PHOTOLITHOGRAPHIC PATTERNING OF ARRAYS OF PILLARS HAVING WIDTHS AND LENGTHS BELOW THE EXPOSURE WAVELENGTHS
    21.
    发明申请
    PHOTOLITHOGRAPHIC PATTERNING OF ARRAYS OF PILLARS HAVING WIDTHS AND LENGTHS BELOW THE EXPOSURE WAVELENGTHS 审中-公开
    具有宽度和长度的支柱阵列的平面图的曝光波长

    公开(公告)号:US20100068658A1

    公开(公告)日:2010-03-18

    申请号:US12233298

    申请日:2008-09-18

    IPC分类号: G03F7/20

    CPC分类号: G03F1/00 G03F7/70558

    摘要: A pillar array is printed in positive photoresist using an optical mask (108) having an array of features (310) corresponding to the pillars. The pillars' width/length dimensions are below the exposure wavelength. Superior results can be achieved (less peeling off of the pillars and less overexposure at the center of each pillar) if the mask features (310) are downsized relative to the pillars' target sizes, and the exposure energy is reduced. Negative photoresist (with a dark field mask) can be used, and can provide good results (in terms of pillars peeling-off) if the combined area of the features (410) corresponding to the pillars is smaller than the area between the features (410).

    摘要翻译: 使用具有对应于柱的特征阵列(310)的光学掩模(108)将柱阵列印刷在正性光致抗蚀剂中。 支柱的宽度/长度尺寸低于曝光波长。 如果掩模特征(310)相对于柱体的目标尺寸减小,并且曝光能量减小,则可以实现优异的结果(较少的柱的剥离和在每个柱的中心处较少的过度曝光)。 如果与柱相对应的特征(410)的组合面积小于特征之间的面积,则可以使用负光致抗蚀剂(具有暗场掩模),并且可以提供良好的结果(在柱子剥离方面) 410)。

    Preset necktie
    22.
    发明授权
    Preset necktie 失效
    预设领带

    公开(公告)号:US4835794A

    公开(公告)日:1989-06-06

    申请号:US163592

    申请日:1988-03-03

    IPC分类号: A41D25/02 A44B19/30

    摘要: A novel preset necktie comprises an outer tie, and inner tie, a zipper, a zipper slider of unique configuration, and a support body. The outer and the inner ties are both separate individual bodies with the upper portion of the inner tie being connected to form a loop and a zipper being disposed to the inner side of the lower portion thereof to form into the tie loop. With the inner tie having been threaded through the support body and the pull tab of the specially designed slider secured to the inner side of said slider, the size of the tie loop can be adjusted by pushing or pulling said support body. A pressing spring plate is provided on the inner side of the slider so as to keep the shape of the tie loop fixed. The upper portion of the outer tie is secured to the support body by means of a rivet and preset into a regular knot such that the user does not have to set the knot each time when wearing then necktie.

    摘要翻译: 一个新颖的预制领带包括一个外部领带,内部领带,拉链,独特构造的拉链滑块和支撑体。 外部和内部连接件是分开的单个主体,内部连接件的上部连接以形成一个环,并且拉链设置在其下部的内侧以形成连接环。 由于内部连接件已经穿过支撑体,并且特别设计的滑块的拉片固定到所述滑块的内侧,可以通过推动或拉动所述支撑体来调节连接环的尺寸。 在滑块的内侧设置有按压弹簧板,以使扎带的形状保持固定。 外部系带的上部通过铆钉固定到支撑体上,并预先设置成规则的结,使得用户每次穿着领带时都不必设置结。

    Method of producing flat ECR layer in microwave plasma device and
apparatus therefor
    23.
    发明授权
    Method of producing flat ECR layer in microwave plasma device and apparatus therefor 失效
    在微波等离子体装置中生产平面ECR层的方法及其装置

    公开(公告)号:US5198725A

    公开(公告)日:1993-03-30

    申请号:US729211

    申请日:1991-07-12

    IPC分类号: H01J37/32

    CPC分类号: H01J37/32192 H01J37/32678

    摘要: A microwave plasma generating device including a plasma chamber for generating plasma, a reaction chamber having a specimen stage on which a specimen is treated with the plasma, a gas supply for supplying gas to the plasma generating chamber, a microwave generator for generating a microwave electric field in the plasma and reaction chambers and a plurality of axially spaced apart and concentric electromagnet coils for generating a magnetic field in the plasma and reaction chambers. The microwave electric field and the magnetic field have perpendicularly crossing components and the magnetic field has a strength which decreases in the axial direction from the plasma chamber towards the reaction chamber with constant strength magnetic flux density lines lying in planes which are substantially parallel to each other and perpendicular to the axial direction. The magnetic field produces a flat ECR condition wherein the ECR layer extends perpendicularly to the axial direction over at least 50% of the width of the plasma chamber. In a method of using this device, upper and lower electromagnets produce magnetic fields such that the magnetic field produced by the lower electromagnet is weaker than that produced by the first electromagnet. For instance, the upper electromagnet can be supplied a higher amount of current than the lower electromagnet. Alternatively, the upper and lower electromagnets can be supplied the same amount of current but the lower electromagnet can be larger in diameter than the first electromagnet. This allows the ECR layer to be made thicker in the axial direction than an ECR layer produced by a conventional plasma generating device.

    摘要翻译: 一种包括用于产生等离子体的等离子体室的微波等离子体产生装置,具有用等离子体处理试样的试样台的反应室,用于向等离子体发生室供给气体的气体供给装置,用于产生微波电力的微波发生器 等离子体和反应室中的多个磁场和用于在等离子体和反应室中产生磁场的多个轴向间隔开和同心的电磁线圈。 微波电场和磁场具有垂直交叉分量,并且磁场具有从等离子体室朝向反应室的轴向方向上减小的强度,其中恒定强度的磁通密度线位于彼此基本平行的平面中 并垂直于轴向。 磁场产生平坦的ECR条件,其中ECR层在等离子体室的宽度的至少50%上垂直于轴向方向延伸。 在使用该装置的方法中,上下电磁体产生磁场,使得由下电磁体产生的磁场弱于由第一电磁体产生的磁场。 例如,可以向上部电磁体提供比下部电磁体更高的电流量。 或者,上电磁体和下电磁体可以供给相同量的电流,但是下电磁体的直径可以大于第一电磁体。 这允许ECR层在轴向方向上比由常规等离子体产生装置产生的ECR层更厚。

    Seaman style preset necktie
    24.
    发明授权
    Seaman style preset necktie 失效
    海员风格预置领带

    公开(公告)号:US4856114A

    公开(公告)日:1989-08-15

    申请号:US224608

    申请日:1988-07-27

    IPC分类号: A41D25/02

    CPC分类号: A41D25/008 A41D25/02

    摘要: The present invention provides a seaman style preset necktie characterized mainly in that the portions of the necktie below the tie knot are bifurated into two branches, there are no inner and outer ties as those with conventional neckties, and that the tie knot is suspended before the wearer's chest instead of being tied adjacent to the neck opening. In the present invention, both ends of the necktie are provided with zippers on the same side and the tie knot is provided with a pair of zipper sliders which are disposed invertedly relative to each other, the upper slider causing the portions of the necktie body to be gathered while the lower one causing them to be separated again, such that the position of the tie knot can be adjusted by sliding the sliders. After proper adjustment, by means of the fastening means on the ends of the outer cover of the tie knot, it is only necessary to fold and press said outer cover of the tie knot to be securely set.

    摘要翻译: 本发明提供了一种海员风格的预制领带,其特征在于,将领结下方的领带部分分为两个分支,不具有与传统领带相同的内,外领带,并且领结在 佩戴者的胸部,而不是被绑在颈部开口附近。 在本发明中,领带的两端在同一侧设置有拉链,并且扣环设置有相对于彼此倒置布置的一对拉链滑块,上滑块使领带主体的部分 聚集在一起,而较低的一个使它们再次分离,使得可以通过滑动滑块来调节打结的位置。 在适当调整后,通过紧固装置在结结外壳的端部,仅需要折叠并按压所述结节的外盖以便牢固地固定。

    Metal and metal silicide nitridization in a high density, low pressure plasma reactor
    25.
    发明授权
    Metal and metal silicide nitridization in a high density, low pressure plasma reactor 失效
    金属和金属硅化物氮化在高密度,低压等离子体反应器中

    公开(公告)号:US06221792B1

    公开(公告)日:2001-04-24

    申请号:US08881710

    申请日:1997-06-24

    IPC分类号: H01L2144

    CPC分类号: H01L21/76856 H01L21/76843

    摘要: A nitridization process to form a barrier layer on a substrate is described. The nitridization process includes depositing a layer of metal or metal silicide on a surface of the substrate, placing the substrate into a high density, low pressure plasma reactor, introducing into the high density low pressure plasma reactor a gas including nitrogen, and striking a plasma in the high density, low pressure plasma reactor under conditions that promote nitridization of at least a portion of the layer of metal or metal silicide to produce a composition of metal nitride or metal silicon nitride, respectively.

    摘要翻译: 描述了在衬底上形成阻挡层的氮化工艺。 氮化工艺包括在衬底的表面上沉积金属或金属硅化物层,将衬底放置在高密度,低压等离子体反应器中,将包含氮气的气体引入高密度低压等离子体反应器中, 在高密度低压等离子体反应器中,在促进至少一部分金属或金属硅化物层的氮化的条件下,分别产生金属氮化物或金属氮化硅的组合物。

    Gas dispersion window for plasma apparatus and method of use thereof
    26.
    发明授权
    Gas dispersion window for plasma apparatus and method of use thereof 失效
    等离子体装置用气体分散窗及其使用方法

    公开(公告)号:US5824605A

    公开(公告)日:1998-10-20

    申请号:US509080

    申请日:1995-07-31

    IPC分类号: H01J37/32 H05H1/46 H05H1/00

    摘要: A gas dispersion window for a plasma etching or plasma deposition reactor including a housing having a chamber in which an article can be treated with plasma. The housing includes at least one inlet port connected to an interior of the chamber through which process gas can be supplied to the chamber. A radiofrequency energy source is arranged to pass radiofrequency energy into the chamber and induce plasma in the interior of the chamber by activating, with an electric field induced by the radiofrequency energy source, process gas supplied to the chamber through the inlet port. A dielectric window formed by spaced apart first and second dielectric members has an inner surface thereof forming part of an inner wall of the chamber. Radiofrequency energy passes from the radiofrequency energy source to the interior of the chamber through the dielectric window. The process gas is supplied to the gap between the first and second dielectric members and passes inwardly into the chamber through gas dispersion holes in the second member.

    摘要翻译: 一种用于等离子体蚀刻或等离子体沉积反应器的气体分散窗,其包括具有腔室的壳体,其中可以用等离子体处理制品。 壳体包括连接到室的内部的至少一个入口端口,通过该入口端口可将工艺气体供应到室。 射频能源设置成将射频能量传递到腔室中并且通过由射频能量源引起的电场通过入口端口供应到腔室的处理气体进行激活而在腔室的内部引起等离子体。 由间隔开的第一和第二电介质构件形成的电介质窗口具有形成室的内壁的一部分的内表面。 射频能量通过电介质窗从射频能量传递到腔室的内部。 工艺气体被供应到第一和第二电介质构件之间的间隙,并通过第二构件中的气体分散孔向内进入腔室。

    Dynamic feedback electrostatic wafer chuck
    27.
    发明授权
    Dynamic feedback electrostatic wafer chuck 失效
    动态反馈静电晶片卡盘

    公开(公告)号:US5812361A

    公开(公告)日:1998-09-22

    申请号:US624988

    申请日:1996-03-29

    CPC分类号: H01L21/6833 Y10T279/23

    摘要: An electrostatic chuck system having an electrostatic chuck for securely holding a wafer on a surface of the electrostatic chuck. The electrostatic chuck system comprises a wafer bias sensor coupled to a first portion of the electrostatic chuck for sensing an alternating current signal at the first portion. The wafer bias sensor outputs, responsive to the alternating current signal, a direct current voltage level representative of a direct current bias level of the wafer. The electrostatic chuck system further comprises a variable electrostatic chuck power supply coupled to the wafer bias sensor. The variable electrostatic chuck power supply provides a first potential level to the first portion of the electrostatic chuck. The first potential level is modified, responsive to the direct current voltage level, to substantially maintain a first predefined potential difference between the first portion of the electrostatic chuck and a first region of the wafer overlaying the first portion irrespective of a magnitude of the direct current bias level of the wafer.

    摘要翻译: 一种具有用于将晶片牢固地保持在静电卡盘的表面上的静电卡盘的静电卡盘系统。 静电吸盘系统包括耦合到静电卡盘的第一部分的晶片偏置传感器,用于感测第一部分处的交流信号。 晶片偏置传感器响应于交流信号输出代表晶片的直流偏置电平的直流电压电平。 静电卡盘系统还包括耦合到晶片偏置传感器的可变静电卡盘电源。 可变静电卡盘电源为静电卡盘的第一部分提供第一电位电平。 响应于直流电压电平修改第一电位电平,以基本上保持静电卡盘的第一部分和覆盖第一部分的晶片的第一区域之间的第一预定电位差,而不管直流电流的大小 晶片的偏置电平。

    Method of treating an article with a plasma apparatus in which a uniform
electric field is induced by a dielectric window
    28.
    发明授权
    Method of treating an article with a plasma apparatus in which a uniform electric field is induced by a dielectric window 失效
    用等离子体装置处理物品的方法,其中电介质窗口引起均匀的电场

    公开(公告)号:US5368710A

    公开(公告)日:1994-11-29

    申请号:US038612

    申请日:1993-03-29

    摘要: A method of plasma treating an article in a housing having a chamber in which the article such as a wafer can be treated with plasma. The housing includes at least one inlet port connected to an interior of the chamber through which process gas can be supplied to the chamber. A radiofrequency energy source is arranged to pass radiofrequency energy into the chamber and induce plasma in the interior of the chamber by activating, with an electric field induced by the radiofrequency energy source, process gas supplied to the chamber through the inlet port. A dielectric window having an inner surface thereof forms part of an inner wall of the chamber. Radiofrequency energy passes from the radiofrequency energy source to the interior of the chamber through the dielectric window. The dielectric window has a thickness which varies at different points along the inner surface thereof such that the thickness is largest at a central portion of the dielectric window. The dielectric window is effective to decrease the induced electric field in the interior of the chamber near the central portion of the dielectric window.

    摘要翻译: 一种等离子体处理具有室的壳体中的物品的方法,其中诸如晶片的物品可以用等离子体处理。 壳体包括连接到室的内部的至少一个入口端口,通过该入口端口可将工艺气体供应到室。 射频能源设置成将射频能量传递到腔室中并且通过由射频能量源引起的电场通过入口端口供应到腔室的处理气体进行激活而在腔室的内部引起等离子体。 具有内表面的电介质窗形成室的内壁的一部分。 射频能量通过电介质窗从射频能量传递到腔室的内部。 电介质窗口具有在其内表面的不同点处变化的厚度,使得在电介质窗口的中心部分处的厚度最大。 电介质窗口有效地减小在电介质窗口的中心部分附近的室内的感应电场。

    Preknotted adjustable necktie
    29.
    发明授权
    Preknotted adjustable necktie 失效
    预打可调领带

    公开(公告)号:US4897887A

    公开(公告)日:1990-02-06

    申请号:US238731

    申请日:1988-08-31

    IPC分类号: A41D25/02

    摘要: A preknotted adjustable necktie comprises a knot former having, an inner body (62) and an outer body (61), an inner tie member with a zipper (3), an outer tie member (5), and a rivet (63). The knot former serves forming and control functions, and the inner tie member is sandwiched between the inner and outer bodies thereof, with a pulling button of the zipper slider on the inner tie member secured to the inner and outer bodies of the knot former and to the outer tie member by a rivet. The outer tie member is tied into a fixed knot over the knot former. By means of the presence of a pair of leaf springs (622) on the inner body, the position of the tie knot and the zipper slider can be adjusted freely and retained in the position set.

    摘要翻译: 一个预打结的可调节领带包括具有内部主体(62)和外部主体(61),具有拉链(3),内部连接件(5)和铆钉(63)的内部连接件的结形成器。 该结成型器具有成形和控制功能,并且内部连接件夹在其内部和外部本体之间,并且内部连接件上的拉链滑块的拉动件固定到打结机的内部和外部主体上,并且 外部绑带构件由铆钉。 外部连接构件被绑在结上的固定结。 通过在内体上存在一对板簧(622),可以自由地调节扎结和拉链滑块的位置并保持在所设定的位置。

    USE OF DIFFERENT PAIRS OF OVERLAY LAYERS TO CHECK AN OVERLAY MEASUREMENT RECIPE
    30.
    发明申请
    USE OF DIFFERENT PAIRS OF OVERLAY LAYERS TO CHECK AN OVERLAY MEASUREMENT RECIPE 审中-公开
    使用不同层次的覆盖层检查覆盖层测量

    公开(公告)号:US20100063764A1

    公开(公告)日:2010-03-11

    申请号:US12208140

    申请日:2008-09-10

    IPC分类号: G01P21/00

    摘要: An overlay measurement recipe is checked for reliability as follows. A first pair of overlay layers (130, 150) is formed (610), and the recipe is used to obtain alignment measurements for the two layers. Then another pair of overlay layers (130, 150) is obtained (630), possibly using the same masks, but this time at least one of the layers (150) is offset from its previous position. The overlay measurement recipe is used again to obtain alignment measurements (640). The two sets of measurements are checked against the offset of the layers from their previous positions to validate the recipe. Other embodiments are also provided.

    摘要翻译: 检查覆盖测量配方的可靠性如下。 形成第一对覆盖层(130,150)(610),并且使用该配方来获得两层的对准测量结果。 然后获得另一对覆盖层(130,150)(630),可能使用相同的掩模,但是此时,层(150)中的至少一个从其先前位置偏移。 再次使用覆盖测量配方以获得对准测量(640)。 对两组测量结果进行检查,以使层与其先前位置的偏移量进行检验,以验证配方。 还提供了其他实施例。