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公开(公告)号：US06406361B1
公开(公告)日：2002-06-18
申请号：US09693041
申请日：2000-10-20
申请人： Steven Zuniga , Hung Chen
发明人： Steven Zuniga , Hung Chen
IPC分类号： B24B4702
摘要： A carrier head for a chemical mechanical polishing apparatus includes a base, a flexible membrane extending beneath the base to provide a mounting surface for a substrate, and a retaining ring surrounding the mounting surface. An edge portion of the flexible membrane extends around an outer surface of a support structure. An outer surface of the support structure is tapered to reduce binding between the flexible membrane and the retaining ring. Alternately, there may be a relatively wide gap between the support structure and the retaining ring, or a sidewall portion of the flexible membrane may be reinforced.
摘要翻译： 用于化学机械抛光装置的载体头包括基底，在基底下方延伸的柔性膜以提供用于基底的安装表面，以及围绕安装表面的保持环。 柔性膜的边缘部分围绕支撑结构的外表面延伸。 支撑结构的外表面是锥形的，以减少柔性膜和保持环之间的结合。 或者，支撑结构和保持环之间可能存在相对宽的间隙，或者可以增强柔性膜的侧壁部分。
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公开(公告)号：US06361420B1
公开(公告)日：2002-03-26
申请号：US09500137
申请日：2000-02-08
IPC分类号： B24B722
摘要： A carrier head, particularly suited for chemical mechanical polishing of a flatted substrate, includes a flexible membrane and an edge load ring. A lower surface of the flexible membrane provides a receiving surface for a center portion of the substrate, whereas a lower surface of the edge load ring provides a receiving surface for a perimeter portion of the substrate. A slurry suitable for chemical mechanical polishing a flatted substrate includes water, a colloidal silica that tends to agglomerate, and a fumed silica that tends not to agglomerate.
摘要翻译： 特别适用于平坦化基材的化学机械抛光的载体头包括柔性膜和边缘负载环。 柔性膜的下表面提供了用于衬底的中心部分的接收表面，而边缘负载环的下表面为衬底的周边部分提供了接收表面。 适用于化学机械抛光平底基材的浆料包括水，倾向于附聚的胶体二氧化硅，以及趋于不凝聚的热解法二氧化硅。
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公开(公告)号：US6165058A
公开(公告)日：2000-12-26
申请号：US207700
申请日：1998-12-09
申请人： Steven Zuniga , Hung Chen
发明人： Steven Zuniga , Hung Chen
摘要： A carrier head for a chemical mechanical polishing apparatus includes a base, a flexible membrane extending beneath the base to provide a mounting surface for a substrate, and a retaining ring surrounding the mounting surface. An edge portion of the flexible membrane extends around an outer surface of a support structure. An outer surface of the support structure is tapered to reduce binding between the flexible membrane and the retaining ring. Alternately, there may be a relatively wide gap between the support structure and the retaining ring, or a sidewall portion of the flexible membrane may be reinforced.
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34.发明授权
公开(公告)号：US5957751A
公开(公告)日：1999-09-28
申请号：US862350
申请日：1997-05-23
申请人： Boris Govzman , Steven M. Zuniga , Hung Chen , Sasson Somekh
发明人： Boris Govzman , Steven M. Zuniga , Hung Chen , Sasson Somekh
IPC分类号： B24B37/005 , B24B37/30 , H01L21/304 , B24B49/00
CPC分类号： B24B37/30 , B24B37/0053
摘要： A carrier head for a chemical mechanical polishing system includes a substrate sensing mechanism. The carrier head includes a base and a flexible member connected to the base to define a chamber. A lower surface of the flexible member provides a substrate receiving surface. The substrate sensing mechanism includes a sensor to measure a pressure in the chamber and generate an output signal representative thereof, and a processor configured to indicate whether the substrate is attached to the substrate receiving surface in response to the output signal.
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35.发明申请公开(公告)号：US20130288578A1
公开(公告)日：2013-10-31
申请号：US13459177
申请日：2012-04-28
申请人： Hui Chen , Allen L. D'Ambra , Jim K. Atkinson , Hung Chen
发明人： Hui Chen , Allen L. D'Ambra , Jim K. Atkinson , Hung Chen
CPC分类号： B24B37/107 , B24B41/068
摘要： The present invention provides methods and apparatus for a pre-CMP semiconductor substrate buffing module. The invention includes a polishing pad assembly adapted to be rotated against a major surface of a substrate; a chuck adapted to hold the substrate and to rotate the substrate against the polishing pad assembly as the polishing pad assembly is rotated; and a lateral motion motor adapted to oscillate the polishing pad assembly laterally across the major surface of the substrate while the polishing pad assembly is rotated against the rotating substrate. Numerous additional features are disclosed.
摘要翻译： 本发明提供了用于CMP前半导体衬底抛光模块的方法和装置。 本发明包括适于相对于基底的主表面旋转的抛光垫组件; 当所述抛光垫组件旋转时，卡盘适于保持所述基底并且将所述基底旋转抵靠所述抛光垫组件; 以及横向运动电动机，其适于在抛光垫组件相对于旋转衬底旋转的同时横向穿过衬底的主表面振荡抛光垫组件。 公开了许多附加特征。
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公开(公告)号：US20130283553A1
公开(公告)日：2013-10-31
申请号：US13456779
申请日：2012-04-26
CPC分类号： A46B13/001 , A46B3/005
摘要： In one aspect, a scrubber brush assembly is provided. The scrubber brush assembly includes a scrubber brush including exterior molded surfaces and a mounting passage having interior molded surfaces, the interior molded surfaces having molded foam, raised rotation-restraining features, and a mandrel including recesses directly coupled to the molded foam, raised rotation-restraining features of the scrubber brush to prevent slippage. Scrubber brushes and methods of assembly are provided, as are numerous other aspects.
摘要翻译： 在一个方面，提供了洗涤器刷组件。 洗涤器刷组件包括洗涤器刷，其包括外部模制表面和具有内部模制表面的安装通道，内部模制表面具有模制泡沫，升高的旋转抑制特征以及包括直接联接到模制泡沫的凹部的心轴， 洗涤刷的限制功能，防止滑动。 提供了洗涤刷和组装方法，以及许多其它方面。
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37.发明申请公开(公告)号：US20130122788A1
公开(公告)日：2013-05-16
申请号：US13459079
申请日：2012-04-28
CPC分类号： B24B37/013 , B24B49/16
摘要： Methods, apparatus, and systems for polishing a substrate are provided. The invention includes an upper platen; a torque/strain measurement instrument coupled to the upper platen; and a lower platen coupled to the torque/strain measurement instrument and adapted to drive the upper platen to rotate through the torque/strain measurement instrument. In other embodiments, the invention includes an upper carriage; a side force measurement instrument coupled to the upper carriage; and a lower carriage coupled to the side force measurement instrument and adapted to support a polishing head. Numerous additional aspects are disclosed.
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公开(公告)号：US20080039000A1
公开(公告)日：2008-02-14
申请号：US11832801
申请日：2007-08-02
申请人： Doyle Bennett , Andrew Nagengast , Hung Chen
发明人： Doyle Bennett , Andrew Nagengast , Hung Chen
摘要： A carrier head for chemical mechanical polishing that has a base, a mounting assembly connected to the base having a surface for contacting a substrate, and a retaining ring secured to the base. The retaining ring can include perfluoroalkoxy, polyetherketoneketone, polybenzimidazole, a semi-crystalline thermoplastic polyester, or a long molecular chain molecule produced from poly-paraphenylene terephthalamide.
摘要翻译： 一种用于化学机械抛光的载体头，其具有基部，连接到基部的安装组件具有用于接触基底的表面和固定到基部的保持环。 保持环可以包括全氟烷氧基，聚醚酮酮，聚苯并咪唑，半结晶热塑性聚酯或由聚对苯二甲酰对苯二胺生产的长分子链分子。
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公开(公告)号：US20070077861A1
公开(公告)日：2007-04-05
申请号：US11241254
申请日：2005-09-30
申请人： Hung Chen
发明人： Hung Chen
CPC分类号： B24B41/005 , B24B37/345
摘要： A method and apparatus for chemical mechanical polishing includes a platen supports a polishing article, a robot located proximate the platen, a carrier head having a retaining ring, and a carrier heads support mechanism. The robot is configured to position a substrate on the polishing article, and the carrier heads support mechanism is configured to move the carrier head into a position that the retaining ring surrounds the substrate.
摘要翻译： 用于化学机械抛光的方法和装置包括压板支撑抛光制品，位于压板附近的机器人，具有保持环的承载头和承载头支撑机构。 机器人构造成将基板定位在抛光制品上，并且载体头支撑机构构造成将承载头移动到保持环围绕基板的位置。
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公开(公告)号：US20060114400A1
公开(公告)日：2006-06-01
申请号：US11288747
申请日：2005-11-28
申请人： Chao Yi Hung , Hung Chen
发明人： Chao Yi Hung , Hung Chen
IPC分类号： G02F1/1343
CPC分类号： G02F1/136213 , G02F1/134363
摘要： An LCD includes an insulating substrate (30) with gate lines (32) and data lines (31) disposed thereon. The gate lines are parallel to each other and extend along a first direction, and the data lines are parallel to each other and extend along a second direction. The data lines cross the gate lines thereby defining a multiplicity of pixel regions (3). Each of the pixel regions includes a TFT (35), a pixel electrode (33) connected to the TFT, a common electrode (36) connected to a corresponding one of the data lines, and a dielectric layer (37) disposed between the common and pixel electrodes. The common electrode includes a plurality of protrusions (34). The protrusions, the dielectric layer, and the pixel electrode cooperatively define a storage capacitor (50) for holding the pixel region at a set voltage level until the next refresh cycle when the TFT is turned off.
摘要翻译： LCD包括具有设置在其上的栅极线（32）和数据线（31）的绝缘基板（30）。 栅极线彼此平行并且沿着第一方向延伸，并且数据线彼此平行并且沿着第二方向延伸。 数据线与栅极线交叉，从而限定多个像素区域（3）。 每个像素区域包括TFT（35），连接到TFT的像素电极（33），连接到对应的一条数据线的公共电极（36）和设置在公共端 和像素电极。 公共电极包括多个突起（34）。 突起，电介质层和像素电极协同地限定用于将像素区域保持在设定电压电平的存储电容器（50），直到TFT关闭时的下一个刷新周期。
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