公开(公告)号：US20250004370A1

公开(公告)日：2025-01-02

申请号：US18392365

申请日：2023-12-21

Applicant: Samsung Electronics Co., Ltd.

Inventor： Beomseok KIM ,  Minsang KIM ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Chanjae AHN ,  Changheon LEE ,  Kyuhyun IM ,  Sungwon CHOI

IPC: G03F7/038 ,  C08F12/22 ,  G03F7/004 ,  G03F7/20

Abstract: Provided are a polymer including a first repeating unit represented by Formula 1, a resist composition including the polymer, and a method of forming a pattern using the resist composition: wherein descriptions of L11 to L14, a11 to a13, A11, X11, R11, R12, b12 and p in Formula 1 are provided in the present specification.

公开(公告)号：US20180305545A1

公开(公告)日：2018-10-25

申请号：US15958549

申请日：2018-04-20

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  SAMSUNG SDI CO., LTD.

Inventor： Chanjae AHN ,  Jungha CHAE ,  Won Suk CHANG ,  A Ra JO ,  Sang Soo JEE ,  Sungwon CHOI

IPC: C08L79/08 ,  C08G73/10 ,  C08G73/14

CPC classification number: C08L79/08 ,  C08G73/1007 ,  C08G73/1039 ,  C08G73/1042 ,  C08G73/1078 ,  C08G73/14 ,  C08J5/18 ,  C08J2379/08 ,  C08L2203/16 ,  C08L2203/20

Abstract: A poly(amide-imide) copolymer including a reaction product of at least one tetracarboxylic acid dianhydride, at least one diamine, and at least one dicarboxylic acid derivative, wherein the at least one tetracarboxylic acid dianhydride includes a tetracarboxylic acid dianhydride represented by Chemical Formula 1, the at least one diamine includes a diamine represented by Chemical Formula 2, and the at least one dicarboxylic acid derivative includes a dicarboxylic acid derivative represented by Chemical Formula 3: wherein, R1 to R3, X1 and X2 are the same as defined in the specification.

公开(公告)号：US20180230278A1

公开(公告)日：2018-08-16

申请号：US15656376

申请日：2017-07-21

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  Samsung SDI Co., Ltd.

Inventor： Sunghyun HAN ,  Chanjae AHN ,  Won Suk CHANG ,  A Ra JO ,  Sungwon CHOI

IPC: C08J5/18 ,  C08G73/14 ,  C08G73/10 ,  G01N3/42 ,  G01N3/44

CPC classification number: C08J5/18 ,  C08G73/1039 ,  C08G73/1042 ,  C08G73/1067 ,  C08G73/1078 ,  C08G73/14 ,  C08J2379/08 ,  G01N3/42 ,  G01N3/44 ,  G01N2203/0091 ,  G01N2203/0282

Abstract: A polyimide film, which is a reaction product of a diamine including an amide structural unit in an amount of greater than about 0 mol % and less than or equal to about 80 mol % and an aromatic dianhydride, wherein the polyimide film has a Martens hardness of about 14 N/mm2 to about 120 N/mm2 at a thickness of about 30 μm to about 100 μm.

公开(公告)号：US20180112049A1

公开(公告)日：2018-04-26

申请号：US15714436

申请日：2017-09-25

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  Samsung SDI Co., Ltd.

Inventor： Sun Jin SONG ,  Sang Soo JEE ,  Boreum JEONG ,  Hyunjeong JEON ,  Chanjae AHN

IPC: C08J7/04 ,  C08J5/18 ,  G02B1/04 ,  G02B1/14

Abstract: A stacked transparent film includes a polymer film including at least one of an amide structural unit and an imide structural unit, wherein the polymer film has a refractive index of about 1.65 to about 1.75 at a 550 nanometer wavelength and an elastic modulus of greater than or equal to about 5.5 gigapascals; and at least one of a first coating layer on a first side of the polymer film and a second coating layer on a side opposite the first side of the polymer film.

公开(公告)号：US20180022875A1

公开(公告)日：2018-01-25

申请号：US15720992

申请日：2017-09-29

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  SAMSUNG SDI CO., LTD.

Inventor： Sungwon CHOI ,  Chanjae AHN ,  Hyunjeong JEON ,  Sang Soo JEE ,  Byunghee SOHN ,  Won Suk CHANG

IPC: C08G77/455 ,  C08L83/12 ,  C08G77/04 ,  C08G73/14

CPC classification number: C08G77/455 ,  C08G73/1007 ,  C08G73/1017 ,  C08G73/1039 ,  C08G73/1042 ,  C08G73/1067 ,  C08G73/14 ,  C08G77/04 ,  C08G77/16 ,  C08G77/18 ,  C08G77/80 ,  C08L79/08 ,  C08L83/12 ,  C09D179/08 ,  C08L83/04

Abstract: A composition including a polyamideimide precursor modified with an alkoxysilane group and an oligosilica compound, wherein the oligosilica compound is a condensation reaction product of an organosilane diol and an alkoxysilane compound.

公开(公告)号：US20160185926A1

公开(公告)日：2016-06-30

申请号：US14980699

申请日：2015-12-28

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  SAMSUNG SDI CO., LTD.

Inventor： Sun Jin SONG ,  Chanjae AHN ,  Kyeong-sik JU ,  Jungha CHAE ,  Sungwoo HONG

IPC: C08J7/04

CPC classification number: C08J7/047 ,  C08G73/14 ,  C08J2369/00 ,  C08J2379/08 ,  C08J2400/21 ,  C08J2433/06 ,  C08J2463/00 ,  C08J2467/04 ,  C08J2475/04 ,  C08J2483/04 ,  G02B1/04 ,  G02B1/14

Abstract: A window for a display device including a plastic substrate having yield strain of greater than or equal to about 0.8% at about 85 degrees Celsius and 85% relative humidity and a hard coating layer disposed on at least one side of the plastic substrate.

Abstract translation: 一种用于显示装置的窗口，包括在约85摄氏度和85％相对湿度下具有大于或等于约0.8％的屈服应变的塑料基板和设置在塑料基板的至少一侧上的硬涂层。

公开(公告)号：US20240319595A1

公开(公告)日：2024-09-26

申请号：US18612246

申请日：2024-03-21

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hoyoon PARK ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Minsang KIM ,  Beomseok KIM ,  Hana KIM ,  Hyeran KIM ,  Chanjae AHN ,  Kyuhyun IM ,  Sungwon CHOI

IPC: G03F7/039

CPC classification number: G03F7/039

Abstract: Provided are a photoreactive polymer compound including a first repeating unit represented by Formula 1 below, a photoresist composition including the same, and a method of forming a pattern by using the photoresist composition:




A description of Formula 1 is provided herein.

公开(公告)号：US20240319594A1

公开(公告)日：2024-09-26

申请号：US18493192

申请日：2023-10-24

Applicant: Samsung Electronics Co., Ltd.

Inventor： Chanjae AHN ,  Cheol KANG ,  Minsang KIM ,  Beomseok KIM ,  Changki KIM ,  Hana KIM ,  Hyeran KIM ,  Changheon LEE ,  Sungwon CHOI ,  Hyunseok CHOI

IPC: G03F7/039 ,  C08F212/14 ,  C08F220/18 ,  G03F7/038

CPC classification number: G03F7/039 ,  C08F212/24 ,  C08F212/28 ,  C08F220/1806 ,  C08F220/1807 ,  G03F7/038

Abstract: Provided are a resist composition and a pattern forming method using the same. The resist composition includes a polymer including a first repeating unit repeating unit Formula 1, a photoacid generator, and an organic solvent.




In Formula 1, L11 to L13, a11 to a13, A11 to A13, R11 to R14, b12 to b14, and p are the same as described in the detailed description.

公开(公告)号：US20240231225A1

公开(公告)日：2024-07-11

申请号：US18325465

申请日：2023-05-30

Applicant: Samsung Electronics Co., Ltd.

Inventor： Haengdeog KOH ,  Yoonhyun KWAK ,  Mijeong KIM ,  Youngmin NAM ,  Chanjae AHN ,  Changheon LEE ,  Kyuhyun IM ,  Sungwon CHOI ,  Sunghyun HAN

IPC: G03F7/004 ,  G03F7/20 ,  G03F7/32

CPC classification number: G03F7/0044 ,  G03F7/2004 ,  G03F7/32

Abstract: Provided are a resist composition and a pattern forming method using the same. The resist composition may include an organometallic compound represented by Formula 1 below and a polymer repeating unit represented by Formula 2 below.




In Formulas 1 and 2, descriptions of M11, R11, R12, n, A21, L21 to L24, a21 to a24, R21, R22, b22, p, and X21 refer to the specification.

公开(公告)号：US20240124635A1

公开(公告)日：2024-04-18

申请号：US18164841

申请日：2023-02-06

Applicant: Samsung Electronics Co., Ltd.

Inventor： Minsang KIM ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Beomseok KIM ,  Chanjae AHN ,  Jungha CHAE ,  Sungwon CHOI

IPC: C08F228/06 ,  G03F7/038 ,  G03F7/20

CPC classification number: C08F228/06 ,  G03F7/038 ,  G03F7/2004

Abstract: Provided are a polymer, a resist composition including the same, and a method of forming a pattern using the resist composition, the polymer including one or more of a first repeating unit represented by Formula 1 and a second repeating unit represented by Formula 2, and free of a repeating unit of which a structure changes by an acid:




In Formulae 1 and 2, R11 to R16, b12, X−, R21 to R24, b22, and Y are as described in the specification.