公开(公告)号：US20080013824A1

公开(公告)日：2008-01-17

申请号：US11822970

申请日：2007-07-11

申请人： Shinji Yamaguchi ,  Koji Hashimoto ,  Yuichiro Yamazaki ,  Ichirota Nagahama

发明人： Shinji Yamaguchi ,  Koji Hashimoto ,  Yuichiro Yamazaki ,  Ichirota Nagahama

IPC分类号： G06K9/00

CPC分类号： G06T7/0004 ,  G01N21/9501 ,  G01N21/95607 ,  G01N2021/95676 ,  G06T7/33 ,  G06T2207/10056 ,  G06T2207/30148

摘要： According to an aspect of the invention, there is provided a defect inspection method of inspecting a defect of a patterned inspection object, the method including extracting a feature pattern having an alignable shape from one of pattern data and an image of the inspection object, and aligning a local area of the inspection object by using the feature pattern.

摘要翻译： 根据本发明的一个方面，提供了一种检查图案化检查对象的缺陷的缺陷检查方法，该方法包括从图案数据和检查对象的图像之一提取具有可对准形状的特征图案，以及 通过使用特征图案对准检查对象的局部区域。

公开(公告)号：US07863580B2

公开(公告)日：2011-01-04

申请号：US11760235

申请日：2007-06-08

申请人： Masahiro Hatakeyama ,  Takeshi Murakami ,  Nobuharu Noji ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Satoshi Mori ,  Tsutomu Karimata ,  Yuichiro Yamazaki ,  Ichirota Nagahama

发明人： Masahiro Hatakeyama ,  Takeshi Murakami ,  Nobuharu Noji ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Satoshi Mori ,  Tsutomu Karimata ,  Yuichiro Yamazaki ,  Ichirota Nagahama

IPC分类号： G21K1/08 ,  H01J3/14 ,  H01J3/26

CPC分类号： H01J37/153 ,  H01J37/065 ,  H01J2237/061 ,  H01J2237/06375 ,  H01J2237/083 ,  H01J2237/1534 ,  H01J2237/24592 ,  H01J2237/28

摘要： An electron beam apparatus for providing an evaluation of a sample, such as a semiconductor wafer, that includes a micro-pattern with a minimum line width not greater than 0.1 μm with high throughput. A primary electron beam generated by an electron gun is irradiated onto a sample and secondary electrons emanating from the sample are formed into an image on a detector by an image projection optical system. An electron gun 61 has a cathode 1 and a drawing electrode 3, and an electron emission surface 1a of the cathode defines a concave surface. The drawing electrode 3 has a convex surface 3a composed of a partial outer surface of a second sphere facing the electron emission surface 1a of the cathode and an aperture 73 formed through the convex surface for passage of the electrons. An aberration correction optical apparatus comprises two identically sized multi-polar Wien filters arranged such that their centers are in alignment with a ¼ plane position and a ¾ plane position, respectively, along an object plane-image plane segment in the aberration correction optical apparatus, and optical elements having bidirectional focus disposed in an object plane position, an intermediate image-formation plane position and an image plane position, respectively, in the aberration correction optical apparatus.

摘要翻译： 一种用于提供诸如半导体晶片的样品的评估的电子束装置，其包括具有不大于0.1μm的最小线宽的微图案，具有高生产量。 由电子枪产生的一次电子束照射在样品上，从样品发出的二次电子通过图像投影光学系统形成检测器上的图像。 电子枪61具有阴极1和牵伸电极3，阴极的电子发射表面1a限定凹面。 拉制电极3具有由与阴极的电子发射表面1a相对的第二球体的局部外表面和由电子通过凸面形成的孔73构成的凸面3a。 像差校正光学装置包括两个相同尺寸的多极维纳滤光器，其布置成使得它们的中心分别沿着像差校正光学装置中的物平面图像平面段与¼平面位置和¾平面位置对准， 以及分别设置在像差校正光学装置中的物平面位置，中间图像形成面位置和像面位置的具有双向焦点的光学元件。

公开(公告)号：US20090072139A1

公开(公告)日：2009-03-19

申请号：US12289846

申请日：2008-11-05

申请人： Ichirota Nagahama ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Motosuke Miyoshi

发明人： Ichirota Nagahama ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Motosuke Miyoshi

IPC分类号： G01N23/00

CPC分类号： H01J37/28 ,  H01J2237/2817

摘要： A substrate inspection apparatus includes: an electron beam irradiation device which emits an electron beam and causes the electron beam to irradiate a substrate to be inspected as a primary beam; an electron beam detector which detects at least one of a secondary electron, a reflected electron and a backscattered electron that are generated from the substrate that has been irradiated by the electron beam, and which outputs a signal that forms a one-dimensional or two-dimensional image of a surface of the substrate; a mapping projection optical system which causes imaging of at least one of the secondary electron, the reflected electron and the backscattered electron on the electron beam detector as a secondary beam; and an electromagnetic wave irradiation device which generates an electromagnetic wave and causes the electromagnetic wave to irradiate a location on the surface of the substrate at which the secondary beam is generated.

摘要翻译： 基板检查装置包括：电子束照射装置，其发射电子束并使电子束照射待检查的基板作为主光束; 电子束检测器，其检测从已经被电子束照射的衬底产生的二次电子，反射电子和反向散射电子中的至少一个，并输出形成一维或二维的信号， 基板的表面的三维图像; 映射投影光学系统，其将二次电子，反射电子和背散射电子中的至少一个成像在电子束检测器上作为次级光束; 以及电磁波照射装置，其产生电磁波，并使电磁波照射到产生二次光束的基板的表面上的位置。

公开(公告)号：US07449691B2

公开(公告)日：2008-11-11

申请号：US11435128

申请日：2006-05-17

申请人： Masahiro Hatakeyama ,  Takeshi Murakami ,  Tohru Satake ,  Nobuharu Noji ,  Ichirota Nagahama ,  Yuichiro Yamazaki

发明人： Masahiro Hatakeyama ,  Takeshi Murakami ,  Tohru Satake ,  Nobuharu Noji ,  Ichirota Nagahama ,  Yuichiro Yamazaki

IPC分类号： G01N23/00

CPC分类号： H01J37/244 ,  G01N21/9501 ,  G03F1/84 ,  H01J37/285 ,  H01J2237/2441 ,  H01J2237/2446

摘要： A detecting apparatus for detecting a fine geometry on a surface of a sample, wherein an irradiation beam is irradiated against the sample placed in a different environment different from an atmosphere and a secondary radiation emanated from the sample is detected by a sensor, and wherein the sensor is disposed at an inside of the different environment, a processing device to process detection signals from the sensor is disposed at an outside of the different environment, and a transmission means transmits detection signals from the sensor to the processing device.

摘要翻译： 一种用于检测样品表面上的精细几何形状的检测装置，其中照射束照射放置在不同于大气的不同环境中的样品，并且由传感器检测从样品发出的二次辐射，并且其中 传感器设置在不同环境的内部，处理来自传感器的检测信号的处理装置设置在不同环境的外部，传输装置将检测信号从传感器传送到处理装置。

公开(公告)号：US20070235644A1

公开(公告)日：2007-10-11

申请号：US11806573

申请日：2007-06-01

申请人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Toshifumi Kimba ,  Hiroshi Sobukawa ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Ichirota Nagahama

发明人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Toshifumi Kimba ,  Hiroshi Sobukawa ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Ichirota Nagahama

IPC分类号： G01N23/00

CPC分类号： H01J29/70 ,  G01N23/225 ,  G01N23/2251 ,  G01N23/227 ,  H01J37/06 ,  H01J37/073 ,  H01J37/141 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/266 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L21/6719 ,  H01L21/67213

摘要： An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.

摘要翻译： 电子束检查装置包括：电子光学装置70，具有用于从电子束源向一个电子束照射物体的电子 - 光学系统;以及用于检测由电子束投射的二次电子图像的检测器， 光学系统; 用于相对于电子 - 光学系统保持和移动物体的平台系统50; 微型环境室20，用于向物体供应清洁气体，以防止灰尘与物体接触; 用于容纳平台装置的工作室31，工作室可控制为具有真空气氛; 设置在微环境室和工作室之间的至少两个装载室41,42适于独立控制以具有真空气氛; 以及用于通过装载室将物体传送到舞台系统的装载器60。

公开(公告)号：US20070200569A1

公开(公告)日：2007-08-30

申请号：US11723591

申请日：2007-03-21

申请人： Kenji Watanabe ,  Tohru Satake ,  Nobuharu Noji ,  Takeshi Murakami ,  Tsutomu Karimata ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Atsushi Onishi

发明人： Kenji Watanabe ,  Tohru Satake ,  Nobuharu Noji ,  Takeshi Murakami ,  Tsutomu Karimata ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Atsushi Onishi

IPC分类号： G01R31/305

CPC分类号： G01R31/305

摘要： Provided is a sample observing method allowing for a detailed observation of a sample by using one and the same electron beam apparatus. The method uses an electron beam apparatus 1 comprising a primary optical system 10 serving for irradiating the electron beam onto the sample surface and a secondary optical system 30 serving for detecting secondary electrons emanating from said sample surface to form an image of the sample surface. The inspection is carried out on the sample surface, S, by irradiating the electron beam to the sample surface, and after the extraction of a defective region in the sample based on the inspection, the extracted defective region is once again applied with the irradiation of the electron beam so as to provide a magnification or a detailed observation of the defective region.

公开(公告)号：US20070194232A1

公开(公告)日：2007-08-23

申请号：US11698132

申请日：2007-01-26

申请人： Ichirota Nagahama ,  Yuichiro Yamazaki ,  Atsushi Onishi

发明人： Ichirota Nagahama ,  Yuichiro Yamazaki ,  Atsushi Onishi

IPC分类号： G21K7/00

CPC分类号： H01J37/026 ,  H01J37/26 ,  H01J2237/0044 ,  H01J2237/0048

摘要： A substrate inspection apparatus includes: an electron gun which generates an electron beam to irradiate the electron beam to a substrate; an electron detection unit which detects at least one of a secondary electron, a reflection electron and a back scattering electron generated from a surface of the substrate by the irradiation of the electron beam to output signals constituting an image showing a state of the substrate surface; and a surface potential uniformizing unit which generates ions, and irradiates the ions to the substrate before the irradiation of the electron beam to uniformize a surface potential of the substrate.

摘要翻译： 基板检查装置包括：电子枪，其产生电子束以将电子束照射到基板; 电子检测单元，其通过电子束的照射检测从基板的表面产生的二次电子，反射电子和背散射电子中的至少一个，以输出构成表示基板表面的状态的图像的信号; 以及产生离子的表面电位均匀化单元，并且在照射电子束之前将离子照射到基板上以使基板的表面电位均匀化。

公开(公告)号：US20050199807A1

公开(公告)日：2005-09-15

申请号：US11019111

申请日：2004-12-22

申请人： Kenji Watanabe ,  Tohru Satake ,  Nobuharu Noji ,  Takeshi Murakami ,  Tsutomu Karimata ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Atsushi Onishi

发明人： Kenji Watanabe ,  Tohru Satake ,  Nobuharu Noji ,  Takeshi Murakami ,  Tsutomu Karimata ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Atsushi Onishi

IPC分类号： G01N23/00 ,  G01R31/305 ,  G21K7/00

CPC分类号： G01R31/305

摘要： Provided is a sample observing method allowing for a detailed observation of a sample by using one and the same electron beam apparatus. The method uses an electron beam apparatus 1 comprising a primary optical system 10 serving for irradiating the electron beam onto the sample surface and a secondary optical system 30 serving for detecting secondary electrons emanating from said sample surface to form an image of the sample surface. The inspection is carried out on the sample surface, S, by irradiating the electron beam to the sample surface, and after the extraction of a defective region in the sample based on the inspection, the extracted defective region is once again applied with the irradiation of the electron beam so as to provide a magnification or a detailed observation of the defective region.

摘要翻译： 提供了通过使用同一电子束装置对样品进行详细观察的样本观察方法。 该方法使用电子束装置1，其包括用于将电子束照射到样品表面上的主要光学系统10和用于检测从所述样品表面发出的二次电子以形成样品表面的图像的二次光学系统30。 通过向样品表面照射电子束，在样品表面S上进行检查，并且在基于检查提取样品中的缺陷区域之后，再次施加提取的缺陷区域 电子束，以便提供缺陷区域的放大或详细观察。

公开(公告)号：US06909092B2

公开(公告)日：2005-06-21

申请号：US10437889

申请日：2003-05-15

申请人： Ichirota Nagahama ,  Yuichiro Yamazaki ,  Kenji Watanabe ,  Masahiro Hatakeyama ,  Tohru Satake ,  Nobuharu Noji

发明人： Ichirota Nagahama ,  Yuichiro Yamazaki ,  Kenji Watanabe ,  Masahiro Hatakeyama ,  Tohru Satake ,  Nobuharu Noji

IPC分类号： G01N23/225 ,  G01K1/08 ,  G01N23/00 ,  G01Q30/04 ,  G21K7/00 ,  H01J37/05 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  H01J37/285 ,  H01J37/29 ,  H01L21/66

CPC分类号： H01J37/28 ,  H01J2237/0044 ,  H01J2237/2817

摘要： A defect inspecting apparatus is provided for generating a less distorted test image to reliably observe a surface of a sample for detecting defects thereon. The defect detecting apparatus comprises a primary electron beam source for irradiating a sample, electrostatic lenses for focusing secondary electrons emitted from the surface of the sample irradiated with the primary electron beam, a detector for detecting the secondary electrons, and an image processing unit for processing a signal from the detector. Further, a second electron source may be provided for emitting an electron beam irradiated to the sample, wherein the sample may be irradiated with the electron beam from the second electron source before it is irradiated with the primary electron beam from the first electron source for observing the sample. A device manufacturing method is also provided for inspecting devices under processing with high throughput using the defect detecting apparatus.

摘要翻译： 提供了一种缺陷检查装置，用于产生较小失真的测试图像，以可靠地观察用于检测缺陷的样品表面。 缺陷检测装置包括用于照射样品的一次电子束源，用于聚焦从一次电子束照射的样品的表面发射的二次电子的静电透镜，用于检测二次电子的检测器，以及用于处理的图像处理单元 来自检测器的信号。 此外，可以提供第二电子源用于发射照射到样品的电子束，其中在用来自第一电子源的一次电子束照射之前，可以用来自第二电子源的电子束照射样品，用于观察 例子。 还提供了一种装置制造方法，用于使用缺陷检测装置以高吞吐量检查处理装置。

公开(公告)号：US08035082B2

公开(公告)日：2011-10-11

申请号：US12580505

申请日：2009-10-16

申请人： Yuichiro Yamazaki ,  Ichirota Nagahama

发明人： Yuichiro Yamazaki ,  Ichirota Nagahama

IPC分类号： H01J37/244

CPC分类号： G01N23/2251 ,  H01J37/05 ,  H01J37/28 ,  H01J2237/057

摘要： A sample is evaluated at a high throughput by reducing axial chromatic aberration and increasing the transmittance of secondary electrons. Electron beams emitted from an electron gun 1 are irradiated onto a sample 7 through a primary electro-optical system, and electrons consequently emitted from the sample are detected by a detector 12 through a secondary electro-optical system. A Wien filter 8 comprising a multi-pole lens for correcting axial chromatic aberration is disposed between a magnification lens 10 in the secondary electro-optical system and a beam separator 5 for separating a primary electron beam and a secondary electron beam, for correcting axial chromatic aberration caused by an objective lens 14 which comprises an electromagnetic lens having a magnetic gap defined on a sample side.

摘要翻译： 通过减少轴向色差并增加二次电子的透射率，以高产量来评估样品。 从电子枪1发射的电子束通过初级电光系统照射到样品7上，由检测器12通过次级电光学系统检测从样品发射的电子。 包括用于校正轴向色差的多极透镜的维恩滤波器8设置在二次电光学系统中的放大透镜10和用于分离一次电子束和二次电子束的光束分离器5之间，用于校正轴向色度 由物镜14引起的像差包括具有限定在样品侧的磁隙的电磁透镜。