SEMICONDUCTOR DEVICE INCLUDING METAL-2 DIMENSIONAL MATERIAL-SEMICONDUCTOR JUNCTION

    公开(公告)号:US20230343846A1

    公开(公告)日:2023-10-26

    申请号:US18151775

    申请日:2023-01-09

    CPC classification number: H01L29/45

    Abstract: A semiconductor device may include a first semiconductor layer including a first semiconductor material; a metal layer facing the first semiconductor layer and having conductivity; a 2D material layer between the first semiconductor layer and the metal layer; and a second semiconductor layer between the first semiconductor layer and the 2D material layer. The second semiconductor layer may include a second semiconductor material different from the first semiconductor material. The second semiconductor layer and the 2D material layer may be in direct contact with each other. The second semiconductor material may include germanium.

    DISHWASHER
    27.
    发明申请

    公开(公告)号:US20220330787A1

    公开(公告)日:2022-10-20

    申请号:US17681566

    申请日:2022-02-25

    Abstract: Disclosed herein is a dishwasher. The dishwasher includes, a tub provided in the cabinet to form a washing chamber, and a drying apparatus arranged on a side wall of the tub and including a flow path provided to allow air sucked from the washing chamber to flow, a heater arranged in the flow path to heat air in the flow path, and a switch arranged upstream of the heater to turn off the heater in response to air, which is adjacent to the heater, reaching a predetermined temperature.

    METHOD OF FORMING GRAPHENE
    28.
    发明申请

    公开(公告)号:US20210163296A1

    公开(公告)日:2021-06-03

    申请号:US17060893

    申请日:2020-10-01

    Abstract: A method of forming graphene includes: preparing a substrate in a reaction chamber; performing a first growth process of growing a plurality of graphene aggregates apart from each other on the substrate at a first growth rate by using a reaction gas including a carbon source; and performing a second growth process of forming a graphene layer by growing the plurality of graphene aggregates at a second growth rate slower than the first growth rate by using the reaction gas including the carbon source.

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