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    Method and system for operating electron guns in magnetic fields
    27.
    发明授权
    Method and system for operating electron guns in magnetic fields 有权
    在磁场中操作电子枪的方法和系统

    公开(公告)号：US09099271B2

    公开(公告)日：2015-08-04

    申请号：US13622212

    申请日：2012-09-18

    Applicant: The Board of Trustees of the Leland Stanford Junior University

    Inventor： Dragos E. Constantin ,  Rebecca Fahrig ,  Paul J. Keall

    IPC: G06F17/50 ,  H01J3/02 ,  H05H7/08

    CPC classification number: H01J3/027 ,  H01J3/029 ,  H05H7/08 ,  H05H2007/084

    Abstract: A method of configuring an electron gun for generating and injecting an electron beam into a linac accelerating waveguide operating in magnetic fringe fields of an MRI scanner in the absence of a magnetic shield is provided using an appropriately programmed computer to determining an anode drift tube diameter at an injection point of a linac according to a magnetic field value from an MRI scanner and to a predetermined current density, where the magnetic field has an isocenter, determining a transverse diameter of a Type M cathode in an electron gun, according to the anode drift tube diameter and the current density, and minimizing an emittance value in an electron beam of the electron gun at an entry point of the anode drift tube by optimizing the distance between the cathode and the anode, where the electron beam is along an axis of symmetry of the magnetic field.

    Abstract translation: 使用适当编程的计算机来配置电子枪的方法，该电子枪用于在不存在磁屏蔽的情况下，将电子束产生和注入到在MRI扫描仪的磁性条纹区域中工作的线性加速波导中，以确定阳极漂移管直径在 根据来自MRI扫描仪的磁场值的线性加速器的注入点和预定的电流密度，其中磁场具有等角点，根据阳极漂移确定电子枪中的M型阴极的横向直径 管直径和电流密度，并且通过优化阴极和阳极之间的距离使电子枪沿着对称轴线的距离最小化在阳极漂移管的入口处的电子枪的电子束中的发射率值 的磁场。

    Cathode arrangement, electron gun, and lithography system comprising such electron gun
    28.
    发明申请
    Cathode arrangement, electron gun, and lithography system comprising such electron gun 有权
    阴极装置，电子枪和包括这种电子枪的光刻系统

    公开(公告)号：US20150187533A1

    公开(公告)日：2015-07-02

    申请号：US14578533

    申请日：2014-12-22

    Applicant: MAPPER LITHOGRAPHY IP B.V

    Inventor： Laura DINU-GÜRTLER ,  Eric Petrus HOGERVORST

    IPC: H01J29/62 ,  G03F7/20 ,  H01J29/48

    CPC classification number: H01J37/3174 ,  G03F7/70058 ,  H01J1/15 ,  H01J1/28 ,  H01J3/027 ,  H01J3/029 ,  H01J37/075 ,  H01J37/3177 ,  H01J2229/481 ,  H01J2237/061

    Abstract: The invention relates to a cathode arrangement comprising: a cathode body housing an emission surface for emitting electrons in a longitudinal direction, wherein the emission surface is bounded by an emission perimeter; a focusing electrode at least partially enclosing the cathode body in a transversal direction and comprising an electron transmission aperture for focusing the electrons emitted by the emission surface, wherein the aperture is bounded by an aperture perimeter, wherein the cathode body is moveably arranged within the focusing electrode over a maximum transversal distance from an aligned position, and wherein the aperture perimeter transversally extends over the emission surface and beyond the emission perimeter over an overlap distance that exceeds the maximum transversal distance.

    Abstract translation: 本发明涉及一种阴极装置，其包括：阴极体，其容纳用于沿纵向发射电子的发射表面，其中所述发射表面由发射周界限定; 聚焦电极至少部分地沿着横向包围阴极体并且包括用于聚焦由发射表面发射的电子的电子传输孔，其中所述孔被孔周边界定，其中阴极体可移动地布置在聚焦 电极，其距离对准位置的最大横向距离，并且其中所述孔径周边在超过所述最大横向距离的重叠距离上在所述发射表面上横向延伸超过所述发射周界。

    Dual-lens-gun electron beam apparatus and methods for high-resolution imaging with both high and low beam currents
    29.
    发明授权
    Dual-lens-gun electron beam apparatus and methods for high-resolution imaging with both high and low beam currents 有权
    双透镜枪电子束装置和用于高分辨率成像和高光束和低光束电流的方法

    公开(公告)号：US08859982B2

    公开(公告)日：2014-10-14

    申请号：US13618760

    申请日：2012-09-14

    Applicant: Xinrong Jiang ,  Liqun Han

    Inventor： Xinrong Jiang ,  Liqun Han

    IPC: H01J37/14

    CPC classification number: H01J37/063 ,  H01J3/029 ,  H01J3/08 ,  H01J37/09 ,  H01J2237/0458 ,  H01J2237/30472

    Abstract: One embodiment relates to an electron beam apparatus which includes a dual-lens electron gun for emitting an electron beam. The electron beam is a high beam-current electron beam in a first operating mode and a low beam-current electron beam in a second operating mode. The apparatus further includes a column aperture which is out of the path of the high beam-current electron beam in the first operating mode and is centered about an optical axis of the electron beam apparatus in the second operating mode. Another embodiment relates to an electron gun which includes a first gun lens, a beam limiting aperture, and a second gun lens. The first gun lens focuses the electrons before they pass through the beam-limiting aperture while the second gun lens focuses the electrons after they pass through the beam-limiting aperture. Other embodiments, aspects and features are also disclosed.

    Abstract translation: 一个实施例涉及一种电子束装置，其包括用于发射电子束的双透镜电子枪。 电子束是第一操作模式中的高束流电子束和处于第二操作模式的低束流电子束。 该装置还包括在第一操作模式中超出远光束电子束的路径的列孔径，并且在第二操作模式中围绕电子束装置的光轴居中。 另一个实施例涉及一种电子枪，其包括第一枪形透镜，光束限制孔和第二枪形透镜。 第一个枪形透镜在电子穿过光束限制孔径之前聚焦电子，而第二个枪形透镜在电子通过光束限制孔径后聚焦电子。 还公开了其它实施例，方面和特征。

    Charged practicles beam apparatus and charged particles beam apparatus design method
    30.
    发明申请
    Charged practicles beam apparatus and charged particles beam apparatus design method 有权
    带电粒子束装置和带电粒子束装置设计方法

    公开(公告)号：US20140097352A1

    公开(公告)日：2014-04-10

    申请号：US13573696

    申请日：2012-10-04

    Applicant: Mamoru Nakasuji

    Inventor： Mamoru Nakasuji

    IPC: G21K5/00

    CPC classification number: G21K5/00 ,  H01J3/029 ,  H01J37/06 ,  H01J37/26 ,  H01J2237/06308 ,  H01J2237/06375 ,  H01J2237/0656

    Abstract: Problems to be solved: To obtain higher brightness than Langmuir limit. Adjust brightness to the optimum value.Method of resolution: To obtain such beams, the following means and methods are effective. A charged particles beam apparatus consisting of a charged particle source, a beam drawing electrode, and a beam control electrode, wherein; after the charged particles beam source a condenser lens is designed, and brightness of the charged particles beam is adjusted by adjusting a magnification factor of said condenser lens.

    Abstract translation: 要解决的问题：获得比朗缪尔限制更高的亮度。 将亮度调整到最佳值。 解决方法：要获得这​​样的梁，以下手段和方法是有效的。 一种带电粒子束装置，由带电粒子源，射束电极和光束控制电极组成，其中： 在带电粒子束源设计聚光透镜之后，通过调整所述聚光透镜的放大系数来调节带电粒子束的亮度。

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