公开(公告)号：US06590210B1

公开(公告)日：2003-07-08

申请号：US09623824

申请日：2000-09-08

Applicant: Erik Essers

Inventor： Erik Essers

IPC: H01J3728

CPC classification number: H01J37/28 ,  H01J37/244 ,  H01J2237/2608

Abstract: With a scanning electron microscope having an electron gun and a specimen chamber between which one or more pressure stage apertures are arranged, through whose orifices a primary electron beam can be deflected to a specimen in the specimen chamber, where the lowest pressure stage aperture (18) nearest the specimen, through which the primary electron beam strikes the specimen, is set up to shield an elevated pressure in the specimen chamber with respect to the remaining microscope column of the scanning electron microscope and to allow secondary electrons emanating from the specimen to pass through their orifice to reach at least one detector, the detector is a high-sensitivity detector (74) biased at a positive potential with respect to the specimen. At least one electrode (44, 55) which is at a positive potential with respect to the pressure stage aperture (18) and is adapted to deflect the secondary electrons from the specimen to the detector (74) may be arranged above the bottom pressure stage aperture (18). As an alternative, the scanning electron microscope is equipped for detection of secondary electrons through the orifice of at least one pressure stage aperture which is constructed in layers of at least two conductive layers which are electrically insulated from one another and can be biased with potentials.

Abstract translation: 使用具有电子枪和样品室的扫描电子显微镜，其间布置有一个或多个压力级孔，通过其孔可以将一次电子束偏转到样品室中的样品，其中最低压级孔（18 ），其中初级电子束撞击样本最近的样本被设置为相对于扫描电子显微镜的剩余显微镜柱屏蔽样品室中的升高的压力，并允许从样品发出的二次电子通过 通过其孔口到达至少一个检测器，检测器是相对于样品偏置为正电位的高灵敏度检测器（74）。 至少一个相对于压力平台孔（18）处于正电位并且将二次电子从试样偏转到检测器（74）的电极（44,55）可以布置在底压级 孔（18）。 作为替代，扫描电子显微镜被配备用于通过至少一个压力级孔的孔口检测二次电子，其被构造成彼此电绝缘并且可以被电位偏置的至少两个导电层的层。

公开(公告)号：US06566655B1

公开(公告)日：2003-05-20

申请号：US09729449

申请日：2000-12-04

Applicant: Bryan K. Choo ,  Bhanwar Singh ,  Sanjay K. Yedur

Inventor： Bryan K. Choo ,  Bhanwar Singh ,  Sanjay K. Yedur

IPC: H01J3728

CPC classification number: H01J37/28 ,  G01N23/2251 ,  H01J2237/1514 ,  H01J2237/24578 ,  H01J2237/2611 ,  H01J2237/2814

Abstract: The present invention provides a system and method that facilitates measuring and imaging topographical features of a substrate, including lines and trenches having reentrant profiles. One aspect of the invention provides an electron microscope that simultaneously scans a substrate with two or more electron beams that are directed against the substrate with substantially differing angles of incidence. Secondary electrons resulting from the interaction of the substrate with the beams are detected by one or more secondary electron detectors. Each secondary electron detector may simultaneously receive secondary electrons resulting from the interaction of the substrate with two or more electron beams. In another of its aspects, the invention provides methods of analysis that permit the interpretation of such data to analyze critical dimensions and form images of the substrate. Critical dimensions that may be determined include feature heights and reentrant profile shapes. The topographical information provided is more complete than that of conventional SEM imaging and is obtained more rapidly than would be possible using multiple scans of a single electron beam.

Abstract translation: 本发明提供了一种便于测量和成像基底的形貌特征的系统和方法，包括具有折返轮廓的线和沟槽。 本发明的一个方面提供了一种电子显微镜，其同时以基本上不同的入射角度针对衬底的两个或更多个电子束扫描衬底。 由基板与光束的相互作用产生的二次电子被一个或多个二次电子检测器检测。 每个二次电子检测器可以同时接收由衬底与两个或更多个电子束的相互作用产生的二次电子。 在另一方面，本发明提供了分析方法，其允许解释这些数据以分析临界尺寸并形成基底的图像。 可能确定的关键尺寸包括特征高度和可重入的轮廓形状。 所提供的地形信息比常规SEM成像更完整，并且比使用单个电子束的多次扫描可能获得的地形信息更快。

公开(公告)号：US06538248B1

公开(公告)日：2003-03-25

申请号：US09398044

申请日：1999-09-17

Applicant: Masatsugu Kametani ,  Kenjiro Yamamoto ,  Taku Ninomiya ,  Osamu Yamada ,  Katsuhisa Ike

Inventor： Masatsugu Kametani ,  Kenjiro Yamamoto ,  Taku Ninomiya ,  Osamu Yamada ,  Katsuhisa Ike

IPC: H01J3728

CPC classification number: H01J37/28 ,  H01J2237/2817

Abstract: In order that the deflection scanning position can be corrected at a time point within a period for fetching information from a subject to be inspected and improvements in accuracy of chip comparison inspection and an inspection near the wafer outer periphery where distortion is large can be assured by correcting the inspection position and biased distortion at a high speed with high accuracy, a digital deflection control scheme is employed in which the deflection scanning signal and correction are all calculated digitally in a deflection controller for deflecting and controlling a charged particle beam irradiated onto a subject to be inspected and the digital value is sequentially converted into an analog value by a time-series train of digital control signal to form a deflection scanning waveform.

Abstract translation: 为了可以在用于从要检查的对象取出信息的时间段内的时间点校正偏转扫描位置，并且可以通过提高芯片比较检查的精度和在失真很大的晶片外周边附近的检查来确保偏转扫描位置 以高精度校正检查位置和偏置的失真，采用数字偏转控制方案，其中偏转扫描信号和校正都全部以偏转控制器数字计算，用于偏转和控制照射到被摄体上的带电粒子束 并通过数字控制信号的时间序列序列将数字值顺序地转换为模拟值，以形成偏转扫描波形。

公开(公告)号：US06407387B1

公开(公告)日：2002-06-18

申请号：US09409109

申请日：1999-09-30

Applicant: Jurgen Frosien ,  Stefan Lanio

Inventor： Jurgen Frosien ,  Stefan Lanio

IPC: H01J3728

CPC classification number: H01J37/28 ,  H01J2237/04756

Abstract: The invention relates to a particle beam apparatus with a source for generating a primary particle beam, means for focussing the primary particle beam onto a specimen, means for decelerating back-scattered and/or secondary electrons released at the specimen, said detecting means being located between said source and said focussing means, means for accelerating the primary particle beam from a first energy to a second higher energy and means for decelerating the primary particle beam to a final beam energy. Furthermore, there are provided first additional means to decelerate the primary particle beam shortly before the detecting means and second additional means to accelerate the primary particle beam immediately after the detecting means.

Abstract translation: 本发明涉及一种具有用于产生一次粒子束的源的粒子束装置，用于将一次粒子束聚焦到试样上的装置，用于减速在试样处释放的反向散射和/或二次电子的装置，所述检测装置位于 在所述源和所述聚焦装置之间，用于将所述初级粒子束从第一能量加速到第二较高能量的装置，以及用于将所述一次粒子束减速至最终射束能量的装置。 此外，提供了在检测装置之前不久减速初级粒子束的第一附加装置和第二附加装置，以在紧接在检测装置之后加速初级粒子束。

公开(公告)号：US06169282A

公开(公告)日：2001-01-02

申请号：US09181851

申请日：1998-10-29

Applicant: Shunji Maeda ,  Kenji Oka ,  Hiroshi Makihira ,  Yasuhiko Nakayama ,  Minoru Yoshida ,  Yukihiro Shibata ,  Chie Shishido

Inventor： Shunji Maeda ,  Kenji Oka ,  Hiroshi Makihira ,  Yasuhiko Nakayama ,  Minoru Yoshida ,  Yukihiro Shibata ,  Chie Shishido

IPC: H01J3728

CPC classification number: G06T7/001 ,  G01R31/308 ,  G01R31/311 ,  G03F7/7065 ,  G06T7/0004 ,  G06T2207/10061 ,  G06T2207/30121 ,  G06T2207/30148

Abstract: A defect inspection method and apparatus therefor for a pattern to be inspected having a plurality of chips formed so as to be identical detect an image signal of a pattern to be inspected and when the image signal is to be compared with a detected image signal of an adjacent or separated pattern to be inspected on the substrate, convert the gray level so that the brightness of each of two image signals for comparing one or both of the detected image signals is almost identical in the local region by linear conversion having a gain and offset, and when a pattern is inspected using it, highly sensitive defect inspection for a pattern to be inspected for detecting a defect of a semiconductor wafer can be realized.

Abstract translation: 对于要检查的图案的缺陷检查方法及其装置，其具有形成为相同的多个芯片，以检测待检查图案的图像信号，并且当图像信号要与检测到的图像信号进行比较时 要在基板上检查的相邻或分离的图案，转换灰度级，使得用于比较检测到的图像信号中的一个或两个的两个图像信号中的每一个的亮度在局部区域中通过具有增益和偏移的线性转换几乎相同 ，并且当使用它来检查图案时，可以实现用于检测半导体晶片的缺陷的待检查图案的高灵敏度缺陷检查。

公开(公告)号：US06812462B1

公开(公告)日：2004-11-02

申请号：US10435011

申请日：2003-05-09

Applicant: Gabor D. Toth ,  John A. Notte, IV ,  Richard A. Price

Inventor： Gabor D. Toth ,  John A. Notte, IV ,  Richard A. Price

IPC: H01J3728

CPC classification number: H01J37/28 ,  H01J2237/281 ,  H01J2237/2814 ,  H01J2237/2815

Abstract: Method and apparatus for imaging at multiple perspectives of a specimen are disclosed. In one embodiment, an apparatus for generating a multi-perspective image using multiple charged particle beams (e.g., electron beams) is disclosed. In one embodiment, the apparatus generally includes a charged particle beam generator system arranged to generate and control a first charged particle beam directed substantially at a first angle towards the specimen and a second charged particle beam directed substantially at a second angle towards the specimen. The apparatus also includes an image generator arranged to generate one or more images based on charged particles emitted from the specimen in response to the first and second charged particle beams and a controller arranged to cause the charged particle beam generator to direct both the first charged particle beam and the second charged particle beam at a first area of the specimen. In a specific implementation, the charged particles are in the form of electrons and the apparatus is a dual electron beam scanning electron microscope (SEM).

Abstract translation: 公开了用于在样本的多个观点进行成像的方法和装置。 在一个实施例中，公开了一种使用多个带电粒子束（例如电子束）产生多视角图像的装置。 在一个实施例中，装置通常包括带电粒子束发生器系统，其被布置成产生并控制基本上以第一角度朝向试样的第一带电粒子束和基本上以第二角度朝向试样的第二带电粒子束。 该装置还包括图像发生器，其被布置为响应于第一和第二带电粒子束而基于从样本发射的带电粒子产生一个或多个图像;以及控制器，布置成使带电粒子束发生器引导第一带电粒子 光束和第二带电粒子束在样品的第一区域。 在具体实施方案中，带电粒子是电子的形式，并且该装置是双电子束扫描电子显微镜（SEM）。

公开(公告)号：US06803573B2

公开(公告)日：2004-10-12

申请号：US10615864

申请日：2003-07-10

Applicant: Satoru Yamaguchi ,  Takashi Iizumi ,  Osamu Komuro ,  Hidetoshi Morokuma ,  Tatsuya Maeda ,  Juntaro Arima ,  Yasuhiko Ozawa

Inventor： Satoru Yamaguchi ,  Takashi Iizumi ,  Osamu Komuro ,  Hidetoshi Morokuma ,  Tatsuya Maeda ,  Juntaro Arima ,  Yasuhiko Ozawa

IPC: H01J3728

CPC classification number: H01J37/28 ,  G01N23/04 ,  G01N23/225 ,  G06T7/74 ,  G06T2207/10056 ,  G06T2207/30148 ,  H01J37/222 ,  H01J2237/2817

Abstract: An object of the present invention is to provide a scanning electron microscope for reducing a process concerning inspection positioning or an input operation, thereby functioning with high precision at high speed. To accomplish the above object, the present invention provides a scanning electron microscope having a function for identifying a desired position on the basis of a pattern registered beforehand, which includes a means for setting information concerning the pattern kind, the interval between a plurality of parts constituting the pattern, and the size of parts constituting the pattern and a means for forming a pattern image composed of a plurality of parts on the basis of the information obtained by the concerned means.

Abstract translation: 本发明的目的是提供一种用于减少与检查定位或输入操作相关的处理的扫描电子显微镜，从而以高速度高精度地运行。 为了实现上述目的，本发明提供了一种扫描电子显微镜，其具有基于预先登记的图案来识别期望位置的功能，该扫描电子显微镜包括用于设置关于图案种类的信息的装置，多个部分之间的间隔 构成图案的部分，以及构成图案的部分的尺寸，以及基于由相关装置获得的信息形成由多个部分组成的图案图像的装置。

公开(公告)号：US06784426B2

公开(公告)日：2004-08-31

申请号：US10686792

申请日：2003-10-16

Applicant: Takayuki Sugiura ,  Hideki Nasuno

Inventor： Takayuki Sugiura ,  Hideki Nasuno

IPC: H01J3728

CPC classification number: G01N23/203 ,  H01J37/28 ,  H01J2237/24475 ,  H01J2237/2817

Abstract: An electron beam irradiation apparatus which irradiates an electron beam to an object for easily detecting a defect of a backscattered electron detector, including: an electron beam generating section for generating an electron beam; a plurality of backscattered electron detectors for detecting backscattered electrons generated when the electron beam is irradiated on a mark; a plurality of attenuation sections for attenuating signal values indicating quantity of backscattered electrons detected by the plurality of backscattered electron detectors; and a defect detecting section for detecting a defect of the plurality of backscattered electron detectors based on the signal values attenuated by the plurality of attenuation sections, with attenuation factors for the plurality of attenuation sections being varied.

公开(公告)号：US06777678B1

公开(公告)日：2004-08-17

申请号：US10666822

申请日：2003-09-17

Applicant: William E. Vanderlinde

Inventor： William E. Vanderlinde

IPC: H01J3728

CPC classification number: H01J37/20 ,  H01J37/28 ,  H01J2237/2802

Abstract: The present invention is a sample-stage for a scanning electron microscope. The sample-stage has a base and a horizontal support member, where there is an aperture in the horizontal support member. A vertical support member abuts the base on one end and the horizontal support member on the other end so that the vertical support member is under, and at an angle to, the aperture in the horizontal support member. A collimator, having an aperture in alignment with the aperture in the horizontal support member, abuts the top of the horizontal support member. A first reflector abuts the surface of the vertical support member under the aperture in the horizontal support. A second reflector abuts a portion of the top surface of the base that is not covered by the vertical support member.

Abstract translation: 本发明是用于扫描电子显微镜的样品级。 样品台具有基部和水平支撑构件，在水平支撑构件中存在孔。 垂直支撑构件在一端邻接基部，在另一端上与水平支撑构件邻接，使得垂直支撑构件在水平支撑构件的孔下方并且成一定角度。 具有与水平支撑构件中的孔对准的孔的准直器邻接在水平支撑构件的顶部。 第一反射器邻接在水平支撑件中的孔下方的垂直支撑构件的表面。 第二反射器邻接基部的顶表面的未被垂直支撑构件覆盖的部分。

公开(公告)号：US06770867B2

公开(公告)日：2004-08-03

申请号：US10186206

申请日：2002-06-27

Applicant: Henri J. Lezec ,  Christian R. Musil

Inventor： Henri J. Lezec ,  Christian R. Musil

IPC: H01J3728

CPC classification number: G01N23/225 ,  H01J2237/28 ,  H01J2237/2826 ,  H01J2237/30444 ,  H01J2237/31749

Abstract: Methods and apparatus for calibration of a scanned beam system are provided by sampling a calibration specimen containing an array of targets with a spacing between samples that is greater than the spacing between targets in the array and forming an image from the samples to reduce calibration specimen degradation and to magnify calibration errors to enable very fine calibration of the scanned beam system.

Abstract translation: 用于校准扫描束系统的方法和装置通过对包含靶阵列的校准样本进行取样来提供，样本阵列之间的间距大于阵列中靶标之间的间距，并从样品中形成图像以减少校准样品降解 并放大校准误差，以便对扫描光束系统进行非常精确的校准。