公开(公告)号：US5131022A

公开(公告)日：1992-07-14

申请号：US769493

申请日：1991-10-01

申请人： Shigeru Terashima ,  Mitsuaki Amemiya ,  Isamu Shimoda ,  Shunichi Uzawa ,  Takao Kariya

发明人： Shigeru Terashima ,  Mitsuaki Amemiya ,  Isamu Shimoda ,  Shunichi Uzawa ,  Takao Kariya

IPC分类号： G03F7/20

CPC分类号： G03F7/70558 ,  G03F7/2008 ,  G03F7/70875

摘要： An exposure apparatus for lithographically transferring a pattern of a mask onto a workpiece coated with a radiation sensitive material includes a first filter made the same material as of the substrate of the mask, a second filter formed by a base member made of the same material as the mask substrate and being coated with a radiation sensitive material, an illuminometer for measuring illuminance of light passed through the first and second filters, respectively, and a control device for determining an exposure time for lithographic transfer of the pattern of the mask onto the wafer, on the basis of a difference between a measured value as measured through the first filter and a measured value as measured through the second filter.

公开(公告)号：US4604345A

公开(公告)日：1986-08-05

申请号：US729051

申请日：1985-04-30

申请人： Mitsuaki Amemiya

发明人： Mitsuaki Amemiya

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03C5/00

CPC分类号： G03F7/70466 ,  G03F7/2022 ,  Y10S430/168

摘要： An exposure method for exposing a sensitive layer on a semiconductor wafer to an integrated-circuit pattern of a mask. The exposure is effected by a combination of a primary exposure step for exposing the sensitive layer to the pattern with a beam of high resolution and a secondary exposure step for exposing the sensitive layer with a beam of lower resolution and by an amount which does not have a substantial effect on the sensitization of the sensitive layer. By the combined exposures, the exposure time can be reduced as compared with that required in the exposure only through a high-resolution exposure.

摘要翻译： 一种用于将半导体晶片上的敏感层暴露于掩模的集成电路图案的曝光方法。 曝光是通过一次曝光步骤的组合实现的，该曝光步骤用高分辨率的光束将感光层曝光到图案;以及二次曝光步骤，用较低分辨率的光束曝光敏感层和不具有 对敏感层敏化的实质性影响。 通过组合曝光，与仅通过高分辨率曝光曝光所需的曝光时间相比，可以减少曝光时间。

公开(公告)号：US07271875B2

公开(公告)日：2007-09-18

申请号：US11214252

申请日：2005-08-29

申请人： Mitsuaki Amemiya ,  Masahito Shinohara

发明人： Mitsuaki Amemiya ,  Masahito Shinohara

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F9/7088 ,  G03F9/7065 ,  G03F9/7096

摘要： An alignment apparatus for aligning with each other a mask stage that supports a mask that has an exposure pattern and a wafer stage that supports an object by using a light with wavelength of 1 nm to 50 nm, said alignment apparatus including a substrate for forming a first reference pattern similar to a second reference pattern formed on the mask or the mask stage, and a detection part for detecting a light from the substrate, wherein said substrate and detection part form a hollow housing, in which a gas is filled.

摘要翻译： 一种对准装置，用于将通过使用波长为1nm至50nm的光来支撑具有曝光图案的掩模的掩模台和支撑物体的对准装置，所述对准装置包括用于形成 与掩模或掩模台上形成的第二参考图案相似的第一参考图案，以及用于检测来自基板的光的检测部分，其中所述基板和检测部分形成填充有气体的中空壳体。

公开(公告)号：US20060186352A1

公开(公告)日：2006-08-24

申请号：US11359303

申请日：2006-02-21

申请人： Mitsuaki Amemiya

发明人： Mitsuaki Amemiya

IPC分类号： G21G5/00

CPC分类号： G03F7/7085 ,  G01J1/26 ,  G01J1/429 ,  G03F7/70558

摘要： A measuring method that utilizes a bandpass filter and a measurement apparatus to measure an intensity of light having a predetermined wavelength among lights emitted from a light source, the bandpass filter transmitting the light having the predetermined wavelength, the measurement apparatus measuring an absolute intensity of an incident light includes the steps of measuring an output of the measurement apparatus continuously, stopping or starting an emission of the light source in the measuring step, calculating a first extreme value t→t0−0 and a second extreme value t→t0+0 in the output of the measurement apparatus at time t0 where t is time in the measuring step, and t0 is time when the emission of the light source stops; and calculating a difference between the first extreme value t→t0−0 and the second extreme value t→t0+0.

摘要翻译： 一种利用带通滤波器和测量装置测量从光源发出的光中的具有预定波长的光的强度的测量方法，所述带通滤光器透射具有预定波长的光，所述测量装置测量绝对强度 入射光包括在测量步骤中连续地测量测量设备的输出，停止或开始光源的发射的步骤，计算第一极限值t→t 0 -0和 在测量步骤的时间t 0 0时，测量装置的输出中的第二极值t-> t <0> 0 <0>，其中t是测量步骤中的时间，t 0 是光源的发射停止的时刻; 以及计算第一极限值t-> t <0> -0和第二极值t→t 0 + 0之间的差值。

公开(公告)号：US06642528B2

公开(公告)日：2003-11-04

申请号：US09986563

申请日：2001-11-09

申请人： Mitsuaki Amemiya ,  Masami Tsukamoto

发明人： Mitsuaki Amemiya ,  Masami Tsukamoto

IPC分类号： H01J3730

CPC分类号： G03F9/7053 ,  G03F7/70233 ,  H01J37/3045 ,  H01J2237/3175

摘要： An apparatus and method for detecting an alignment mark on a substrate using electron beams. The method include the steps of setting an accelerating voltage of the electron beams in accordance with the layer structure of the substrate, irradiating the substrate with the electron beams having the accelerating voltage set in the setting step, and detecting one of radiation and electrons from the substrate after the irradiating step is performed, and determining the position of the alignment mark based on the detecting operation. The apparatus includes a device for setting such an accelerating voltage, a device for irradiating the substrate with the electron beams, and a detector for detecting one of the radiation and the electrons. In one embodiment, fluorescent X-rays are detected, while in another embodiment secondary electrons or backscattered electrons are detected.

公开(公告)号：US06455203B1

公开(公告)日：2002-09-24

申请号：US09545464

申请日：2000-04-07

申请人： Mitsuaki Amemiya ,  Shunichi Uzawa ,  Keiko Chiba

发明人： Mitsuaki Amemiya ,  Shunichi Uzawa ,  Keiko Chiba

IPC分类号： G03F900

CPC分类号： G03F9/00 ,  G03F1/22 ,  G03F7/2022

摘要： A mask manufacturing method includes performing a multiple exposure process to a substrate so that a number of latent images are formed on the substrate, and processing the exposed substrate to produce actual mask patterns, wherein the multiple exposure process includes a first exposure step for forming a latent image of relatively-fine periodic patterns on the substrate by use of a first master mask having absorptive periodic patterns, and a second exposure step for forming a latent image of relatively-rough patterns on the substrate by use of a second master mask having absorptive patterns.

摘要翻译： 掩模制造方法包括对基板进行多次曝光处理，使得在基板上形成多个潜像，并处理曝光的基板以产生实际的掩模图案，其中多次曝光处理包括第一曝光步骤，用于形成 通过使用具有吸收性周期性图案的第一主掩模在基板上的相对精细的周期性图案的潜像，以及第二曝光步骤，用于通过使用具有吸收性的第二主掩模在基板上形成相对粗糙的图案的潜像 模式。

公开(公告)号：US5138643A

公开(公告)日：1992-08-11

申请号：US591252

申请日：1990-10-01

申请人： Eiji Sakamoto ,  Ryuichi Ebinuma ,  Mitsuaki Amemiya ,  Shunichi Uzawa ,  Koji Uda

发明人： Eiji Sakamoto ,  Ryuichi Ebinuma ,  Mitsuaki Amemiya ,  Shunichi Uzawa ,  Koji Uda

IPC分类号： G03F7/20

CPC分类号： G03F7/70875 ,  G03F7/70008 ,  G03F7/70691 ,  G03F7/70858 ,  G03F7/70866

摘要： An exposure apparatus includes a chamber for placing an article in a predetermined ambience; a holding device for holding the article in the chamber; a fluid supplying device for supplying a temperature adjusting fluid into the holding device through a flow passageway; a detecting device for detecting leakage of the fluid from the flow passageway; and a flow rate controlling device for controlling the flow rate of the fluid to be supplied to the holding device on the basis of the detection by the detecting device.

公开(公告)号：US5093579A

公开(公告)日：1992-03-03

申请号：US550989

申请日：1990-07-11

申请人： Mitsuaki Amemiya ,  Shinichi Hara ,  Eiji Sakamoto

发明人： Mitsuaki Amemiya ,  Shinichi Hara ,  Eiji Sakamoto

IPC分类号： H01L21/30 ,  G03F7/20 ,  H01L21/027 ,  H01L21/683

CPC分类号： H01L21/6838 ,  G03F7/707 ,  G03F7/70866 ,  G03F7/70875

摘要： A substrate holding device includes a holding table having a reduced pressure passageway; a pressure gauge for measuring a value related to the pressure in the reduced pressure passageway; a pump for producing a pressure difference between a first surface of the substrate to be attracted to the holding table and a second surface of the substrate not to be attracted to the holding table; a valve which can be opened/closed for control of the pressure in the reduced pressure passageway; a pressure control system for controlling the opening/closing of the valve on the basis of an output corresponding to the value measured by the pressure gauge; and a temperature control system for controlling the temperature of the holding table.

公开(公告)号：US07633598B2

公开(公告)日：2009-12-15

申请号：US11456673

申请日：2006-07-11

申请人： Mitsuaki Amemiya

发明人： Mitsuaki Amemiya

IPC分类号： G03B27/42

CPC分类号： G02B5/208 ,  G02B7/006 ,  G03F7/70191

摘要： A filter used for an exposure apparatus that exposes a plate using a light from a light source includes a light transmitting film configured to transmit the light from the light source, a first rod member that includes plural first rod members, and thermally contacts the light transmitting film, the plural second rod members being rod members and including a second rod member; and a second member that includes plural second rod members, and thermally contacts the light transmitting film and/or the first member, the plural second rod members being other rod members including a second rod member, wherein a heating value transmittable by the first rod member per unit time in a longitudinal direction of the first rod member is smaller than a heating value transmittable by the second rod member per unit time in a longitudinal direction of the second rod member.

摘要翻译： 用于使用来自光源的光曝光板的曝光装置的过滤器包括：构造成透过来自光源的光的透光膜;第一杆构件，包括多个第一杆构件，并且热接触透光 多个第二杆构件是杆构件并且包括第二杆构件; 以及第二构件，其包括多个第二杆构件，并且与所述透光膜和/或所述第一构件热接触，所述多个第二杆构件是包括第二杆构件的其他杆构件，其中，可由所述第一杆构件 在第一杆构件的纵向方向上的每单位时间小于在第二杆构件的纵向方向上每单位时间可由第二杆构件传递的加热值。

公开(公告)号：US06331709B1

公开(公告)日：2001-12-18

申请号：US08725400

申请日：1996-10-03

申请人： Mitsuaki Amemiya ,  Masami Tsukamoto

发明人： Mitsuaki Amemiya ,  Masami Tsukamoto

IPC分类号： H01J3730

CPC分类号： G03F9/7053 ,  G03F7/70233 ,  H01J37/3045 ,  H01J2237/3175

摘要： An apparatus and method for detecting an alignment mark on a substrate using electron beams. The method include the steps of setting an accelerating voltage of the electron beams in accordance with the layer structure of the substrate, irradiating the substrate with the electron beams having the accelerating voltage set in the setting step, and detecting one of radiation and electrons from the substrate after the irradiating step is performed, and determining the position of the alignment mark based on the detecting operation. The apparatus includes a device for setting such an accelerating voltage, a device for irradiating the substrate with the electron beams, and a detector for detecting one of the radiation and the electrons. Fluorescent X-rays, secondary electrons or backscattered electrons are detected.

摘要翻译： 一种使用电子束检测基板上的对准标记的装置和方法。 该方法包括以下步骤：根据衬底的层结构设定电子束的加速电压，用设定步骤中设定的加速电压的电子束照射衬底，并从 执行照射步骤之后的基板，并且基于检测操作确定对准标记的位置。 该装置包括用于设置这种加速电压的装置，用于用电子束照射基板的装置，以及用于检测辐射和电子之一的检测器。 检测荧光X射线，二次电子或背散射电子。