公开(公告)号：US20100103561A1

公开(公告)日：2010-04-29

申请号：US12631697

申请日：2009-12-04

申请人： Yuichiro Yamazaki

发明人： Yuichiro Yamazaki

IPC分类号： G11B5/56

CPC分类号： G11B5/09 ,  G11B20/10009 ,  G11B20/10046 ,  G11B20/10296 ,  G11B20/10481 ,  G11B20/1258 ,  G11B20/18 ,  G11B2220/2516

摘要： According to one embodiment, a storage device includes: ahead actuator configured to move a head to an arbitrary position on a disk medium; a write/read module configured to write data to or read data from the disk medium using the head; an adjustment region selector configured to divide the disk medium into a plurality of regions in a circumferential direction, write test data to each of the regions, read the test data to measure signal quality of the each of the regions, compare the signal quality of the each of the regions, and select a parameter adjustment region; and a parameter adjustment module configured to adjust a parameter used for the write/read module to write data to and read data from the disk medium to an optimal value using the selected parameter adjustment region.

摘要翻译： 根据一个实施例，一种存储装置包括：前端致动器，被配置为将磁头移动到盘介质上的任意位置; 写/读模块，被配置为使用所述头将数据写入或从所述盘介质读取数据; 调整区域选择器，被配置为将盘介质沿周向划分成多个区域，将测试数据写入每个区域，读取测试数据以测量每个区域的信号质量，比较 每个区域，并选择参数调整区域; 以及参数调整模块，被配置为使用所选择的参数调整区域调整用于写入/读取模块的参数以将数据写入和从盘介质读取数据到最佳值。

公开(公告)号：US07592586B2

公开(公告)日：2009-09-22

申请号：US10543151

申请日：2004-01-27

申请人： Kenji Watanabe ,  Takeshi Murakami ,  Masahiro Hatakeyama ,  Yoshinao Hirabayashi ,  Tohru Satake ,  Nobuharu Noji ,  Yuichiro Yamazaki ,  Ichirota Nagahama

发明人： Kenji Watanabe ,  Takeshi Murakami ,  Masahiro Hatakeyama ,  Yoshinao Hirabayashi ,  Tohru Satake ,  Nobuharu Noji ,  Yuichiro Yamazaki ,  Ichirota Nagahama

IPC分类号： H01J37/28

CPC分类号： H01J37/32211 ,  G01N23/225 ,  H01J37/32357 ,  H01J2237/2441 ,  H01J2237/2446

摘要： An apparatus capable of detecting defects of a pattern on a sample with high accuracy and reliability and at a high throughput, and a semiconductor manufacturing method using the same are provided. The electron beam apparatus is a mapping-projection-type electron beam apparatus for observing or evaluating a surface of the sample by irradiating the sample with a primary electron beam and forming on a detector an image of reflected electrons emitted from the sample. An electron impact-type detector such as an electron impact-type CCD or an electron impact-type TDI is used as the detector for detecting the reflected electrons. The reflected electrons are selectively detected from an energy difference between the reflected electrons and secondary electrons emitted from the sample. To eliminate charge-up caused on the sample surface by irradiation with the primary electron beam, the surface of the sample is covered with a cover placed above the sample and a gas is supplied to the space above the sample covered with the cover. The gas is brought into contact with the sample surface to reduce charge-up on the sample surface.

摘要翻译： 提供了能够以高精度和可靠性以高产量检测样品上的图案的缺陷的装置，以及使用该缺陷的半导体制造方法。 电子束装置是用于通过用一次电子束照射样品来观察或评价样品的表面的映射投影型电子束装置，并在检测器上形成从样品发射的反射电子的图像。 作为检测反射电子的检测器，使用电子碰撞型CCD或电子碰撞型TDI等电子轰击型检测器。 从反射电子和从样品发射的二次电子之间的能量差选择性地检测反射电子。 为了通过照射一次电子束来消除样品表面上产生的电荷，样品的表面被放置在样品上方的盖子覆盖，并将气体供应到覆盖有覆盖物的样品上方。 气体与样品表面接触以减少样品表面的充电。

公开(公告)号：US20080173814A1

公开(公告)日：2008-07-24

申请号：US12068484

申请日：2008-02-07

申请人： Kenji Watanabe ,  Hirosi Sobukawa ,  Nobuharu Noji ,  Tohru Satake ,  Shoji Yoshikawa ,  Tsutomu Karimata ,  Mamoru Nakasuji ,  Masahiro Hatakeyama ,  Takeshi Murakami ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Takamitsu Nagai ,  Kazuyoshi Sugihara

发明人： Kenji Watanabe ,  Hirosi Sobukawa ,  Nobuharu Noji ,  Tohru Satake ,  Shoji Yoshikawa ,  Tsutomu Karimata ,  Mamoru Nakasuji ,  Masahiro Hatakeyama ,  Takeshi Murakami ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Takamitsu Nagai ,  Kazuyoshi Sugihara

IPC分类号： G01N23/00 ,  G21K5/04

CPC分类号： H01J37/28 ,  H01J37/224 ,  H01J37/244 ,  H01J2237/006 ,  H01J2237/20221 ,  H01J2237/2445 ,  H01J2237/2817

摘要： An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary electron optical system converges secondary electrons emitted from the sample. A detector converts the converged secondary electrons into an optical image through a fluorescent screen and focuses the image to a line sensor. A controller controls the charge transfer time of the line sensor at which the picked-up line image is transferred between each pair of adjacent pixel rows provided in the line sensor in association with the moving speed of a stage for moving the sample.

公开(公告)号：US07352195B2

公开(公告)日：2008-04-01

申请号：US11723591

申请日：2007-03-21

申请人： Kenji Watanabe ,  Tohru Satake ,  Nobuharu Noji ,  Takeshi Murakami ,  Tsutomu Karimata ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Atsushi Onishi

发明人： Kenji Watanabe ,  Tohru Satake ,  Nobuharu Noji ,  Takeshi Murakami ,  Tsutomu Karimata ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Atsushi Onishi

IPC分类号： G01N23/00

CPC分类号： G01R31/305

摘要： Provided is a sample observing method allowing for a detailed observation of a sample by using one and the same electron beam apparatus. The method uses an electron beam apparatus 1 comprising a primary optical system 10 serving for irradiating the electron beam onto the sample surface and a secondary optical system 30 serving for detecting secondary electrons emanating from said sample surface to form an image of the sample surface. The inspection is carried out on the sample surface, S, by irradiating the electron beam to the sample surface, and after the extraction of a defective region in the sample based on the inspection, the extracted defective region is once again applied with the irradiation of the electron beam so as to provide a magnification or a detailed observation of the defective region.

摘要翻译： 提供了通过使用同一电子束装置对样品进行详细观察的样本观察方法。 该方法使用电子束装置1，其包括用于将电子束照射到样品表面上的主要光学系统10和用于检测从所述样品表面发出的二次电子以形成样品表面的图像的二次光学系统30。 通过向样品表面照射电子束，在样品表面S上进行检查，并且在基于检查提取样品中的缺陷区域之后，再次施加提取的缺陷区域 电子束，以便提供缺陷区域的放大或详细观察。

公开(公告)号：US20080074772A1

公开(公告)日：2008-03-27

申请号：US11986179

申请日：2007-11-20

申请人： Nobuyoshi Yamasaki ,  Yuichiro Yamazaki

发明人： Nobuyoshi Yamasaki ,  Yuichiro Yamazaki

IPC分类号： G11B27/36 ,  G11B5/09 ,  G11B5/02 ,  G11B21/02

CPC分类号： G11B27/36 ,  G11B5/40 ,  G11B5/455 ,  G11B2220/2516

摘要： A magnetic recording and reproducing device comprising a magnetic head for writing data to a storage medium by write current, and a computing unit that has a program area for determining a value indicating a signal quality of data read from the recording medium, and a memory area for holding a first write current value which is a predetermined optimum value and a second write current value which is lower than the first write current value.

摘要翻译： 一种磁记录和再现装置，包括用于通过写入电流将数据写入存储介质的磁头;以及计算单元，具有用于确定指示从记录介质读取的数据的信号质量的值的程序区和存储区 用于保持作为预定最佳值的第一写入电流值和低于第一写入电流值的第二写入电流值。

公开(公告)号：US20080013824A1

公开(公告)日：2008-01-17

申请号：US11822970

申请日：2007-07-11

申请人： Shinji Yamaguchi ,  Koji Hashimoto ,  Yuichiro Yamazaki ,  Ichirota Nagahama

发明人： Shinji Yamaguchi ,  Koji Hashimoto ,  Yuichiro Yamazaki ,  Ichirota Nagahama

IPC分类号： G06K9/00

CPC分类号： G06T7/0004 ,  G01N21/9501 ,  G01N21/95607 ,  G01N2021/95676 ,  G06T7/33 ,  G06T2207/10056 ,  G06T2207/30148

摘要： According to an aspect of the invention, there is provided a defect inspection method of inspecting a defect of a patterned inspection object, the method including extracting a feature pattern having an alignable shape from one of pattern data and an image of the inspection object, and aligning a local area of the inspection object by using the feature pattern.

摘要翻译： 根据本发明的一个方面，提供了一种检查图案化检查对象的缺陷的缺陷检查方法，该方法包括从图案数据和检查对象的图像之一提取具有可对准形状的特征图案，以及 通过使用特征图案对准检查对象的局部区域。

公开(公告)号：US07212017B2

公开(公告)日：2007-05-01

申请号：US11019111

申请日：2004-12-22

申请人： Kenji Watanabe ,  Tohru Satake ,  Nobuharu Noji ,  Takeshi Murakami ,  Tsutomu Karimata ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Atsushi Onishi

发明人： Kenji Watanabe ,  Tohru Satake ,  Nobuharu Noji ,  Takeshi Murakami ,  Tsutomu Karimata ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Atsushi Onishi

IPC分类号： G01N23/00

CPC分类号： G01R31/305

摘要： Provided is a sample observing method allowing for a detailed observation of a sample by using one and the same electron beam apparatus. The method uses an electron beam apparatus 1 comprising a primary optical system 10 serving for irradiating the electron beam onto the sample surface and a secondary optical system 30 serving for detecting secondary electrons emanating from said sample surface to form an image of the sample surface. The inspection is carried out on the sample surface, S, by irradiating the electron beam to the sample surface, and after the extraction of a defective region in the sample based on the inspection, the extracted defective region is once again applied with the irradiation of the electron beam so as to provide a magnification or a detailed observation of the defective region.

摘要翻译： 提供了通过使用同一电子束装置对样品进行详细观察的样本观察方法。 该方法使用电子束装置1，其包括用于将电子束照射到样品表面上的主要光学系统10和用于检测从所述样品表面发出的二次电子以形成样品表面的图像的二次光学系统30。 通过向样品表面照射电子束，在样品表面S上进行检查，并且在基于检查提取样品中的缺陷区域之后，再次施加提取的缺陷区域 电子束，以便提供缺陷区域的放大或详细观察。

公开(公告)号：US07148479B2

公开(公告)日：2006-12-12

申请号：US11086212

申请日：2005-03-23

申请人： Atsushi Onishi ,  Yuichiro Yamazaki ,  Ichirota Nagahama

发明人： Atsushi Onishi ,  Yuichiro Yamazaki ,  Ichirota Nagahama

IPC分类号： H01J37/256

CPC分类号： H01J37/28 ,  G01N23/225 ,  H01J2237/057 ,  H01J2237/221 ,  H01J2237/2817

摘要： A defect inspection apparatus includes a charged particle beam source which emits a charged particle beam to illuminate the charged particle beam onto a sample as a primary beam; an image pickup which includes an imaging element having a light receiving face receiving at least one of a secondary charged particle, a reflective charged particle, and a back-scattered charged particle generated from the sample by the illumination of the primary beam and which outputs a signal indicating a state of the surface of the sample; a mapping projection system which maps/projects at least one of the secondary charged particle, the reflective charged particle, and the back-scattered charged particle as a secondary beam and which makes the beam to form an image on the light receiving face of the imaging element; a controller which adjusts a beam diameter of the primary beam in such a manner as to apply the beam to the sample with a size smaller than that of an imaging region as a target of review to scan the imaging region and which allows the image pickup to pick up a plurality of frame images; an image processor which processes the plurality of obtained frame images to prepare a review image; and a defect judgment unit which judges a defect of the sample based on the review image.

摘要翻译： 缺陷检查装置包括：带电粒子束源，其发射带电粒子束，以将带电粒子束照射到样品上作为主光束; 一种图像拾取器，其包括具有光接收面的成像元件，所述光接收面接收通过所述一次光束的照射从所述样品产生的二次带电粒子，反射带电粒子和反向散射带电粒子中的至少一个，并且输出 指示样品表面状态的信号; 映射投影系统，其将二次带电粒子，反射带电粒子和反向散射带电粒子中的至少一个作为次级光束进行映射/投影，并且使得该光束在成像的光接收面上形成图像 元件; 控制器，其以这样的方式调节主光束的光束直径，使得将光束以比成像区域的尺寸小的像素的尺寸施加到作为检查对象的扫描成像区域，并且允许图像拾取 拾取多个帧图像; 处理所述多个获得的帧图像以准备检查图像的图像处理器; 以及缺陷判定单元，其基于检查图像判断样本的缺陷。

公开(公告)号：US07081756B2

公开(公告)日：2006-07-25

申请号：US10933440

申请日：2004-09-03

申请人： Hiroyuki Hayashi ,  Yuichiro Yamazaki

发明人： Hiroyuki Hayashi ,  Yuichiro Yamazaki

IPC分类号： G01R31/08 ,  G01R31/26

CPC分类号： G01R31/307

摘要： A substrate inspection apparatus includes a first waveform measurer which acquires a first amplitude waveform that is the amplitude waveform of an AC voltage obtained from a semiconductor of a semiconductor substrate which is being inspected when an external AC power source is connected to the semiconductor and an AC voltage from the AC power source is applied to the semiconductor, the semiconductor substrate also having an interconnection that is supposed to be connected to the semiconductor; a second waveform measurer which is connectable to the interconnection of the semiconductor substrate and acquires a second amplitude waveform that is the amplitude waveform of a voltage in the interconnection when the AC voltage is applied to the semiconductor; and an evaluator which calculates the phase difference between the first amplitude waveform and the second amplitude waveform and extracts information on a defect of the semiconductor substrate on the basis of the thus-calculated phase difference.

摘要翻译： 基板检查装置包括：第一波形测量器，其获取作为当外部AC电源连接到半导体时被检查的半导体基板的半导体获得的AC电压的幅度波形的第一幅度波形，AC 来自交流电源的电压施加到半导体，半导体衬底也具有假定连接到半导体的互连; 第二波形测量器，其可连接到半导体衬底的互连，并且当AC电压被施加到半导体时获取作为互连中的电压的幅度波形的第二幅度波形; 以及评估器，其基于由此计算的相位差计算第一幅度波形和第二振幅波形之间的相位差，并提取关于半导体衬底的缺陷的信息。

公开(公告)号：US20050263701A1

公开(公告)日：2005-12-01

申请号：US11137473

申请日：2005-05-26

申请人： Ichirota Nagahama ,  Yuichiro Yamazaki ,  Atsushi Onishi

发明人： Ichirota Nagahama ,  Yuichiro Yamazaki ,  Atsushi Onishi

IPC分类号： G01N23/225 ,  G01N23/203 ,  G01R31/02 ,  G01R31/302 ,  G21K7/00 ,  H01J37/244 ,  H01J37/26 ,  H01J37/29 ,  H01L21/66

CPC分类号： H01J37/26 ,  H01J2237/04735 ,  H01J2237/1538

摘要： A substrate inspection method includes: generating an electron beam and irradiating the electron beam as a primary electron beam to a substrate as a specimen; inducing at least any of a secondary electron, a reflected electron and a backscattering electron which are emitted from the substrate receiving the primary electron beam, and magnifying and projecting the induced electron as a secondary electron beam so as to form an image of the secondary electron beam; a trajectory of the primary electron beam and a trajectory of the secondary electron beam having an overlapping space and space charge effect of the secondary electron beam occurring in the overlapping space, detecting the image of the secondary electron beam to output a signal representing a state of the substrate; and suppressing aberration caused by the space charge effect in the overlapping space.

摘要翻译： 基板检查方法包括：产生电子束并将作为一次电子束的电子束照射到作为检体的基板; 诱导从接收一次电子束的基板发射的二次电子，反射电子和后向散射电子中的任一种，并且将感应电子放大并投影为二次电子束，以形成二次电子的图像 光束; 一次电子束的轨迹和二次电子束的轨迹具有在重叠空间中发生的二次电子束的重叠空间和空间电荷效应，检测二次电子束的图像以输出表示二次电子束的状态的信号 基材; 并且抑制由重叠空间中的空间电荷效应引起的像差。