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36 条记录 (耗时 0.031 秒)

    Self-assembly of water-soluble nanocrystals
    32.
    发明授权
    Self-assembly of water-soluble nanocrystals 有权
    水溶性纳米晶体的自组装

    公开(公告)号：US08092595B1

    公开(公告)日：2012-01-10

    申请号：US12038037

    申请日：2008-02-27

    申请人： Hongyou Fan ,  C. Jeffrey Brinker ,  Gabriel P. Lopez

    发明人： Hongyou Fan ,  C. Jeffrey Brinker ,  Gabriel P. Lopez

    IPC分类号： C30B7/04

    CPC分类号： C30B7/14 ,  C30B29/68

    摘要： A method for forming an ordered array of nanocrystals where a hydrophobic precursor solution with a hydrophobic core material in an organic solvent is added to a solution of a surfactant in water, followed by removal of a least a portion of the organic solvent to form a micellar solution of nanocrystals. A precursor co-assembling material, generally water-soluble, that can co-assemble with individual micelles formed in the micellar solution of nanocrystals can be added to this micellar solution under specified reaction conditions (for example, pH conditions) to form an ordered-array mesophase material. For example, basic conditions are used to precipitate an ordered nanocrystal/silica array material in bulk form and acidic conditions are used to form an ordered nanocrystal/silica array material as a thin film.

    摘要翻译： 一种用于形成纳米晶体的有序阵列的方法，其中在有机溶剂中具有疏水性核心材料的疏水性前体溶液加入到表面活性剂在水中的溶液中，然后除去至少一部分有机溶剂以形成胶束 纳米晶体的溶液。 可以在规定的反应条件（例如，pH条件）下，将能够与形成在纳米晶体的胶束溶液中的单个胶束共同组装的通常为水溶性的前体共组装材料加入到该胶束溶液中， 阵列中间相材料。 例如，使用基本条件来沉淀有序的纳米晶体/二氧化硅阵列材料的体积形式，并且酸性条件用于形成有序的纳米晶体/二氧化硅阵列材料作为薄膜。

    Method of controlling the chemical structure of polymeric films by plasma deposition and films produced thereby
    35.
    发明授权
    Method of controlling the chemical structure of polymeric films by plasma deposition and films produced thereby 失效
    通过等离子体沉积控制聚合物膜的化学结构的方法和由此制备的膜

    公开(公告)号：US5153072A

    公开(公告)日：1992-10-06

    申请号：US675531

    申请日：1991-03-25

    申请人： Buddy D. Ratner ,  Gabriel P. Lopez

    发明人： Buddy D. Ratner ,  Gabriel P. Lopez

    IPC分类号： B05D3/06 ,  B05D7/24

    CPC分类号： C08J7/123 ,  B05D1/62 ,  Y10T428/31681 ,  Y10T428/31692 ,  Y10T428/31917 ,  Y10T428/31928

    摘要： A method of controlling the chemical structure of polymeric thin films formed by plasma deposition and films produced by these methods, is disclosed. An important aspect of the method involves controlling the temperature of the substrate and the reactor so as to create a temperature differential between the substrate and reactor such that the precursor molecules are preferentially adsorbed or condensed onto the substrate either during plasma deposition or between plasma deposition steps. The polymeric thin films produced by the methods of this invention exhibit more defined and predictable chemical structures and properties than conventional plasma deposited films.

    摘要翻译： 公开了一种控制通过等离子体沉积形成的聚合物薄膜的化学结构的方法和通过这些方法生产的薄膜。 该方法的一个重要方面包括控制衬底和反应器的温度，以便在衬底和反应器之间产生温度差，使得前体分子在等离子体沉积期间或在等离子体沉积步骤之间优先吸附或冷凝到衬底上 。 通过本发明的方法制备的聚合物薄膜比常规的等离子体沉积膜显示更多的限定和可预测的化学结构和性能。

    Method of controlling the chemical structure of polymeric films by plasma
    36.
    发明授权
    Method of controlling the chemical structure of polymeric films by plasma 失效
    通过等离子体控制聚合物膜的化学结构的方法

    公开(公告)号：US5002794A

    公开(公告)日：1991-03-26

    申请号：US402181

    申请日：1989-08-31

    申请人： Buddy D. Ratner ,  Gabriel P. Lopez

    发明人： Buddy D. Ratner ,  Gabriel P. Lopez

    IPC分类号： B05D3/06 ,  B05D7/24

    CPC分类号： C08J7/123 ,  B05D1/62

    摘要： A method of controlling the chemical structure of thin films formed by plasma deposition and films produced by these methods, is disclosed. An important aspect of the method involves controlling the temperature of the substrate and the reactor so as to create a temperature differential between the substrate and reactor such that the precursor molecules are preferentially adsorbed or condensed onto the substrate either during plasma deposition or between plasma deposition steps. The thin films produced by the methods of this invention exhibit more defined and predictable chemical structures and properties than conventional plasma deposited films.

    摘要翻译： 公开了一种控制通过等离子体沉积形成的薄膜的化学结构的方法和通过这些方法制造的薄膜。 该方法的一个重要方面包括控制衬底和反应器的温度，以便在衬底和反应器之间产生温度差，使得前体分子在等离子体沉积期间或在等离子体沉积步骤之间优先吸附或冷凝到衬底上 。 通过本发明的方法生产的薄膜表现出比常规等离子体沉积膜更加确定和可预测的化学结构和性能。