Wilklow , Roel De Jonge
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： A lithographic apparatus is provided in which exposure is carried out by projecting through an aqueous solution of alkali metal halide(s), the solution being in contact with the substrate to be exposed.
摘要翻译： 提供了一种光刻设备，其中通过突出通过碱金属卤化物的水溶液进行曝光，该溶液与待暴露的基板接触。
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公开(公告)号：US20050094119A1
公开(公告)日：2005-05-05
申请号：US10927531
申请日：2004-08-27
申请人： Erik Loopstra , Johannes Baselmans , Marcel Mathijs Theodore Dierichs , Johannes Jasper , Hendricus Meijer , Uwe MicKan , Johannes Catharinus Mulkens , Matthew Lipson , Tammo Utterdijk
发明人： Erik Loopstra , Johannes Baselmans , Marcel Mathijs Theodore Dierichs , Johannes Jasper , Hendricus Meijer , Uwe MicKan , Johannes Catharinus Mulkens , Matthew Lipson , Tammo Utterdijk
IPC分类号： H01L21/027 , G02B1/10 , G03F7/20 , G03B27/54
CPC分类号： G03F7/70966 , G03F7/70341 , G03F7/70958 , G03F7/70983 , Y10S430/162
摘要： A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
摘要翻译： 公开了一种与位于投影系统和基板之间的浸没液体一起使用的光刻投影装置。 公开了几种方法和机构来保护投影系统，衬底台和液体限制系统的组件。 这些包括在投影系统的最终元件上提供保护涂层，以及在部件上游提供一个或多个牺牲体。 还公开了CaF 2 2的双组分最终光学元件。
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24.发明授权公开(公告)号：US09330912B2
公开(公告)日：2016-05-03
申请号：US13238941
申请日：2011-09-21
IPC分类号： G03B27/52 , G03B27/42 , H01L21/027 , G03F7/20
CPC分类号： H01L21/0274 , G03F7/70341
摘要： A system for tuning the refractive index of immersion liquid in an immersion lithographic apparatus is disclosed. Two or more immersion liquids of different refractive index are mixed together in order to achieve a desired refractive index. Further, the fluids may be conditioned and treated to maintain optical characteristics.
摘要翻译： 公开了一种用于调节浸没式光刻设备中浸没液的折射率的系统。 将两种或更多种不同折射率的浸液混合在一起以达到所需的折射率。 此外，流体可以被调节和处理以保持光学特性。
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25.发明申请公开(公告)号：US20130308116A1
公开(公告)日：2013-11-21
申请号：US13991089
申请日：2011-09-21
申请人： Peter Richard Helmus , Matthew Lipson , Ronald A. Wilklow , James Kennon , Kennard White , Wilbur Jordan Reichmann, II
发明人： Peter Richard Helmus , Matthew Lipson , Ronald A. Wilklow , James Kennon , Kennard White , Wilbur Jordan Reichmann, II
CPC分类号： G03F7/70708 , G03F7/70691 , H01L21/6833 , H02N13/00
摘要： An electrostatic clamp for use in a lithographic apparatus includes burls and an electrode surrounded by an insulator and/or a dielectric material between adjacent burls. In an embodiment, two or more layers of dielectric material are provided between adjacent burls and surround an electrode provided between adjacent burls. The electrostatic clamp may be used to clamp an object to an object support in a lithographic apparatus.
摘要翻译： 用于光刻设备的静电夹具包括毛刺和由绝缘体和/或相邻毛边之间的介电材料包围的电极。 在一个实施例中，两层或更多层电介质材料设置在相邻的孔之间并且围绕设置在相邻的孔之间的电极。 静电夹可用于将物体夹持在光刻设备中的物体支撑件上。
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26.发明授权Lithographic apparatus with a fluid combining unit and related device manufacturing method 有权具有流体组合单元和相关器件制造方法的平版印刷设备公开(公告)号：US08045135B2
公开(公告)日：2011-10-25
申请号：US11603255
申请日：2006-11-22
CPC分类号： H01L21/0274 , G03F7/70341
摘要： A system for tuning the refractive index of immersion liquid in an immersion lithographic apparatus is disclosed. Two or more immersion liquids of different refractive index are mixed together in order to achieve a desired refractive index. Further, the fluids may be conditioned and treated to maintain optical characteristics.
摘要翻译： 公开了一种用于调节浸没式光刻设备中浸没液的折射率的系统。 将两种或更多种不同折射率的浸液混合在一起以达到所需的折射率。 此外，流体可以被调节和处理以保持光学特性。
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公开(公告)号：US07894040B2
公开(公告)日：2011-02-22
申请号：US10957751
申请日：2004-10-05
申请人： Matthew Lipson , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk , Ronald Wilklow , Roel De Jonge
发明人： Matthew Lipson , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk , Ronald Wilklow , Roel De Jonge
IPC分类号： G03B27/54
CPC分类号： G03F7/70341
摘要： A lithographic apparatus is provided in which exposure is carried out by projecting through an aqueous solution of alkali metal halide(s), the solution being in contact with the substrate to be exposed.
摘要翻译： 提供了一种光刻设备，其中通过突出通过碱金属卤化物的水溶液进行曝光，该溶液与待暴露的基板接触。
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公开(公告)号：US20100128242A1
公开(公告)日：2010-05-27
申请号：US12700049
申请日：2010-02-04
CPC分类号： H01L21/68757 , G03F7/707 , Y10T156/10 , Y10T156/1089 , Y10T428/24744
摘要： A wafer chuck for use in a lithographic apparatus, which includes a low-thermal expansion glass ceramic substrate, a silicon silicon carbide layer, and a bonding layer comprising silicate having a strength of at least about 5 megapascals, the bonding layer attaching the silicon silicon carbide layer to the substrate is described. Also, a method of forming a wafer chuck for use in a lithographic apparatus, which includes coating a portion of one or both of a low-thermal expansion glass ceramic substrate and a silicon silicon carbide layer with a bonding solution, and contacting the substrate and the silicon silicon carbide layer to bond the substrate and the silicon silicon carbide layer together is described.
摘要翻译： 一种用于光刻设备的晶片卡盘，其包括低热膨胀玻璃陶瓷基板，硅碳化硅层和包括具有至少约5兆帕的强度的硅酸盐的粘合层，所述粘合层将硅硅 描述了到基底的碳化物层。 另外，一种形成用于光刻设备的晶片卡盘的方法，其包括用粘合溶液涂覆低热膨胀玻璃陶瓷基板和硅碳化硅中的一个或两个的一部分，并使基板和 描述了将基板和硅碳化硅层结合在一起的硅碳化硅层。
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公开(公告)号：US07678458B2
公开(公告)日：2010-03-16
申请号：US11626747
申请日：2007-01-24
CPC分类号： H01L21/68757 , G03F7/707 , Y10T156/10 , Y10T156/1089 , Y10T428/24744
摘要： A wafer chuck for use in a lithographic apparatus, which includes a low-thermal expansion glass ceramic substrate, a silicon silicon carbide layer, and a bonding layer comprising silicate having a strength of at least about 5 megapascals, the bonding layer attaching the silicon silicon carbide layer to the substrate is described. Also, a method of forming a wafer chuck for use in a lithographic apparatus, which includes coating a portion of one or both of a low-thermal expansion glass ceramic substrate and a silicon silicon carbide layer with a bonding solution, and contacting the substrate and the silicon silicon carbide layer to bond the substrate and the silicon silicon carbide layer together is described.
摘要翻译： 一种用于光刻设备的晶片卡盘，其包括低热膨胀玻璃陶瓷基板，硅碳化硅层和包括具有至少约5兆帕的强度的硅酸盐的粘合层，所述粘合层将硅硅 描述了到基底的碳化物层。 另外，一种形成用于光刻设备的晶片卡盘的方法，其包括用粘合溶液涂覆低热膨胀玻璃陶瓷基板和硅碳化硅中的一个或两个的一部分，并使基板和 描述了将基板和硅碳化硅层结合在一起的硅碳化硅层。
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公开(公告)号：US20080117392A1
公开(公告)日：2008-05-22
申请号：US11603255
申请日：2006-11-22
IPC分类号： G03B27/52
CPC分类号： H01L21/0274 , G03F7/70341
摘要： Lithographic Apparatus and Device Manufacturing Method A system for tuning the refractive index of immersion liquid in an immersion lithographic apparatus is disclosed. Two or more immersion liquids of different refractive index are mixed together in order to achieve a desired refractive index. Further, the fluids may be conditioned and treated to maintain optical characteristics.
摘要翻译： 平版印刷设备和设备制造方法公开了一种用于调节浸没式光刻设备中浸没液体的折射率的系统。 将两种或更多种不同折射率的浸液混合在一起以达到所需的折射率。 此外，流体可以被调节和处理以保持光学特性。
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