公开(公告)号：US07312121B2

公开(公告)日：2007-12-25

申请号：US11155174

申请日：2005-06-16

申请人： Jung-woo Seo ,  Tae-hyuk Ahn ,  Jeong-sic Jeon

发明人： Jung-woo Seo ,  Tae-hyuk Ahn ,  Jeong-sic Jeon

IPC分类号： H01L21/8242

CPC分类号： H01L21/76895 ,  H01L21/76802 ,  H01L21/76831 ,  H01L27/10814 ,  H01L27/10855 ,  H01L27/10885 ,  H01L27/10888

摘要： Manufacturing a semiconductor memory by first forming a first insulating layer covering a conductive pad. Next forming and pattering a bit line conductive layer and a second insulating layer to expose a part of the first insulating layer. A third insulating layer covering the exposed surfaces of the first insulating layer is formed. Exposing an upper surface of the bit line conductive layer pattern and an upper surface of the third insulating layer. Removing part of the third insulating layer and first insulating layer to expose the conductive pad. Forming a spacer on the side walls of the bit line conductive layer pattern and the first insulating layer. An insulating layer pattern and a second spacer layer are respectively formed on the bit line conductive layer pattern and on a side wall of the first spacer and a conductive plug, which is in contact with the conductive pad is formed.

摘要翻译： 通过首先形成覆盖导电垫的第一绝缘层来制造半导体存储器。 接下来形成和图案位线导电层和第二绝缘层以暴露第一绝缘层的一部分。 形成覆盖第一绝缘层的暴露表面的第三绝缘层。 露出位线导电层图案的上表面和第三绝缘层的上表面。 去除第三绝缘层和第一绝缘层的一部分以暴露导电焊盘。 在位线导电层图案和第一绝缘层的侧壁上形成间隔物。 分别在位线导电层图案和第一间隔物的侧壁上形成绝缘层图案和第二间隔层，并且形成与导电焊盘接触的导电插塞。

公开(公告)号：US07208705B2

公开(公告)日：2007-04-24

申请号：US10933428

申请日：2004-09-03

申请人： Sung Gi Hwang ,  Jung Woo Seo

发明人： Sung Gi Hwang ,  Jung Woo Seo

IPC分类号： H05B3/06

CPC分类号： D06F58/04

摘要： A heater bracket assembly for securing a heater case in a dryer is disclosed. The heater bracket assembly includes a supporting part secured to a bottom end of the heater case for supporting the heater case, a fixing part secured to a base plate of the dryer, and a connecting part connecting the supporting part and the fixing part, wherein the supporting part comprises a first extension member extended therefrom which engages with an aperture provided to the bottom end of the heater case such that the supporting part is initially secured to the heater case.

摘要翻译： 公开了一种用于将加热器壳固定在干燥器中的加热器支架组件。 加热器支架组件包括固定到加热器壳体的底端以支撑加热器壳体的支撑部分，固定到干燥器的基板的固定部分和连接支撑部件和固定部件的连接部件，其中 支撑部件包括从其延伸的第一延伸构件，其与设置在加热器壳体的底端的孔接合，使得支撑部件最初固定到加热器壳体。

公开(公告)号：US20060186479A1

公开(公告)日：2006-08-24

申请号：US11354175

申请日：2006-02-15

申请人： Jung-woo Seo ,  Jong-seo Hong ,  Tae-hyuk Ahn ,  Jeong-sic Jeon ,  Jun-sik Hong ,  Young-sun Cho

发明人： Jung-woo Seo ,  Jong-seo Hong ,  Tae-hyuk Ahn ,  Jeong-sic Jeon ,  Jun-sik Hong ,  Young-sun Cho

IPC分类号： H01L23/52 ,  H01L21/4763

CPC分类号： H01L21/76895 ,  H01L21/76837 ,  H01L21/76885 ,  H01L21/76897 ,  H01L27/10855 ,  H01L27/10888 ,  H01L27/10894

摘要： A semiconductor memory device includes a semiconductor substrate in which a cell region and a core and peripheral region are defined. The device further comprises isolation layers formed in the semiconductor substrate to define active regions, a first gate electrode structure formed in the cell region and a second gate electrode structure formed in the core and peripheral region. Source and drain regions formed in the active regions on respective sides of each of the gate electrode structures and self-aligned contact pads are formed in the cell region in contact with the source and drain regions. An insulating interlayer is formed on the semiconductor substrate between the self-aligned contact pads, and etch stoppers are formed on the insulating interlayer between the self-aligned contact pads in the cell region.

摘要翻译： 半导体存储器件包括其中限定了单元区域和芯和外围区域的半导体衬底。 该器件还包括形成在半导体衬底中以限定有源区的隔离层，形成在单元区域中的第一栅电极结构和形成在芯和外围区中的第二栅电极结构。 形成在每个栅电极结构和自对准接触焊盘的相应侧上的有源区中的源区和漏区形成在与源区和漏区接触的单元区域中。 在自对准接触焊盘之间的半导体衬底上形成绝缘中间层，并且在电池区域中的自对准接触焊盘之间的绝缘中间层上形成蚀刻阻挡层。

公开(公告)号：US20050233505A1

公开(公告)日：2005-10-20

申请号：US11155174

申请日：2005-06-16

申请人： Jung-woo Seo ,  Tae-hyuk Ahn ,  Jeong-sic Jeon

发明人： Jung-woo Seo ,  Tae-hyuk Ahn ,  Jeong-sic Jeon

IPC分类号： H01L21/28 ,  H01L21/336 ,  H01L21/768 ,  H01L21/8242 ,  H01L27/108

CPC分类号： H01L21/76895 ,  H01L21/76802 ,  H01L21/76831 ,  H01L27/10814 ,  H01L27/10855 ,  H01L27/10885 ,  H01L27/10888

摘要： Manufacturing a semiconductor memory by first forming a first insulating layer covering a conductive pad. Next forming and pattering a bit line conductive layer and a second insulating layer to expose a part of the first insulating layer. A third insulating layer covering the exposed surfaces of the first insulating layer is formed. Exposing an upper surface of the bit line conductive layer pattern and an upper surface of the third insulating layer. Removing part of the third insulating layer and first insulating layer to expose the conductive pad. Forming a spacer on the side walls of the bit line conductive layer pattern and the first insulating layer. An insulating layer pattern and a second spacer layer are respectively formed on the bit line conductive layer pattern and on a side wall of the first spacer and a conductive plug, which is in contact with the conductive pad is formed.

公开(公告)号：US08651021B2

公开(公告)日：2014-02-18

申请号：US13303305

申请日：2011-11-23

申请人： Jung Woo Cho ,  Dae Jung Kim ,  Dong Min Kim ,  Sin Kwon ,  Jung Woo Seo

发明人： Jung Woo Cho ,  Dae Jung Kim ,  Dong Min Kim ,  Sin Kwon ,  Jung Woo Seo

IPC分类号： B41F35/00

CPC分类号： B41F35/00 ,  B41F17/26 ,  B41P2235/26 ,  B41P2235/27 ,  H05K3/1275

摘要： According to example embodiments, a roll printing apparatus includes a cleaning device in which a cleaning nozzle unit and a spray nozzle unit are integrated so that both a reverse offset process and a cliche cleaning process may be achieved in the roll printing apparatus. The roll printing apparatus may include a base plate, a blanket roll to transfer an ink material to a cliche and a substrate, a blanket roll supporter located on the base plate to support the blanket roll, a cliche table located on the base plate to fix and move the cliche, a substrate table located on the base plate to fix the substrate, and the cleaning device installed on the base plate to clean the cliche. The cleaning device may include a cleaning nozzle unit to spray a cleaning solution and a spray nozzle unit to spray DIW, which are integrated.

摘要翻译： 根据示例性实施例，卷筒印刷装置包括清洁装置，其中清洁喷嘴单元和喷嘴单元被整合，使得可以在卷筒印刷装置中实现反向偏移处理和清晰处理。 卷筒印刷装置可以包括基板，用于将油墨材料转印到纸板和基板的橡皮布辊，位于基板上以支撑橡皮布辊的覆盖辊支撑件，位于基板上的陈列台，以固定 并移动底板，位于基板上的基板台以固定基板，以及安装在基板上的清洁装置以清洁陈列架。 清洁装置可以包括用于喷射清洁溶液的清洁喷嘴单元和喷射单元以喷射集成的DIW。

公开(公告)号：US08596509B2

公开(公告)日：2013-12-03

申请号：US12461061

申请日：2009-07-30

申请人： Dong Min Kim ,  Sin Kwon ,  Young Tae Cho ,  Jung Woo Seo ,  Ki Keon Yeom ,  Ki Hyun Kim

发明人： Dong Min Kim ,  Sin Kwon ,  Young Tae Cho ,  Jung Woo Seo ,  Ki Keon Yeom ,  Ki Hyun Kim

IPC分类号： B65H23/038 ,  B65H23/192 ,  B65H27/00

CPC分类号： B65H23/26 ,  B65H2301/511 ,  B65H2555/14

摘要： Disclosed is a substrate alignment apparatus capable of performing coarse and fine alignments of a substrate in a progressing route to remove or reduce an alignment error between the substrate and a pattern roll. The coarse alignment may be performed by moving a frame using a stage when the alignment error is relatively large, and the fine alignment may be performed by moving subsidiary rollers of a roller unit relative to a main roller of a roller unit when the alignment error is relatively small. An example substrate alignment apparatus may include a frame and a roller unit rotatably fixed to the frame to support a substrate, wherein the roller unit includes a main roller, and at least one subsidiary roller fixed to the main roller such that the at least one subsidiary roller can move relative to the main roller to align the substrate.

摘要翻译： 公开了一种基板对准装置，其能够在进行中的路线中执行基板的粗略和精细对准以去除或减小基板和图案辊之间的对准误差。 当对准误差相对较大时，可以通过使用阶段移动框架来执行粗略对准，并且当对准误差为对准误差时，可以通过相对于辊单元的主辊移动辊单元的辅助辊来执行精细对准 比较小 示例性基板对准装置可以包括框架和滚子单元，其可旋转地固定到框架以支撑基板，其中滚子单元包括主辊，以及至少一个辅助辊，其固定到主辊，使得至少一个附属 辊可以相对于主辊移动以对准衬底。

公开(公告)号：US08557130B2

公开(公告)日：2013-10-15

申请号：US12654023

申请日：2009-12-08

申请人： Young Tae Cho ,  Suk Won Lee ,  Sin Kwon ,  Jung Woo Seo ,  Jeong Gil Kim

发明人： Young Tae Cho ,  Suk Won Lee ,  Sin Kwon ,  Jung Woo Seo ,  Jeong Gil Kim

IPC分类号： C03C15/00 ,  C03C25/68 ,  C23F1/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： In forming a pattern on a substrate with reduced pattern error using a mold having an area smaller than an area of the substrate, a first resin pattern is formed on at least a first of a plurality of regions of an etching object layer by imprinting resin applied to the etching object layer using a first mold The etching object layer is then etched using the first resin pattern as an etching mask. A second resin pattern is formed on at least a second of the plurality of regions by imprinting resin applied to the etching object layer using a second mold. The etching object layer is again etched using the second resin pattern as an etching mask.

摘要翻译： 在使用面积小于基板的面积的模具的基板上形成图案减少图案的情况下，通过印刷树脂施加在蚀刻对象层的多个区域的至少第一区域上形成第一树脂图案 使用第一模具到蚀刻对象层。然后使用第一树脂图案作为蚀刻掩模蚀刻蚀刻对象层。 通过使用第二模具将施加到蚀刻对象层的树脂压印，在多个区域中的至少一个区域上形成第二树脂图案。 使用第二树脂图案作为蚀刻掩模再次蚀刻蚀刻对象层。

公开(公告)号：US08424487B2

公开(公告)日：2013-04-23

申请号：US12662677

申请日：2010-04-28

申请人： Young Tae Cho ,  Sin Kwon ,  Ki Hyun Kim ,  Jung Woo Seo ,  Dong Min Kim ,  Jeong Gil Kim

发明人： Young Tae Cho ,  Sin Kwon ,  Ki Hyun Kim ,  Jung Woo Seo ,  Dong Min Kim ,  Jeong Gil Kim

IPC分类号： B05C11/00 ,  B05C1/00 ,  B05C1/06

CPC分类号： B65H23/038 ,  B05C5/0241 ,  B05D1/40 ,  B05D3/067 ,  B65H2301/5114 ,  B65H2301/5126 ,  B65H2404/15212

摘要： Disclosed herein is a roll-to-roll patterning apparatus and a patterning system using the same. The patterning system may include a supply roll to supply a film member, a recovery roll to recover the film member, and a roll-to-roll patterning apparatus forming a coating on the film member. The roll-to-roll patterning apparatus may include a pattern roller, a plurality of press rollers, and an alignment roller. The pattern roller may include an outer peripheral surface with a first pattern. The plurality of press rollers may press a film member against the pattern roller to form a second pattern on the film member. The alignment roller may be spaced apart from the pattern roller and may be arranged at an upstream position in a movement direction of the film member. The alignment roller may align the film member entering a region between the pattern roller and the plurality of press rollers.

摘要翻译： 本文公开了一种卷对卷图案形成装置和使用其的图案形成系统。 图案形成系统可以包括用于供应膜构件的供应辊，用于回收膜构件的回收辊以及在膜构件上形成涂层的卷对卷图案形成装置。 卷对卷图案形成装置可以包括图案辊，多个压辊和对准辊。 图案辊可以包括具有第一图案的外周表面。 多个压辊可以将膜构件压靠在图案辊上，以在膜构件上形成第二图案。 对准辊可以与图案辊间隔开，并且可以布置在膜构件的移动方向上的上游位置处。 对准辊可以将膜构件对准进入图案辊和多个压辊之间的区域。

公开(公告)号：US20120174106A1

公开(公告)日：2012-07-05

申请号：US13026974

申请日：2011-02-14

申请人： Jung Woo SEO ,  Youn Seok SHIN ,  Dae Gil KIM ,  Hyun Sook YOUN ,  Jong In OH ,  Jung Im YOO ,  Jung LEE ,  Jung In LEE

发明人： Jung Woo SEO ,  Youn Seok SHIN ,  Dae Gil KIM ,  Hyun Sook YOUN ,  Jong In OH ,  Jung Im YOO ,  Jung LEE ,  Jung In LEE

IPC分类号： G06F9/46

CPC分类号： G06F9/485 ,  G06F9/5083 ,  G06F11/3433 ,  G06F2201/865

摘要： A mobile terminal includes an execution unit to execute tasks, a determination unit to determine whether to manage the executed tasks and to generate a termination processing signal for terminating a first executed tasks if the executed tasks are to be managed, and a control unit to terminate the first executed task according to the termination processing signal generated by the determination unit. A method for managing tasks includes executing tasks, determining whether to manage the executed tasks, generating a termination processing signal for terminating a first executed task according to the determination result, and terminating the first executed task according to the termination processing signal.

摘要翻译： 移动终端包括执行任务的执行单元，确定是否管理所执行的任务的确定单元，并且如果要执行的任务被管理，则生成用于终止第一执行任务的终止处理信号，以及终止控制单元 所述第一执行任务根据由所述确定单元生成的终止处理信号。 用于管理任务的方法包括执行任务，确定是否管理所执行的任务，根据确定结果生成用于终止第一执行任务的终止处理信号，并根据终止处理信号终止第一执行任务。

公开(公告)号：US07491601B2

公开(公告)日：2009-02-17

申请号：US11956360

申请日：2007-12-14

申请人： In-joon Yeo ,  Tae-hyuk Ahn ,  Kwang-wook Lee ,  Jung-woo Seo ,  Jeong-sic Jeon

发明人： In-joon Yeo ,  Tae-hyuk Ahn ,  Kwang-wook Lee ,  Jung-woo Seo ,  Jeong-sic Jeon

IPC分类号： H01L21/8242 ,  H01L21/8243 ,  H01L21/8244

CPC分类号： H01L28/90 ,  H01L27/10817 ,  H01L27/10852 ,  H01L28/91

摘要： An electronic device may include a substrate, a conductive layer on the substrate, and an insulating spacer. The conductive electrode may have an electrode wall extending away from the substrate. The insulating spacer may be provided on the electrode wall with portions of the electrode wall being free of the insulating spacer between the substrate and the insulating spacer, and portions of the electrode most distant from the substrate may be free of the insulating spacer. Related methods and structures are also discussed.

摘要翻译： 电子器件可以包括衬底，衬底上的导电层和绝缘间隔物。 导电电极可以具有远离衬底延伸的电极壁。 绝缘间隔物可以设置在电极壁上，电极壁的部分在衬底和绝缘间隔物之间​​没有绝缘间隔物，并且电极最远离衬底的部分可以没有绝缘间隔物。 还讨论了相关的方法和结构。