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公开(公告)号：US20060072217A1
公开(公告)日：2006-04-06
申请号：US11262360
申请日：2005-10-28
申请人： Ulrich Weber , Hubert Holderer , Dirk Rexhaeuser
发明人： Ulrich Weber , Hubert Holderer , Dirk Rexhaeuser
IPC分类号： G02B7/02
CPC分类号： G03F7/70258 , G02B7/003 , G03F7/70825
摘要： In an apparatus for positioning an optical element in a structure, particularly in an objective housing of a projection objective for microlithography, the optical element is connected to the structure via fastening elements. The position of the optical element is set by means of adjusting fasteners. The fastening elements are arranged in such a way and the adjusting fasteners can be actuated in such a way that the optical element can be tilted about three mutually independent axes and can additionally be displaced in a translatory fashion in one axial direction
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公开(公告)号：US06259571B1
公开(公告)日：2001-07-10
申请号：US09503023
申请日：2000-02-14
申请人： Hubert Holderer , Peter Ruemmer , Michael Trunz , Bernhard Geuppert , Thomas Polzer , Johan Dries , Hugo Timmers , Albert Post
发明人： Hubert Holderer , Peter Ruemmer , Michael Trunz , Bernhard Geuppert , Thomas Polzer , Johan Dries , Hugo Timmers , Albert Post
IPC分类号： G02B702
摘要： An adjustable assembly comprises a base (mount ring 1), an adjustable part (inner ring 3), a lever (tilting lever 5) and a drive (drive element 6). The lever (tilting lever 5) is connected to the base (mount ring 1) and to the adjustable part (inner ring 3) via two elastic solid pivoting joints (7, 8) oriented in parallel. One of the two solid pivoting joints (7) is divided into two pivoting joint parts (7a, 7b), which are arranged such that along their pivoting axis (9) they are offset sideways on either side of the second solid pivoting joint (8).
摘要翻译： 可调组件包括基座（安装环1），可调部分（内环3），杠杆（倾斜杆5）和驱动（驱动元件6））。 杠杆（倾斜杆5）通过平行定向的两个弹性固体枢转接头（7,8）连接到基座（安装环1）和可调节部分（内环3）。 两个固定枢转接头（7）中的一个被分成两个枢转接头部分（7a，7b），它们被布置为使得沿着它们的枢转轴线（9），它们在第二固体枢转接头（8）的任一侧侧向偏移 ）。
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公开(公告)号：US06229657B1
公开(公告)日：2001-05-08
申请号：US09328938
申请日：1999-06-09
申请人： Hubert Holderer , Peter Rümmer , Michael Trunz
发明人： Hubert Holderer , Peter Rümmer , Michael Trunz
IPC分类号： G02B702
CPC分类号： G03F7/70058 , G02B7/023 , G03F7/70241 , G03F7/70825
摘要： Assembly of an optical element and a mount, in which the optical element is coupled by means of numerous lugs to a rigid intermediate ring, which itself is coupled by adjusting members or passive decouplers to the mount for connection to a housing and/or to a further mount.
摘要翻译： 光学元件和安装件的组装，其中光学元件通过许多凸耳连接到刚性中间环，该刚性中间环本身通过调节构件或被动分离器耦合到安装件，以连接到壳体和/或 进一步安装。
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公开(公告)号：US08342701B2
公开(公告)日：2013-01-01
申请号：US12851187
申请日：2010-08-05
申请人： Holger Kierey , Michel Le Maire , Willi Anderl , Hubert Holderer , Anton Lengel
发明人： Holger Kierey , Michel Le Maire , Willi Anderl , Hubert Holderer , Anton Lengel
IPC分类号： G02B5/08
CPC分类号： G02B5/0891 , G02B7/181 , G02B7/1815
摘要： A reflective optical element for use in an EUV system is disclosed. The reflective optical element includes a base body, which is produced at least partly from a substrate material. At least one cooling channel through which a cooling medium can flow is arranged in the base body. A material having a thermal conductivity of greater than 50 W/mK is provided as substrate material. The reflective optical element also includes a polishing layer, which is applied on the substrate material. The polishing layer includes an amorphous material which can be processed via polishing.
摘要翻译： 公开了一种用于EUV系统的反射光学元件。 反射型光学元件包括至少部分地由基底材料制成的基体。 冷却介质可以流过的至少一个冷却通道布置在基体中。 提供具有大于50W / mK的热导率的材料作为基材。 反射光学元件还包括施加在基板材料上的抛光层。 抛光层包括可通过研磨加工的非晶材料。
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公开(公告)号：US20110051267A1
公开(公告)日：2011-03-03
申请号：US12851187
申请日：2010-08-05
申请人： Holger Kierey , Michel Le Maire , Willi Anderl , Hubert Holderer , Anton Lengel
发明人： Holger Kierey , Michel Le Maire , Willi Anderl , Hubert Holderer , Anton Lengel
IPC分类号： G02B5/08
CPC分类号： G02B5/0891 , G02B7/181 , G02B7/1815
摘要： A reflective optical element (10) for use in an EUV system is disclosed. The reflective optical element includes a base body, which is produced at least partly from a substrate material. At least one cooling channel through which a cooling medium can flow is arranged in the base body. A material having a thermal conductivity of greater than 50 W/mK is provided as substrate material. The reflective optical element also includes a polishing layer, which is applied on the substrate material. The polishing layer includes an amorphous material which can be processed via polishing.
摘要翻译： 公开了一种用于EUV系统的反射光学元件（10）。 反射型光学元件包括至少部分地由基底材料制成的基体。 冷却介质可以流过的至少一个冷却通道布置在基体中。 提供具有大于50W / mK的热导率的材料作为基材。 反射光学元件还包括施加在基板材料上的抛光层。 抛光层包括可通过研磨加工的非晶材料。
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公开(公告)号：US07710542B2
公开(公告)日：2010-05-04
申请号：US11936768
申请日：2007-11-07
申请人： Wolfgang Hummel , Jürgen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schöngart , Markus Neumaier , Bärbel Trossbach , Ulrich Weber , Michael Mühlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
发明人： Wolfgang Hummel , Jürgen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schöngart , Markus Neumaier , Bärbel Trossbach , Ulrich Weber , Michael Mühlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
CPC分类号： G03F7/70258 , G03F7/70825
摘要： An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.
摘要翻译： 用于微光刻的投影曝光机中的成像装置具有至少一个光学元件和至少一个具有线性驱动的操纵器，用于操纵光学元件的位置。 线性驱动器具有驱动区域和非驱动子区域，它们可以在运动轴线的方向上相对于彼此移动。 至少临时地通过具有主动轴的功能元件和通过至少大致平行于运动轴的有源方向的功能元件临时地互相连接。
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公开(公告)号：US20090141258A1
公开(公告)日：2009-06-04
申请号：US12363065
申请日：2009-01-30
申请人： Stephan Back , Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Schwaer , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
发明人： Stephan Back , Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Schwaer , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
CPC分类号： G03F7/70258 , G03F7/70825
摘要： An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.
摘要翻译： 用于微光刻的投影曝光机中的成像装置包括至少一个光学元件和至少一个操纵器，用于操纵光学元件的位置的线性驱动器。 线性驱动器具有至少一个移动元件，移动元件具有剪切部分和提升部分。 剪切部分被布置成移动光学元件，并且提升部分被布置成移动剪切部分。 线性驱动器具有支撑元件，该支撑元件在通过提升部分移动剪切部分的同时与光学元件接触并防止其移动。
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公开(公告)号：US20080100815A1
公开(公告)日：2008-05-01
申请号：US11842313
申请日：2007-08-21
申请人： Hubert Holderer , Claudia Ekstein
发明人： Hubert Holderer , Claudia Ekstein
CPC分类号： G03F7/70825 , Y10T29/49826
摘要： Arrangements of a first body and a second body connected to the first body, as well as related systems and methods, are disclosed. The arrangements, systems and methods can be used, for example, with optical devices, such as in the field of microlithography systems used to manufacture of microelectronic devices.
摘要翻译： 公开了连接到第一体的第一体和第二体的安排，以及相关系统和方法。 布置，系统和方法可以用于例如光学器件，例如在用于制造微电子器件的微光刻系统领域。
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39.发明授权Objective, particularly a projection objective for use in semiconductor lithography 失效目的，特别是用于半导体光刻的投影目标公开(公告)号：US07123427B2
公开(公告)日：2006-10-17
申请号：US10484866
申请日：2002-07-20
CPC分类号： G03F7/70225 , G02B27/62 , G03F7/70258 , G03F7/70825
摘要： The invention relates to an objective, particularly a projection objective for use in semiconductor lithography, comprising optical elements such as lenses (16) and mirrors (11a). According to the invention, at least a portion of the optical elements (16, 11a) is provided with a reflective surface outside of the optically active area serving as the reference surface (12) for a the optical element inside the objective (8).
摘要翻译： 本发明涉及一种目的，特别是用于半导体光刻的投影物镜，包括诸如透镜（16）和反射镜（11a）之类的光学元件。 根据本发明，光学元件（16,11a）的至少一部分在用作物镜（8）内的光学元件的基准面（12）的光学有效区域外面设置有反射表面， 。
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公开(公告)号：US20050030656A1
公开(公告)日：2005-02-10
申请号：US10841846
申请日：2004-05-07
申请人： Hubert Holderer , Andres Heisler , Wolfgang Singer , Markus Weiss , Andreas Seifert , Frank Melzer , Heinz Mann
发明人： Hubert Holderer , Andres Heisler , Wolfgang Singer , Markus Weiss , Andreas Seifert , Frank Melzer , Heinz Mann
CPC分类号： G03F7/70258 , G02B5/09 , G02B7/1821 , G02B7/1824 , G02B26/0816 , G03F7/70075 , G03F7/70141 , G03F7/702 , G03F7/70275
摘要： In a facet mirror with a number of mirror facets, wherein the mirror facets are provided with reflecting surfaces, the mirror facets are mounted jointly in a basic body via bearing devices. The mirror facets comprise mirror bodies contacting at the periphery with the bearing devices via a surface, line or point contact. The preferred field of use of the facet mirrors is a projection objective of a projection exposure machine in microlithography for fabricating semiconductor elements.
摘要翻译： 在具有多个镜面的小平面镜中，其中镜面设置有反射面，镜面通过轴承装置联合地安装在基体内。 镜面包括通过表面，线或点接触在外周与轴承装置接触的镜体。 小平面镜的优选使用领域是用于制造半导体元件的微光刻中的投影曝光机的投影物镜。
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