公开(公告)号：US20240231225A1

公开(公告)日：2024-07-11

申请号：US18325465

申请日：2023-05-30

Applicant: Samsung Electronics Co., Ltd.

Inventor： Haengdeog KOH ,  Yoonhyun KWAK ,  Mijeong KIM ,  Youngmin NAM ,  Chanjae AHN ,  Changheon LEE ,  Kyuhyun IM ,  Sungwon CHOI ,  Sunghyun HAN

IPC: G03F7/004 ,  G03F7/20 ,  G03F7/32

CPC classification number: G03F7/0044 ,  G03F7/2004 ,  G03F7/32

Abstract: Provided are a resist composition and a pattern forming method using the same. The resist composition may include an organometallic compound represented by Formula 1 below and a polymer repeating unit represented by Formula 2 below.




In Formulas 1 and 2, descriptions of M11, R11, R12, n, A21, L21 to L24, a21 to a24, R21, R22, b22, p, and X21 refer to the specification.

公开(公告)号：US20240124635A1

公开(公告)日：2024-04-18

申请号：US18164841

申请日：2023-02-06

Applicant: Samsung Electronics Co., Ltd.

Inventor： Minsang KIM ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Beomseok KIM ,  Chanjae AHN ,  Jungha CHAE ,  Sungwon CHOI

IPC: C08F228/06 ,  G03F7/038 ,  G03F7/20

CPC classification number: C08F228/06 ,  G03F7/038 ,  G03F7/2004

Abstract: Provided are a polymer, a resist composition including the same, and a method of forming a pattern using the resist composition, the polymer including one or more of a first repeating unit represented by Formula 1 and a second repeating unit represented by Formula 2, and free of a repeating unit of which a structure changes by an acid:




In Formulae 1 and 2, R11 to R16, b12, X−, R21 to R24, b22, and Y are as described in the specification.

公开(公告)号：US20190077917A1

公开(公告)日：2019-03-14

申请号：US16126270

申请日：2018-09-10

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  SAMSUNG SDI CO., LTD.

Inventor： Boreum JEONG ,  Sang Soo JEE ,  Won Suk CHANG ,  Kyeong-sik JU ,  Chanjae AHN ,  A Ra JO ,  Sungwon CHOI

IPC: C08G73/14 ,  C08J5/18 ,  G02B1/14

Abstract: A poly(amide-imide) copolymer that is a reaction product of a substituted or unsubstituted aromatic diamine having a maximum absorption wavelength in a range from 500 nanometers (nm) to 650 nm in a visible light region, a diamine represented by Chemical Formula 1, a dicarbonyl compound represented by Chemical Formula 2, and a tetracarboxylic acid dianhydride represented by Chemical Formula 3: wherein, in Chemical Formulae 1 to 3, A, R3, R10, R12, R13, X, n7 and n8 are the same as defined in the specification.

公开(公告)号：US20170106636A1

公开(公告)日：2017-04-20

申请号：US15212785

申请日：2016-07-18

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  SAMSUNG SDI CO., LTD.

Inventor： A Ra JO ,  Chanjae AHN ,  Sungwon CHOI ,  Byunghee SOHN ,  Seung Bum Joseph CHUN ,  Sung Woo HONG ,  Junghwa KIM ,  Da Eun YU

IPC: B32B27/34 ,  B32B27/38 ,  B32B27/28

CPC classification number: B32B27/34 ,  B32B7/04 ,  B32B27/08 ,  B32B27/281 ,  B32B27/308 ,  B32B27/38 ,  B32B27/40 ,  B32B2250/02 ,  B32B2250/03 ,  B32B2250/24 ,  B32B2255/00 ,  B32B2307/40 ,  B32B2307/412 ,  B32B2307/536 ,  B32B2307/54 ,  B32B2307/546 ,  B32B2307/584 ,  B32B2307/732 ,  B32B2451/00 ,  B32B2457/00 ,  B32B2457/20 ,  B32B2457/202 ,  B32B2457/204 ,  B32B2457/206

Abstract: A window for a display device including: a plastic substrate including a poly(imide-amide) copolymer, which is a reaction product of a reagent combination of 4,4′-hexafluoroisopropylidene diphthalic anhydride, 3,3′,4,4′-biphenyltetracarboxylic dianhydride, 2,2′-bis-trifluoromethyl-4,4′-biphenyldiamine, and terephthaloyl chloride, and a hard coating layer disposed on at least one side of the plastic substrate, wherein the plastic substrate has pencil scratch hardness of greater than or equal to 3H when measured according to an ASTM D3363 standard at a vertical load of about 0.5 kilograms, and a peak intensity ratio A2/A1 of a peak intensity A2 at a position of about 23.5° in 2θ to a peak intensity A1 at a position of about 15.5° in 2θ of an X-ray diffraction spectrum is greater than or equal to about 0.8.

公开(公告)号：US20160237214A1

公开(公告)日：2016-08-18

申请号：US14879287

申请日：2015-10-09

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  SAMSUNG SDI CO., LTD.

Inventor： Sung Woo HONG ,  Byung-hee SOHN ,  Sun Jin SONG ,  Chanjae AHN ,  Kyeong-sik JU ,  Sungwon CHOI

IPC: C08G73/22

CPC classification number: C08G73/22 ,  C08G73/1039 ,  C08G73/1042 ,  C08G73/1067 ,  C08G73/1085 ,  C08G73/14

Abstract: A composition for preparing poly(imide-benzoxazole) copolymer is described, where the copolymer include: a tetracarboxylic acid dianhydride represented by Chemical Formula 1, a diamine represented by Chemical Formula 2, and a diamine represented by Chemical Formula 3: wherein definitions of groups and variables in Chemical Formulae 1 to 3 are the same as described in the specification.

Abstract translation: 描述了用于制备聚（酰亚胺 - 苯并恶唑）共聚物的组合物，其中共聚物包括：由化学式1表示的四羧酸二酐，由化学式2表示的二胺和由化学式3表示的二胺：其中基团 并且化学式1至3中的变量与说明书中描述的相同。

公开(公告)号：US20250043046A1

公开(公告)日：2025-02-06

申请号：US18405175

申请日：2024-01-05

Applicant: Samsung Electronics Co., Ltd.

Inventor： Minsang KIM ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Jeongho MUN ,  Seonghyeon AHN ,  Chanjae AHN ,  Jaejun LEE ,  Kyuhyun IM ,  Jungha CHAE ,  Sungwon CHOI

IPC: C08F120/28 ,  G03F7/004 ,  G03F7/20

Abstract: Provided are a polymer including a first repeating unit represented by Formula 1 and having a glass transition temperature of 50° C. or less, a polymer-containing composition including the polymer, and a method of forming a pattern by using the polymer-containing composition: wherein, in Formula 1, descriptions of L11 to L13, a11 to a13, An, R11, R12, b12, and p1 are provided in the present specification.

公开(公告)号：US20250021003A1

公开(公告)日：2025-01-16

申请号：US18537601

申请日：2023-12-12

Applicant: Samsung Electronics Co., Ltd.

Inventor： Cheol KANG ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Minsang KIM ,  Beomseok KIM ,  Hana KIM ,  Hoyoon PARK ,  Chanjae AHN ,  Jaejun LEE ,  Sungwon CHOI

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/038

Abstract: Provided are a polymer including a first repeating unit represented by Formula 1 below, a resist composition including the same, a method of forming a pattern by using the same, and a monomer represented by Formula 10 below. In Formulae 1 and 10, L11 to L13, a11 to a13, X11, Rf, and R11 to R13 are as described in the specification.

公开(公告)号：US20230324791A1

公开(公告)日：2023-10-12

申请号：US18313555

申请日：2023-05-08

Applicant: Samsung Electronics Co., Ltd.

Inventor： Eunkyung LEE ,  Sumin KIM ,  Hyunwoo KIM ,  Juhyeon PARK ,  Giyoung SONG ,  Sukkoo HONG ,  Yoonhyun KWAK ,  Youngmin NAM ,  Byunghee SOHN ,  Sunyoung LEE ,  Aram JEON ,  Sungwon CHOI

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  C07C309/12 ,  C07D333/76 ,  C07C381/12

CPC classification number: G03F7/0045 ,  C07C309/12 ,  C07C381/12 ,  C07D333/76 ,  G03F7/038 ,  G03F7/039 ,  C07C2603/74

Abstract: Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1:





wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.

公开(公告)号：US20210221953A1

公开(公告)日：2021-07-22

申请号：US17205637

申请日：2021-03-18

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  SAMSUNG SDI CO., LTD.

Inventor： A Ra JO ,  Chanjae AHN ,  Sungwon CHOI ,  Sun Jin SONG ,  Boreum JEONG ,  Won Suk CHANG

IPC: C08G73/10 ,  C08J5/18 ,  C09D179/08 ,  C08G73/14

Abstract: A film comprising a polyimide or poly(imide-amide) copolymer, wherein the film has an amplitude of a surface roughness curve of less than or equal to 270 nanometers.

公开(公告)号：US20210016552A1

公开(公告)日：2021-01-21

申请号：US16929382

申请日：2020-07-15

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  SAMSUNG SDI CO., LTD.

Inventor： Chanjae AHN ,  Sun Jin SONG ,  Won Suk CHANG ,  Boreum JEONG ,  A Ra JO ,  Kyeong-sik JU ,  Sungwon CHOI

IPC: B32B27/34 ,  G02B1/14 ,  G06F1/16 ,  G09F9/30 ,  C08J7/04 ,  C08J7/046 ,  B32B27/08 ,  B32B27/28

Abstract: Disclosed is a window film for a display device including a light transmitting substrate including a polyamide including a structural unit represented by Chemical Formula 1 and a structural unit represented by Chemical Formula 2, and a hard coating layer laminated on one surface of the light transmitting substrate: in Chemical Formula 1 and Chemical Formula 2, each of A1, A2, B, and D is the same as defined in the detailed description.