METHODS AND APPARATUSES FOR PROVIDING DRM INTEROPERABILITY
    31.
    发明申请
    METHODS AND APPARATUSES FOR PROVIDING DRM INTEROPERABILITY 有权
    提供DRM互操作性的方法和设备

    公开(公告)号:US20100138671A1

    公开(公告)日:2010-06-03

    申请号:US12630646

    申请日:2009-12-03

    CPC classification number: G06F21/10 G06F2221/0728

    Abstract: Methods and apparatuses for providing DRM interoperability are provided. Proxy re-encryption technique using bilinear map is used, and the same content can be used in different devices. According to the method of providing DRM interoperability includes in proxy agent with respect to digital rights management (DRM) service providers and device which supports predetermined DRM, first DRM service provider, second DRM service provider, the proxy agent, and the device identify each other, and proxy re-encrypt an interoperable content (IC) and provide the IC to the device. The IC is second-level encrypted by using a key of the first DRM service provider, and the proxy re-encryption is performed by using a proxy key generated from proxy key information provided from the first DRM service provider and the second DRM service provider. Therefore, a problem in which interoperability cannot be guaranteed since a DRM technique depends on a service provider is resolved.

    Abstract translation: 提供了提供DRM互操作性的方法和设备。 使用双线性映射的代理重新加密技术,相同的内容可以在不同的设备中使用。 根据提供DRM互操作性的方法,其包括关于数字权限管理(DRM)服务提供商的代理代理和支持预定DRM的设备,第一DRM服务提供商,第二DRM服务提供商,代理代理和设备彼此识别 ,并且代理重新加密可互操作的内容(IC)并将IC提供给设备。 IC通过使用第一DRM服务提供商的密钥进行二级加密,并且通过使用从第一DRM服务提供商和第二DRM服务提供商提供的代理密钥信息生成的代理密钥来执行代理重新加密。 因此,解决了DRM技术取决于服务提供商的互操作性不能保证的问题。

    Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds
    33.
    发明授权
    Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds 有权
    用于深紫外光刻的光致抗蚀剂组合物,其包含光活性化合物的混合物

    公开(公告)号:US06991888B2

    公开(公告)日:2006-01-31

    申请号:US10439472

    申请日:2003-05-16

    CPC classification number: G03F7/0392 G03F7/0045 Y10S430/115

    Abstract: The present invention relates to a novel photoresist composition that can be developed with an aqueous alkaline solution, and is capable of being imaged at exposure wavelengths in the deep ultraviolet. The invention also relates to a process for imaging the novel photoresist as well as novel photoacid generators.The novel photoresist comprises a) a polymer containing an acid labile group, and b) a novel mixture of photoactive compounds, where the mixture comprises a lower absorbing compound selected from structure 1 and 2, and a higher absorbing compound selected from structure 4 and 5, where, R1 and R2 R5, R6, R7, R8, and R9 are defined herein; m=1–5; X− is an anion, and Ar is selected from naphthyl, anthracyl, and structure 3, where R30, R31, R32, R33, and R34 are defined herein.

    Abstract translation: 本发明涉及一种可用碱性水溶液显影的新型光刻胶组合物,能够在深紫外线的曝光波长下成像。 本发明还涉及用于对新型光致抗蚀剂以及新型光酸产生剂进行成像的方法。 新型光致抗蚀剂包含a)含有酸不稳定基团的聚合物,和b)光活性化合物的新混合物,其中该混合物包含选自结构1和2的较低吸收化合物和选自结构4和5的较高吸收化合物 ,其中R 1和R 2 R 5,R 6,R 7,或N R 8,R 9和R 9在本文中定义; m = 1-5; X - 是阴离子,Ar选自萘基,蒽基和结构3,其中R 30,R 31,R SUB > 32,R 33和R 34在本文中定义。

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