公开(公告)号：US4589064A

公开(公告)日：1986-05-13

申请号：US469817

申请日：1983-02-25

申请人： Takashi Chiba ,  Satoru Koga ,  Minji Senda

发明人： Takashi Chiba ,  Satoru Koga ,  Minji Senda

IPC分类号： G06F12/14 ,  G06F9/00

CPC分类号： G06F12/1466

摘要： A data processing apparatus includes at least one processing unit, a main storage unit, a main storage control unit, a key storage unit and a key storage control unit. The main storage unit is divided into blocks and the key storage unit stores main storage protection keys, each of which corresponds to one of the blocks of the main storage unit. Key storage access requests are received from a processing unit or the main storage control unit by the key storage control unit whenever data is to be read from or written to a block of main storage. The key storage control unit registers the key storage access requests in a key queue, prevents duplicate access requests from being registered, and processes the queued key storage access requests. The processing of key storage access requests includes updating the contents of the key storage unit to maintain a record of accesses to the main storage unit and controlling accesses to the main storage unit by permitting or denying access thereto.

摘要翻译： 数据处理装置包括至少一个处理单元，主存储单元，主存储控制单元，密钥存储单元和密钥存储控制单元。 主存储单元被分成块，密钥存储单元存储主存储保护密钥，每个主存储保护密钥对应于主存储单元的块之一。 每当要从主存储块读取或写入数据时，由密钥存储控制单元从处理单元或主存储控制单元接收密钥存储访问请求。 密钥存储控制单元将密钥存储访问请求注册在密钥队列中，防止重复访问请求被注册，并处理排队的密钥存储访问请求。 密钥存储访问请求的处理包括更新密钥存储单元的内容以保持对主存储单元的访问记录，并通过允许或拒绝对主存储单元的访问来控制对主存储单元的访问。

公开(公告)号：US09287058B2

公开(公告)日：2016-03-15

申请号：US14005472

申请日：2012-02-27

申请人： Nobuo Ando ,  Teruaki Tezuka ,  Yuu Watanabe ,  Makoto Taguchi ,  Kenji Kojima ,  Takashi Chiba ,  Hirobumi Suzuki

发明人： Nobuo Ando ,  Teruaki Tezuka ,  Yuu Watanabe ,  Makoto Taguchi ,  Kenji Kojima ,  Takashi Chiba ,  Hirobumi Suzuki

IPC分类号： H01G9/00 ,  H01G11/26 ,  H01G11/22 ,  H01M4/02 ,  H01M10/04 ,  H01M10/42 ,  H01G11/50 ,  H01G11/06 ,  H01G11/70 ,  H01M10/0525

CPC分类号： H01G11/26 ,  H01G11/06 ,  H01G11/22 ,  H01G11/50 ,  H01G11/70 ,  H01M4/02 ,  H01M10/0431 ,  H01M10/0525 ,  H01M10/42 ,  H01M2004/021 ,  H01M2010/4292 ,  Y02E60/13 ,  Y02T10/7011 ,  Y02T10/7022

摘要： An accumulator device which provides a high energy density and high output power is provided. The accumulator device (D) includes a positive electrode in which a positive electrode layer (A) is formed, a negative electrode in which a negative electrode layer (B) is formed, and an electrolytic solution (C). The accumulator device is characterized by satisfying that 1.02≦WA/WB≦2.08 and that 390 μm≦TA≦750 μm, where WA is the weight of the positive electrode layer (A), WB is the weight of the negative electrode layer (B), and TA is the thickness of the positive electrode in which the positive electrode layer (A) is formed.

摘要翻译： 提供了提供高能量密度和高输出功率的蓄电池装置。 蓄电装置（D）包括形成有正极层（A）的正电极，形成有负极层（B）的负极和电解液（C）。 蓄电装置的特征在于满足1.02＆nlE; WA / WB＆nlE; 2.08以及390μm＆nlE; TA＆nlE;750μm，其中WA是正极层（A）的重量，WB是负极层的重量 B），TA是形成正极层（A）的正极的厚度。

公开(公告)号：US20090293908A1

公开(公告)日：2009-12-03

申请号：US12431232

申请日：2009-04-28

申请人： Hitoshi KATOH ,  Tsuneyuki Okabe ,  Kohichi Orito ,  Takashi Chiba

发明人： Hitoshi KATOH ,  Tsuneyuki Okabe ,  Kohichi Orito ,  Takashi Chiba

IPC分类号： C03C23/00 ,  B08B3/00

CPC分类号： C03C23/0075

摘要： A method is used for removing a metal contaminant deposited on a quartz member selected from the group consisting of a reaction tube, wafer boat, and heat-insulating cylinder of a vertical heat processing apparatus for a semiconductor process. The method includes obtaining the quartz member unattached to the vertical heat processing apparatus; then, performing diluted hydrofluoric acid cleaning of cleaning the quartz member by use of diluted hydrofluoric acid; then, performing first purified water cleaning of cleaning the quartz member by use of purified water; then, performing hydrochloric acid cleaning of cleaning the quartz member by use of hydrochloric acid; and then, performing second purified water cleaning of cleaning the quartz member by use of purified water.

摘要翻译： 一种方法用于去除沉积在选自由用于半导体工艺的垂直热处理装置的反应管，晶片舟和隔热圆柱体组成的组中的石英构件上的金属污染物。 该方法包括获得未连接到垂直热处理装置的石英构件; 然后，使用稀释的氢氟酸进行稀释的氢氟酸清洗来清洗石英部件; 然后，使用净化水进行清洗石英部件的第一净化水清洗; 然后用盐酸进行清洗石英部件的盐酸清洗; 然后进行使用净化水清洗石英部件的第二净化水清洗。

公开(公告)号：US20080187859A1

公开(公告)日：2008-08-07

申请号：US11578546

申请日：2005-04-13

申请人： Isao Nishimura ,  Takashi Chiba ,  Tsutomu Shimokawa

发明人： Isao Nishimura ,  Takashi Chiba ,  Tsutomu Shimokawa

IPC分类号： G03F7/004

CPC分类号： G03F7/0046 ,  G03F7/0045 ,  G03F7/0757

摘要： A radiation-sensitive resin composition exhibiting only extremely controlled change in the sensitivity after storage when used as a chemically-amplified resist possessing high transparency at a wavelength of 193 nm or less and particularly excellent depth of focus (DOF) is provided.The radiation-sensitive resin composition comprises (A) a siloxane resin having a structural unit (I) shown by the following formula (I) and/or a structural unit (II) shown by the following formula (II), (B) a photoacid generator, and (C) a solvent, the content of nitrogen-containing compounds in the composition being not more than 100 ppm, wherein A and B individually represent a substituted or unsubstituted divalent linear, branched, or cyclic hydrocarbon group, R1 represents a monovalent acid-dissociable group, and R2 represents a hydrogen atom or monovalent acid-dissociable group.

摘要翻译： 提供了当用作具有193nm或更小波长的特别优异的聚焦深度（DOF）时具有高透明度的化学放大抗蚀剂时，储存后灵敏度极度受控变化的辐射敏感性树脂组合物。 辐射敏感性树脂组合物包含（A）具有下式（I）所示的结构单元（I）和/或下式（II）所示的结构单元（II）的硅氧烷树脂，（B）a 光生酸发生剂和（C）溶剂，组合物中含氮化合物的含量不超过100ppm，其中A和B各自表示取代或未取代的二价直链，支链或环状烃基R SUP > 1 表示一价酸解离基团，R 2表示氢原子或一价酸解离基团。

公开(公告)号：US07337347B2

公开(公告)日：2008-02-26

申请号：US10998151

申请日：2004-11-29

申请人： Masahito Kubo ,  Takashi Chiba ,  Masakazu Takahashi ,  Shinichiro Nakamura ,  Kenji Takebe ,  Hirofumi Koseki

发明人： Masahito Kubo ,  Takashi Chiba ,  Masakazu Takahashi ,  Shinichiro Nakamura ,  Kenji Takebe ,  Hirofumi Koseki

IPC分类号： G06F1/04 ,  G06F1/00 ,  G06F1/12 ,  G06F5/06

CPC分类号： G06F1/14

摘要： An elapsed cycle number during the predetermined period of the inputted clock source is counted using the clock reference signal as a yardstick, a frequency of the clock source is computed based on an elapsed cycle number obtained by counting, control timing of various interfaces relating to the CPU is adjusted and an interruption generating interval in which interruption is generated regularly by the CPU so that adjustment of control timing of various interfaces and setting of a timer interruption interval during the OS operation in accordance with a frequency of the clock source without performing OS modification such as rebuilding and the like.

摘要翻译： 使用时钟参考信号作为衡量标准，在输入的时钟源的预定时段期间的经过周期数被计数，基于通过计数获得的经过的周期数来计算时钟源的频率，控制与 CPU被调整，并且中断生成间隔由CPU定期产生中断，从而根据时钟源的频率在OS操作期间调整各种接口的控制定时并设置定时器中断间隔，而不进行OS修改 例如重建等。

公开(公告)号：US20050136693A1

公开(公告)日：2005-06-23

申请号：US10942103

申请日：2004-09-16

申请人： Kazuhide Hasebe ,  Yutaka Takahashi ,  Kota Umezawa ,  Satoshi Takagi ,  Mitsuhiro Okada ,  Takashi Chiba ,  Jun Ogawa

发明人： Kazuhide Hasebe ,  Yutaka Takahashi ,  Kota Umezawa ,  Satoshi Takagi ,  Mitsuhiro Okada ,  Takashi Chiba ,  Jun Ogawa

IPC分类号： C23C16/34 ,  C23C16/455 ,  H01L21/205 ,  H01L21/314 ,  H01L21/318 ,  H01L21/324 ,  H01L21/336 ,  H01L21/31 ,  H01L21/469

CPC分类号： H01L21/0217 ,  C23C16/345 ,  C23C16/45531 ,  C23C16/45546 ,  H01L21/022 ,  H01L21/02271 ,  H01L21/3141 ,  H01L21/3185

摘要： The present invention is a thermal processing method of conducting a thermal process to an object to be processed, a base film having been formed on a surface of the object to be processed, the base film consisting of a SiO2 film or a SiON film. The method includes: an arranging step of arranging the object to be processed in a processing container; and a laminating step of supplying a source gas and an ammonia gas alternatively and repeatedly, so as to form a silicon nitride film on the base film repeatedly, the source gas being selected from a group consisting of dichlorosilane, hexachlorodisilane and tetrachlorosilane.

摘要翻译： 本发明是对待处理物体进行热处理的热处理方法，在被处理物的表面上形成的基膜，由SiO 2 2 电影或SiON电影。 该方法包括：将处理对象物置于处理容器内的布置步骤; 以及层叠步骤，交替重复地供给源气体和氨气，以在所述基膜上重复形成氮化硅膜，所述源气体选自二氯硅烷，六氯二硅烷和四氯硅烷。

公开(公告)号：USD357393S

公开(公告)日：1995-04-18

申请号：US21600

申请日：1994-04-12

申请人： Yasuo Kazama ,  Takashi Chiba

设计人： Yasuo Kazama ,  Takashi Chiba

公开(公告)号：US4871901A

公开(公告)日：1989-10-03

申请号：US878353

申请日：1986-06-25

申请人： Masaru Igusa ,  Takashi Chiba

发明人： Masaru Igusa ,  Takashi Chiba

IPC分类号： A23N12/10 ,  A23N12/12

CPC分类号： A23N12/12 ,  A23N12/10

摘要： A coffee roasting apparatus is disclosed. The coffee roasting apparatus comprises a cylindrical container, a cylindrical drum rotatably extended within the center portion of the container, and a heater element diposed within the drum. The apparatus includes a blower device to cause air circulation within the interior of the container to more uniformily heat the beans. The heater element is controlled by a control device to reduce the calorific value of the heater element when the temperature of the container reaches a predetermined temperature. Therefore, abnormal temperature in the container is prevented, while the roasting operation is speedily done. A control device for the blower device is also disclosed which will vary the speed of the blower in response to changes in the input voltage. In this way, an increase in the input voltage which may have caused unwanted overheating is avioded by a corresponding increase in air circulation.

摘要翻译： 公开了一种咖啡焙烧装置。 咖啡焙烧装置包括圆柱形容器，可旋转地延伸在容器的中心部分内的圆柱形鼓和放在滚筒内的加热器元件。 该装置包括鼓风机装置，以使容器内部的空气循环更均匀地加热豆类。 当容器的温度达到预定温度时，加热器元件由控制装置控制，以减小加热器元件的发热量。 因此，能够快速地进行焙烧作业，防止容器内的异常温度上升。 还公开了一种用于鼓风机装置的控制装置，其将响应于输入电压的变化而改变鼓风机的速度。 以这种方式，可能引起不必要的过热的输入电压的增加通过空气循环的相应增加来改变。

公开(公告)号：US4115855A

公开(公告)日：1978-09-19

申请号：US715862

申请日：1976-08-19

申请人： Takashi Chiba

发明人： Takashi Chiba

IPC分类号： G06F9/48 ,  G06F12/12 ,  G06F7/00 ,  G06F13/00

CPC分类号： G06F12/125

摘要： For extracting a unit data block of the lowest priority from a plurality of unit data blocks stored in a buffer memory of large capacity, the unit data blocks are divided into set blocks, each comprising a predetermined number of unit data blocks, and priority levels of the set blocks are determined to extract one of them. At the same time, priority levels of the predetermined number of unit data blocks making up each set block are determined to extract one of them. One unit data block is extracted by a combination of the extracted set block with the unit data blocks extracted from the respective set blocks. In this manner, one of many unit data blocks is extracted by using a small number of bits.

摘要翻译： 为了从存储在大容量的缓冲存储器中的多个单位数据块提取具有最低优先级的单位数据块，单位数据块被划分为每个包括预定数量的单位数据块的设置块和优先级 确定设置块以提取其中的一个。 同时，确定构成每个集合块的预定数量的单位数据块的优先级，以提取它们中的一个。 通过提取的集合块与从各个集合块提取的单位数据块的组合提取一个单位数据块。 以这种方式，通过使用少量的位来提取许多单位数据块中的一个。

公开(公告)号：US09182674B2

公开(公告)日：2015-11-10

申请号：US13550733

申请日：2012-07-17

申请人： Toru Kimura ,  Yukio Nishimura ,  Tomohiro Utaka ,  Hiroaki Nemoto ,  Atsushi Nakamura ,  Takashi Chiba ,  Hiroki Nakagawa

发明人： Toru Kimura ,  Yukio Nishimura ,  Tomohiro Utaka ,  Hiroaki Nemoto ,  Atsushi Nakamura ,  Takashi Chiba ,  Hiroki Nakagawa

IPC分类号： G03F7/11 ,  G03F7/20 ,  C08F214/18 ,  C08F216/10 ,  C08F220/18 ,  C08F220/24

CPC分类号： G03F7/2041 ,  C08F214/182 ,  C08F214/186 ,  C08F216/10 ,  C08F220/18 ,  C08F220/24 ,  G03F7/11 ,  C08F220/06 ,  C08F2222/1013

摘要： An immersion upper layer film composition includes a resin and a solvent. The resin forms a water-stable film during irradiation and is dissolved in a subsequent developer. The solvent contains a monovalent alcohol having 6 or less carbon atoms. The composition is to be applied to form a coat on a photoresist film in an immersion exposure process in which the photoresist film is irradiated through water provided between a lens and the photoresist film.

摘要翻译： 浸渍上层膜组合物包括树脂和溶剂。 树脂在照射期间形成水稳定膜并溶解在随后的显影剂中。 溶剂含有具有6个或更少碳原子的一价醇。 在浸渍曝光工艺中，应用该组合物在光致抗蚀剂膜上形成涂层，其中光致抗蚀剂膜通过设置在透镜和光致抗蚀剂膜之间的水进行照射。