公开(公告)号：US09575416B2

公开(公告)日：2017-02-21

申请号：US14419910

申请日：2013-08-02

Applicant: ASML Netherlands B.V.

Inventor： Engelbertus Antonius Fransiscus Van Der Pasch ,  Ruud Antonius Catharina Maria Beerens ,  Martinus Agnes Willem Cuijpers ,  Christiaan Alexander Hoogendam ,  Fransiscus Mathijs Jacobs ,  Willem Herman Gertruda Anna Koenen ,  Erik Roelof Loopstra

IPC: G03F7/20

CPC classification number: G03F7/70483 ,  G03F7/70725 ,  G03F7/70775

Abstract: A lithographic apparatus including a moveable object (WT) and a displacement measuring system arranged to determine a position quantity of the moveable object. The displacement measuring system includes an encoder (BC) and a grid structure. One of the encoder and the grid structure is connected to the moveable object. The grid structure includes a high precision grid portion (HG) and a low precision grid portion (LG). The encoder is arranged to cooperate with the high precision grid portion to determine the position quantity relative to the grid structure with a high precision. The encoder is arranged to cooperate with the low precision grid portion to determine the position quantity relative to the grid structure with a low precision.

Abstract translation: 一种光刻设备，包括可移动物体（WT）和位移测量系统，其布置成确定可移动物体的位置量。 位移测量系统包括编码器（BC）和网格结构。 编码器和网格结构之一连接到可移动对象。 栅格结构包括高精度栅格部分（HG）和低精度栅格部分（LG）。 编码器配置成与高精度格栅部分配合，以高精度确定相对于格栅结构的位置量。 编码器配置成与低精度格栅部分配合，以较低精度确定相对于格栅结构的位置数量。

公开(公告)号：US09529277B2

公开(公告)日：2016-12-27

申请号：US14657772

申请日：2015-03-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Steven Christiaan Westerlaken ,  Gerardus Arnoldus Hendricus Franciscus Janssen ,  Peter Paul Steijaert ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Franciscus Van De Mast

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/70341 ,  G03F7/70608 ,  G03F7/70683 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70908

Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.

公开(公告)号：US09410796B2

公开(公告)日：2016-08-09

申请号：US13687524

申请日：2012-11-28

Applicant: ASML Netherlands B.V.

Inventor： Ruud Antonius Catharina Maria Beerens ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Theodorus Petrus Maria Cadee ,  Raymond Wilhelmus Louis Lafarre

IPC: G03F7/20 ,  G01B11/14

CPC classification number: G01B11/14 ,  G03F7/70008 ,  G03F7/70775

Abstract: A displacement measurement system comprising at least one retro reflector and a diffraction grating. Said displacement measurement system is constructed and arranged to measure a displacement by providing a first beam of radiation to the measurement system, wherein the diffraction grating is arranged to diffract the first beam of radiation a first time to form diffracted beams. The at least one retro reflector is arranged to subsequently redirect the diffracted beams to diffract a second time on the diffraction grating. The at least one retro reflector is arranged to redirect the diffraction beams to diffract at least a third time on the diffraction grating before the diffracted beams are being recombined to form a second beam. And the displacement system is provided with a sensor configured to receive the second beam and determine the displacement from an intensity of the second beam.

Abstract translation: 一种位移测量系统，包括至少一个回射反射器和衍射光栅。 所述位移测量系统被构造和布置成通过向测量系统提供第一辐射束来测量位移，其中衍射光栅被布置成第一次衍射第一辐射束以形成衍射光束。 所述至少一个回射反射器被布置成随后重定向衍射光束以在衍射光栅上第二次衍射。 所述至少一个回射反射器被布置成在衍射光束被重新组合以形成第二光束之前将衍射光束重定向至少在衍射光栅上衍射至少三次。 并且位移系统设置有被配置为接收第二光束并且从第二光束的强度确定位移的传感器。

公开(公告)号：US09268211B2

公开(公告)日：2016-02-23

申请号：US14038533

申请日：2013-09-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Van Eijk ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen

IPC: G03F1/44 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F1/44 ,  G03B27/42 ,  G03F7/704 ,  G03F7/70516 ,  G03F7/70775 ,  G03F7/7085

Abstract: The invention relates to a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate support constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and an encoder-type measurement system configured to at least during projection of the patterned radiation beam onto a target portion of the substrate continuously determine a position quantity of a patterning device supported on the patterning device support using a grid or grating provided on the patterning device.

公开(公告)号：US09229340B2

公开(公告)日：2016-01-05

申请号：US14036991

申请日：2013-09-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Engelbertus Antonius Fransiscus Van Der Pasch ,  Joost Jeroen Ottens ,  Emiel Jozef Melanie Eussen ,  Johannes Henricus Wilhelmus Jacobs ,  William Peter Van Drent ,  Frank Staals ,  Lukasz Jerzy Macht ,  Erik Willem Bogaart

IPC: G03B27/58 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/70833 ,  G03F7/709

Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.

公开(公告)号：US20150227060A1

公开(公告)日：2015-08-13

申请号：US14423405

申请日：2013-08-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Ruud Antonius Catharina Maria Beerens ,  Rob Johan Theodoor Rutten ,  Jan Steven Christiaan Westerlaken ,  Koen Jacobus Johannes Maria Zaal ,  Richard Henricus Adrianus Van Lieshout ,  Engelbertus Antonius Fransiscus Van Der Pasch

IPC: G03F7/20 ,  G01D5/34

CPC classification number: G03F7/70725 ,  G01D5/34 ,  G01D5/38 ,  G03F7/70775 ,  G03F7/70933

Abstract: A stage system includes a movable stage, and an encoder for measuring a position of the stage, wherein the encoder includes an emitter for emitting an encoder beam, a grating for interacting with the encoder beam, and a detector for detecting the encoder beam having interacted with the grating, the encoder beam in use propagating along an optical path; a purging cap at least partly enclosing the optical path; and a purging medium supply device for supplying a purging medium into the purging cap.

Abstract translation: 舞台系统包括可移动舞台和用于测量舞台位置的编码器，其中编码器包括用于发射编码器光束的发射器，用于与编码器光束相互作用的光栅，以及用于检测具有相互影响的编码器光束的检测器 利用光栅，编码器光束在使用中沿光路传播; 至少部分地包围光路的清洗盖; 以及用于将清洗介质供给到清洗盖中的清洗介质供给装置。