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    Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method
    31.
    发明申请
    Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method 审中-公开
    用于改善至少两个光学元件的成像特性和光刻制造方法的方法

    公开(公告)号：US20060146427A1

    公开(公告)日：2006-07-06

    申请号：US11361345

    申请日：2006-02-24

    申请人： Birgit Kurz ,  Toralf Gruner ,  Alexander Kohl

    发明人： Birgit Kurz ,  Toralf Gruner ,  Alexander Kohl

    IPC分类号： G02B7/02

    CPC分类号： G03F7/70591 ,  G02B5/3083 ,  G03F7/70258 ,  G03F7/70566 ,  G03F7/70966 ,  Y10S359/90

    摘要： A method for improving imaging properties of two or more optical elements comprises the step of determining for at least one of the two optical elements a polarisation-dependent perturbation. In a further step a polarisation-independent perturbation is determined for at least one of the two optical elements. Then a target position for the at least one movable optical element is calculated such that, in the target position, the total perturbation of the at least two optical elements which is made up of the polarisation-dependent perturbations and polarisation-independent perturbations of the two optical elements, is minimized. Finally the at least one movable optical element is moved the to the calculated target position.

    摘要翻译： 一种用于改善两个或多个光学元件的成像特性的方法包括确定两个光学元件中的至少一个偏振相关扰动的步骤。 在另一步骤中，确定两个光学元件中的至少一个的偏振无关扰动。 然后，计算出至少一个可移动光学元件的目标位置，使得在目标位置中，由偏振相关扰动和两极偏振无关的扰动构成的至少两个光学元件的总扰动 光学元件被最小化。 最后，将至少一个可移动光学元件移动到计算出的目标位置。

    Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method
    32.
    发明授权
    Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method 失效
    用于改善至少两个光学元件的成像特性和光刻制造方法的方法

    公开(公告)号：US07027237B2

    公开(公告)日：2006-04-11

    申请号：US11185066

    申请日：2005-07-20

    申请人： Birgit Mecking ,  Toralf Gruner ,  Alexander Kohl

    发明人： Birgit Mecking ,  Toralf Gruner ,  Alexander Kohl

    IPC分类号： G02B7/02

    CPC分类号： G03F7/70591 ,  G02B5/3083 ,  G03F7/70258 ,  G03F7/70566 ,  G03F7/70966 ,  Y10S359/90

    摘要： A method for improving imaging properties of two or more optical elements comprises the step of determining for at least one of the two optical elements a polarization-dependent perturbation. In a further step a polarization-independent perturbation is determined for at least one of the two optical elements. Then a target position for the at least one movable optical element is calculated such that, in the target position, the total perturbation of the at least two optical elements which is made up of the polarization-dependent perturbations and polarization-independent perturbations of the two optical elements, is minimized. Finally the at least one movable optical element is moved the to the calculated target position.

    摘要翻译： 一种用于改善两个或多个光学元件的成像特性的方法包括确定两个光学元件中的至少一个偏振相关扰动的步骤。 在另一步骤中，确定两个光学元件中的至少一个的偏振无关扰动。 然后，计算出至少一个可移动光学元件的目标位置，使得在目标位置中，由偏振相关扰动和两极偏振无关的扰动构成的至少两个光学元件的总扰动 光学元件被最小化。 最后，将至少一个可移动光学元件移动到计算出的目标位置。

    Catadioptric reduction objective
    33.
    发明申请
    Catadioptric reduction objective 审中-公开
    反射折射减少目标

    公开(公告)号：US20050190446A1

    公开(公告)日：2005-09-01

    申请号：US11019202

    申请日：2004-12-23

    申请人： Birgit Kuerz ,  Olaf Dittmann ,  Toralf Gruner ,  Vladimir Kamenov ,  Martin Brunotte

    发明人： Birgit Kuerz ,  Olaf Dittmann ,  Toralf Gruner ,  Vladimir Kamenov ,  Martin Brunotte

    IPC分类号： G02B1/02 ,  G02B13/14 ,  G02B17/08 ,  G02B27/28 ,  G03F7/20 ,  G02B17/00

    CPC分类号： G02B17/0892 ,  G02B1/02 ,  G02B13/143 ,  G02B17/08 ,  G02B27/283 ,  G03F7/70225 ,  G03F7/70566

    摘要： A catadioptric projection objective for projecting a pattern, which is located in the object plane of the projection objective, into the image plane of the projection objective has, between the object plane and the image plane, a catadioptric objective part provided with a concave mirror (17), with a first deviating mirror (16) and with at least one second deviating mirror (19). A polarization rotating device (26) rotates the preferred polarization direction of the light approximately 90° inside the light path between the deviating mirrors. This permits an at least partial compensation for polarization-dependent reflectivity differences and phase effect differences of the deviating mirrors thereby enabling a projection with a largely identical contrast for all structural directions.

    摘要翻译： 用于将位于投影物镜的物平面中的图案投影到投影物镜的像平面中的反射折射投射物镜在物平面和像平面之间具有设置有凹面镜的反射折射物镜部（ 17），具有第一偏转镜（16）和至少一个第二偏转镜（19）。 偏振旋转装置（26）将偏光镜之间的光路内的光的优选偏振方向旋转大约90°。 这允许偏振相关反射率差异和偏离反射镜的相位效应差异的至少部分补偿，从而使得能够对于所有结构方向具有大致相同的对比度的投影。

    Method of manufacturing a miniaturized device
    35.
    发明授权
    Method of manufacturing a miniaturized device 有权
    制造小型化装置的方法

    公开(公告)号：US08542342B2

    公开(公告)日：2013-09-24

    申请号：US12408577

    申请日：2009-03-20

    申请人： Markus Schwab ,  Aksel Goehnermeier ,  Toralf Gruner ,  Tammo Uitterdijk

    发明人： Markus Schwab ,  Aksel Goehnermeier ,  Toralf Gruner ,  Tammo Uitterdijk

    IPC分类号： G03B27/42 ,  G03B27/54 ,  G03B27/32

    CPC分类号： G03B27/42 ,  G03F7/70258

    摘要： A lithographic method of manufacturing a miniaturized device using a projection exposure system involves illuminating the object plane of an imaging optics of the projection exposure system with measuring light; detecting, for each of a plurality of locations on an image plane of the imaging optics, an angular distribution of an intensity of the measuring light traversing the image plane at the respective location; adjusting a telecentricity of the projection exposure system based on a selected patterning structure to be imaged and on the plurality of the detected angular distributions; disposing the selected pattern structure to be imaged in a region of the object plane of the imaging optics; disposing a substrate carrying a resist in a region of the image plane of the imaging optics and exposing the resist with imaging light using the projection exposure system with the adjusted telecentricity; and developing the exposed resist and processing the substrate with the developed resist.

    摘要翻译： 使用投影曝光系统制造小型化装置的光刻方法包括用测量光照射投影曝光系统的成像光学元件的物平面; 针对所述摄像光学元件的像平面上的多个位置中的每一个检测在相应位置处穿过所述图像平面的测量光的角度分布; 基于要成像的所选择的图案化结构和所述多个所检测的角度分布来调整所述投影曝光系统的远心度; 将要成像的所选择的图案结构设置在成像光学器件的物平面的区域中; 在所述成像光学元件的像面的区域中设置携带抗蚀剂的基板，并且利用所述投影曝光系统以调节的远心度将成像光曝光; 并显影出曝光的抗蚀剂并用显影的抗蚀剂处理衬底。

    METHOD FOR STRESS-ADJUSTED OPERATION OF A PROJECTION EXPOSURE SYSTEM AND CORRESPONDING PROJECTION EXPOSURE SYSTEM
    36.
    发明申请
    METHOD FOR STRESS-ADJUSTED OPERATION OF A PROJECTION EXPOSURE SYSTEM AND CORRESPONDING PROJECTION EXPOSURE SYSTEM 有权
    投影曝光系统和相关投影曝光系统的应力调整方法

    公开(公告)号：US20130044303A1

    公开(公告)日：2013-02-21

    申请号：US13590673

    申请日：2012-08-21

    申请人： Bernhard Kneer ,  Markus Deguenther ,  Toralf Gruner

    发明人： Bernhard Kneer ,  Markus Deguenther ,  Toralf Gruner

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70191 ,  G03F7/70116 ,  G03F7/70341 ,  G03F7/70558 ,  G03F7/7085

    摘要： A projection exposure system and a method for operating a projection exposure system for microlithography with an illumination system are disclosed. The illumination system includes at least one variably adjustable pupil-defining element. The illumination stress of at least one optical element of the projection exposure system is determined automatically in the case of an adjustment of the at least one variably adjustable pupil-defining element. From the automatically determined illumination stress, the maximum radiant power of the light source is set or determined and/or in which an illumination system is provided with which different illumination settings can be made. Usage of the projection exposure system is recorded and, from the history of the usage, at least one state parameter of at least one optical element of the projection exposure system is determined.

    摘要翻译： 公开了一种用于利用照明系统操作用于微光刻的投影曝光系统的投影曝光系统和方法。 所述照明系统包括至少一个可变地调整的光瞳限定元件。 在调整至少一个可变瞳孔限定元件的情况下，自动确定投影曝光系统的至少一个光学元件的照明应力。 根据自动确定的照明应力，设置或确定光源的最大辐射功率，和/或其中提供可以进行不同照明设置的照明系统。 记录投影曝光系统的使用，并且根据使用历史确定投影曝光系统的至少一个光学元件的至少一个状态参数。

    METHOD OF MANUFACTURING A PROJECTION OBJECTIVE AND PROJECTION OBJECTIVE
    39.
    发明申请
    METHOD OF MANUFACTURING A PROJECTION OBJECTIVE AND PROJECTION OBJECTIVE 有权
    制作投影目标和投影目标的方法

    公开(公告)号：US20120134016A1

    公开(公告)日：2012-05-31

    申请号：US13364565

    申请日：2012-02-02

    申请人： Heiko Feldmann ,  Toralf Gruner ,  Alexander Epple

    发明人： Heiko Feldmann ,  Toralf Gruner ,  Alexander Epple

    IPC分类号： G02B17/08

    CPC分类号： G03F7/70891 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/705 ,  G03F7/70983

    摘要： The disclosure relates to a method of manufacturing a projection objective, and a projection objective, such as a projection objective configured to be used in a microlithographic process. The method can include defining an initial design for the projection objective and optimizing the design using a merit function. The method can be used in the manufacturing of projection objectives which may be used in a microlithographic process of manufacturing miniaturized devices.

    摘要翻译： 本公开涉及一种制造投影物镜的方法，以及投影物镜，例如被配置为在微光刻工艺中使用的投影物镜。 该方法可以包括定义投影物镜的初始设计，并使用优值函数优化设计。 该方法可用于制造可用于制造小型化装置的微光刻工艺中的投影物镜。