公开(公告)号：US06846750B1

公开(公告)日：2005-01-25

申请号：US09604724

申请日：2000-06-28

申请人： Tokuhisa Ohiwa ,  Shoji Seta ,  Nobuo Hayasaka ,  Katsuya Okumura ,  Akihiro Kojima ,  Junko Ohuchi ,  Tsukasa Azuma ,  Hideo Ichinose ,  Ichiro Mizushima

发明人： Tokuhisa Ohiwa ,  Shoji Seta ,  Nobuo Hayasaka ,  Katsuya Okumura ,  Akihiro Kojima ,  Junko Ohuchi ,  Tsukasa Azuma ,  Hideo Ichinose ,  Ichiro Mizushima

IPC分类号： H01L21/302 ,  H01L21/033 ,  H01L21/30 ,  H01L21/306 ,  H01L21/3065 ,  H01L21/311 ,  H01L21/316 ,  H01L21/768 ,  H01L21/461

CPC分类号： H01L21/76802 ,  H01L21/0331 ,  H01L21/31111 ,  H01L21/31116 ,  H01L21/31604 ,  H01L21/31616 ,  H01L21/76816 ,  H01L21/7682

摘要： According to the present invention, there is provided a method of manufacturing a semiconductor device, where a soluble thin film which is soluble in a dissolving liquid is used. According to the method of the present invention, when a soluble thin film is formed between a film to be processed which should be patterned and a mask pattern, it becomes possible to remove the mask pattern by lifting-off. On the other hand, when the thin film is used for a dummy layer for forming an air wiring structure, the dummy layer can be removed without performing ashing using oxygen plasma.

摘要翻译： 根据本发明，提供一种制造半导体器件的方法，其中使用可溶于溶解液的可溶性薄膜。 根据本发明的方法，当在要被图案化的被处理膜和掩模图案之间形成可溶性薄膜时，可以通过剥离来去除掩模图案。 另一方面，当薄膜用于形成空气布线结构的虚拟层时，可以去除虚拟层而不用氧等离子体进行灰化。

公开(公告)号：US5759746A

公开(公告)日：1998-06-02

申请号：US653426

申请日：1996-05-24

申请人： Tsukasa Azuma ,  Tokuhisa Ohiwa ,  Tetsuo Matsuda ,  David M. Dobuzinsky ,  Katsuya Okumura

发明人： Tsukasa Azuma ,  Tokuhisa Ohiwa ,  Tetsuo Matsuda ,  David M. Dobuzinsky ,  Katsuya Okumura

IPC分类号： G03F7/11 ,  G03F7/09 ,  H01L21/027 ,  G03F7/26

CPC分类号： G03F7/091 ,  H01L21/0276 ,  Y10S430/151 ,  Y10S438/945 ,  Y10S438/95

摘要： A fabrication process includes a step of providing a substrate to be fabricated. A multi-layer antireflective layer is then formed on the substrate. A patterned resist having a thickness less than 850 nanometers is formed on the multi-layer antireflective layer and the substrate is fabricated using the patterned resist as a mask.

摘要翻译： 制造工艺包括提供待制造的基板的步骤。 然后在基板上形成多层抗反射层。 在多层抗反射层上形成厚度小于850纳米的图案化抗蚀剂，并使用图案化的抗蚀剂作为掩模制造基板。

公开(公告)号：US5487082A

公开(公告)日：1996-01-23

申请号：US243736

申请日：1994-05-17

申请人： Tomoo Takenouchi ,  Yoshiaki Ichinomiya ,  Junji Ishizaka ,  Junji Itagaki ,  Shuzo Ohhashi ,  Tsukasa Azuma ,  Yasuhiko Tanaka

发明人： Tomoo Takenouchi ,  Yoshiaki Ichinomiya ,  Junji Ishizaka ,  Junji Itagaki ,  Shuzo Ohhashi ,  Tsukasa Azuma ,  Yasuhiko Tanaka

IPC分类号： C22B9/18 ,  H05B3/60

CPC分类号： C22B9/18 ,  Y10T29/4932

摘要： A process for producing a turbine rotor using an ingot in which segregation is prevented effectively when ESR is used to produce a large-sized ingot. A hole is formed along an axial direction in the core of an electrode. The molten pool is made shallow and flat and segregation is prevented from occurring. Consequently, an ESR ingot of good quality offering an excellent surface is obtainable as it is free from segregation. Moreover, an electrode melting rate is increased and efficiency is improved so that a high quality turbine can be manufactured from the ingot.

摘要翻译： 一种使用铸锭制造涡轮转子的方法，其中当ESR用于生产大型锭时，其中有效地防止了偏析。 在电极的芯部中沿着轴向形成有孔。 使熔池变浅而平坦，防止发生分离。 因此，可以获得具有优异表面的优质ESR锭，因为它没有分离。 此外，电极熔化速率提高并且效率提高，从而可以从锭制造高质量的涡轮机。