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公开(公告)号：US5311026A
公开(公告)日：1994-05-10
申请号：US858575
申请日：1992-03-27
IPC分类号： H01L21/027 , H01J37/304
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3045 , H01J2237/1505 , H01J2237/3045 , H01J2237/31776
摘要： The present invention relates to a system for drawing patterns on a wafer by using a charged particle beam such as an electron beam, in which a complicated prealigning mechanism used for mounting the wafer on a stage is omitted. Instead, according to the present system, rotation of the wafer is detected and a shaped beam is rotated by an amount corresponding to the value detected. Subsequently, a predetermined pattern is drawn on the substrate. The system includes a detecting device for detecting the rotation of the wafer by using an orientation flat or adjusting marks; a computer for storing a value corresponding to the rotation thus detected; a rotating lens control circuit for receiving data from the computer; and a rotating lens.
摘要翻译： 本发明涉及一种通过使用诸如电子束的带电粒子束在晶片上绘制图形的系统，其中省略了用于将晶片安装在平台上的复杂预对准机构。 相反，根据本系统，检测晶片的旋转，并且将成形光束旋转与所检测的值对应的量。 随后，在衬底上绘制预定图案。 该系统包括用于通过使用取向平面或调整标记来检测晶片的旋转的检测装置; 用于存储与所检测的旋转对应的值的计算机; 用于从计算机接收数据的旋转透镜控制电路; 和旋转透镜。
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公开(公告)号：US5099926A
公开(公告)日：1992-03-31
申请号：US679246
申请日：1991-04-02
申请人： Fusao Fushiya , Takashi Yamazaki , Yoshio Sugiyama
发明人： Fusao Fushiya , Takashi Yamazaki , Yoshio Sugiyama
CPC分类号： B25D11/005 , B25D2250/131 , B25D2250/191
摘要： An impact tool includes a body, a barrel mounted on the body and a cylinder disposed within the barrel and reciprocally moved by a drive mechanism. A communication groove is formed between the cylinder and the barrel and communicates with the outside. The cylinder includes a plurality of communication holes formed in a radial direction and spaced from each other in a longitudinal direction. A striker is reciprocally movable within the cylinder, and an air chamber is formed between the striker and the cylinder. The striker is positioned at a first position when the tool bit is not pressed on a work. The striker at the first position permits communication between the air chamber and the communication groove through any one of the communication holes so as to be prevented from idle impact. Further, the striker is movable to a second position rearward of the first position through the pressing operation of the tool bit on the work. The striker at a position rearwardly of the second position prevents communication between the air chamber and the communication groove so as to permit normal impact operation by the tool bit.
摘要翻译： 冲击工具包括主体，安装在主体上的筒体和设置在筒体内并由驱动机构往复移动的筒体。 在气缸和筒体之间形成有与外部连通的连通槽。 圆筒包括沿径向形成的多个连通孔，并且在纵向上彼此间隔开。 冲击器在气缸内可往复运动，并且在冲击器和气缸之间形成空气室。 当工具头没有按压在工件上时，撞针位于第一位置。 在第一位置处的撞针允许通过任何一个连通孔在气室和连通槽之间进行连通，以防止空转。 此外，通过工具上的工具钻头的按压操作，撞针可以移动到第一位置后的第二位置。 在第二位置后方的位置处的撞针防止气室和连通槽之间的连通，从而允许工具钻头进行正常的冲击操作。
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公开(公告)号：USD316020S
公开(公告)日：1991-04-09
申请号：US192897
申请日：1988-05-12
申请人： Fusao Fushiya , Takashi Yamazaki , Mikio Saito
设计人： Fusao Fushiya , Takashi Yamazaki , Mikio Saito
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公开(公告)号：US4889759A
公开(公告)日：1989-12-26
申请号：US203539
申请日：1988-06-01
申请人： Takashi Yamazaki
发明人： Takashi Yamazaki
CPC分类号： C09J7/02 , B05B15/0456 , B65H35/004 , C09J2203/31 , Y10S428/906 , Y10T428/1476 , Y10T428/24669 , Y10T428/24686 , Y10T428/24777 , Y10T428/28 , Y10T428/2839 , Y10T428/2848 , Y10T428/31663 , Y10T428/31667
摘要： An apparatus for allying and dispensing a masking paper wound in a roll form includes a housing accommodating the masking paper, a group of rolls for taking the masking paper out of the housing and a cutter blade for cutting the masking paper. The masking paper is a relatively thin synthetic resin film folded in a plurality of parallel pleats and a relatively thick tape disposed along a longitudinal margin of the film and having a pressure sensitive adhesive layer formed on the opposite sides thereof.
摘要翻译： 用于分配卷绕卷筒纸的掩模纸的装置包括容纳掩蔽纸的壳体，用于将掩蔽纸从外壳中取出的一组辊和用于切割掩模纸的切割刀。 掩模纸是折叠成多个平行褶皱的相对薄的合成树脂膜和沿着膜的纵向边缘布置的相对厚的带，并且在其相对侧上形成有压敏粘合剂层。
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公开(公告)号：US4600492A
公开(公告)日：1986-07-15
申请号：US758505
申请日：1985-07-24
申请人： Hirosuke Ooshio , Tetsuo Aikawa , Hidetaka Jo , Haruo Okano , Takashi Yamazaki
发明人： Hirosuke Ooshio , Tetsuo Aikawa , Hidetaka Jo , Haruo Okano , Takashi Yamazaki
CPC分类号： H01J37/3455 , H01J37/3408
摘要： A plurality of bar-like magnets are arranged in a vacuum chamber at an equal space interval to form a plurality of strong magnetic fields in a stripe-pattern form and the magnets are moved reciprocally in the direction of arrangement of the magnetic fields while changing gradually the stop points of the magnets over a work to be processed by etching or sputtering in a step-like manner so that the integral effect of each magnetic field acting on the work is uniform over the entire region of the work.
摘要翻译： 多个棒状磁体以等间距布置在真空室中，以形成条纹图案形式的多个强磁场，并且磁体在磁场的排列方向上往复移动，同时逐渐变化 通过蚀刻或溅射以阶梯状方式处理的工件上的磁体的停止点，使得作用在工件上的每个磁场的整体效应在工件的整个区域上是均匀的。
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公开(公告)号：US4442338A
公开(公告)日：1984-04-10
申请号：US296305
申请日：1981-08-26
申请人： Takashi Yamazaki
发明人： Takashi Yamazaki
IPC分类号： C23F4/00 , H01J37/32 , H01L21/302 , H01L21/3065 , B23K9/00 , C23F1/02
CPC分类号： H01J37/32 , Y10S422/906
摘要： Disclosed ia a plasma etching apparatus in which an etching chamber accomodates a pair of parallel flat plate electrodes facing each other. The etching chamber is also provided with a device for applying high frequency power to one of the electrodes and a system for introducing a reactive gas. An after-treatment chamber is connected to the etching chamber and provided with a system for introducing a heated gas into the interior, a partition means for hermetically partitioning the etching chamber and after-treatment chamber, and a system for transporting the workpiece in the etching chamber into the after-treatment chamber.
摘要翻译： 公开了一种等离子体蚀刻装置，其中蚀刻室容纳彼此面对的一对平行平板电极。 蚀刻室还设置有用于向一个电极施加高频功率的装置和用于引入反应气体的系统。 后处理室连接到蚀刻室，并且设置有用于将加热气体引入内部的系统，用于气蚀分隔蚀刻室和后处理室的分隔装置，以及用于在蚀刻中输送工件的系统 进入后处理室。
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公开(公告)号：US09899385B2
公开(公告)日：2018-02-20
申请号：US13480956
申请日：2012-05-25
IPC分类号： H01L29/66 , H01L27/092 , H01L21/8238 , H01L27/02
CPC分类号： H01L27/0922 , H01L21/823842 , H01L27/0266 , H01L27/0285
摘要： A semiconductor integrated circuit includes a protected circuit connected to two power supply lines that provide a supply voltage, a detecting circuit that includes a resistive element and a capacitive element connected in series between two power supply lines and detects a surge generated in the power supply line based on potential variation of an inter-element connecting node, and a protection transistor that is connected between two power supply lines and has a control electrode connected to an output of the detecting circuit. The protection transistor has the control electrode formed from a different electrode material having a work function difference from a transistor of the same channel conductivity type in the protected circuit, to have a different threshold voltage from the transistor so that the amount of leakage current per unit channel width may be smaller compared with the transistor.
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公开(公告)号：US20140321668A1
公开(公告)日：2014-10-30
申请号：US14359725
申请日：2012-06-04
CPC分类号： H03G3/00 , H03G5/165 , H03G9/005 , H03G9/025 , H04R3/00 , H04R3/007 , H04R3/04 , H04R29/00 , H04R29/001
摘要： A signal processing device includes an excessive input estimating unit 102 that estimates excessive input of a target signal, a controller 105 that calculates frequency characteristics which will lessen the excessive input of the target signal from the excessive input information estimated by the excessive input estimating unit 102, and a frequency characteristic modification unit 103 that modifies the frequency characteristics of the target signal in accordance with the frequency characteristics the controller 105 calculates.
摘要翻译： 信号处理装置包括：估计目标信号的过度输入的过度输入估计单元102;计算频率特性的控制器105，其根据由过量输入估计单元102估计出的过大的输入信息来减小目标信号的过度输入 以及根据控制器105计算的频率特性来修正目标信号的频率特性的频率特性修改单元103。
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公开(公告)号：US08780193B2
公开(公告)日：2014-07-15
申请号：US13071797
申请日：2011-03-25
申请人： Takashi Yamazaki , Takeshi Soeda
发明人： Takashi Yamazaki , Takeshi Soeda
CPC分类号： H04N7/18 , G06T7/62 , G06T7/66 , G06T2207/10056 , G06T2207/30108 , H01J37/26 , H01J37/28 , H01J37/295 , H01J2237/22 , H01J2237/24578 , H01J2237/2805
摘要： A physical properties measuring method includes: acquiring an experimental convergent beam electron diffraction image of a sample by using a transmission electron microscope; calculating Zernike moment intensities of the experimental convergent beam electron diffraction image; and comparing the Zernike moment intensities of the experimental convergent beam electron diffraction image with Zernike moment intensities of calculated convergent beam electron diffraction images calculated on changed physical properties of the sample.
摘要翻译： 物理性质测量方法包括：使用透射电子显微镜获取样品的实验收敛束电子衍射图像; 计算实验收敛束电子衍射图像的泽尼克力矩; 并且将实验收敛束电子衍射图像的泽尼克力矩与用样品的改变的物理性质计算的计算的收敛束电子衍射图像的泽尼克力矩进行比较。
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公开(公告)号：US08766515B2
公开(公告)日：2014-07-01
申请号：US13125000
申请日：2009-10-22
IPC分类号： H03H9/21
CPC分类号： H03H9/21 , H03H9/0547 , H03H9/1021 , H03H9/19 , H03H9/215
摘要： Deterioration of the Q value caused by the thermoelastic effect is suppressed. Since a first depth of a first groove and a second depth of a second groove are smaller than a distance between a surface including a third surface and a surface including a fourth surface, the first and second grooves do not penetrate between the surface including the third surface and the surface including the fourth surface. In addition, the sum of the first depth of the first groove and the second depth of the second groove is greater than the distance between the third and fourth surfaces, a heat transfer path between a first expandable portion (the first surface) and a second expandable portion (the second surface) cannot be formed as a straight line. As such, the heat transfer path between the first expandable portion (the first surface) and a second expandable portion (the second surface) is made to detour to the first and second grooves and and thus be lengthened.
摘要翻译： 抑制由热弹性效应引起的Q值的劣化。 由于第一凹槽的第一深度和第二凹槽的第二深度小于包括第三表面的表面和包括第四表面的表面之间的距离，所以第一和第二凹槽不会穿过包括第三凹槽的表面 表面和包括第四表面的表面。 此外，第一凹槽的第一深度和第二凹槽的第二深度之和大于第三和第四表面之间的距离，第一可膨胀部分（第一表面）和第二凹槽之间的传热路径 可膨胀部分（第二表面）不能形成为直线。 因此，使第一可膨胀部分（第一表面）和第二可膨胀部分（第二表面）之间的传热路径绕第一和第二槽弯曲并因此被延长。
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