Abstract:
A Field Emitter Array comprising a semiconductor substrate with an emitterurface formed thereon. A plurality of emitter pyramids is disposed on the emitter surface for emitting an electron current. The magnitude of the electron current emitted by each emitter pyramid I.sub.max, is controlled by a reverse-biased p-n junction associated with each emitter pyramid where I.sub.max =j.sub.sat X A.sub.p-n, j.sub.sat being the saturation current density and A.sub.p-n being the area of the reverse-biased p-n junction associated with each emitter pyramid. A grid, positively biased relative to the emitter surface and the emitter pyramids, is disposed above the emitter surface for creating an electric field that induces the emission of the electron current from the emitter tips.
Abstract:
An electron source having good electron emission efficiency comprises a silicon or other semiconductor body (10) having an n-type first region (3) which is separated from an n-type or p-type second region (2) by a barrier. The barrier may be a p-n junction between p-type region (2) and the n-type region (3), or it may be a p-type region (1) forming p-n junctions with the n-type regions (2 and 3). By means of electrode connections (13 and 12) to the first and second regions (3 and 2) a potential difference (V) is applied across the barrier so as to bias the first region (3) positive with respect to the second region (2) and thereby to establish a supply of hot electrons (24) injected from the second region (2) across the barrier into the first region (3). These hot electrons (24) are emitted into free space (20) from a surface area (4) of the body (10) which may have a caesium coating (14) to reduce the electron work function. A surface region (5) which may be depleted even at zero bias adjoins the surface area (4) and comprises a p-type doping concentration which serves to form in the body (10) a potential peak which is spaced from the surface area (4) from which the hot electrons (24) are emitted to provide an adjacent drift field (15) which accelerates electrons (24) towards this surface area (4) so assisting the electron emission. The electron sources may be used in cathode-ray tubes, display devices and even electron lithography equipment.
Abstract:
The invention relates to a semiconductor cathode and a camera tube and a display tube, respectively, having such a cathode, based on avalanche breakdown in a p-n junction extending parallel to the surface of the semiconductor body. The released electrons obtain extra energy by means of an accelerating electrode provided on the device. The resulting efficiency increase makes the manufacture of such cathodes in planar silicon technology practical. Since the depletion zone of the p-n junction upon avalanche breakdown does not extend to the surface, the released electrons show a sharp, narrow energy distribution. This makes such cathodes particularly suitable for camera tubes. In addition they find application, for example, in display tubes and flat displays.
Abstract:
A METHOD FOR MAKING A NEGATIVE EFFECTIVE-ELECTRONAFFINITY SILICON ELECTRON EMITTER INCLUDES THE STEPS OF PREPARING THE SILICON BY FIRST HEATING FOR A SHORT TIME TO NEAR THE MELTING POINT OF THE SILICON, SENSITIZING BY APPLYING A LAYER OF WORK-FUNCTION-REDUCING MATERIAL, HEATING AGAIN FOR A SHORT TIME TO A LOWER TEMPERATURE THAN THE FIRST AND AGAINST SENSITIZING BY APPLYING A LAYER OF WORK-FUNCTION-REDUCING MATERIAL.
Abstract:
An electron emitter comprising a body of a semiconductor material which is adapted to generate light therein when properly biased but which is a poor absorber of the generated light. On a surface of the body is a thin region of a semiconductor material which is a good absorber of the generated light and which has an index of refraction which substantially matches the index of refraction of the material of the body. The thin semiconductor material region is adapted to absorb the light from the body and convert the light into free electrons. On the surface of the semiconductor material layer is a thin film of an electropositive work function reducing material which is adapted to emit the electrons formed in the semiconductor material layer.
Abstract:
A photocathode epitaxial structure. The photocathode epitaxial structure includes an improved substrate stack. The improved substrate stack includes a GaAs substrate and one or more additional layers formed on the GaAs substrate. The one or more additional layers are configured to provide an improved substrate stack surface with predetermined characteristics for forming a semiconductor device on the improved substrate stack surface. The photocathode epitaxial structure further includes an InGaAs p-type photocathode formed on the improved substrate stack surface. The InGaAs p-type photocathode has a predetermined percentage of In.
Abstract:
According to one embodiment, an electron emitting element includes a first region, a second region, and a third region. The first region includes a semiconductor including a first element of an n-type impurity. The second region includes diamond. The diamond includes a second element including at least one selected from the group consisting of nitrogen, phosphorous, arsenic, antimony, and bismuth. The third region is provided between the first region and the second region. The third region includes Alx1Ga1-x1N (0