公开(公告)号：US20080106707A1

公开(公告)日：2008-05-08

申请号：US10588297

申请日：2005-02-03

申请人： Naoyuki Kobayashi ,  Soichi Owa ,  Shigeru Hirukawa ,  Yasuhiro Omura

发明人： Naoyuki Kobayashi ,  Soichi Owa ,  Shigeru Hirukawa ,  Yasuhiro Omura

IPC分类号： G03B27/52

CPC分类号： G03F7/70875 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/7075 ,  G03F7/70891

摘要： An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) through liquid (LQ). The exposure apparatus (EX) has a substrate holder (PH) for holding the substrate (P), a substrate stage (PST) capable of moving the substrate (P) held by the substrate holder (PH), and a temperature adjusting system (60) for adjusting the temperature of the substrate holder (PH). The temperature of the substrate (P) is controlled so that there is no difference in temperature between the substrate (P) and the liquid (LQ), thereby preventing a reduction in exposure accuracy resulting from variation in temperature of the liquid (LQ).

摘要翻译： 曝光装置（EX）通过液体（LQ）在基板（P）上照射曝光光（EL）而曝光基板（P）。 曝光装置（EX）具有用于保持基板（P）的基板保持器（PH），能够移动由基板保持件（PH）保持的基板（P）的基板台（PST）和温度调节系统 60），用于调节衬底保持器（PH）的温度。 控制基板（P）的温度，使得基板（P）和液体（LQ）之间的温度没有差异，从而防止由液体（LQ）的温度变化引起的曝光精度的降低。

公开(公告)号：US20080049336A1

公开(公告)日：2008-02-28

申请号：US11907797

申请日：2007-10-17

申请人： Yasuhiro Omura ,  Hironori Ikezawa ,  David Williamson

发明人： Yasuhiro Omura ,  Hironori Ikezawa ,  David Williamson

IPC分类号： G02B9/64 ,  G02B17/00 ,  G02B3/00 ,  G02B9/04 ,  G02B9/12 ,  G02B9/62

CPC分类号： G02B17/0892 ,  G02B13/22 ,  G02B17/08 ,  G02B21/33 ,  G03F7/70225 ,  G03F7/70341

摘要： An immersion optical system includes a plurality of lenses disposed along a light beam path of the immersion optical system. The plurality of lenses include a liquid immerged lens which is contactable with a liquid layer. An optically conjugate point of an object surface is formed in the light beam path of the immersion optical system. The object surface is contactable with a liquid.

摘要翻译： 浸入式光学系统包括沿着浸没式光学系统的光束路径设置的多个透镜。 多个透镜包括可与液体层接触的液体浸没透镜。 物镜表面的光学共轭点形成在浸没式光学系统的光束路径中。 物体表面可与液体接触。

公开(公告)号：US20080018870A1

公开(公告)日：2008-01-24

申请号：US11793402

申请日：2005-12-09

申请人： Yasuhiro Omura

发明人： Yasuhiro Omura

IPC分类号： G03B27/68

CPC分类号： G02B26/0891 ,  G02B13/24 ,  G02B27/0068 ,  G03F7/70308

摘要： An exposure apparatus for performing exposure of a predetermined pattern on a photosensitive substrate, comprising an objective optical system that forms an image of the predetermined pattern in a field region of a substantially rectangular shape, in an exposure region on the photosensitive substrate; and a transformer that transforms the image formed in the exposure region, into a parallelogram.

摘要翻译： 一种用于在感光基片上曝光预定图案的曝光装置，包括在感光基片上的曝光区域中形成预定图案的图像的目标光学系统，该场景区域基本为矩形; 以及将在曝光区域中形成的图像变换为平行四边形的变压器。

公开(公告)号：US07319508B2

公开(公告)日：2008-01-15

申请号：US11878402

申请日：2007-07-24

申请人： Yasuhiro Omura ,  Naomasa Shiraishi ,  Soichi Owa

发明人： Yasuhiro Omura ,  Naomasa Shiraishi ,  Soichi Owa

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： G02B17/0892 ,  G02B13/24 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70833

摘要： A catadioptric optical system forms an image of a first surface onto a second surface. The system includes a first lens having a first optical axis, a combination of a concave mirror and a second lens, the combination having a second optical axis, a third lens having a third optical axis, a first reflection plane that is arranged in an optical path between the first lens and the combination, and a second reflection plane that is arranged in an optical path between the combination and the third lens. An intersection line of an extension plane of the first reflection plane and an extension plane of the second reflection plane is set up so that the first optical axis, the second optical axis and the third optical axis intersect at one point. In addition, at least one of the first lens and the third lens is movable.

摘要翻译： 反折射光学系统在第二表面上形成第一表面的图像。 该系统包括具有第一光轴的第一透镜，凹面镜和第二透镜的组合，该组合具有第二光轴，具有第三光轴的第三透镜，配置在光学器件中的第一反射面 第一透镜和组合之间的路径，以及布置在组合和第三透镜之间的光路中的第二反射面。 第一反射面的延伸面和第二反射面的延伸面的交线被设定为使得第一光轴，第二光轴和第三光轴在一点相交。 此外，第一透镜和第三透镜中的至少一个是可移动的。

公开(公告)号：US20070297072A1

公开(公告)日：2007-12-27

申请号：US11882208

申请日：2007-07-31

申请人： Yasuhiro Omura

发明人： Yasuhiro Omura

IPC分类号： G02B17/00

CPC分类号： G03F7/7015 ,  G02B9/34 ,  G02B17/0844 ,  G03F7/70225 ,  G03F7/70341 ,  H01L21/027

摘要： A projection objective includes at least four curved mirrors, which include a first curved mirror that is a most optically forward mirror and a second curved mirror that is a second most optically forward mirror, as defined along a light path. In addition, an intermediate lens element is disposed physically between the first and second mirrors, the intermediate lens element being a single pass type lens. The objective forms an image with a numerical aperture of at least substantially 1.0 in immersion.

摘要翻译： 投影物镜包括至少四个弯曲镜，其包括第一曲面镜，其是最光学正镜，以及沿着光路限定的第二最光学前向镜的第二曲面镜。 此外，中间透镜元件物理地设置在第一和第二反射镜之间，中间透镜元件是单通式透镜。 物镜在浸入中形成数值孔径至少为1.0的图像。

公开(公告)号：US06473243B1

公开(公告)日：2002-10-29

申请号：US09644645

申请日：2000-08-24

申请人： Yasuhiro Omura

发明人： Yasuhiro Omura

IPC分类号： G02B1700

CPC分类号： G02B17/0892 ,  G02B17/0808 ,  G02B17/0812 ,  G02B17/0856 ,  G03F7/70225

摘要： The object of the present invention is to provide a catadioptric imaging system, or the like, which is capable of obtaining a desired image-side NA and an image circle without increasing the size of a reflecting mirror with a smaller number of lenses. This catadioptric imaging system comprises a first imaging optical system and a second imaging optical system, wherein the first imaging optical system is provided with a positive first lens group, an aperture stop, and a positive second lens group in the order from the object side, and the second imaging optical system is provided with a primary mirror comprising a concave first reflecting surface having a first radiation transmitting portion at the center thereof, and a secondary mirror comprising a second reflecting surface having a second radiation transmitting portion at the center thereof. In this case, all of the refracting members for constituting the optical system is formed of the same optical material, or at least one of the refracting surfaces and the reflecting surfaces is formed to be aspherical, or a refracting member is disposed to be separated from the first reflecting surface or the second reflecting surface.

摘要翻译： 本发明的目的是提供一种反射折射成像系统等，其能够在不增加具有较少数量的透镜的反射镜的尺寸的情况下获得期望的图像侧NA和图像圆。 该反折射成像系统包括第一成像光学系统和第二成像光学系统，其中第一成像光学系统以从物体侧开始的顺序设置有正的第一透镜组，孔径光阑和正的第二透镜组， 并且所述第二成像光学系统设置有主镜，所述主镜包括在其中心具有第一辐射透射部分的凹入的第一反射表面，以及包括在其中心具有第二辐射透射部分的第二反射表面的次级反射镜。 在这种情况下，用于构成光学系统的所有折射构件由相同的光学材料形成，或者折射表面和反射表面中的至少一个形成为非球面，或折射构件被设置为与 第一反射面或第二反射面。

公开(公告)号：US06362926B1

公开(公告)日：2002-03-26

申请号：US09721956

申请日：2000-11-27

申请人： Yasuhiro Omura ,  Yutaka Ichihara ,  Tetsuo Takahashi

发明人： Yasuhiro Omura ,  Yutaka Ichihara ,  Tetsuo Takahashi

IPC分类号： G02B1700

CPC分类号： G02B17/0892 ,  G02B13/143 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70833

摘要： The present invention relates to a projection exposure apparatus (10) for and method of imaging a reticle (R) having patterned surface onto a substrate (W) in photolithographic processes for manufacturing a variety of devices. The invention further relates to an optical system (C) having a folding member(M1) suited to the projection exposure apparatus, and a method for manufacturing the optical system. The projection exposure apparatus comprises an illumination optical system (IS) and a reticle stage (RS) capable of holding the reticle so the normal line to its patterned surface is in the direction of gravity. The apparatus also includes a substrate stage (WS) capable of holding the substrate with its surface normal parallel to the direction of gravity. The optical system includes a first imaging optical system (A) comprising a concave reflecting mirror and a dioptric optical member arranged along a first optical axis. The first imaging optical system (A) forms an intermediate image of the patterned surface. The optical system also includes a second imaging optical system (B) having a second optical axis, and forms a reduced image of the intermediate image on the substrate. The first folding member is arranged in the optical path from the first imaging optical system to the second imaging optical system. The first and second imaging optical systems and the first and second folding members are positioned so that a reduced image of the pattered surface is formed parallel to the pattern surface of the reticle, and the first and second optical axes are positioned so that they are substantially parallel to the direction of gravity.

摘要翻译： 本发明涉及一种投影曝光装置（10），该投影曝光装置（10）用于在具有用于制造各种装置的光刻工艺中将具有图案化表面的掩模版（R）成像到基板（W）上。 本发明还涉及一种具有适合于投影曝光装置的折叠构件（M1）的光学系统（C），以及用于制造光学系统的方法。 投影曝光装置包括能够保持标线的照明光学系统（IS）和光罩台（RS），使得其图案化表面的法线在重力方向上。 该装置还包括能够将其表面保持平行于重力方向的基板的基底台（WS）。 光学系统包括第一成像光学系统（A），其包括沿第一光轴布置的凹面反射镜和屈光光学构件。 第一成像光学系统（A）形成图案化表面的中间图像。 光学系统还包括具有第二光轴的第二成像光学系统（B），并且在基板上形成中间图像的缩小图像。 第一折叠构件布置在从第一成像光学系统到第二成像光学系统的光路中。 第一和第二成像光学系统以及第一和第二折叠构件被定位成使得图案化表面的缩小图像平行于标线板的图案表面形成，并且第一和第二光轴被定位成使得它们基本上 平行于重力方向。

公开(公告)号：US08436983B2

公开(公告)日：2013-05-07

申请号：US10587254

申请日：2005-01-14

申请人： Yasuhiro Omura

发明人： Yasuhiro Omura

IPC分类号： G02B5/30 ,  G03B27/32 ,  G03B27/42 ,  G03B27/52 ,  G03B27/54 ,  G03B27/72

CPC分类号： G02B17/0892 ,  G02B13/143 ,  G02B17/08 ,  G02B27/28 ,  G03F7/70091 ,  G03F7/70191 ,  G03F7/70566 ,  G03F7/70966

摘要： An optical system is able to achieve a substantially azimuthal polarization state in a lens aperture while suppressing loss of light quantity, based on a simple configuration. The optical system of the present invention is provided with a birefringent element for achieving a substantially circumferential distribution or a substantially radial distribution as a fast axis distribution in a lens aperture, and an optical rotator located behind the birefringent element and adapted to rotate a polarization state in the lens aperture. The birefringent element has an optically transparent member which is made of a uniaxial crystal material and a crystallographic axis of which is arranged substantially in parallel with an optical axis of the optical system. A light beam of substantially spherical waves in a substantially circular polarization state is incident to the optically transparent member.

摘要翻译： 基于简单的配置，光学系统能够在抑制光量损失的同时实现透镜孔中的基本方位极化状态。 本发明的光学系统设置有用于实现基本圆周分布或基本上径向分布作为透镜孔径中的快轴分布的双折射元件，以及位于双折射元件后面并适于旋转偏振状态的旋转器 在镜头光圈。 双折射元件具有由单轴晶体材料制成的光学透明构件，其晶轴基本上与光学系统的光轴平行。 呈基本圆形极化状态的大致球形的光束入射到光学透明构件。

公开(公告)号：US20120002186A1

公开(公告)日：2012-01-05

申请号：US13229589

申请日：2011-09-09

申请人： Yasuhiro Omura ,  Takaya Okada ,  Hiroyuki Nagasaka

发明人： Yasuhiro Omura ,  Takaya Okada ,  Hiroyuki Nagasaka

IPC分类号： G03B27/54 ,  G02B3/02

CPC分类号： G03F7/70725 ,  G02B1/06 ,  G02B17/08 ,  G02B17/0892 ,  G02B21/33 ,  G03F7/702 ,  G03F7/70225 ,  G03F7/70341

摘要： An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).

摘要翻译： 具有例如反射折射和离轴结构的浸没投影光学系统减少了填充有液体（浸没液体）的图像空间的部分。 通过液体将第一平面的缩小图像投影到第二平面上的投影光学系统包括最靠近第二平面布置的折射光学元件（Lp）。 折射光学元件包括成形为在第二平面上相对于彼此垂直的两个轴向（XY轴）基本对称的发光表面（Lpb）。 发光表面具有与对应于折射光学元件的光入射表面（Lpa）的圆周的圆（40）的中心轴线（40a）基本重合的中心轴线（Lpba）。 发光面的中心轴线从光轴（AX）的两个轴向（Y轴）的一方偏心。

公开(公告)号：US07990609B2

公开(公告)日：2011-08-02

申请号：US12219866

申请日：2008-07-29

申请人： Yasuhiro Omura

发明人： Yasuhiro Omura

IPC分类号： G02B17/08 ,  G03B27/52 ,  G03B27/70

CPC分类号： G02B17/0812 ,  G02B13/22 ,  G02B17/0892 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70308

摘要： A catadioptric imaging optical system of a high numerical aperture in which various aberrations are properly corrected without using a reflection surface having an aspherical shape of high order or a reciprocal optical element. The catadioptric imaging optical system forms an image of a first plane on a second plane and includes a first imaging system for forming a first intermediate image of the first plane based on light from the first plane, a second imaging system having two concave reflection mirrors for forming a second intermediate image of the first plane based on light from the first intermediate image, and a third imaging system for forming a final image of the first plane on the second plane based on light from the second intermediate image. The two concave reflection mirrors have prolate spheroidal-shaped reflection surfaces.

摘要翻译： 一种高数值孔径的反折射成像光学系统，其中各种像差被适当地校正，而不使用具有高阶非球面形状的反射表面或可逆光学元件。 反射折射成像光学系统在第二平面上形成第一平面的图像，并且包括用于基于来自第一平面的光形成第一平面的第一中间图像的第一成像系统，具有两个凹面反射镜的第二成像系统 基于来自第一中间图像的光形成第一平面的第二中间图像;以及第三成像系统，用于基于来自第二中间图像的光在第二平面上形成第一平面的最终图像。 两个凹面反射镜具有长椭球形反射面​​。