METHOD AND APPARATUS FOR IMPRINTING MICROSTRUCTURE AND STAMPER THEREFOR
    21.
    发明申请
    METHOD AND APPARATUS FOR IMPRINTING MICROSTRUCTURE AND STAMPER THEREFOR 有权
    用于印刷微结构和印刷机的方法和装置

    公开(公告)号:US20090243126A1

    公开(公告)日:2009-10-01

    申请号:US12388573

    申请日:2009-02-19

    IPC分类号: G11B3/00 B29C59/16

    摘要: A method of imprinting a microstructure comprising: contacting a stamper comprising a pattern layer with the microstructure of the order of from micrometers to nanometers in one face of the pattern layer and a substrate supporting the pattern layer with an imprinting member having a deformable layer to which the microstructure is imprinted, wherein the pattern layer is supported on a round surface having a prescribed radius of curvature of the substrate, the center of the round surface protruding towards the rear face of the pattern layer; causing the deformable layer on the imprinting member; and separating the stamper from the cured deformable layer.

    摘要翻译: 一种压印微结构的方法,包括:将包含图案层的压模与图案层的一个表面中的微米级至数毫米级的微结构接触;以及支撑图案层的基板,其具有可变形层的压印构件, 印刷微结构,其中图案层被支撑在具有规定的基底曲率半径的圆形表面上,圆形表面的中心朝向图案层的背面突出; 使压印构件上的可变形层产生; 以及将所述压模与所述固化的可变形层分离。

    PATTERN TRANSFER METHOD AND IMPRINT DEVICE
    22.
    发明申请
    PATTERN TRANSFER METHOD AND IMPRINT DEVICE 失效
    图案转印方法和印刷装置

    公开(公告)号:US20080028953A1

    公开(公告)日:2008-02-07

    申请号:US11833284

    申请日:2007-08-03

    IPC分类号: B31F1/07 G01B11/00

    摘要: In order to allow for aligning a relative position between a transferred object and a stamper with high accuracy without providing an alignment pattern in the transferred object, there are provided: a pattern transfer method, including: when adjusting the relative position between the stamper and the transferred object, a step of detecting at least two or more edge positions of the transferred object and calculating an arbitrary point from the detected edge positions; a step of detecting a position of the stamper from an edge of the stamper or an alignment mark formed in the stamper; and a step of adjusting the relative position between the transferred object and the stamper from the arbitrary point and the position of the stamper; and an imprint device using the same.

    摘要翻译: 为了允许高精度地对准被转印物体与压模之间的相对位置,而不在被转移物体中提供对准图案,提供了一种图案转印方法,包括:当调节压模与 检测被转移对象的至少两个以上边缘位置的步骤,并从检测到的边缘位置计算任意点; 从压模的边缘或形成在压模中的对准标记检测压模的位置的步骤; 以及从任意点和压模的位置调整被转印物体与压模之间的相对位置的步骤; 以及使用其的压印装置。

    Pattern transfer method and imprint device
    23.
    发明授权
    Pattern transfer method and imprint device 失效
    图案转印方法和印版装置

    公开(公告)号:US08491291B2

    公开(公告)日:2013-07-23

    申请号:US13366792

    申请日:2012-02-06

    IPC分类号: B29C59/16

    摘要: In order to allow for aligning a relative position between a transferred object and a stamper with high accuracy without providing an alignment pattern in the transferred object, there are provided: a pattern transfer method, including: when adjusting the relative position between the stamper and the transferred object, a step of detecting at least two or more edge positions of the transferred object and calculating an arbitrary point from the detected edge positions; a step of detecting a position of the stamper from an edge of the stamper or an alignment mark formed in the stamper; and a step of adjusting the relative position between the transferred object and the stamper from the arbitrary point and the position of the stamper; and an imprint device using the same.

    摘要翻译: 为了允许高精度地对准被转印物体与压模之间的相对位置,而不在被转移物体中提供对准图案,提供了一种图案转印方法,包括:当调节压模和 检测被转移物体的至少两个以上边缘位置的步骤,并从检测到的边缘位置计算任意点; 从压模的边缘或形成在压模中的对准标记检测压模的位置的步骤; 以及从任意点和压模的位置调整被转印物体与压模之间的相对位置的步骤; 以及使用其的压印装置。

    Method and apparatus for imprinting microstructure and stamper therefor
    24.
    发明授权
    Method and apparatus for imprinting microstructure and stamper therefor 有权
    用于印刷微结构和压模的方法和装置

    公开(公告)号:US08192637B2

    公开(公告)日:2012-06-05

    申请号:US12388573

    申请日:2009-02-19

    IPC分类号: B44C1/22

    摘要: A method of imprinting a microstructure comprising: contacting a stamper comprising a pattern layer with the microstructure of the order of from micrometers to nanometers in one face of the pattern layer and a substrate supporting the pattern layer with an imprinting member having a deformable layer to which the microstructure is imprinted, wherein the pattern layer is supported on a round surface having a prescribed radius of curvature of the substrate, the center of the round surface protruding towards the rear face of the pattern layer; causing the deformable layer on the imprinting member; and separating the stamper from the cured deformable layer.

    摘要翻译: 一种压印微结构的方法,包括:将包含图案层的压模与图案层的一个表面中的微米级至数毫米级的微结构接触;以及支撑图案层的基板,其具有可变形层的压印构件, 印刷微结构,其中图案层被支撑在具有规定的基底曲率半径的圆形表面上,圆形表面的中心朝向图案层的背面突出; 使压印构件上的可变形层产生; 以及将所述压模与所述固化的可变形层分离。

    Imprint device and microstructure transfer method
    26.
    发明申请
    Imprint device and microstructure transfer method 审中-公开
    压印装置和微结构转印方法

    公开(公告)号:US20060286193A1

    公开(公告)日:2006-12-21

    申请号:US11438336

    申请日:2006-05-23

    IPC分类号: B28B11/08

    摘要: In an imprint device and a microstructure transfer method, a fluid is ejected at the back of at least either a stamper or a transfer target body during pressurization of the stamper and the transfer target body. The fluid is ejected through plural holes formed in a stage disposed at the back of at least either the stamper or the transfer target body. The plural holes are connected to independent pressure regulating mechanisms, which can individually control the amount of fluid ejection, the timing of start of ejection, and so on. When the stamper is peeled from the transfer target body, the plural holes are evacuated to fix the stamper or the transfer target body to the stage by suction so as to peel the stamper. The present invention enables to apply uniform pressure to the stamper against the surface of the target substrate, to control the in-plane pressure distribution according to the surface profile or external appearance of the stamper or the target substrate, and to peel the stamper from the target substrate immediately after pressurization.

    摘要翻译: 在压印装置和微结构转印方法中,在压模和转印体的加压期间,在至少压模或转印体的至少一个的背面喷射流体。 流体通过形成在设置在压模或转印体中的至少一个的背面的台中的多个孔喷出。 多个孔连接到独立的压力调节机构,其可以单独控制流体喷射的量,喷射开始的时间等。 当压模从转印体上剥离时,将多个孔抽真空,通过抽吸将压模或转印目标体固定在平台上,从而剥离压模。 本发明能够对压模施加均匀的压力以抵抗目标基板的表面,以根据压模或目标基板的表面轮廓或外观来控制平面内的压力分布,并且将压模从 加压后立即进行目标基材。

    Gate-last fabrication of quarter-gap MGHK FET
    29.
    发明授权
    Gate-last fabrication of quarter-gap MGHK FET 失效
    最后制造四分之一MGHK FET

    公开(公告)号:US08786030B2

    公开(公告)日:2014-07-22

    申请号:US13570388

    申请日:2012-08-09

    IPC分类号: H01L21/02

    摘要: A quarter-gap p-type field effect transistor (PFET) formed by gate-last fabrication includes a gate stack formed on a silicon substrate, the gate stack including: a high-k dielectric layer located on the silicon substrate; and a gate metal layer located over the high-k dielectric layer, the gate metal layer including titanium nitride and having a thickness of about 20 angstroms; and a metal contact formed over the gate stack. A quarter-gap n-type field effect transistor (NFET) formed by gate-last fabrication includes a gate stack formed on a silicon substrate, the gate stack including: a high-k dielectric layer located on the silicon substrate; and a first gate metal layer located over the high-k dielectric layer, the first gate metal layer including titanium nitride; and a metal contact formed over the gate stack.

    摘要翻译: 通过栅极最终制造形成的四分之一间隙p型场效应晶体管(PFET)包括形成在硅衬底上的栅极堆叠,所述栅极堆叠包括:位于硅衬底上的高k电介质层; 以及位于高k电介质层上方的栅极金属层,所述栅极金属层包括氮化钛并且具有约20埃的厚度; 以及形成在栅极堆叠上的金属接触。 通过栅极最后制造形成的四分之一间隙n型场效应晶体管(NFET)包括形成在硅衬底上的栅极堆叠,该栅极堆叠包括:位于硅衬底上的高k电介质层; 以及位于所述高k电介质层上方的第一栅极金属层,所述第一栅极金属层包括氮化钛; 以及形成在栅极堆叠上的金属接触。

    Positioning apparatus
    30.
    发明授权
    Positioning apparatus 有权
    定位装置

    公开(公告)号:US08740506B2

    公开(公告)日:2014-06-03

    申请号:US13033253

    申请日:2011-02-23

    IPC分类号: B65G51/20

    摘要: A positioning apparatus includes a stage on which a piezoelectric element is set, a stop unit having a stop face to which the piezoelectric element set on the stage is pushed so that the piezoelectric element is positioned at a target position corresponding to an attaching part of, for example, a head suspension to which the piezoelectric element is attached, and a pushing unit to push the piezoelectric element toward the stop face, the pushing unit blowing a gas to push the piezoelectric element. The positioning apparatus is capable of correctly positioning the piezoelectric element to the target position without damaging the piezoelectric element.

    摘要翻译: 一种定位装置,包括设置有压电元件的台,具有止动面的停止单元,所述停止面被压入到设置在所述台上的所述压电元件,使得所述压电元件位于对应于所述平台的安装部的目标位置, 例如,安装有压电元件的磁头悬架以及将压电元件朝向止动面推压的推压单元,推压单元吹出气体来推压压电元件。 定位装置能够将压电元件正确地定位到目标位置而不损坏压电元件。