公开(公告)号：US07588868B2

公开(公告)日：2009-09-15

申请号：US10971350

申请日：2004-10-22

申请人： Franz X. Zach ,  Abdurrahman Sezginer ,  Gokhan Percin

发明人： Franz X. Zach ,  Abdurrahman Sezginer ,  Gokhan Percin

IPC分类号： G03F9/00 ,  G03C5/00

CPC分类号： G03B27/72 ,  G03F7/70441 ,  G03F7/70558 ,  G03F7/70625 ,  G03F7/70641

摘要： First and second exposures of a mask onto a wafer are performed such that the exposure field of the second exposure partially overlaps the exposure field of the first exposure. A characteristic of a set of features is determined, and a value of a parameter of an optical proximity correction model is determined. An alignment feature can be used to align a measurement tool. In yet another embodiment, pupil intensity distribution of an imaging system is measured by exposing an image field of a radiation detector with a bright feature, positioning the detector at a distance away from the image plane, and exposing the image field of the detector with a bright feature, resulting in a cumulative exposure of the image field of the detector from the two exposures. A characteristic of a spatial pattern in the cumulative exposure of the image field of the detector is then determined.

摘要翻译： 进行掩模在晶片上的第一曝光和第二曝光，使得第二曝光的曝光场部分地与第一曝光的曝光场重叠。 确定一组特征的特征，并且确定光学邻近校正模型的参数的值。 对齐功能可用于对齐测量工具。 在另一个实施例中，成像系统的光瞳强度分布是通过用明亮特征曝光放射线检测器的图像场，将检测器定位在距离图像平面一定距离处，并且将检测器的图像场用 明亮的特征，导致来自两次曝光的检测器的图像场的累积曝光。 然后确定检测器的图像场的累积曝光中的空间图案的特性。

公开(公告)号：US07568174B2

公开(公告)日：2009-07-28

申请号：US11504928

申请日：2006-08-16

申请人： Abdurrahman Sezginer ,  Bayram Yenikaya

发明人： Abdurrahman Sezginer ,  Bayram Yenikaya

IPC分类号： G06F17/50

CPC分类号： G03F7/70441 ,  G03F1/36 ,  G03F7/705

摘要： A technique for determining, without having to perform optical proximity correction, when the result of optical proximity correction will fail to meet the design requirements for printability. A disclosed embodiment has application to a process for producing a photomask for use in the printing of a pattern on a wafer by exposure with optical radiation to optically image the photomask on the wafer. A method is set forth for checking the printability of a target layout proposed for defining the photomask, including the following steps: deriving a system of inequalities that expresses a set of design requirements with respect to the target layout; and checking the printability of the target layout by determining whether the system of inequalities is feasible.

摘要翻译： 当光学邻近校正的结果不能满足可印刷性的设计要求时，确定无需进行光学邻近校正的技术。 所公开的实施例应用于制造光掩模的方法，该光掩模用于通过用光辐射曝光来在晶片上印刷图案以将晶片上的光掩模光学成像。 提出了一种用于检查建议用于定义光掩模的目标布局的可印刷性的方法，包括以下步骤：导出表示相对于目标布局的一组设计要求的不等式系统; 并通过确定不等式系统是否可行来检查目标布局的可印刷性。

公开(公告)号：US07506300B2

公开(公告)日：2009-03-17

申请号：US11203522

申请日：2005-08-13

申请人： Abdurrahman Sezginer ,  Roy Prasad

发明人： Abdurrahman Sezginer ,  Roy Prasad

IPC分类号： G06F17/50

CPC分类号： G06F17/5068 ,  G03F1/36 ,  G03F7/70291 ,  G03F7/70441

摘要： A method of modifying polygons in a data set mask-less or mask based optical projection lithography includes: 1) mapping the data set to a figure-of-demerit; 2) moving individual polygon edges to decrease the figure-of-demerit; and 3) disrupting the set of polygons to enable a further decrease in the figure-of-demerit, wherein disrupting polygons includes any of the following polygon disruptions: breaking up, merging, or deleting polygons.

摘要翻译： 一种在数据集无掩模或基于掩模的光学投影光刻中修改多边形的方法包括：1）将数据集映射到数字图; 2）移动单个多边形边缘以减少缺点; 并且3）中断多边形集合以使得进一步减少数字，其中中断的多边形包括以下任何多边形中断：分解，合并或删除多边形。

公开(公告)号：US07444615B2

公开(公告)日：2008-10-28

申请号：US11139551

申请日：2005-05-31

申请人： Gokhan Percin ,  Ram S. Ramanujam ,  Franz X. Zach ,  Abdurrahman Sezginer ,  Chi-Song Horng ,  Roy Prasad

发明人： Gokhan Percin ,  Ram S. Ramanujam ,  Franz X. Zach ,  Abdurrahman Sezginer ,  Chi-Song Horng ,  Roy Prasad

IPC分类号： G06F17/50

CPC分类号： G03F7/70441 ,  G03F1/36 ,  G03F1/44 ,  G03F1/68

摘要： A method for generating an OPC model is provided which takes into consideration across-wafer variations which occur during the process of manufacturing semiconductor chips. More particularly, a method for generating an OPC model is provided which takes into consideration across-wafer variations which occur during the process of manufacturing semiconductor chips based on the parameters of test patterns measured at the “wafer sweet spots” so as to arrive at an accurate model.

摘要翻译： 提供了一种产生OPC模型的方法，其考虑了在制造半导体芯片的过程中发生的跨晶片变化。 更具体地，提供了一种用于生成OPC模型的方法，其考虑了在基于在“晶片甜点”处测量的测试图案的参数的制造半导体芯片的过程期间发生的跨晶片变化，以便到达 准确模型。

公开(公告)号：US07289219B2

公开(公告)日：2007-10-30

申请号：US11105099

申请日：2005-04-13

申请人： Adam E. Norton ,  Abdurrahman Sezginer ,  Fred E. Stanke

发明人： Adam E. Norton ,  Abdurrahman Sezginer ,  Fred E. Stanke

IPC分类号： G01N21/55 ,  G01J4/00

CPC分类号： G01B11/02 ,  G01J3/02 ,  G01J3/0294 ,  G01N21/211 ,  G01N21/25 ,  G01N21/474 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/213

摘要： An optical measurement system for evaluating a sample has a motor-driven rotating mechanism coupled to an azimuthally rotatable measurement head, allowing the optics to rotate with respect to the sample. A polarimetric scatterometer, having optics directing a polarized illumination beam at non-normal incidence onto a periodic structure on a sample, can measure optical properties of the periodic structure. An E-O modulator in the illumination path can modulate the polarization. The head optics collect light reflected from the periodic structure and feed that light to a spectrometer for measurement. A beamsplitter in the collection path can ensure both S and P polarization from the sample are separately measured. The measurement head can be mounted for rotation of the plane of incidence to different azimuthal directions relative to the periodic structures. The instrument can be integrated within a wafer process tool in which wafers may be provided at arbitrary orientation.

摘要翻译： 用于评估样品的光学测量系统具有耦合到方位角可旋转测量头的电动机旋转机构，允许光学器件相对于样品旋转。 具有将非正常入射的偏振照明光束引导到样品上的周期性结构上的光学偏振散射仪可以测量周期性结构的光学性质。 照明路径中的E-O调制器可以调制偏振。 头部光学器件收集从周期性结构反射的光并将光馈送到光谱仪进行测量。 收集路径中的分束器可以确保来自样品的S和P极化分别测量。 测量头可以安装成相对于周期性结构使入射平面旋转到不同的方位角方向。 仪器可以集成在晶片工艺工具中，其中可以以任意取向提供晶片。

公开(公告)号：US07189481B2

公开(公告)日：2007-03-13

申请号：US10933090

申请日：2004-09-01

申请人： Bo Wu ,  Abdurrahman Sezginer ,  Franz X. Zach

发明人： Bo Wu ,  Abdurrahman Sezginer ,  Franz X. Zach

IPC分类号： G03F9/00

CPC分类号： G03F7/70941 ,  G03F1/44 ,  G03F7/70591

摘要： Flare of an imaging system is measured using resist by employing the imaging system to directly expose a first part of the resist at an image plane of the imaging system to a first dose of radiation and to indirectly expose a second part of the resist as a result of flare. The imaging system exposes the second part of the resist to a second dose of radiation. Flare of the imaging system is determined from a pattern that is formed in the second part of the resist.

摘要翻译： 使用抗蚀剂通过使用成像系统将成像系统的图像平面处的抗蚀剂的第一部分直接暴露于第一剂量的辐射并且间接暴露抗蚀剂的第二部分来测量成像系统的耀斑，结果 的耀斑。 成像系统将抗蚀剂的第二部分暴露于第二剂量的辐射。 从形成在抗蚀剂的第二部分的图案确定成像系统的光斑。

公开(公告)号：US20060268254A1

公开(公告)日：2006-11-30

申请号：US11141803

申请日：2005-05-31

申请人： Gokhan Percin ,  Abdurrahman Sezginer ,  Franz Zach

发明人： Gokhan Percin ,  Abdurrahman Sezginer ,  Franz Zach

IPC分类号： G03B27/72

CPC分类号： G03F7/7025 ,  G03F7/70591

摘要： An apparatus and method for characterizing an illumination pupil of an exposure tool comprises forming a plurality of pinhole test patterns at a plurality of test site locations to facilitate locating test pattern edges for extracting therefrom the illumination pupil characteristics of the exposure tool.

摘要翻译： 用于表征曝光工具的照明光瞳的装置和方法包括在多个测试位置处形成多个针孔测试图案，以便于定位测试图案边缘以从其中提取曝光工具的照明光瞳特性。

公开(公告)号：US07095496B2

公开(公告)日：2006-08-22

申请号：US10317898

申请日：2002-12-12

申请人： Abdurrahman Sezginer ,  Kenneth Johnson ,  Adam E. Norton ,  Holger A. Tuitje

发明人： Abdurrahman Sezginer ,  Kenneth Johnson ,  Adam E. Norton ,  Holger A. Tuitje

IPC分类号： G01N21/88

CPC分类号： G01N21/9501 ,  G01N21/274 ,  G01N21/278 ,  G01N21/93

摘要： A calibration method suitable for highly precise and highly accurate surface metrology measurements is described. In preferred embodiments, an optical inspection tool including a movable optics system is characterized in terms of position and wavelength dependent quantities over a range of motion. Once the position-dependant quantities are determined at various wavelengths and positions, they are stored and used to interpret data from test wafers having an unknown metrology. Free of position-dependent variations and other information pertaining to the measurement system, the accuracy of the resulting wafer measurement more closely matches the precision of the tool than existing techniques. In particular embodiments, a portion of the characterization of the optical system is accomplished by using tilted black glass to provide a non-reflective reference.

公开(公告)号：US07088451B2

公开(公告)日：2006-08-08

申请号：US11256764

申请日：2005-10-24

申请人： Abdurrahman Sezginer

发明人： Abdurrahman Sezginer

IPC分类号： G01B9/02

CPC分类号： G01B9/0201 ,  G01B9/02044 ,  G01B9/02069 ,  G01B9/02088 ,  G01B9/0209 ,  G01B11/0675 ,  G01B2210/56 ,  G01B2290/70 ,  G01J3/453

摘要： A phase-sensitive interferometric broadband reflectometer includes an illumination source for generating an optical beam. A beam splitter or other optical element splits the optical beam into probe beam and reference beam portions. The probe beam is reflected by a subject under test and then rejoined with the reference beam. The combination of the two beams creates an interference pattern that may be modulated by changing the length of the path traveled by the probe or reference beams. The combined beam is received and analyzed by a spectrometer.

摘要翻译： 相敏干涉测量宽带反射计包括用于产生光束的照明源。 分束器或其他光学元件将光束分成探测光束和参考光束部分。 探测光束被被测物体反射，然后用参考光束重新连接。 两个光束的组合产生干涉图案，其可以通过改变由探针或参考光束行进的路径的长度来调制。 组合光束由光谱仪接收和分析。

公开(公告)号：US06919724B2

公开(公告)日：2005-07-19

申请号：US10240646

申请日：2001-03-29

申请人： Philip Cheung ,  Andrew Hayman ,  Dennis Pittman ,  Abdurrahman Sezginer

发明人： Philip Cheung ,  Andrew Hayman ,  Dennis Pittman ,  Abdurrahman Sezginer

IPC分类号： G01V3/24 ,  G01V3/18

CPC分类号： G01V3/24

摘要： The present invention relates to a method of investigating the wall (2) of a borehole in a geological formation by means of two injectors (4, 5) with a potential V being applied between them and in measuring the potential difference δV between two electrically isolated measurement electrodes (6) situated between the two injectors (4, 5) and spaced apart from the formation by an insulating layer (1), in which the resistivity of the formation is obtained from the measured values of δV, V and I, with corrections being made for the effects due to the nature and the thickness of the insulating layer (1). In a first variant these corrections are based on a correction factor obtained from curves of K=Rt.I/δV as a function of the impedance V/I of the injector. In a second variant these corrections are obtained by estimating the current IF actually injected into the formation while taking account of leakage current IL, and calculating the resistivity of the formation from the equation (I). The invention also provides an investigation device enabling the values of IF and/or IL to be estimated. Rt = k c ⁢ δ ⁢   ⁢ V I F = k c ⁢ δ ⁢   ⁢ V I - I L ( I )