公开(公告)号：US08537335B2

公开(公告)日：2013-09-17

申请号：US12917956

申请日：2010-11-02

Applicant: Markus Schwab ,  Michael Layh ,  Markus Deguenther ,  Artur Hoegele

Inventor： Markus Schwab ,  Michael Layh ,  Markus Deguenther ,  Artur Hoegele

IPC: G03B27/54 ,  G03B27/42

CPC classification number: G03F7/70116 ,  G03F7/70075

Abstract: An illumination system for a microlithography projection exposure apparatus for illuminating an illumination field with the light from a primary light source has a variably adjustable pupil shaping unit for receiving light from the primary light source and for generating a variably adjustable two-dimensional intensity distribution in a pupil shaping surface of the illumination system. The pupil shaping unit has a Fourier optical system for converting an entrance beam bundle entering through an entrance plane of the Fourier optical system into an exit beam bundle exiting from an exit plane of the Fourier optical system. The Fourier optical system has a focal length fFOS and a structural length L measured between an entrance-side first system surface and an exit-side last system surface along an optical axis, where (L/fFOS)

Abstract translation: 一种用于利用来自初级光源的光照射照明场的微光刻投影曝光设备的照明系统具有可变地调节的瞳孔成形单元，用于接收来自主光源的光并且用于产生可变地调节的二维强度分布 照明系统的瞳孔成形表面。 瞳孔成形单元具有傅里叶光学系统，用于将通过傅立叶光学系统的入射面进入的入射束束转换成从傅立叶光学系统的出射平面离开的出射光束束。 傅里叶光学系统具有焦距fFOS和在沿着光轴的入射侧第一系统表面和出射侧最后系统表面之间测量的结构长度L，其中（L / fFOS）<1/6。

公开(公告)号：US20130148092A1

公开(公告)日：2013-06-13

申请号：US13760268

申请日：2013-02-06

Applicant: Johannes Wangler ,  Heiko Siekmann ,  Kenneth Weible ,  Ralf Scharnweber ,  Manfred Maul ,  Markus Deguenther ,  Michael Layh ,  Axel Scholz ,  Uwe Spengler ,  Reinhard Voelkel

Inventor： Johannes Wangler ,  Heiko Siekmann ,  Kenneth Weible ,  Ralf Scharnweber ,  Manfred Maul ,  Markus Deguenther ,  Michael Layh ,  Axel Scholz ,  Uwe Spengler ,  Reinhard Voelkel

IPC: G03F7/20

CPC classification number: G03F7/70191 ,  G02B3/0056 ,  G02B27/0911 ,  G03F7/70058 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70158

Abstract: Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.

公开(公告)号：US08339577B2

公开(公告)日：2012-12-25

申请号：US12506364

申请日：2009-07-21

Applicant: Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Andras G. Major ,  Manfred Maul ,  Johannes Eisenmenger ,  Damian Fiolka ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Johannes Wangler ,  Michael Layh

Inventor： Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Andras G. Major ,  Manfred Maul ,  Johannes Eisenmenger ,  Damian Fiolka ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Johannes Wangler ,  Michael Layh

IPC: G01C11/26 ,  G01N21/00 ,  G03B27/32 ,  G03B27/54 ,  G03B27/74

CPC classification number: G03F7/70258 ,  G01B11/002 ,  G01B11/272 ,  G01M11/30 ,  G01N21/55 ,  G02B26/0833 ,  G03F7/70058 ,  G03F7/70116 ,  G03F7/70133 ,  G03F7/702 ,  G03F7/70291 ,  G03F7/70516 ,  G03F7/7085 ,  G05B13/048 ,  Y10S359/904

Abstract: An illumination system of a microlithographic projection exposure apparatus has a pupil surface and an essentially flat arrangement of desirably individually drivable beam deviating elements for variable illumination of the pupil surface. Each beam deviating element allows deviation of a projection light beam incident on it to be achieved as a function of a control signal applied to the beam deviating element. A measurement illumination instrument directs a measurement light beam, independent of the projection light beams, onto a beam deviating element. A detector instrument records the measurement light beam after deviation by the beam deviating element. An evaluation unit determines the deviation of the projection light beam from measurement signals provided by the detector instrument.

Abstract translation: 微光刻投影曝光装置的照明系统具有瞳孔表面和基本上平坦的布置，其具有期望地单独驱动的光束偏离元件，用于可变照明瞳孔表面。 每个光束偏离元件允许作为施加到光束偏离元件的控制信号的函数来实现入射到其上的投影光束的偏移。 测量照明仪器将独立于投影光束的测量光束引导到光束偏离元件上。 检测仪器在光束偏离元件偏离后记录测量光束。 评估单元确定投影光束与由检测器仪器提供的测量信号的偏差。

公开(公告)号：US20120242968A1

公开(公告)日：2012-09-27

申请号：US13421024

申请日：2012-03-15

Applicant: Michael Layh ,  Markus Deguenther

Inventor： Michael Layh ,  Markus Deguenther

IPC: G03B27/54

CPC classification number: G03F7/70075 ,  G03F7/70083 ,  G03F7/70191 ,  G03F7/702

Abstract: A method includes moving a correction device into a neutral position; subsequently ascertaining, for a given arrangement of imaging light channels in the illumination optical unit of the projection exposure apparatus, intensity distributions of at least some of the individual imaging light partial beams along a transverse coordinate transverse to a displacement direction of an object to be imaged; subsequently ascertaining, in dependence on the transverse coordinate, an actual variation of actual values of structure image sizes of object structures in an image field, onto which the object is imaged; and subsequently specifying a predetermined variation of the structure image sizes over the transverse coordinate and displacing correction elements of the correction device, starting from the neutral position, such that the actual variation matches the predetermined variation within a tolerance bandwidth. The method can provide improved imaging results as compared to known uniformity adjustment.

Abstract translation: 一种方法包括将校正装置移动到中立位置; 随后确定对于投影曝光设备的照明光学单元中的成像光通道的给定布置，沿着横向于待成像对象的位移方向的横向坐标的各个成像光部分光束的至少一些的强度分布 ; 随后根据横坐标确定对象被成像的图像场中的对象结构的结构图像尺寸的实际值的实际变化; 并且随后从中性位置开始指定校正装置的横向坐标和位移校正元件上的结构图像尺寸的预定变化，使得实际变化与公差带宽内的预定变化相匹配。 与已知的均匀度调整相比，该方法可以提供改善的成像结果。

公开(公告)号：US20110177463A1

公开(公告)日：2011-07-21

申请号：US13038453

申请日：2011-03-02

Applicant: Michael Layh ,  Ralf Stuetzle ,  Damian Fiolka ,  Martin Endres ,  Holger Weigand

Inventor： Michael Layh ,  Ralf Stuetzle ,  Damian Fiolka ,  Martin Endres ,  Holger Weigand

IPC: G03F7/20 ,  G21K5/00

CPC classification number: G03F7/70083 ,  G02B17/0605 ,  G02B17/0647 ,  G02B27/0043 ,  G03F7/70033 ,  G03F7/70075

Abstract: An illumination system for EUV microlithography includes an EUV light source which generates EUV illumination light with an etendue that is higher than 0.01 mm2. The EUV light source generates a sequence of EUV light pulses having a pulse sequence frequency. An illumination optics of the illumination system is used to guide the illumination light from the light source to an object field. At least one optical modulation component of the illumination system is preferably modulatable synchronously with the pulse sequence frequency. The result is an illumination system where a homogeneity of an object field illumination is improved.

Abstract translation: 用于EUV微光刻的照明系统包括产生具有高于0.01mm 2的光密度的EUV照明光的EUV光源。 EUV光源产生具有脉冲序列频率的EUV光脉冲序列。 照明系统的照明光学器件用于将来自光源的照明光引导到物场。 照明系统的至少一个光调制部件优选地可以与脉冲序列频率同步地进行调制。 其结果是改善了物场照明的均匀性的照明系统。

公开(公告)号：US20110102758A1

公开(公告)日：2011-05-05

申请号：US12917956

申请日：2010-11-02

Applicant: Markus Schwab ,  Michael Layh ,  Markus Deguenther ,  Artur Hoegele

Inventor： Markus Schwab ,  Michael Layh ,  Markus Deguenther ,  Artur Hoegele

IPC: G03B27/54

CPC classification number: G03F7/70116 ,  G03F7/70075

Abstract: An illumination system for a microlithography projection exposure apparatus for illuminating an illumination field with the light from a primary light source has a variably adjustable pupil shaping unit for receiving light from the primary light source and for generating a variably adjustable two-dimensional intensity distribution in a pupil shaping surface of the illumination system. The pupil shaping unit has a Fourier optical system for converting an entrance beam bundle entering through an entrance plane of the Fourier optical system into an exit beam bundle exiting from an exit plane of the Fourier optical system. The Fourier optical system has a focal length fFOS and a structural length L measured between an entrance-side first system surface and an exit-side last system surface along an optical axis, where (L/fFOS)

Abstract translation: 一种用于利用来自初级光源的光照射照明场的微光刻投影曝光设备的照明系统具有可变地调节的瞳孔成形单元，用于接收来自主光源的光并且用于产生可变地调节的二维强度分布 照明系统的瞳孔成形表面。 瞳孔成形单元具有傅里叶光学系统，用于将通过傅立叶光学系统的入射面进入的入射束束转换成从傅立叶光学系统的出射平面离开的出射光束束。 傅里叶光学系统具有焦距fFOS和在沿着光轴的入射侧第一系统表面和出射侧最后系统表面之间测量的结构长度L，其中（L / fFOS）<1/6。

公开(公告)号：US20110083542A1

公开(公告)日：2011-04-14

申请号：US12973234

申请日：2010-12-20

Applicant: Oliver Wolf ,  Heiko Siekmann ,  Eva Kalchbrenner ,  Siegfried Rennon ,  Johannes Wangler ,  Andre Bresan ,  Michael Gerhard ,  Nils Haverkamp ,  Axel Scholz ,  Ralf Scharnweber ,  Michael Layh ,  Stefan Burkart

Inventor： Oliver Wolf ,  Heiko Siekmann ,  Eva Kalchbrenner ,  Siegfried Rennon ,  Johannes Wangler ,  Andre Bresan ,  Michael Gerhard ,  Nils Haverkamp ,  Axel Scholz ,  Ralf Scharnweber ,  Michael Layh ,  Stefan Burkart

IPC: B26D3/06 ,  B26D7/27

CPC classification number: G03F7/70958 ,  G03F7/70075 ,  Y10T83/0304 ,  Y10T83/04

Abstract: The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems.

Abstract translation: 本发明涉及一种被配置为在微光刻投影曝光设备的照明系统中产生多个次级光源的光学积分器。 本公开还涉及制造用于这种照明系统的细长微透镜阵列的方法。 细长微透镜的数组经常被包含在这种照明系统的光学积分器或散射板中。

公开(公告)号：US09304400B2

公开(公告)日：2016-04-05

申请号：US13038453

申请日：2011-03-02

Applicant: Michael Layh ,  Ralf Stuetzle ,  Damian Fiolka ,  Martin Endres ,  Holger Weigand

Inventor： Michael Layh ,  Ralf Stuetzle ,  Damian Fiolka ,  Martin Endres ,  Holger Weigand

IPC: G03B27/54 ,  G03F7/20 ,  G02B17/06 ,  G02B27/00

CPC classification number: G03F7/70083 ,  G02B17/0605 ,  G02B17/0647 ,  G02B27/0043 ,  G03F7/70033 ,  G03F7/70075

Abstract: An illumination system for EUV microlithography includes an EUV light source which generates EUV illumination light with an etendue that is higher than 0.01 mm2. The EUV light source generates a sequence of EUV light pulses having a pulse sequence frequency. An illumination optics of the illumination system is used to guide the illumination light from the light source to an object field. At least one optical modulation component of the illumination system is preferably modulatable synchronously with the pulse sequence frequency. The result is an illumination system where a homogeneity of an object field illumination is improved.

Abstract translation: 用于EUV微光刻的照明系统包括产生具有高于0.01mm 2的光密度的EUV照明光的EUV光源。 EUV光源产生具有脉冲序列频率的EUV光脉冲序列。 照明系统的照明光学器件用于将来自光源的照明光引导到物场。 照明系统的至少一个光调制部件优选地可以与脉冲序列频率同步地进行调制。 其结果是改善了物场照明的均匀性的照明系统。

公开(公告)号：US20140233006A1

公开(公告)日：2014-08-21

申请号：US14255302

申请日：2014-04-17

Applicant: Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Manfred Maul ,  Johannes Eisenmenger ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Damian Fiolka ,  Andras G. Major ,  Johannes Wangler ,  Michael Layh

Inventor： Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Manfred Maul ,  Johannes Eisenmenger ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Damian Fiolka ,  Andras G. Major ,  Johannes Wangler ,  Michael Layh

IPC: G03F7/20 ,  G01N21/55

CPC classification number: G03F7/70258 ,  G01B11/002 ,  G01B11/272 ,  G01M11/30 ,  G01N21/55 ,  G02B26/0833 ,  G03F7/70058 ,  G03F7/70116 ,  G03F7/70133 ,  G03F7/702 ,  G03F7/70291 ,  G03F7/70516 ,  G03F7/7085 ,  G05B13/048 ,  Y10S359/904

Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.

公开(公告)号：US08724086B2

公开(公告)日：2014-05-13

申请号：US12818844

申请日：2010-06-18

Applicant: Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

Inventor： Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

IPC: G03B27/54

CPC classification number: G03F7/702 ,  G02B5/09 ,  G02B26/105 ,  G03F7/70116 ,  G03F7/7055 ,  G03F7/70583

Abstract: A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(γ) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points. The illumination optics further contain at least one optical system to temporally stabilize the illumination of the multi-mirror array so that, for each object field point, the intensity distribution in the associated exit pupil deviates from a second adjusted intensity distribution in the associated exit pupil by less than 0.1 in at least one of an inner σ or an outer σ.

Abstract translation: 公开了一种用于微光刻的投影曝光装置，包括用于照射物平面中的物场的对象场点的照明光学装置。 对于物场的每个物场点，照明光学器件具有与对象点相关联的出射光瞳，其中sin（γ）是出射光瞳的最大边缘角度值。 照明光学器件包括多镜阵列，其包括多个反射镜以调整与对象场点相关联的出射光瞳中的强度分布。 照明光学器件还包含至少一个光学系统，用于在时间上稳定多镜阵列的照明，使得对于每个物体场点，相关出射光瞳中的强度分布偏离相关出射光瞳中的第二调整的强度分布 在内部和外部的至少一个中小于0.1; 或外部的。