公开(公告)号：US06737492B2

公开(公告)日：2004-05-18

申请号：US10229219

申请日：2002-08-27

申请人： Wen-Bing Kang ,  Munirathna Padmanaban ,  Hatsuyuki Tanaka ,  Ken Kimura ,  Takanori Kudo ,  Georg Pawlowski

发明人： Wen-Bing Kang ,  Munirathna Padmanaban ,  Hatsuyuki Tanaka ,  Ken Kimura ,  Takanori Kudo ,  Georg Pawlowski

IPC分类号： C08F11636

CPC分类号： C09D4/00 ,  C08F246/00 ,  G03F7/091 ,  C08F220/26 ,  C08F220/58 ,  C08F212/00

摘要： A radiation absorbing polymer having chemically bonded thereto a radiation absorbing dye, which has high absorption at a predetermined wavelength radiation, which shows good adhesion to a substrate and good thin film-forming, which has no dependence upon resists, which is soluble in a solvent for photoresists but becomes insoluble after being baked; a composition for radiation absorbing coating containing this polymer, and a radiation absorbing coating such as an anti-reflective coating formed from this composition are disclosed. The radiation absorbing polymer comprises a copolymer containing at least both a recurring unit composed of a monomer containing a keto group and a divalent group (preferably a methylene group) in its side chain and a recurring unit composed of a monomer containing an organic chromophore bonded directly or through a linkage group to the main chain. This radiation absorbing polymer is dissolved in a solvent such as alcohol, aromatic hydrocarbon, ketone, ester, etc., and the resulting solution is applied to a wafer and baked to form a radiation absorbing coating such as an anti-reflective coating. On this coating is coated, for example, a chemically amplified resist. This coated substrate is then exposed to deep UV rays and is developed to form a fine resist pattern excluding the influence of standing wave.

摘要翻译： 一种辐射吸收聚合物，其化学键合有辐射吸收染料，该辐射吸收染料在预定波长辐射下具有高吸收性，其对基底具有良好的粘附性，并且与溶于溶剂的抗蚀剂无关的良好的薄膜形成 用于光致抗蚀剂，但在烘烤后变得不溶; 公开了含有这种聚合物的辐射吸收涂层用组合物和由该组合物形成的抗反射涂层等吸收辐射涂层。 辐射吸收聚合物包括共聚物，其至少包含由侧链中含有酮基和二价基团（优选亚甲基）的单体构成的重复单元，以及由含有直接键合的有机发色团的单体构成的重复单元 或通过连接组到主链。 将这种辐射吸收聚合物溶于醇，芳族烃，酮，酯等溶剂中，将所得溶液施加到晶片上并烘烤以形成抗辐射涂层等吸收辐射的涂层。 在该涂层上涂覆例如化学放大抗蚀剂。 然后将该涂覆的基材暴露于深紫外线，并显影以形成除了驻波的影响之外的精细抗蚀剂图案。

公开(公告)号：US06723488B2

公开(公告)日：2004-04-20

申请号：US10037161

申请日：2001-11-07

申请人： Takanori Kudo ,  Ralph R. Dammel ,  Munirathna Padmanaban

发明人： Takanori Kudo ,  Ralph R. Dammel ,  Munirathna Padmanaban

IPC分类号： G03F7004

CPC分类号： G03F7/0392 ,  G03F7/0397 ,  G03F7/40 ,  Y10S430/106

摘要： The present invention relates to a photoresist composition sensitive to radiation in the deep ultraviolet, particularly a positive working photoresist sensitive in the range of 100-200 nanometers(nm). The photoresist composition comprises a) a polymer that is insoluble in an aqueous alkaline solution and comprises at least one acid labile group, and furthermore where the polymer is essentially non-phenolic, b) a compound capable of producing an acid upon radiation, and c) an additive that reduces the effect of electrons and ions on the photoresist image.

摘要翻译： 本发明涉及对深紫外线辐射敏感的光致抗蚀剂组合物，特别是在100-200纳米（nm）范围内敏感的正性工作光致抗蚀剂。 光致抗蚀剂组合物包含：a）不溶于碱性水溶液且包含至少一种酸不稳定基团的聚合物，此外，聚合物基本上是非酚类的，b）能够在辐射时产生酸的化合物，c ）减少电子和离子对光致抗蚀剂图像的影响的添加剂。

公开(公告)号：US06468718B1

公开(公告)日：2002-10-22

申请号：US09244358

申请日：1999-02-04

申请人： Wen-Bing Kang ,  Munirathna Padmanaban ,  Hatsuyuki Tanaka ,  Ken Kimura ,  Takanori Kudo ,  Georg Pawlowski

发明人： Wen-Bing Kang ,  Munirathna Padmanaban ,  Hatsuyuki Tanaka ,  Ken Kimura ,  Takanori Kudo ,  Georg Pawlowski

IPC分类号： G03C173

CPC分类号： C09D4/00 ,  C08F246/00 ,  G03F7/091 ,  C08F220/26 ,  C08F220/58 ,  C08F212/00

摘要： A radiation absorbing polymer having chemically bonded thereto a radiation absorbing dye, which has high absorption at a predetermined wavelength radiation, which shows good adhesion to a substrate and good thin film-forming, which has no dependence upon resists, which is soluble in a solvent for photoresists but becomes insoluble after being baked; a composition for radiation absorbing coating containing this polymer, and a radiation absorbing coating such as an anti-reflective coating formed from this composition are disclosed. The radiation absorbing polymer comprises a copolymer containing at least both a recurring unit composed of a monomer containing a keto group and a divalent group (preferably a methylene group) in its side chain and a recurring unit composed of a monomer containing an organic chromophore bonded directly or through a linkage group to the main chain. This radiation absorbing polymer is dissolved in a solvent such as alcohol, aromatic hydrocarbon, ketone, ester, etc., and the resulting solution is applied to a wafer and baked to form a radiation absorbing coating such as an anti-reflective coating. On this coating is coated, for example, a chemically amplified resist. This coated substrate is then exposed to deep UV rays and is developed to form a fine resist pattern excluding the influence of standing wave.

摘要翻译： 一种辐射吸收聚合物，其化学键合有辐射吸收染料，该辐射吸收染料在预定波长辐射下具有高吸收性，其对基底具有良好的粘附性，并且与溶于溶剂的抗蚀剂无关的良好的薄膜形成 用于光致抗蚀剂，但在烘烤后变得不溶; 公开了含有这种聚合物的辐射吸收涂层用组合物和由该组合物形成的抗反射涂层等吸收辐射涂层。 辐射吸收聚合物包括共聚物，其至少包含由侧链中含有酮基和二价基团（优选亚甲基）的单体构成的重复单元，以及由含有直接键合的有机发色团的单体构成的重复单元 或通过连接组到主链。 将这种辐射吸收聚合物溶于醇，芳族烃，酮，酯等溶剂中，将所得溶液施加到晶片上并烘烤以形成抗辐射涂层等吸收辐射的涂层。 在该涂层上涂覆例如化学放大抗蚀剂。 然后将该涂覆的基材暴露于深紫外线，并显影以形成除了驻波的影响之外的精细抗蚀剂图案。

公开(公告)号：US5691100A

公开(公告)日：1997-11-25

申请号：US623735

申请日：1996-03-29

申请人： Takanori Kudo ,  Seiya Masuda ,  Yoshiaki Kinoshita ,  Klaus Przybilla ,  Natsumi Endo ,  Natsumi Suehiro ,  Hiroshi Okazaki

发明人： Takanori Kudo ,  Seiya Masuda ,  Yoshiaki Kinoshita ,  Klaus Przybilla ,  Natsumi Endo ,  Natsumi Suehiro ,  Hiroshi Okazaki

IPC分类号： G03F7/004 ,  G03C1/54 ,  G03C1/56 ,  G03C1/685

CPC分类号： G03F7/0045 ,  Y10S430/12 ,  Y10S430/121 ,  Y10S430/122

摘要： A material for the formation of a pattern is provided which has a wide exposure latitude and is less liable to cause a dimensional change of a pattern with a change in exposure. The material comprises (A) a compound having a capability of producing an acid upon irradiation with an active beam, (B) a compound capable of producing a base or increasing its basicity, (C) a compound having at least one bond clearable with an acid and/or (D) a compound insoluble in water but soluble in an aqueous alkaline solution.

摘要翻译： 提供了用于形成图案的材料，其具有宽的曝光宽容度，并且不太可能导致图案的尺寸变化随着曝光的变化。 该材料包含（A）具有在活性束照射时产生酸的能力的化合物，（B）能够产生碱或增加其碱度的化合物，（C）具有至少一个键的化合物可以与 酸和/或（D）不溶于水但可溶于碱性水溶液的化合物。

公开(公告)号：US5498457A

公开(公告)日：1996-03-12

申请号：US270536

申请日：1994-07-05

申请人： Heigo Ishihara ,  Takanori Kudo

发明人： Heigo Ishihara ,  Takanori Kudo

IPC分类号： G11B5/72 ,  C09D171/02 ,  C10M105/54 ,  C10M105/58 ,  C10N40/18 ,  G11B5/725 ,  G11B5/82 ,  G11B5/00

CPC分类号： G11B5/725 ,  Y10S428/90 ,  Y10T428/265 ,  Y10T428/3154 ,  Y10T428/31544

摘要： A highly reliable rotary magnetic recording medium has a lubricating film layer on its surface, the lubricating film layer being composed of fluoropolyether having at least two acidic functional groups in one molecule as a lubricant and fluoropolyether having at least two basic functional groups in one molecule as another lubricant, where a stable network structure is formed on the surface of the magnetic recording medium by an appropriate combination of the lubricant having the acidic groups at the terminal ends of lubricant molecule and the lubricant having the basic groups at the terminal ends of lubricant molecule.

摘要翻译： 高度可靠的旋转磁记录介质在其表面上具有润滑膜层，润滑膜层由在一个分子中具有至少两个酸性官能团的氟聚醚作为润滑剂和在一个分子中具有至少两个碱性官能团的氟聚醚组成 另一种润滑剂，其中通过在润滑剂分子的末端具有酸性基团的润滑剂和在润滑剂分子的末端具有碱性基团的润滑剂的适当组合，在磁记录介质的表面上形成稳定的网络结构 。

公开(公告)号：US08623589B2

公开(公告)日：2014-01-07

申请号：US13153765

申请日：2011-06-06

申请人： Takanori Kudo ,  Alberto Dioses ,  Edward Ng ,  Srinivasan Chakrapani ,  Munirathna Padmanaban

发明人： Takanori Kudo ,  Alberto Dioses ,  Edward Ng ,  Srinivasan Chakrapani ,  Munirathna Padmanaban

IPC分类号： G03F7/38 ,  G03F7/40 ,  C09D5/00 ,  G03F7/039 ,  G03F7/11

CPC分类号： C09D5/006 ,  G03F7/091

摘要： The present invention relates to an antireflective coating composition comprising a crosslinking agent, a polymer comprising at least one chromophore group and at least one hydroxyl and/or a carboxyl group, and an additive, further where the additive has structure 1 and comprises at least one arylene-hydroxyl moiety, where Y is selected from an carboxylate anion or sulfonate anion, R1, R2, and R3 are independently selected from unsubstituted C1-C8 alkyl, substituted C1-C8 alkyl, aryl and arylene-hydroxyl; X1, X2, and X3 are independently selected from direct valence bond and C1-C8 alkylene group, and, n=1, 2 or 3. The invention further relates to a process for using the composition.

摘要翻译： 本发明涉及包含交联剂，包含至少一个发色团和至少一个羟基和/或羧基的聚合物和添加剂的抗反射涂料组合物，此外，其中添加剂具有结构1并且包含至少一个 亚芳基 - 羟基部分，其中Y选自羧酸根阴离子或磺酸根阴离子，R 1，R 2和R 3独立地选自未取代的C 1 -C 8烷基，取代的C 1 -C 8烷基，芳基和亚芳基 - 羟基; X1，X2和X3独立地选自直接键键和C1-C8亚烷基，n = 1,2或3.本发明还涉及使用该组合物的方法。

公开(公告)号：US20080153032A1

公开(公告)日：2008-06-26

申请号：US11613403

申请日：2006-12-20

申请人： M. Dalil Rahman ,  Takanori Kudo

发明人： M. Dalil Rahman ,  Takanori Kudo

IPC分类号： G03F7/004 ,  G03F7/26 ,  C07C309/63 ,  C07C313/04

CPC分类号： C07C311/48 ,  C07C43/225 ,  C07C309/04 ,  C07C309/10 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/12

摘要： The present application relates to a compound of formula where X is selected from the group CF3SO3, C4F9SO3, N(SO2C2F5)2, N(SO2CF3SO2C4F9), N(SO2C3F7)2, N(SO2C4F9)2, CF3CHFO(CF2)2SO3, and CH3CH2CH2O(CF2)4SO3. A photoresist composition comprising a polymer containing an acid labile group, the above compounds, and one or more additional photoacid generators is also provided for.

摘要翻译： 本申请涉及下式的化合物，其中X选自CF 3，SO 3，C 4 H 9， N（SO 2 CO 2）3 N 2 SO 2， >，N（SO 2，CF 3）3，SO 3，S 3，N 3， N（SO 2）2，N（SO 2 H 2 SO 3） CF 3（CH 2）2 CF 3，CF 3 CH 2（CF 2） 2 3 3和CH 3 3 CH 2 CH 2 O（CF 3） 4 3 3。 还提供了包含含有酸不稳定基团的聚合物，上述化合物和一种或多种另外的光酸产生剂的光致抗蚀剂组合物。

公开(公告)号：US20060024610A1

公开(公告)日：2006-02-02

申请号：US10909513

申请日：2004-08-02

申请人： Munirathna Padmanaban ,  Guanyang Lin ,  Takanori Kudo ,  Chi-Sun Hong ,  M. Dalil Rahman

发明人： Munirathna Padmanaban ,  Guanyang Lin ,  Takanori Kudo ,  Chi-Sun Hong ,  M. Dalil Rahman

IPC分类号： G03C1/76

CPC分类号： G03F7/0395 ,  Y10S430/111

摘要： The present invention provides for a photoresist composition comprising a mixture of two different copolymers.

公开(公告)号：US06991888B2

公开(公告)日：2006-01-31

申请号：US10439472

申请日：2003-05-16

申请人： Munirathna Padmanaban ,  Takanori Kudo ,  Sangho Lee ,  Ralph R. Dammel ,  M. Dalil Rahman

发明人： Munirathna Padmanaban ,  Takanori Kudo ,  Sangho Lee ,  Ralph R. Dammel ,  M. Dalil Rahman

IPC分类号： G03F7/004 ,  C08F2/46 ,  C07C53/00 ,  G03C5/00

CPC分类号： G03F7/0392 ,  G03F7/0045 ,  Y10S430/115

摘要： The present invention relates to a novel photoresist composition that can be developed with an aqueous alkaline solution, and is capable of being imaged at exposure wavelengths in the deep ultraviolet. The invention also relates to a process for imaging the novel photoresist as well as novel photoacid generators.The novel photoresist comprises a) a polymer containing an acid labile group, and b) a novel mixture of photoactive compounds, where the mixture comprises a lower absorbing compound selected from structure 1 and 2, and a higher absorbing compound selected from structure 4 and 5, where, R1 and R2 R5, R6, R7, R8, and R9 are defined herein; m=1–5; X− is an anion, and Ar is selected from naphthyl, anthracyl, and structure 3, where R30, R31, R32, R33, and R34 are defined herein.

摘要翻译： 本发明涉及一种可用碱性水溶液显影的新型光刻胶组合物，能够在深紫外线的曝光波长下成像。 本发明还涉及用于对新型光致抗蚀剂以及新型光酸产生剂进行成像的方法。 新型光致抗蚀剂包含a）含有酸不稳定基团的聚合物，和b）光活性化合物的新混合物，其中该混合物包含选自结构1和2的较低吸收化合物和选自结构4和5的较高吸收化合物 ，其中R 1和R 2 R 5，R 6，R 7，或N R 8，R 9和R 9在本文中定义; m = 1-5; X - 是阴离子，Ar选自萘基，蒽基和结构3，其中R 30，R 31，R SUB > 32，R 33和R 34在本文中定义。

公开(公告)号：US06800416B2

公开(公告)日：2004-10-05

申请号：US10042531

申请日：2002-01-09

申请人： Takanori Kudo ,  Munirathna Padmanaban ,  Ralph R. Dammel ,  Medhat A. Touky

发明人： Takanori Kudo ,  Munirathna Padmanaban ,  Ralph R. Dammel ,  Medhat A. Touky

IPC分类号： G03F7004

CPC分类号： G03F7/0382 ,  G03F7/0045 ,  G03F7/0046 ,  Y10S430/108

摘要： The present invention relates to a novel negative working deep uv photoresist that is developable in an aqueous alkaline solution, and comprises a fluorinated polymer, photoactive compound and a crosslinking agent. The photoresist composition is particularly useful for patterning with exposure wavelengths of 193 nm and 157 nm.

摘要翻译： 本发明涉及一种可在碱性水溶液中显影的新型负极深紫外光致抗蚀剂，其包含氟化聚合物，光活性化合物和交联剂。 光致抗蚀剂组合物特别适用于193nm和157nm的曝光波长的图形化。