公开(公告)号：US20180001001A1

公开(公告)日：2018-01-04

申请号：US15201452

申请日：2016-07-03

申请人： Mengju Wu ,  Banqiu Wu

发明人： Mengju Wu ,  Banqiu Wu

IPC分类号： A61M1/06 ,  A61M39/10

CPC分类号： A61M1/064 ,  A61M39/10 ,  A61M2205/07 ,  A61M2205/3337 ,  A61M2205/3344 ,  A61M2205/50 ,  A61M2205/52 ,  A61M2209/088

摘要： A hands-free breast pump system uses an advanced air bag for excellent contact between the air bag and breast so that a vacuum near the nipple can be guaranteed. The breast pumping and non-pumping condition can be easily converted by inflation and deflation of air bag using a computer-controlled microsystem. These properties not only make breast-pumping hands-free, but also allows the wearer to keep her clothing and bra on. The automatic control of breast milk expression also realizes hands-free breast milk pumping in public or during sleep. The control of pump time and duration can be programmed in a program or in an app. The breast milk expression system can be used independently, or together with a bra, or a shirt. The system disclosed in this patent can also simulate breast milk expression by a real baby by using a pulsing pressure in the air bag, which can squeeze the nipple periodically according a predetermined program.

公开(公告)号：US20160286690A1

公开(公告)日：2016-09-29

申请号：US14672196

申请日：2015-03-29

申请人： Banqiu Wu ,  Ming Xu

发明人： Banqiu Wu ,  Ming Xu

IPC分类号： H05K7/20

CPC分类号： H05K7/2079 ,  H05K7/20772

摘要： A computer system using regular IC or 3D IC is cooled by using liquid coolants such as water, oil, and ionic liquid. Liquid coolant flows in a closed coolant conduit which is configured to thermally contact heat-generating components in a computer system and a large water body such as river and reservoir. The heat created in computer system is carried out by liquid coolant and dissipated to large water body. The cooling system is simple and cost-effective.

摘要翻译： 使用常规IC或3D IC的计算机系统通过使用液体冷却剂如水，油和离子液体来冷却。 液体冷却剂在封闭的冷却剂管道中流动，该冷却剂管道被配置为热接触计算机系统中的发热部件和诸如河流和水库的大型水体。 计算机系统产生的热量由液体冷却剂进行，并散发到大型水体。 冷却系统简单，性价比高。

公开(公告)号：US09439331B1

公开(公告)日：2016-09-06

申请号：US14672196

申请日：2015-03-29

申请人： Banqiu Wu ,  Ming Xu

发明人： Banqiu Wu ,  Ming Xu

IPC分类号： H05K7/20 ,  G06F1/20

CPC分类号： H05K7/2079 ,  H05K7/20772

摘要： A computer system using regular IC or 3D IC is cooled by using liquid coolants such as water, oil, and ionic liquid. Liquid coolant flows in a closed coolant conduit which is configured to thermally contact heat-generating components in a computer system and a large water body such as river and reservoir. The heat created in computer system is carried out by liquid coolant and dissipated to large water body. The cooling system is simple and cost-effective.

公开(公告)号：US09439330B1

公开(公告)日：2016-09-06

申请号：US14672198

申请日：2015-03-29

申请人： Banqiu Wu ,  Ming Xu

发明人： Banqiu Wu ,  Ming Xu

IPC分类号： H05K7/20 ,  G06F1/20

CPC分类号： H05K7/20772 ,  H05K7/2079

摘要： A computer system includes central processing units designed by using reduced instruction set computing (RISC) strategy, dynamic random access memory (DRAM) packages manufactured by using three-dimensional integrated circuit (3D IC) stacked using through-silicon via (TSV) stacking processes, and liquid cooling approach. The system has advantages of low power consumption, fast DRAM access rate, high performance, high cooling efficiency, small form factor, and low costs. Cooling liquid could be water, oil, and ionic liquid. The heat generated in 3D IC chips is carried out by liquid coolant and dissipated to heat exchanger where cooling water dissipates heat to large water body such as river, reservoir, or ocean. The computer disclosed in this invention is suitable to be a server for application in datacenter.

摘要翻译： 计算机系统包括通过使用精简指令集计算（RISC）策略设计的中央处理单元，使用通过使用硅通孔（TSV）堆叠处理堆叠的三维集成电路（3D IC）制造的动态随机存取存储器（DRAM）封装 ，和液体冷却方式。 该系统具有功耗低，DRAM访问速度快，性能高，冷却效率高，外形尺寸小，成本低等优点。 冷却液体可以是水，油和离子液体。 3D IC芯片产生的热量由液体冷却剂进行，并散发到热交换器，冷却水将热量散发到诸如河流，水库或海洋等大型水体。 本发明公开的计算机适合作为数据中心应用的服务器。

公开(公告)号：US08598016B2

公开(公告)日：2013-12-03

申请号：US13160973

申请日：2011-06-15

申请人： Madhava Rao Yalamanchili ,  Wei-Sheng Lei ,  Brad Eaton ,  Saravjeet Singh ,  Ajay Kumar ,  Banqiu Wu

发明人： Madhava Rao Yalamanchili ,  Wei-Sheng Lei ,  Brad Eaton ,  Saravjeet Singh ,  Ajay Kumar ,  Banqiu Wu

IPC分类号： H01L21/00

CPC分类号： H01L21/78 ,  B23K26/0624 ,  B23K26/364 ,  B23K26/40 ,  B23K2101/40 ,  B23K2103/172 ,  B23K2103/50 ,  H01L21/30655 ,  H01L21/3086 ,  H01L21/67207

摘要： Methods of dicing substrates by both laser scribing and plasma etching. A method includes forming an in-situ mask with a plasma etch chamber by accumulating a thickness of plasma deposited polymer to protect IC bump surfaces from a subsequent plasma etch. Second mask materials, such as a water soluble mask material may be utilized along with the plasma deposited polymer. At least some portion of the mask is patterned with a femtosecond laser scribing process to provide a patterned mask with trenches. The patterning exposing regions of the substrate between the ICs in which the substrate is plasma etched to singulate the IC and the water soluble material layer washed off.

摘要翻译： 通过激光划线和等离子体蚀刻来切割基板的方法。 一种方法包括通过累积等离子体沉积聚合物的厚度来形成具有等离子体蚀刻室的原位掩模，以保护IC凸起表面免于随后的等离子体蚀刻。 可以与等离子体沉积的聚合物一起使用第二掩模材料，例如水溶性掩模材料。 用飞秒激光划线工艺对掩模的至少一部分进行图案化以提供具有沟槽的图案化掩模。 在IC之间的衬底的图案化曝光区域中，其中衬底被等离子体蚀刻以分离IC和水溶性材料层被洗掉。

公开(公告)号：US20130224665A1

公开(公告)日：2013-08-29

申请号：US13762446

申请日：2013-02-08

申请人： Banqiu Wu ,  Ajay Kumar ,  Omkaram Nalamasu

发明人： Banqiu Wu ,  Ajay Kumar ,  Omkaram Nalamasu

IPC分类号： G03F7/16

CPC分类号： G03F7/16 ,  G03F7/0035 ,  G03F7/165 ,  G03F7/167

摘要： Methods and apparatus for performing an atomic layer deposition lithography process are provided in the present disclosure. In one embodiment, a method for forming features on a material layer in a device includes pulsing a first reactant gas mixture to a surface of a substrate disposed in a processing chamber to form a first monolayer of a material layer on the substrate surface, directing an energetic radiation to treat a first region of the first monolayer, and pulsing a second reactant gas mixture to the substrate surface to selectively form a second monolayer on a second region of the first monolayer.

摘要翻译： 在本公开中提供了用于执行原子层沉积光刻工艺的方法和装置。 在一个实施例中，用于在器件中的材料层上形成特征的方法包括将第一反应气体混合物脉动到设置在处理室中的衬底的表面，以在衬底表面上形成材料层的第一单层， 高能辐射以处理第一单层的第一区域，以及将第二反应气体混合物脉冲至衬底表面以在第一单层的第二区域上选择性地形成第二单层。

公开(公告)号：US20120103939A1

公开(公告)日：2012-05-03

申请号：US13276496

申请日：2011-10-19

申请人： Banqiu Wu ,  Ajay Kumar

发明人： Banqiu Wu ,  Ajay Kumar

IPC分类号： C23F1/00 ,  C23F1/08

CPC分类号： H01L21/0273 ,  H01J37/32192 ,  H01J37/3266 ,  H01J37/32678 ,  H01J2237/3343 ,  H01L21/31138

摘要： The present invention provides methods and an apparatus for controlling and modifying line width roughness (LWR) of a photoresist layer. In one embodiment, an apparatus for controlling a line width roughness of a photoresist layer disposed on a substrate includes a chamber body having a top wall, side wall and a bottom wall defining an interior processing region, a microwave power generator coupled to the to the chamber body through a waveguild, and one or more coils or magnets disposed around an outer circumference of the chamber body adjacent to the waveguide, and a gas source coupled to the waveguide through a gas delivery passageway.

摘要翻译： 本发明提供了控制和修改光致抗蚀剂层的线宽粗糙度（LWR）的方法和装置。 在一个实施例中，用于控制设置在基板上的光致抗蚀剂层的线宽粗糙度的装置包括具有顶壁，侧壁和限定内部处理区域的底壁的室主体，耦合到 并且一个或多个线圈或磁体设置在邻近波导的腔室主体的外圆周周围，气体源通过气体输送通道耦合到波导管。

公开(公告)号：US20090186282A1

公开(公告)日：2009-07-23

申请号：US12015984

申请日：2008-01-17

申请人： Banqiu Wu ,  Ajay Kumar

发明人： Banqiu Wu ,  Ajay Kumar

IPC分类号： G03F1/14 ,  H01J37/08

CPC分类号： G03F7/70916 ,  G03F7/70858

摘要： Embodiments of the present invention provide methods and apparatus for removing debris particles using a stream of charged species. One embodiment of the present invention provides an apparatus for removing debris particles from a beam of radiation comprising a charged species source configured to dispense electrically charged species, and a collecting plate biased electrically opposite to the charged species from the charged species source, wherein the collecting plate and the charged species source are disposed on opposite sides of the beam of radiation, a stream of charged species from the charged species source to the collecting plate intersects the beam of radiation, the stream of charged species is configured to attach and remove debris particles from the beam of radiation by electrostatic force, and the collecting plate is configured to receive the charged species and the debris particles removed from the beam of radiation.

摘要翻译： 本发明的实施例提供了使用带电物质流去除碎屑颗粒的方法和装置。 本发明的一个实施例提供了一种用于从辐射束去除碎屑颗粒的装置，包括被配置成分配带电物质的带电物质源，以及与带电物质源电荷相反的收集板，其中收集 板和带电物质源设置在辐射束的相对侧上，从带电物质源到收集板的带电物流流与辐射束相交，带电物质流被配置为附着和去除碎屑颗粒 通过静电力从辐射束获得，并且收集板被配置为接收带电物质并且从辐射束去除碎屑颗粒。