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公开(公告)号：US20190157130A1
公开(公告)日：2019-05-23
申请号：US16194014
申请日：2018-11-16
Applicant: SEMES CO., LTD.
Inventor： SEUNG PYO LEE , HYUNG JOON KIM
IPC: H01L21/687 , H01L21/67 , H01L21/683 , H01J37/32
Abstract: Disclosed are a support unit and a substrate treating apparatus comprising the same. The inventive concept provides a support unit that may prove temperature uniformity between facing areas on a substrate the other areas of the substrate and may solve a problem of not easily separating a substrate by a negative pressure in a pin hole when the substrate is separated from the support unit, and a substrate treating apparatus.
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公开(公告)号：US20190131153A1
公开(公告)日：2019-05-02
申请号：US16168890
申请日：2018-10-24
Applicant: SEMES CO., LTD.
Inventor： YOUNG HUN JUNG , JINHWAN KIM
Abstract: Disclosed is an apparatus for monitoring substrate processing, the apparatus including a process data acquisition unit that acquires process data regarding the substrate processing from substrate processing equipment, a storage unit that stores screen configuration data regarding a process monitoring screen that is configured to match a layout of the substrate processing equipment, a processing unit that imports the screen configuration data and operates the process monitoring screen according to the process data, and a control unit that classifies the process data according to time points and outputs a process data value at a specific time point on the process monitoring screen.
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公开(公告)号：US20190131146A1
公开(公告)日：2019-05-02
申请号：US16166614
申请日：2018-10-22
Applicant: SEMES CO., LTD.
Inventor： Jinwoo Sim , Hyung Joon Kim
IPC: H01L21/67
Abstract: Disclosed is An apparatus for treating a substrate includes a chamber having a treatment space provided therein to treat the substrate and having an entrance for introducing or withdrawing the substrate, a liner disposed in the treatment space, disposed adjacent to an inner sidewall of the chamber, and having an opening formed at a position of facing the entrance to introduce or withdraw the substrate, a supporting unit to support the substrate in the treatment space, a gas supplying unit to supply process gas to the treatment space, a plasma source to produce plasma from the process gas, and a door assembly to open or close the entrance. The door assembly includes a door which includes a door unit provided outside the chamber to be movable between an opening position to open the entrance and a closing position to close the entrance, and an insertion unit extending from the door unit toward the treatment space and inserted into the opening of the liner at the closing position, and a door driving unit to drive the door.
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公开(公告)号：US20190131115A1
公开(公告)日：2019-05-02
申请号：US16174679
申请日：2018-10-30
Applicant: SEMES CO., LTD.
Inventor： Jamyung Gu , Jungmo Gu , Jun Ho Lee , Jong Hwan An , Saewon Na
IPC: H01J37/32 , H01L21/67 , H01L21/3065 , H03H7/01
Abstract: The substrate treating apparatus includes a chamber having a treatment space in the interior thereof, a support unit configured to support a substrate, a gas supply unit configured to supply a gas into the treatment space, and a plasma source configured to generate plasma, wherein the support unit includes a support plate, on which the substrate is positioned, a ring assembly surrounding a circumference of the support plate and having a ring-shaped electrode, and a voltage applying unit configured to control an incident angle of the plasma onto the substrate by applying a voltage to the ring-shaped electrode, and wherein the voltage applying unit includes a base plate of a conductive material, a DC power source configured to apply a DC voltage to the base plate, and a plurality of connecting bodies connecting the base plate and the ring-shaped electrode, formed of a conductive material.
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公开(公告)号：US20190113839A1
公开(公告)日：2019-04-18
申请号：US16158698
申请日：2018-10-12
Applicant: SEMES CO., LTD.
Inventor： Seong Soo Lee , Jeong Yeong Park , Sung Bum Park , Byung Chul Kang
Abstract: Disclosed is a method for cleaning a photo mask. The method includes a pre-treatment operation of wetting a chemical on an entire surface of the photo mask in a state in which the photo mask is stopped, and a cleaning operation of supplying the chemical to a pattern area of the photo mask in a state in which the photo mask is rotated.
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Patent Agency Ranking
公开(公告)号：US20190111450A1
公开(公告)日：2019-04-18
申请号：US16157541
申请日：2018-10-11
Applicant: SEMES CO., LTD.
Inventor： Kwangsup Kim
Abstract: Disclosed are a substrate treating apparatus and a method for inspecting a treatment liquid nozzle. The substrate treating apparatus includes a support member configured to support a substrate, a treatment liquid nozzle configured to discharge a treatment liquid to the substrate located on the support member, a light source configured to irradiate light to a point of the substrate, to which the treatment liquid is discharged, a camera configured to photograph the point of the substrate, to which the treatment liquid is discharged, and a controller configured to determine, through an image captured by the camera, whether a crown is generated when the treatment liquid collides with the substrate.
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公开(公告)号：US20190103292A1
公开(公告)日：2019-04-04
申请号：US16131587
申请日：2018-09-14
Applicant: SEMES CO., LTD.
Inventor： JUDONG LEE
IPC: H01L21/67 , B08B3/02 , H01L21/687 , H01L21/02
Abstract: Provided are an apparatus and a method for supplying a liquid. An apparatus for treating a substrate includes a substrate support unit to support the substrate, and a liquid supplying unit to supply a liquid to a substrate supported by the substrate support unit. The liquid supplying unit includes a nozzle to discharge the liquid, a liquid supplying line to supply the liquid to the nozzle, a constant pressure valve installed on the liquid supplying line, a shut-off valve installed on the liquid supplying line while being interposed between the constant pressure valve and the nozzle to supply the liquid or to stop the supply of the liquid, and a controller to control the constant pressure valve and the shut-off valve.
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公开(公告)号：US20190096717A1
公开(公告)日：2019-03-28
申请号：US16133043
申请日：2018-09-17
Applicant: SEMES CO., LTD.
Inventor： Sangmin Lee , Woo Young Kim , Joo Jib Park , Boong Kim
IPC: H01L21/67 , H01L21/687 , H01L21/673 , H01L21/02
Abstract: Provided are an apparatus and a method for treating a substrate at a high-pressure atmosphere. The apparatus for treating the substrate includes a first body and a second body combined with each other to define a treatment space in which the substrate is treated, a sealing member interposed between the first body and the second body to seal the treatment space from an outside at a position in which the first body is in close contact with the second body, and a driving member to drive the first body or the second body such that the treatment space is open or closed. The sealing member is positioned in a sealing groove formed in the first body. The sealing member is deformed to be in close contact with the second body by pressure of the treatment space when a process is performed.
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公开(公告)号：US20190088449A1
公开(公告)日：2019-03-21
申请号：US16120498
申请日：2018-09-04
Applicant: Semes Co., Ltd.
Inventor： Ogsen Galstyan , Harutyun Melikyan , Young Bin Kim , Jong Hwan An
IPC: H01J37/32 , H01L21/683
Abstract: Disclosed is a substrate treating apparatus. The substrate treating apparatus includes a process chamber having a treatment space in the interior thereof, a support unit configured to support a substrate in the treatment space, a gas supply unit configured to supply a treatment gas into the treatment space, and a plasma generating unit configured to generate plasma from the gas in the treatment space, wherein the plasma generating unit includes a high-frequency power source, a high-frequency antenna, to which a current is applied from the high-frequency power source, and an additional antenna provided to be spaced apart from the high-frequency antenna and to which a coupling current is applied from the high-frequency antenna.
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公开(公告)号：US10236194B2
公开(公告)日：2019-03-19
申请号：US14264410
申请日：2014-04-29
Applicant: Semes Co., Ltd.
Inventor： Hyung Joon Kim , Seung Kue Kim
Abstract: Provided is a supporting unit supporting a substrate. The supporting unit includes a body including a plurality of heating regions and disposed with the substrate on a top surface thereof and a heating unit heating the body. Herein, the heating unit includes heating lines provided in the plurality of heating regions, respectively, to control temperatures of the plurality of heating regions independently from one another, terminals provided to the body and receiving power from the outside, and connecting lines connecting the heating lines to the terminals mutually corresponding to one another. Also, the terminals are disposed in one of the plurality of heating regions in a top view.
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