摘要:
An angle cavity resonant photodetector assembly (8), which uses multiple reflections of light within a photodetector (14) to convert input light into an electrical signal. The photodetector (14) has a combination of generally planar semiconductor layers including semiconductor active layers (20) where light is converted into an electrical output. The photodetector (14) is positioned relative to a waveguide (10), where the waveguide (10) has a waveguide active layer (22) located between a pair of waveguide cladding layers (24) and (26) and includes a first end (28) for receiving light and a second end (30) for transmitting the light to the photodetector (14). The photodetector (14) has a first reflector (12) and second reflector (16) that provides for multiple reflections across the semiconductor active layers (20). In another embodiment, the waveguide (10) is positioned on one side of a cavity (58) and the photodetector (64) is positioned at an opposite end of the cavity (58) such that the light from the waveguide (10) travels across the cavity (58). The photodetector (64) is angled relative to the propagation direction of the light. The photodetector includes the first reflector (62) and the second reflector (68), which causes the light to pass through different areas of the photodetector active layers (72).
摘要:
A resonant photodetector assembly (10) which uses multiple reflections of light within a photodetector (20) to convert input light into an electrical signal. The photodetector (20) includes a combination of generally planar semiconductor layers including a photodetector active layer (36) where light is converted into an electrical output. The photodetector (20) further includes a first outer electrical contact layer (34) and a second outer electrical contact layer (42). A waveguide (22) is positioned on the photodetector (20) and has a waveguide active layer (26) positioned between a pair of waveguide cladding layers (24, 28), a first end (30) for receiving input light and a second end (50) for reflecting the light. A reflector (32) is positioned on the second end (50) of the waveguide (22) at an angle relative to a line parallel to the substrate (14), where the reflector (32) reflects the light received by the first end (30) of the waveguide active layer (26) towards the photodetector (20). A reflector (38) is positioned on the second outer layer (42) of the photodetector (20) and provides a reflective surface for reflecting the light within the photodetector (20).
摘要:
A micro-miniature switch apparatus (10) includes a substrate (12) having a surface (14) with first and second channels (16, 18) extending from the surface (14) into the substrate (12). The first and second channels (16, 18) are spaced apart from each other, with a channel axis (20) extending longitudinally through the first and second channels (16, 18). A body (68) that is movable relative to the substrate (12) includes two arms (70, 72). Each of the arms (70, 72) extends into one of the first and second channels (16, 18) to support the body (68) for movement relative to the substrate (12) between first and second electrical conditions of the switch apparatus (10).
摘要:
A micromirror device (10) is provided with a rotatable optical component (22) for use in a digital image processing application. The micromirror device (10) includes a semiconductor wafer (12), having a recess (14) formed therein, and a platform (20) with the optical component (22) deposited thereon that is movably coupled to the side surface of the recess (14). A first magnetic field source (24) is disposed around the periphery of the optical component (22) on the platform (20) and a second magnetic field source (26) is disposed proximate to this first magnetic field source (24), such that these magnetic field sources are selectively activatable to generate an electromagnetic field for rotating the platform (20). More specifically, the second magnetic field source (26) is disposed on the angular side surfaces of the recess (14) or adjacent to the recess (14) on a top surface of the wafer (12). A magnetic strip (30) may optionally be disposed on the bottom surface of the recess (14) for concentrating the electromagnetic field.
摘要:
A photosensitive photoresist material which is effective for use as an ion etch barrier layer after patterning. The photoresist composition includes the reaction product of a compound having the general formula R.sub.1 --COO--(CH.sub.2).sub.n --O--R.sub.2 and a silylating agent.
摘要:
A photosensitive photoresist material which is effective for use as an ion etch barrier layer after patterning. The photoresist composition includes the reaction product of a compound having the general formula R.sub.1 --COO--(CH.sub.2).sub.n --O--R.sub.2 and a silylating agent.
摘要:
The invention relates to a method for fabricating III-V semiconductor micro-optical lenses for hybrid integration with micro-optical devices, where a micro-optical lens is formed from a semiconductor wafer by selectively etching a surface of the semiconductor wafer and a lens arm is formed from the semiconductor wafer on a surface opposite the surface by selectively etching the surface of the semiconductor wafer. The lens and lens arm are then cleaved from the substrate wafer and directly mounted to a micro-optical device. As a result of using III-V semiconductor material to form micro-optical lenses for hybrid integration to micro-optical devices of the same semiconductor material, thermal expansion stability is increased and efficient transfer of light between micro-optical lenses and micro-optical devices is achieved.