Resistive Sense Memory with Complementary Programmable Recording Layers
    21.
    发明申请
    Resistive Sense Memory with Complementary Programmable Recording Layers 审中-公开
    具有互补可编程记录层的电阻感知存储器

    公开(公告)号:US20100254174A1

    公开(公告)日:2010-10-07

    申请号:US12416976

    申请日:2009-04-02

    IPC分类号: G11C11/00 G11C11/14 G11C7/00

    摘要: A resistive sense memory and method of writing data thereto. In accordance with various embodiments, the resistive sense memory comprises a first reference layer with a fixed magnetic orientation in a selected direction coupled to a first tunneling barrier, a second reference layer with a fixed magnetic orientation in the selected direction coupled to a second tunneling barrier, and a recording structure disposed between the first and second tunneling barriers comprising first and second free layers. A selected logic state is written to the resistive sense memory by applying a programming input to impart complementary first and second programmed magnetic orientations to the respective first and second free layers.

    摘要翻译: 一种电阻读出存储器及其数据写入方法。 根据各种实施例,电阻式感测存储器包括在耦合到第一隧道势垒的选定方向上具有固定磁性取向的第一参考层,在所选择的方向上具有固定的磁性取向的第二参考层,其耦合到第二隧道势垒 以及设置在第一和第二隧穿屏障之间的记录结构,包括第一和第二自由层。 所选择的逻辑状态通过施加编程输入来写入电阻式读出存储器,以将互补的第一和第二编程磁性取向传递给相应的第一和第二自由层。

    Band engineered high-K tunnel oxides for non-volatile memory
    25.
    发明授权
    Band engineered high-K tunnel oxides for non-volatile memory 有权
    用于非易失性存储器的带式工程高K隧道氧化物

    公开(公告)号:US07875923B2

    公开(公告)日:2011-01-25

    申请号:US12120715

    申请日:2008-05-15

    IPC分类号: H01L29/788

    CPC分类号: H01L29/792

    摘要: A non-volatile memory cell that has a charge source region, a charge storage region, and a crested tunnel barrier layer that has a potential energy profile which peaks between the charge source region and the charge storage region. The tunnel barrier layer has multiple high-K dielectric materials, either as individual layers or as compositionally graded materials.

    摘要翻译: 具有电荷源区域,电荷存储区域和具有在电荷源区域和电荷存储区域之间峰值的势能分布的波峰隧道势垒层的非易失性存储单元。 隧道势垒层具有多个高K电介质材料,无论是单独层还是成分分级材料。

    BAND ENGINEERED HIGH-K TUNNEL OXIDES FOR NON-VOLATILE MEMORY
    27.
    发明申请
    BAND ENGINEERED HIGH-K TUNNEL OXIDES FOR NON-VOLATILE MEMORY 有权
    用于非易失性存储器的BAND工程高K隧道氧化物

    公开(公告)号:US20090283816A1

    公开(公告)日:2009-11-19

    申请号:US12120715

    申请日:2008-05-15

    IPC分类号: H01L29/788

    CPC分类号: H01L29/792

    摘要: A non-volatile memory cell that has a charge source region, a charge storage region, and a crested tunnel barrier layer that has a potential energy profile which peaks between the charge source region and the charge storage region. The tunnel barrier layer has multiple high-K dielectric materials, either as individual layers or as compositionally graded materials.

    摘要翻译: 具有电荷源区域,电荷存储区域和具有在电荷源区域和电荷存储区域之间峰值的势能分布的波峰隧道势垒层的非易失性存储单元。 隧道势垒层具有多个高K电介质材料,无论是单独层还是成分分级材料。