公开(公告)号：US07750059B2

公开(公告)日：2010-07-06

申请号：US10313596

申请日：2002-12-04

申请人： Gun Young Jung ,  Sivapackia Ganapathiappan ,  Yong Chen ,  R. Stanley Williams

发明人： Gun Young Jung ,  Sivapackia Ganapathiappan ,  Yong Chen ,  R. Stanley Williams

IPC分类号： B29C35/08

CPC分类号： B29C43/003 ,  B29C35/0888 ,  B29C59/022 ,  B29C2035/0827 ,  B29C2043/025 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/033

摘要： A method of forming features on substrates by imprinting is provided. The method comprises: (a) forming a polymer solution comprising at least one polymer dissolved in at least one polymerizable monomer; and (b) depositing the polymer solution on a substrate to form a liquid film thereon; and then either: (c) curing the liquid film by causing the monomer(s) to polymerize and optionally cross-linking the polymer(s) to thereby form a polymer film, the polymer film having a glass transition temperature (Tg); and imprinting the polymer film with a mold having a desired pattern to form a corresponding negative pattern in the polymer film, or (d) imprinting the liquid film with the mold and curing it to form the polymer film. The temperature of imprinting is as little as 10° C. above the Tg, or even less if the film is in the liquid state. The pressure of the imprinting can be within the range of 100 to 500 psi.

摘要翻译： 提供了通过压印在基板上形成特征的方法。 该方法包括：（a）形成包含至少一种溶解在至少一种可聚合单体中的聚合物的聚合物溶液; 和（b）将聚合物溶液沉积在基底上以在其上形成液膜; 然后：（c）通过使单体聚合并任选地交联聚合物从而形成聚合物膜来固化液膜，所述聚合物膜具有玻璃化转变温度（Tg）; 并用具有所需图案的模具印刷聚合物膜，以在聚合物膜中形成相应的负图案，或（d）用模具印刷液膜并固化以形成聚合物膜。 压印温度比Tg高出10℃，或者如果薄膜处于液体状态，则其温度更低。 压印的压力可以在100-500psi的范围内。

公开(公告)号：US20100072262A1

公开(公告)日：2010-03-25

申请号：US12284536

申请日：2008-09-23

申请人： Kenji Sugawara ,  Yong Chen

发明人： Kenji Sugawara ,  Yong Chen

IPC分类号： B23K31/00

CPC分类号： B23K20/004 ,  B23K20/26 ,  H01L24/78 ,  H01L2224/78 ,  H01L2224/78301 ,  H01L2224/859 ,  H01L2924/00014 ,  H01L2224/48 ,  H01L2224/45099 ,  H01L2224/05599 ,  H01L2924/00

摘要： A wire bonding method capable of further improving accuracy in wire bonding and realizing faster wire bonding including: transferring a semiconductor chip to a bonding center; capturing an image of a bonding point on the semiconductor chip; recognizing a position of the bonding point; performing wire bonding to the bonding point that has been corrected; capturing a post-bonding image of the semiconductor chip; transferring a next semiconductor chip to the bonding center; capturing an image of a bonding point on the next semiconductor chip; recognizing a position of the bonding point of the next semiconductor chip; and then recognizing an amount of displacement in the post-bonding image of the semiconductor chip during wire bonding to the bonding point that is of the next semiconductor chip and has been corrected.

摘要翻译： 一种能够进一步提高引线接合的精度并实现更快的引线接合的引线接合方法，包括：将半导体芯片转移到接合中心; 捕捉半导体芯片上的接合点的图像; 识别接合点的位置; 对已校正的接合点进行引线接合; 捕获半导体芯片的后贴合图像; 将下一个半导体芯片传送到接合中心; 捕获下一个半导体芯片上的接合点的图像; 识别下一个半导体芯片的接合点的位置; 然后识别在引线接合期间半导体芯片的后贴合图像中的位移量与下一个半导体芯片的接合点并被校正。

公开(公告)号：US07654816B2

公开(公告)日：2010-02-02

申请号：US10960731

申请日：2004-10-07

申请人： Yong Chen

发明人： Yong Chen

IPC分类号： B29C59/00

CPC分类号： G03F9/7076 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7042 ,  G03F9/7053

摘要： Systems and methods of aligning a lithographic mask are described. In one aspect, a substrate and a lithographic mask are aligned based at least in part on a motive force between a substrate alignment mark on the substrate and a mask alignment mark on the lithographic mask that induces movement of at least one of the substrate and the lithographic mask into mutual alignment.

摘要翻译： 描述了对准光刻掩模的系统和方法。 在一个方面，衬底和光刻掩模至少部分地基于衬底上的衬底对准标记和光刻掩模上的掩模对准标记之间的动力进行对准，其引起衬底和衬底中的至少一个的移动 平版印刷掩模相互对准。

公开(公告)号：US20090104550A1

公开(公告)日：2009-04-23

申请号：US12249947

申请日：2008-10-12

申请人： Yong Chen

发明人： Yong Chen

IPC分类号： G03G13/04

CPC分类号： B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03G13/28 ,  G03G13/283 ,  G03G13/286

摘要： A nanoscale lithographic method in which a reusable conductive mask, having a pattern of conductive surfaces and insulating surfaces, is positioned upon a substrate whose surface contains an electrically responsive resist layer over a buried conductive layer. When an electric field is applied between the conductive mask and buried conductive layer, the resist layer is altered in portions adjacent the conductive areas of the mask. Selective processing is performed on the surface of the substrate, after mask removal, to remove portions of the resist layer according to the pattern transferred from the mask. The substrate may be a target substrate, or the substrate may be utilized for a lithographic masking step of another substrate. In one aspect of the invention the electrodes to which the charge is applied are divided, such as into a plurality of rows and columns wherein any desired pattern may be created without the need to fabricate specific masks.

摘要翻译： 一种纳米级光刻方法，其中具有导电表面和绝缘表面图案的可重复使用的导电掩模位于其表面在掩埋导电层上包含电响应抗蚀剂层的基底上。 当在导电掩模和掩埋导电层之间施加电场时，抗蚀剂层在与掩模的导电区域相邻的部分中改变。 在掩模移除之后，在基板的表面上进行选择性处理，以根据从掩模转印的图案去除部分抗蚀剂层。 衬底可以是目标衬底，或者衬底可以用于另一衬底的光刻掩模步骤。 在本发明的一个方面，施加电荷的电极被分割成多个行和列，其中可以创建任何期望的图案，而不需要制造特定的掩模。

公开(公告)号：US20080318855A1

公开(公告)日：2008-12-25

申请号：US11752725

申请日：2007-05-23

申请人： Yong Chen ,  Gleb Feldman ,  Hassan Salari

发明人： Yong Chen ,  Gleb Feldman ,  Hassan Salari

IPC分类号： A61K38/16 ,  C07K2/00 ,  C07H21/00 ,  C12N5/10 ,  A61P35/00 ,  C12N15/64 ,  C12N1/21 ,  C12P21/00

CPC分类号： A61K38/10 ,  A61K38/195 ,  A61K48/00 ,  C07K14/4703 ,  C07K14/522 ,  C12N2501/21 ,  G06Q30/02

摘要： This invention is generally directed to a recombinant method of producing SDF-1 receptor antagonists. More particularly, the invention is directed to the isolated and/or recombinant polynucleotide sequences encoding analogs of human SDF-1 alpha or beta and, in particular, SDF-1 analogs having the proline at residue position number 2 replaced with a glycine to provide an SDF-1 receptor antagonist. The recombinant method can be used to produce drugs for a variety of therapeutic uses including, but not limited to, treatment of cancer, inhibiting angiogenesis, and hematopoietic cell proliferation.

摘要翻译： 本发明一般涉及生产SDF-1受体拮抗剂的重组方法。 更具体地，本发明涉及编码人SDF-1α或β的类似物的分离和/或重组多核苷酸序列，特别是具有用甘氨酸替代的残基位置2处的脯氨酸的SDF-1类似物，以提供 SDF-1受体拮抗剂。 该重组方法可用于产生各种治疗用途的药物，包括但不限于治疗癌症，抑制血管生成和造血细胞增殖。

公开(公告)号：US20080296785A1

公开(公告)日：2008-12-04

申请号：US12150063

申请日：2008-04-23

申请人： Theodore I. Kamins ,  Philip J. Kuekes ,  Yong Chen

发明人： Theodore I. Kamins ,  Philip J. Kuekes ,  Yong Chen

IPC分类号： H01L23/48

CPC分类号： B82Y30/00 ,  B82Y10/00 ,  C30B11/00 ,  C30B11/12 ,  C30B29/605 ,  H01L2924/0002 ,  H01L2924/00

摘要： Methods for forming a predetermined pattern of catalytic regions having nanoscale dimensions are provided for use in the growth of nanowires. The methods include one or more nanoimprinting steps to produce arrays of catalytic nanoislands or nanoscale regions of catalytic material circumscribed by noncatalytic material.

公开(公告)号：US20070263598A1

公开(公告)日：2007-11-15

申请号：US11430641

申请日：2006-05-09

申请人： Yong Chen ,  Jack Ger ,  Yong He

发明人： Yong Chen ,  Jack Ger ,  Yong He

IPC分类号： H04L12/66 ,  H04L12/56

CPC分类号： H04L29/06027 ,  H04L65/1026 ,  H04L65/1036 ,  H04L65/1043 ,  H04M3/242 ,  H04M3/362 ,  H04M7/1205

摘要： A method, system, and computer-readable medium for emulating a converged network are provided. A media gateway receives a call at a first interface of a first network type. The call is processed for distribution on a second network type. The processed call is transmitted to a second interface of a second network type. A service module of the media gateway receives the processed call.

摘要翻译： 提供了用于模拟融合网络的方法，系统和计算机可读介质。 媒体网关在第一网络类型的第一接口处接收呼叫。 处理呼叫以在第二种网络类型上进行分发。 经处理的呼叫被发送到第二网络类型的第二接口。 媒体网关的服务模块接收已处理的呼叫。

公开(公告)号：US07211503B2

公开(公告)日：2007-05-01

申请号：US11065929

申请日：2005-02-24

申请人： Yong Chen ,  Tad Hogg

发明人： Yong Chen ,  Tad Hogg

IPC分类号： H01L21/44

CPC分类号： H01L27/101 ,  B82Y10/00 ,  G11C13/0023 ,  G11C13/02 ,  G11C2213/81 ,  H01L2221/1094 ,  Y10S977/784

摘要： Embodiments of the present invention are directed to methods for fabricating microscale-to-nanoscale interfaces. In numerous embodiments of the present invention, hybrid microscale/nanoscale crossbar multiplexers/demultiplexers provide for selection and control of individual nanowires through a set of microscale signal lines. In order to overcome the difficulty of aligning nanowires with submicroscale and microscale signal lines, at least a portion of the interconnections between nanowires and sub-microscale or microscale signal lines are randomly generated by one of various connection-fabrication methods. Addresses for individual nanowires, or groups of nanowires, can be discovered by testing the microscale-to-nanoscale interfaces.

摘要翻译： 本发明的实施例涉及用于制造微米到纳米级界面的方法。 在本发明的许多实施例中，混合微米/纳米级交叉多路复用器/解复用器提供通过一组微信号线选择和控制单个纳米线。 为了克服纳米线与亚微米和微米信号线对准的困难，纳米线和亚微米级或微米级信号线之间的互连的至少一部分通过各种连接制造方法之一随机产生。 单个纳米线或纳米线组的地址可以通过测试微米到纳米级的界面来发现。

公开(公告)号：US07163917B2

公开(公告)日：2007-01-16

申请号：US10518940

申请日：2003-05-30

申请人： Yufen Zhao ,  Guo Tang ,  Ning Zhou ,  Liming Hu ,  Yong Chen

发明人： Yufen Zhao ,  Guo Tang ,  Ning Zhou ,  Liming Hu ,  Yong Chen

IPC分类号： A01N37/18

CPC分类号： C07K5/06026 ,  Y02P20/55

摘要： A synthesis method of alanyl-glutamine includes the steps of: The N-terminal protected alanine reacts with triphenylphosphine and hexachloroethane in organic solvent to form active ester, the active ester reacts with glutamine in a solution mixture containing organic solvent and aqueous solution of inorganic base, the resultant mixture is acidified with inorganic acid, and then the N-terminal protecting group is removed. In this method, the raw materials are cheap, the synthesis technique is simple, no disposals of separation and purification are needed, the product is easy to be separated and purified, the toxicities of all the reagents used in the course of production are minimal, it is advantageous to environment protection.

摘要翻译： 丙氨酰 - 谷氨酰胺的合成方法包括以下步骤：N-末端保护的丙氨酸与三苯基膦和六氯乙烷在有机溶剂中反应形成活性酯，活性酯与含有机溶剂和无机碱水溶液的溶液中的谷氨酰胺反应 ，将所得混合物用无机酸酸化，然后除去N-末端保护基。 在这种方法中，原料便宜，合成技术简单，不需要分离纯化处理，易于分离和纯化，生产过程中使用的所有试剂的毒性小， 有利于环境保护。

公开(公告)号：US07141275B2

公开(公告)日：2006-11-28

申请号：US10870664

申请日：2004-06-16

申请人： Yong Chen

发明人： Yong Chen

IPC分类号： H01L1/04

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： A method is provided for imprinting a pattern having nanoscale features from a mold into the patternable layer on a substrate. The method comprises: providing the mold; forming the patternable layer on the substrate; and imprinting the mold into the patternable layer, wherein the patternable layer comprises a metal or alloy having a transition temperature from its solid form to its liquid form that is within a range of at least 10° above room temperature.

摘要翻译： 提供了一种用于将具有纳米尺度特征的图案从模具压印到基底上的可图案层中的方法。 该方法包括：提供模具; 在所述基板上形成所述图案化层; 并将模具压印到图案化层中，其中可图案层包括具有从其固体形式到其液体形式的转变温度的金属或合金，其在高于室温的至少10°的范围内。