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公开(公告)号：US20070152175A1
公开(公告)日：2007-07-05
申请号：US11319770
申请日：2005-12-29
申请人： Johannes Moors , Vadim Banine , Johannes Christiaan Franken , Vladimir Ivanov , Konstantin Koshelev , Alexander Struycken
发明人： Johannes Moors , Vadim Banine , Johannes Christiaan Franken , Vladimir Ivanov , Konstantin Koshelev , Alexander Struycken
IPC分类号： G21G4/00
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/005
摘要： A radiation source generates short-wavelength radiation, such as extreme ultraviolet radiation, for use in lithography. Rotating electrodes are provided which dip into respective baths of liquid metal, for example, tin. An electrical discharge is produced between the electrodes to generate the radiation. Holes are provided in the electrodes and/or in a metal shielding plate around the electrodes to enable better pumping down to low pressure in the vicinity of the discharge to improve the conversion efficiency of the source. The holes in the electrodes improve cooling of the electrodes by causing stirring of the liquid metal, and by improving the thermal and electrical contact between the electrodes and the liquid metal. Improved electrical contact also reduces the time-constant of the discharge circuit, thereby further improving the conversion efficiency of the source.
摘要翻译： 辐射源产生用于光刻的短波长辐射，例如极紫外辐射。 提供旋转电极，其浸入液体金属例如锡的各个浴中。 在电极之间产生放电以产生辐射。 在电极周围设置孔和/或在电极周围的金属屏蔽板中，以便在排出附近更好地向下降低压力以提高源的转换效率。 电极中的孔通过搅拌液态金属而改善电极的冷却，并改善电极和液态金属之间的热和电接触。 改善的电接触也降低了放电电路的时间常数，从而进一步提高了源的转换效率。
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公开(公告)号：US20070146660A1
公开(公告)日：2007-06-28
申请号：US11319193
申请日：2005-12-28
申请人： Marc Lorenz Van Der Velden , Vadim Banine , Bastiaan Mertens , Johannes Josephina Moors , Markus Weiss , Bastiaan Wolschrijn , Michiel Nijkerk
发明人： Marc Lorenz Van Der Velden , Vadim Banine , Bastiaan Mertens , Johannes Josephina Moors , Markus Weiss , Bastiaan Wolschrijn , Michiel Nijkerk
IPC分类号： G03B27/52
CPC分类号： G03F7/70933 , G03F7/70916 , G03F7/7095
摘要： The invention relates to a lithographic apparatus that includes a system configured to condition a radiation beam or project a patterned radiation beam onto a target portion of a substrate. The system includes an optically active device configured to direct the radiation beam or the patterned radiation beam, respectively, and a support structure configured to support the optically active device. The apparatus further includes a gas supply for providing a background gas into the system. The radiation beam or patterned radiation beam react with the background gas to form a plasma that includes a plurality of ions. The support structure includes an element that includes a material that has a low sputtering yield, a high sputter threshold energy, or a high ion implantation yield, to reduce sputtering and the creation of sputtering products.
摘要翻译： 本发明涉及一种光刻设备，其包括被配置为调节辐射束或将图案化的辐射束投影到基板的目标部分上的系统。 该系统包括被配置为分别引导辐射束或图案化辐射束的光学有源器件，以及被配置为支持光学有源器件的支撑结构。 该装置还包括用于将背景气体提供到系统中的气体供应。 辐射束或图案化的辐射束与背景气体反应以形成包括多个离子的等离子体。 支撑结构包括包括具有低溅射产率，高溅射阈值能量或高离子注入产量的材料的元件，以减少溅射和溅射产物的产生。
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公开(公告)号：US20070145295A1
公开(公告)日：2007-06-28
申请号：US11296702
申请日：2005-12-08
申请人： Vadim Banine , Vladimir Ivanov , Johannes Josephina Moors , Bastiaan Wolschrijn , Derk Jan Klunder , Maarten Johannes Wilhelmus Van Herpen
发明人： Vadim Banine , Vladimir Ivanov , Johannes Josephina Moors , Bastiaan Wolschrijn , Derk Jan Klunder , Maarten Johannes Wilhelmus Van Herpen
IPC分类号： A61N5/00
CPC分类号： G03F7/70933 , G03F7/70925
摘要： A cleaning arrangement is configured to clean an EUV optic of an EUV lithographic apparatus. The partial radical pressure ranges between 0.1-10 Pa. The cleaning arrangement can be configured inside a cleaning cocoon of the lithographic apparatus for offline cleaning. It can also be configured at particular positions inside the apparatus to clean nearby optics during production. In the pressure range of 0.1-10 Pa the penetration of atomic hydrogen into the optical devices is high, while the recombination to molecular hydrogen and hydrogen consumption is limited.
摘要翻译： 清洁装置被配置为清洁EUV光刻设备的EUV光学元件。 部分自由基压力范围在0.1-10Pa之间。清洁装置可以被配置在光刻设备的清洁茧内用于离线清洁。 它也可以配置在设备内的特定位置，以便在生产过程中清洁附近的光学元件。 在0.1-10Pa的压力范围内，原子氢进入光学器件的渗透率很高，而分子氢和氢消耗的复合受到限制。
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公开(公告)号：US20070131878A1
公开(公告)日：2007-06-14
申请号：US11296701
申请日：2005-12-08
IPC分类号： G03F7/20
CPC分类号： G03F7/70933 , B82Y10/00 , G03F7/70166 , G03F7/70925
摘要： A lithographic apparatus includes a collector configured to collect radiation from a radiation source, the collector including a plurality of shells forming separate compartments, and a cleaning arrangement including a gas inlet and a gas outlet, the cleaning arrangement being configured to clean surfaces of the plurality of shells by guiding a gas flow from the inlet through the compartments to the outlet. The cleaning arrangement includes a distribution system configured to divide the gas flow into several sub flows, each of the sub flows corresponding to one or more of the compartments, and a control system configured to control the relative amount of the sub flows.
摘要翻译： 光刻设备包括收集器，其被配置为收集来自辐射源的辐射，所述收集器包括形成分离的隔室的多个壳体，以及包括气体入口和气体出口的清洁装置，所述清洁装置构造成清洁所述多个 通过引导气流从入口通过隔间引导到出口。 清洁装置包括分配系统，其配置为将气流分成几个子流，每个子流对应于一个或多个隔间，以及被配置为控制子流的相对量的控制系统。
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公开(公告)号：US20060261290A1
公开(公告)日：2006-11-23
申请号：US11133460
申请日：2005-05-20
IPC分类号： A61N5/00
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70166
摘要： A radiation system for providing a projection beam of radiation in a lithographic apparatus is disclosed. The radiation system includes an EUV source for providing EUV radiation, and a contamination barrier that includes a plurality of foil plates for trapping contaminant material coming from the EUV source. The foil plates are arranged in an optically closed arrangement so that at least one of the foil plates reflects EUV radiation passing the contamination barrier at least one time.
摘要翻译： 公开了一种用于在光刻设备中提供投影辐射束的辐射系统。 辐射系统包括用于提供EUV辐射的EUV源，以及包括用于捕获来自EUV源的污染物质的多个箔板的污染屏障。 箔板以光学关闭的布置布置，使得至少一个箔片板反射至少一次通过污染屏障的EUV辐射。
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36.发明申请Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method 有权用于多层反射镜的光谱纯度滤光器，包括这种多层反射镜的光刻设备，用于扩大所需辐射和不期望辐射的比率的方法，以及器件制造方法公开(公告)号：US20060245057A1
公开(公告)日：2006-11-02
申请号：US11115406
申请日：2005-04-27
CPC分类号： G02B1/10 , B82Y10/00 , B82Y40/00 , G02B5/0816 , G02B5/0891 , G02B5/283 , G03F1/24 , G03F7/70575 , G03F7/70958 , G21K1/062 , G21K2201/067
摘要： A multi-layer mirror includes on top of the multi-layer mirror a spectral purity enhancement layer, for example for application in an EUV lithographic apparatus. This spectral purity enhancement layer includes a first spectral purity enhancement layer, but between the multi-layer mirror and first spectral purity enhancement layer there may optionally be an intermediate layer or a second spectral purity enhancement layer and intermediate layer. Hence, multi-layer mirrors with the following configurations are possible: multi-layer mirror/first spectral purity enhancement layer; multi-layer mirror/intermediate layer/first spectral purity enhancement layer; and multi-layer mirror/second spectral purity enhancement layer/intermediate layer/first spectral purity enhancement layer. The spectral purity of normal incidence radiation may be enhanced, such that DUV radiation is diminished relatively stronger than EUV radiation.
摘要翻译： 多层反射镜在多层镜的顶部包括光谱纯度增强层，例如用于EUV光刻设备中。 该光谱纯度增强层包括第一光谱纯度增强层，但是在多层反射镜和第一光谱纯度增强层之间，可选地可以有中间层或第二光谱纯度增强层和中间层。 因此，具有以下配置的多层反射镜是可能的：多层镜/第一光谱纯度增强层; 多层镜/中间层/第一光谱纯度增强层; 和多层镜/第二光谱纯度增强层/中间层/第一光谱纯度增强层。 可以增强正常入射辐射的光谱纯度，使得DUV辐射比EUV辐射相对更强。
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公开(公告)号：US20060114441A1
公开(公告)日：2006-06-01
申请号：US11335681
申请日：2006-01-20
申请人： Vadim Banine , Levinus Bakker , Jeroen Jonkers , Erik Loopstra
发明人： Vadim Banine , Levinus Bakker , Jeroen Jonkers , Erik Loopstra
IPC分类号： G03B27/72
CPC分类号： G03F7/70008 , G03F7/7005
摘要： A lithographic apparatus includes an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, a substrate table and a projection system. Furthermore, the lithographic apparatus includes a plurality of EUV sources for providing EUV radiation to the illumination system and a distributor which is arranged to convert the EUV radiation from each of the EUV sources into an intermediate beam of radiation. The intermediate beam of radiation is directed from the distributor in a first direction by a mirror surface. The distributor may include a rotationally driven mirror arrangement, the axis of rotation being non-parallel to the mirror surface.
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38.发明申请Lithographic apparatus, radiation system, contaminant trap, device manufacturing method, and method for trapping contaminants in a contaminant trap 有权平版印刷设备，辐射系统，污染物捕集阱，装置制造方法以及在污染物捕集器中捕获污染物的方法公开(公告)号：US20060012761A1
公开(公告)日：2006-01-19
申请号：US10890404
申请日：2004-07-14
IPC分类号： G03B27/52
CPC分类号： G03F7/70908 , G03F7/70916 , G03F7/70933
摘要： A lithographic apparatus includes a radiation system that includes a source for producing a radiation beam, a contaminant trap arranged in a path of the radiation beam, and an illumination system configured to condition the radiation beam produced by the source, and a support for supporting a patterning device. The patterning device serves to impart the conditioned radiation beam with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, and a projection system for projecting the patterned radiation beam onto a target portion of the substrate. The contaminant trap includes a plurality of foils that define channels that are arranged substantially parallel to the direction of propagation of the radiation beam. The trap is provided with a gas supply system that is arranged to inject gas into at least one of the channels of the trap.
摘要翻译： 光刻设备包括辐射系统，其包括用于产生辐射束的源，布置在辐射束的路径中的污染物阱，以及被配置为调节由源产生的辐射束的照明系统，以及用于支撑 图案形成装置。 图案形成装置用于使经调节的辐射束在其横截面上具有图案。 该装置还包括用于保持基板的基板台和用于将图案化的辐射束投影到基板的目标部分上的投影系统。 污染物捕集器包括限定基本上平行于辐射束的传播方向布置的通道的多个箔片。 陷阱设置有气体供应系统，其被布置成将气体注入到阱的至少一个通道中。
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公开(公告)号：US20050254029A1
公开(公告)日：2005-11-17
申请号：US10842637
申请日：2004-05-11
CPC分类号： G03F7/70191 , G03F7/70575
摘要： A lithographic apparatus includes an illumination system configured to transmit a beam of radiation, the beam of radiation comprising desired radiation having a predetermined wavelength or a predetermined wavelength range, and undesired radiation having another wavelength or another wavelength range; a support structure configured to support a patterning structure, the patterning structure being configured to impart the beam of radiation with a pattern in its cross-section; a substrate table configured to hold a substrate; and a projection system configured to project the patterned beam of radiation onto a target portion of the substrate; wherein at least part of the lithographic apparatus, in use, includes a gas substantially transmissive for at least part of the desired radiation and substantially less transmissive for at least part of the undesired radiation.
摘要翻译： 光刻设备包括被配置为透射辐射束的照明系统，所述辐射束包括具有预定波长或预定波长范围的期望辐射，以及具有另一波长或另一波长范围的不需要的辐射; 支撑结构，其构造成支撑图案形成结构，所述图案化结构被配置为在其横截面中赋予所述辐射束的图案; 被配置为保持基板的基板台; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 其中在使用中至少部分光刻设备包括至少部分所需辐射基本上透射的气体，对于至少部分不需要的辐射基本上较少透射。
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40.发明申请Method of and apparatus for supplying a dynamic protective layer to a mirror 审中-公开将动态保护层供应给镜子的方法和装置公开(公告)号：US20050120953A1
公开(公告)日：2005-06-09
申请号：US10957753
申请日：2004-10-05
申请人： Vadim Banine , Levinus Bakker
发明人： Vadim Banine , Levinus Bakker
IPC分类号： G21K1/06 , G03F7/20 , H01L21/027 , C23C16/00
CPC分类号： G03F7/70983 , G03F7/70916 , G03F7/70958
摘要： A method of supplying a dynamic protective layer to a mirror in a lithographic apparatus to protect the mirror from etching by ions is disclosed. The method includes supplying a gaseous matter to a chamber that contains the mirror, monitoring reflectivity of the mirror, and controlling the thickness of the protective layer by controlling a potential of the surface of the mirror, based on the monitored reflectivity of the mirror.
摘要翻译： 公开了一种向光刻设备中的反射镜提供动态保护层以保护镜子免受离子蚀刻的方法。 该方法包括将气体物质提供给包含反射镜的室，监测反射镜的反射率，以及通过控制反射镜表面的电位来控制反射镜表面的电位来控制保护层的厚度。
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