公开(公告)号：US20090202138A1

公开(公告)日：2009-08-13

申请号：US12361954

申请日：2009-01-29

Applicant: Masaaki Ito ,  Minori Noguchi ,  Shigeru Matsui

Inventor： Masaaki Ito ,  Minori Noguchi ,  Shigeru Matsui

IPC: G06K9/00

CPC classification number: G01N21/9501 ,  G01N21/95623 ,  G01N2021/8822 ,  G06K9/74

Abstract: The present invention provides an inspection apparatus having a high throughput and high sensitivity with respect to a number of various manufacturing processes and defects of interest in inspection of a specimen such as a semiconductor wafer on which a pattern is formed. The apparatus illuminates with light the specimen having the pattern formed thereon, forms an image of the specimen on an image sensor through a reflective optics, and determines the existence/nonexistence of a defect. The reflective optics has a conjugate pair of Fourier transform optics. An aberration of the reflective optics is corrected off-axis. The reflective optics has a field of view in non-straight-line slit form on the specimen surface. Also, the optics is of a reflection type, includes a conjugate pair of Fourier transform optics and has a field of view in non-straight-line slit form. An optimum wavelength band is selected according to the specimen (FIG. 1).

Abstract translation: 本发明提供了一种检测装置，其相对于在其上形成有图案的半导体晶片的样本的检查中的多种制造工艺和多个不同的制造工艺和缺陷而具有高生产率和高灵敏度。 该装置用光照射具有形成在其上的图案的样本，通过反射光学元件在图像传感器上形成样本的图像，并且确定缺陷的存在/不存在。 反射光学器件具有傅立叶变换光学器件的共轭对。 反射光学器件的像差被偏离校正。 反射光学元件在样品表面上具有非直线狭缝形式的视场。 此外，光学器件是反射型的，包括傅立叶变换光学器件的共轭对，并且具有非直线狭缝形式的视场。 根据样品选择最佳波长带（图1）。

公开(公告)号：US07557911B2

公开(公告)日：2009-07-07

申请号：US11830320

申请日：2007-07-30

Applicant: Kenji Oka ,  Shigeru Matsui

Inventor： Kenji Oka ,  Shigeru Matsui

IPC: G01N21/00

CPC classification number: G01N21/8851 ,  G01N21/9501

Abstract: An appearance inspection apparatus analyzes a difference in detection characteristics of detection signals obtained by detectors to flexibly meet various inspection purposes without changing a circuit or software. The apparatus includes a signal synthesizing section that synthesizes detection signals from the detectors in accordance with a set condition. An input operating section sets a synthesizing condition of the detection signal by the signal synthesizing section, and an information display section displays a synthesizing map structured based on a synthesized signal which is synthesized by the signal synthesizing section in accordance with a condition set by the input operating section.

Abstract translation: 外观检查装置分析由检测器获得的检测信号的检测特性的差异，以灵活地满足各种检查目的，而不改变电路或软件。 该装置包括信号合成部，其根据设定条件合成来自检测器的检测信号。 输入操作部分通过信号合成部分设置检测信号的合成条件，并且信息显示部分显示由信号合成部分根据由输入设置的条件合成的合成信号构成的合成图 操作部分。

公开(公告)号：US07535562B2

公开(公告)日：2009-05-19

申请号：US11437643

申请日：2006-05-22

Applicant: Shigeru Matsui ,  Masaaki Ito

Inventor： Shigeru Matsui ,  Masaaki Ito

IPC: G01N21/00

CPC classification number: G01N21/8806 ,  G01N21/956

Abstract: In the conventional methods for enhancing defect detection sensitivity by improving the resolving power, if a microscopic pattern, which is a high spatial-frequency structure as is the case with a microscopic defect, has become the brightest portion, the gray-scale contrast of the microscopic defect will be enhanced. At the same time, however, the gray-scale contrast of the microscopic pattern will also be enhanced simultaneously. Consequently, there has existed a problem that it is impossible to enhance the microscopic-defect detection sensitivity further than that. In the present invention, an aperture stop which is divided into a plurality of small apertures is located on an illumination pupil plane. Then, light-shield/light-transmission for each small aperture is controlled independently of each other. This control allows an inspection-target object to be illuminated at only an incident angle at which the gray-scale contrast of the microscopic defect will be emphasized more sharply.

Abstract translation: 在通过提高分辨能力来提高缺陷检测灵敏度的常规方法中，如果与微观缺陷一样的高空间频率结构的微观图案已经成为最亮部分，则灰度对比度 微观缺陷将得到加强。 然而，同时，微观图案的灰度对比度也将同时提高。 因此，存在不可能进一步提高微观缺陷检测灵敏度的问题。 在本发明中，分割成多个小孔的孔径光阑位于照明光瞳平面上。 然后，彼此独立地控制每个小孔的遮光/透光。 该控制允许仅在更明显地强调微观缺陷的灰度对比度的入射角度照射检查对象物体。

公开(公告)号：US20090041335A1

公开(公告)日：2009-02-12

申请号：US12249328

申请日：2008-10-10

Applicant: Shigeru MATSUI ,  Katsuya SUZUKI

Inventor： Shigeru MATSUI ,  Katsuya SUZUKI

IPC: G06K9/00

CPC classification number: G06T7/001 ,  G01N21/95607 ,  G03F7/7065 ,  G06T2207/30148

Abstract: The pattern defect inspection apparatus is operable to detect defects by comparing a detection image, which is obtained through scanning by an image sensor those patterns that have the identical shape and are continuously disposed on the object under tested at equal intervals in row and column directions, with a reference image obtained by scanning neighboring identical shape patterns in the row and column directions. This apparatus has a unit for generating an average reference image by statistical computation processing from the images of identical shape patterns lying next to the detection image including at least eight nearest chips on the up-and-down and right-and-left sides and at diagonal positions with the detection image being intermediately situated. The apparatus also includes a unit that detects a defect by comparing the detection image to the average reference image thus generated.

Abstract translation: 图案缺陷检查装置可以通过将通过图像传感器进行扫描而得到的检测图像进行比较来检测缺陷，所述检测图像具有相同形状且连续设置在被检测物体上的行和列方向上等间隔的那些图案， 具有通过扫描行和列方向上的相邻相同形状图案而获得的参考图像。 该装置具有用于通过统计计算处理从邻近检测图像的相同形状图案的图像生成平均参考图像的单元，该检测图像包括上下左右侧的至少八个最近的码片，以及在 对角位置，检测图像位于中间位置。 该装置还包括通过将检测图像与由此生成的平均参考图像进行比较来检测缺陷的单元。

公开(公告)号：US07456948B2

公开(公告)日：2008-11-25

申请号：US11822330

申请日：2007-07-05

Applicant: Takahiro Togashi ,  Shigeru Matsui

Inventor： Takahiro Togashi ,  Shigeru Matsui

IPC: G01N21/88 ,  G01N21/86

CPC classification number: G01N21/9501 ,  G01N21/94 ,  G01N2021/8861 ,  G01N2021/8874 ,  G01N2021/95676

Abstract: A method and equipment which includes an illustrated-spot illumination-distribution data table for storing an illumination distribution within an illustrated spot and which calculates a coordinate position for a particle or a defect and the diameter of the particle on the basis of detection light intensity data about the particle or defect and the illustrated-spot illumination-distribution data table. Thus, even when the illumination distribution within the illustrated spot based on an actual illumination optical system is not a Gaussian distribution, the calculation of the particle diameter of the detected particle or defect and the calculation of a coordinate position on the surface of an object to be inspected can be attained with an increased accuracy.

Abstract translation: 一种方法和设备，其包括用于存储所示斑点内的照明分布的示出点照度分布数据表，并且基于检测光强度数据计算颗粒或缺陷的坐标位置和颗粒的直径 关于颗粒或缺陷以及所示的点光照度分布数据表。 因此，即使在基于实际的照明光学系统的所示光点内的照明分布不是高斯分布的情况下，检测出的粒子或缺陷的粒径的计算以及物体表面上的坐标位置的计算 被检查可以提高准确度。

公开(公告)号：US20080279445A1

公开(公告)日：2008-11-13

申请号：US12216642

申请日：2008-07-09

Applicant: Shigeru Matsui ,  Katsuya Suzuki

Inventor： Shigeru Matsui ,  Katsuya Suzuki

IPC: G06K9/46

CPC classification number: G06T7/001 ,  G01N21/95607 ,  G03F7/7065 ,  G06T2207/30148

Abstract: The pattern defect inspection apparatus is operable to detect defects by comparing a detection image, which is obtained through scanning by an image sensor those patterns that have the identical shape and are continuously disposed on the object under tested at equal intervals in row and column directions, with a reference image obtained by scanning neighboring identical shape patterns in the row and column directions. This apparatus has a unit for generating an average reference image by statistical computation processing from the images of identical shape patterns lying next to the detection image including at least eight nearest chips on the up-and-down and right-and-left sides and at diagonal positions with the detection image being intermediately situated. The apparatus also includes a unit that detects a defect by comparing the detection image to the average reference image thus generated.

公开(公告)号：US20080218751A1

公开(公告)日：2008-09-11

申请号：US12073295

申请日：2008-03-04

Applicant: Takahiro Togashi ,  Shigeru Matsui

Inventor： Takahiro Togashi ,  Shigeru Matsui

IPC: G01N21/00

CPC classification number: G01N21/9503 ,  G01N21/4738

Abstract: An inspection device of an object, comprising: a laser beam source for oscillating a laser beam and irradiating the laser beam onto a surface of an object to be inspected, a rotary table for loading and rotating the object, a moving mechanism for moving the rotary table in a transfer direction of the object, a plurality of light receptors disposed above the object for receiving a scattering light scattered from the surface of the object when the laser beam irradiated from the laser beam source onto the surface of the object loaded on the rotary table, and a data processor for performing operations on the basis of received signals of the scattering light received by the plurality of light receptors and discriminating a boundary position between a flat plane area of the surface of the object which is irradiated with the laser beam and a predetermined area corresponding to an edge portion outside the plane area.

Abstract translation: 一种物体的检查装置，包括：激光束源，用于振荡激光束并将激光束照射到待检查物体的表面上;旋转台，用于装载和旋转物体;移动机构，用于使旋转 在物体的传送方向上设置多个光接收器，设置在物体上方的多个光接收器，用于当从激光束源照射到加载在旋转体上的物体的表面上时从物体的表面散射的散射光 表和数据处理器，用于基于由多个光接收器接收的散射光的接收信号进行操作，并且识别被激光束照射的物体的表面的平面区域与边界位置之间的边界位置;以及 对应于平面区域外的边缘部分的预定区域。

公开(公告)号：US20080174764A1

公开(公告)日：2008-07-24

申请号：US11834217

申请日：2007-08-06

Applicant: Shigeru Matsui

Inventor： Shigeru Matsui

IPC: G01N21/00

CPC classification number: G01N21/9501 ,  G01N21/4738

Abstract: Provided are a surface inspection method and a surface inspection apparatus that are capable of detecting scattered light from a contaminant particle and a defect at a good S/N even when the relative ratio of background scattered light to the total quantity of scattered light and the anisotropy of background scattered light in angular directions are not relatively large in a case where background scattered light deriving from the surface roughness of a semiconductor wafer has directivity in a direction of an elevation angle or an azimuthal angle and in a case where the directivity of background scattered light changes depending on positions on a wafer to be inspected. In surface inspection according to the present invention, by use of a plurality of photodetectors arranged in a plurality of directions, light scattered, diffracted or reflected on a surface of an object to be inspected or in the vicinity of the surface is detected and a plurality of signals obtained by this are subjected to weighted addition processing or weighted averaging processing by linear combination, whereby a contaminant particle and a defect on a surface of an object to be inspected and the like are detected. The size of a contaminant particle and a defect is calculated from results of the weighted addition processing or weighted averaging processing.

Abstract translation: 提供了即使当背景散射光与散射光的总量和各向异性的相对比率时，能够检测来自污染物颗粒的散射光和良好S / N的缺陷的表面检查方法和表面检查装置 在从半导体晶片的表面粗糙度导出的背景散射光在仰角方位角或方位角方向上具有方向性的背景散射光在角度方向上的背景散射光不会相对较大，并且在背景分散的方向性的情况下 光取决于要检查的晶片上的位置。 在根据本发明的表面检查中，通过使用多个沿多个方向布置的光检测器，检测被检测物体的表面或表面附近的散射，衍射或反射的光，并且检测多个 通过线性组合对由此获得的信号进行加权相加处理或加权平均处理，由此检测待检测对象的表面上的污染物颗粒和缺陷等。 通过加权加法处理或加权平均处理的结果计算污染物颗粒的尺寸和缺陷。

公开(公告)号：US20070268484A1

公开(公告)日：2007-11-22

申请号：US11798805

申请日：2007-05-17

Applicant: Shigeru Matsui

Inventor： Shigeru Matsui

IPC: G01N21/00

CPC classification number: G01N21/9501 ,  G01N21/47 ,  G01N2021/8861

Abstract: An optical inspection apparatus irradiates a light beam onto the outer surface of an object to be inspected, in the form of an illumination spot having an illumination intensity which is higher in the outer peripheral part of the object to be inspected than in the inner peripheral part thereof while uniformly maintains a temperature rise caused by the irradiation of the light beam, over the outer surface of the object to be inspected, in order to prevent the effective entire signal value of a scattered light signal from lowering, without lowering the linear speed of a movable stage for the object to be inspected in the outer peripheral part of the object to be inspected, thereby it is possible to prevent lowering of the detectability for a foreign matter or a defect, for preventing lowering of inspection throughput.

Abstract translation: 光学检查装置将光束照射到被检查物体的外周部的照明强度比要检查对象的外周部的照明强度高于内周部的照明光斑的形状 同时在被检查物体的外表面上均匀地保持由光束照射引起的温度升高，以防止散射光信号的有效整体信号值降低，而不会降低线性速度 在待检查物体的外周部分中可检测物体的可移动台，从而可以防止异物或缺陷的可检测性的降低，以防止检查吞吐量的降低。

公开(公告)号：US5253183A

公开(公告)日：1993-10-12

申请号：US803894

申请日：1991-12-09

Applicant: Masaru Inoue ,  Shigeru Matsui

Inventor： Masaru Inoue ,  Shigeru Matsui

IPC: G01J3/453 ,  G01J9/02

CPC classification number: G01J3/4537 ,  G01J2009/0261

Abstract: A device according to the present invention includes an interferometer which produces interference fringes from light received from a light source. The interference fringes are imaged onto a photo-diode array which transforms the imaged interference fringes into a single set of electric signals. The single set of electric signals is digitized and stored as a group of consecutive data points which represent an interferogram signal containing a DC component. The data points are processed to obtain moving average values representing the DC component of the interferogram signal. The moving average values are subtracted from the data points to obtain a clean interferogram signal which is Fourier-transformed to obtain a spectrogram of the light source.

Abstract translation: 根据本发明的装置包括干涉仪，其从光源接收的光产生干涉​​条纹。 干涉条纹被成像到光电二极管阵列，其将成像的干涉条纹变换成单组电信号。 单组电信号被数字化并存储为表示包含DC分量的干涉图信号的一组连续数据点。 处理数据点以获得表示干涉图信号的DC分量的移动平均值。 从数据点中减去移动平均值，以获得干涉干涉图信号，该信号被傅里叶变换以获得光源的光谱图。