公开(公告)号：US11361936B2

公开(公告)日：2022-06-14

申请号：US17030983

申请日：2020-09-24

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Ayana Muraki ,  Atsushi Uemoto ,  Tatsuya Asahata

IPC: H01J37/20 ,  H01J37/32 ,  H01J37/244

Abstract: To accomplish fast automated micro-sampling, provided is a charged particle beam apparatus, which is configured to automatically fabricate a sample piece from a sample, the charged particle beam apparatus including: a charged particle beam irradiation optical system configured to radiate a charged particle beam; a sample stage configured to move the sample that is placed on the sample stage; a sample piece transportation unit configured to hold and convey the sample piece separated and extracted from the sample; a holder fixing base configured to hold a sample piece holder to which the sample piece is transported; and a computer configured to perform position control with respect to a second target, based on a machine learning model in which first information including a first image of a first target is learned, and on second information including a second image, which is obtained by irradiation with the charged particle beam.

公开(公告)号：US10658147B2

公开(公告)日：2020-05-19

申请号：US15468290

申请日：2017-03-24

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Makoto Sato ,  Satoshi Tomimatsu ,  Atsushi Uemoto ,  Tatsuya Asahata

IPC: H01J37/02 ,  H01J37/20

Abstract: A charged particle beam apparatus which automatically prepares a sample piece from a sample, includes: a charged particle beam irradiation optical system configured to perform irradiation of a charged particle beam; a sample stage configured to move, the sample being placed on the sample stage; a sample piece relocation unit configured to hold and transport the sample piece which is separated and picked up from the sample; a holder fixing stage which holds a sample piece holder to which the sample piece is relocated; and a computer which performs positional control in relation to a target object based on a template and positional information which is obtained from an image of the target object, the template being generated based on an absorption current image of the target object which is acquired using the irradiation of the charged particle beam.

公开(公告)号：US20190157037A1

公开(公告)日：2019-05-23

申请号：US16192723

申请日：2018-11-15

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Satoshi TOMIMATSU ,  Tatsuya Asahata ,  Makoto Sato ,  Masato Suzuki

IPC: H01J37/28 ,  G02B27/09 ,  G01N23/225

Abstract: (Task) To repeatedly perform an operation of extracting a sample piece formed by processing a sample with an ion beam and of transferring the extracted sample piece to a sample piece holder.(Problem Solving Means) A charged particle beam apparatus includes a computer that sets a shaping processing region including a bottom portion of s ample piece in a thickness direction of the sample piece corresponding to a depth direction at the time of processing a sample after a needle holds the sample piece, and controls a focused ion beam irradiation optical system to irradiate the shaping processing region with a focused ion beam to thereby shape the sample piece.

公开(公告)号：US10096449B2

公开(公告)日：2018-10-09

申请号：US15162133

申请日：2016-05-23

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Xin Man ,  Tatsuya Asahata ,  Atsushi Uemoto

IPC: H01J37/304 ,  H01J37/22 ,  G01N23/2202 ,  G01N23/2251 ,  G01N23/20091 ,  H01J37/305 ,  H01J37/28 ,  H01J37/29 ,  G01N1/32

Abstract: A cross-section processing-and-observation method includes: a cross-section exposure step of irradiating a sample with a focused ion beam to expose a cross-section of the sample; a cross-sectional image acquisition step of irradiating the cross-section with an electron beam to acquire a cross-sectional image of the cross-section; and a step of repeatedly performing the cross-section exposure step and the cross-sectional image acquisition step along a predetermined direction of the sample at a setting interval to acquire a plurality of cross-sectional images of the sample. In the cross-sectional image acquisition step, a cross-sectional image is acquired under different condition settings for a plurality of regions of the cross-section.

公开(公告)号：US10088401B2

公开(公告)日：2018-10-02

申请号：US15317030

申请日：2015-06-29

Applicant: Hitachi High-Tech Science Corporation

Inventor： Atsushi Uemoto ,  Tatsuya Asahata ,  Makoto Sato ,  Yo Yamamoto

IPC: H01J37/31 ,  G01N1/44 ,  H01J37/317

Abstract: A charged particle beam device (10a) includes a computer (21) which controls multiple charged particle beam irradiation optical systems, the needle (18), and a gas supply portion (17) to transfer a sample piece Q to a predetermined position of the sample piece holder P, based on at least images of a sample piece holder (P), a needle (18), and the sample piece (Q) previously acquired by multiple charged particle beams.

公开(公告)号：US09741535B2

公开(公告)日：2017-08-22

申请号：US14859726

申请日：2015-09-21

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Shota Torikawa ,  Tatsuya Asahata ,  Atsushi Uemoto ,  Makoto Sato

IPC: H01J37/304

CPC classification number: H01J37/3045 ,  H01J2237/317

Abstract: A charged particle beam apparatus includes a stage for fixing a sample, a driving mechanism for driving the stage, a focused ion beam column, an electron beam column, a detector that detects a secondary charged particle emitted from the sample irradiated with a charged particle beam, a gas supplying device that supplies gas for forming a deposition film on a surface of the sample, and a control device that generates image data indicating the position distribution of the secondary charged particle detected by the detector. The control device irradiates the sample with the electron beam prior to irradiating the sample with a focused ion beam, recognizes an alignment mark provided in the sample in the image data by the electron beam, and performs positioning of an irradiation region of the sample using the alignment mark.

公开(公告)号：US09347896B2

公开(公告)日：2016-05-24

申请号：US14475046

申请日：2014-09-02

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Xin Man ,  Tatsuya Asahata ,  Atsushi Uemoto

IPC: G01N23/225 ,  H01J37/28 ,  H01J37/305 ,  G01N23/22 ,  G01N23/20 ,  G01N1/32

CPC classification number: H01J37/222 ,  G01N1/32 ,  G01N23/20091 ,  G01N23/2202 ,  G01N23/2251 ,  G01N2223/418 ,  H01J37/28 ,  H01J37/292 ,  H01J37/3053 ,  H01J37/3056 ,  H01J2237/2811 ,  H01J2237/31749

Abstract: A cross-section processing-and-observation method, including a cross-section exposure step in which a sample is irradiated with a focused ion beam to expose a cross-section of the sample, and a cross-sectional image acquisition step in which the cross-section is irradiated with an electron beam to acquire a cross-sectional image of the cross-section. The cross-section exposure step and the cross-sectional image acquisition step are repeatedly performed along a predetermined direction of the sample at a setting interval to acquire multiple cross-sectional images of the sample. The method also includes a specific observation target detection step in which a predetermined specific observation target from the cross-sectional image acquired a the cross-sectional image acquisition step is detected. In the specific observation target detection step, after a predetermined specific observation target is detected, the setting interval of the cross-section exposure step is set to be shorter than that before the specific observation target is detected.

Abstract translation: 一种截面处理和观察方法，包括横截面曝光步骤，其中用聚焦离子束照射样品以暴露样品的横截面;以及横截面图像获取步骤，其中， 横截面用电子束照射以获得横截面的横截面图像。 横截面曝光步骤和横截面图像获取步骤沿着样品的预定方向以设定间隔重复进行，以获得样品的多个横截面图像。 该方法还包括特定观察目标检测步骤，其中检测到获取截面图像的横截面图像中的预定特定观察目标。 在特定观察目标检测步骤中，在检测到预定的特定观察目标之后，将横截面曝光步骤的设定间隔设定为短于检测出特定观察对象之前的设定间隔。

公开(公告)号：US09269539B2

公开(公告)日：2016-02-23

申请号：US14665410

申请日：2015-03-23

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Tatsuya Asahata ,  Hidekazu Suzuki ,  Makoto Sato

IPC: H01J37/00 ,  H01J37/317 ,  H01J37/244 ,  H01J37/22

CPC classification number: H01J37/317 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J37/3005 ,  H01J2237/221 ,  H01J2237/2448 ,  H01J2237/30466 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: A focused ion beam apparatus includes: a focused ion beam tube configured to irradiate a focused ion beam onto a sample; a detector configured to detect secondary particles generated from the sample due to the irradiation and to output detection information regarding detected secondary particles; an image forming unit configured to form an observation image of the sample based on the detection information; a storage unit configured to store positional relation between a first processing area set on an observation image of a first sample and a cross-section surface of the first sample; and a processing area setting unit configured to automatically set a second processing area on an observation image of a second sample based on the positional relation stored in the storage unit and a position of a cross-section surface of the second sample on the observation image of the second sample.

Abstract translation: 聚焦离子束装置包括：聚焦离子束管，被配置为将聚焦的离子束照射到样品上; 检测器，其被配置为检测由于所述照射而从所述样品产生的二次粒子，并输出关于检测到的二次粒子的检测信息; 图像形成单元，被配置为基于所述检测信息形成所述样本的观察图像; 存储单元，被配置为存储设置在第一样本的观察图像上的第一处理区域和第一样本的截面之间的位置关系; 以及处理区域设定单元，被配置为基于存储在存储单元中的位置关系和第二样本的横截表面的位置来自动设置第二样本的观察图像上的第二处理区域， 第二个样本。

公开(公告)号：US08822911B2

公开(公告)日：2014-09-02

申请号：US13839989

申请日：2013-03-15

Applicant: Hitachi High-Tech Science Corporation

Inventor： Yasuhiko Sugiyama ,  Tatsuya Asahata ,  Toshio Doi ,  Hiroshi Oba

IPC: H01J3/14

CPC classification number: H01J3/14 ,  H01J37/304 ,  H01J2237/0458 ,  H01J2237/30433 ,  H01J2237/30472 ,  H01J2237/31749

Abstract: Provided is a focused ion beam apparatus including a control portion configured to: store in advance, in a condenser voltage table, a calculation value of a condenser voltage for obtaining a reference beam current for all each of a plurality of apertures; obtain an experimental value of the condenser voltage for obtaining the reference beam current for a reference aperture; obtain a correction value of the condenser voltage by subtracting the calculation value stored for the reference aperture from the experimental value for the reference aperture; obtain setting values of the condenser voltage by adding the correction value to the calculation values stored for each of the plurality of the apertures; and store the obtained setting value in the condenser voltage table.

Abstract translation: 提供了一种聚焦离子束装置，其包括控制部分，该控制部分被配置为：预先存储在聚光器电压表中的用于为多个孔中的每一个获得参考光束电流的聚光器电压的计算值; 获得用于获得参考光圈的参考光束电流的电容器电压的实验值; 通过从参考孔径的实验值中减去存储在参考孔径上的计算值来获得冷凝器电压的校正值; 通过将所述校正值与对于所述多个孔中的每一个存储的计算值相加来获得所述冷凝器电压的设定值; 并将获得的设定值存储在冷凝器电压表中。

公开(公告)号：US08642980B2

公开(公告)日：2014-02-04

申请号：US13840311

申请日：2013-03-15

Applicant: Hitachi High-Tech Science Corporation

Inventor： Xin Man ,  Yo Yamamoto ,  Atsushi Uemoto ,  Tatsuya Asahata

IPC: G01N23/225 ,  H01J37/26 ,  H01J37/317

CPC classification number: H01J37/20 ,  H01J37/023 ,  H01J37/3005 ,  H01J2237/0245

Abstract: Provided is a composite charged particle beam apparatus, including: an electron beam column for irradiating a sample with an electron beam; an ion beam column for irradiating the sample with an ion beam to perform etching processing; a sample stage drive portion for moving a sample stage in an irradiation axis direction of the electron beam; and a column adjusting portion for moving the ion beam column relatively to a sample chamber such that the sample is irradiated with the ion beam at a position irradiated with the electron beam.

Abstract translation: 提供一种复合带电粒子束装置，包括：用于用电子束照射样品的电子束柱; 离子束柱，用离子束照射样品进行蚀刻处理; 用于在电子束的照射轴方向移动样品台的样品台驱动部分; 以及用于相对于样品室移动离子束柱的柱调节部分，使得样品在被电子束照射的位置处被离子束照射。