Multiplexing pixel circuits
    33.
    发明授权
    Multiplexing pixel circuits 有权
    多路复用像素电路

    公开(公告)号:US06476787B1

    公开(公告)日:2002-11-05

    申请号:US09186313

    申请日:1998-11-04

    IPC分类号: G09G336

    摘要: An active matrix display in accordance with the present invention includes a plurality of pixels arranged in an array. At least two transistors are included for coupling to each pixel, and the transistors are positioned within the array for switching the pixels on and off according to data and gate signals. A plurality of control lines are coupled to the transistors of each pixel such that the control lines provide multiplexing for at least one of data signal multiplexing and gate signal multiplexing.

    摘要翻译: 根据本发明的有源矩阵显示器包括排列成阵列的多个像素。 包括用于耦合到每个像素的至少两个晶体管,并且晶体管位于阵列内,用于根据数据和门信号开启和关闭像素。 多个控制线耦合到每个像素的晶体管,使得控制线为数据信号复用和门信号复用中的至少一个提供复用。

    Silicon photonic chip optical coupling structures
    34.
    发明授权
    Silicon photonic chip optical coupling structures 有权
    硅光子芯片光耦合结构

    公开(公告)号:US08855452B2

    公开(公告)日:2014-10-07

    申请号:US13353118

    申请日:2012-01-18

    IPC分类号: G02B6/34 G02B6/12

    CPC分类号: G02B6/4204 G02B6/34

    摘要: A silicon photonic chip is provided. An active silicon layer that includes a photonic device is on a front side of the silicon photonic chip. A silicon substrate that includes an etched backside cavity is on a backside of the silicon photonic chip. A microlens is integrated into the etched backside cavity. A buried oxide layer is located between the active silicon layer and the silicon substrate. The buried oxide layer is an etch stop for the etched backside cavity.

    摘要翻译: 提供硅光子芯片。 包括光子器件的有源硅层位于硅光子芯片的前侧。 包括蚀刻的背面腔的硅衬底位于硅光子芯片的背面。 将微透镜集成到蚀刻的背面腔中。 掩埋氧化物层位于有源硅层和硅衬底之间。 掩埋氧化物层是用于蚀刻的背面腔的蚀刻停止。

    Dosimeter Powered by Passive RF Absorption
    35.
    发明申请
    Dosimeter Powered by Passive RF Absorption 有权
    剂量计由被动RF吸收

    公开(公告)号:US20110127438A1

    公开(公告)日:2011-06-02

    申请号:US12627076

    申请日:2009-11-30

    IPC分类号: G01T1/02 G01T3/00

    CPC分类号: G01T1/026

    摘要: A system for determining an amount of radiation includes a dosimeter configured to receive the amount of radiation, the dosimeter comprising a circuit having a resonant frequency, such that the resonant frequency of the circuit changes according to the amount of radiation received by the dosimeter, the dosimeter further configured to absorb RF energy at the resonant frequency of the circuit; a radio frequency (RF) transmitter configured to transmit the RF energy at the resonant frequency to the dosimeter; and a receiver configured to determine the resonant frequency of the dosimeter based on the absorbed RF energy, wherein the amount of radiation is determined based on the resonant frequency.

    摘要翻译: 用于确定辐射量的系统包括配置成接收辐射量的剂量计,该剂量计包括具有谐振频率的电路,使得电路的谐振频率根据剂量计接收的辐射量而改变, 剂量计还被配置为吸收电路的谐振频率处的RF能量; 射频(RF)发射器,被配置为以共振频率将所述RF能量传输到所述剂量计; 以及接收器,被配置为基于所吸收的RF能量来确定所述剂量计的谐振频率,其中所述辐射量基于所述谐振频率来确定。

    CHARGING-FREE ELECTRON BEAM CURE OF DIELECTRIC MATERIAL
    36.
    发明申请
    CHARGING-FREE ELECTRON BEAM CURE OF DIELECTRIC MATERIAL 失效
    无电子电子束光电材料

    公开(公告)号:US20090181534A1

    公开(公告)日:2009-07-16

    申请号:US12013799

    申请日:2008-01-14

    IPC分类号: H01L21/4763 B05C11/00

    摘要: An ultra low-k dielectric material layer is formed on a semiconductor substrate. In one embodiment, a grid of wires is placed at a distance above a top surface of the ultra low-k dielectric material layer and is electrically biased such that the total electron emission coefficient becomes 1.0 at the energy of electrons employed in electron beam curing of the ultra low-k dielectric material layer. In another embodiment, a polymeric conductive layer is formed directly on the ultra low-k dielectric material layer and is electrically biased so that the total electron emission coefficient becomes 1.0 at the energy of electrons employed in electron beam curing of the ultra low-k dielectric material layer. By maintaining the total electron emission coefficient at 1.0, charging of the substrate is avoided, thus protecting any device on the substrate from any adverse changes in electrical characteristics.

    摘要翻译: 在半导体基板上形成超低k电介质材料层。 在一个实施例中,电线格栅放置在超低k电介质材料层的顶表面上方的距离处,并被电偏置,使得在电子束固化中使用的电子的能量下,总电子发射系数为1.0 超低k电介质材料层。 在另一个实施例中,聚合物导电层直接形成在超低k电介质材料层上并被电偏置,使得在超低k电介质的电子束固化中使用的电子能量下,总电子发射系数变为1.0 材料层。 通过将总电子发射系数保持在1.0,避免了衬底的充电,从而保护衬底上的任何器件免受电特性的任何不利变化。

    Method of detecting and transmitting radiation detection information to a network
    38.
    发明授权
    Method of detecting and transmitting radiation detection information to a network 失效
    检测和发射辐射检测信息到网络的方法

    公开(公告)号:US07491948B2

    公开(公告)日:2009-02-17

    申请号:US11342429

    申请日:2006-01-30

    IPC分类号: G01T3/00

    CPC分类号: G01T1/04

    摘要: A method of detecting and transmitting radiation detection information to a network. The method including: communicating with one or more personal radiation detection devices, each device including, a host memory, an event memory, a microprocessor, a global positioning unit and a transceiver or a transmitter; a radiation shield around the host memory and the event memory; a radiation detection memory, the radiation detection memory, responsive to alpha radiation and including two or more SRAM arrays including cross-coupled invertors coupled to wordlines through different value capacitors; a conversion device including a material able to convert neutron and/or gamma radiation into alpha radiation; and an event detection circuit configured to detect and to store data relative to detection of the alpha radiation events by the radiation detection memory; storing the data in the event memory; and retrieving, in a reading device of the network, the data stored in the event memory.

    摘要翻译: 一种检测和发射辐射检测信息到网络的方法。 该方法包括:与一个或多个个人辐射检测设备通信,每个设备包括主机存储器,事件存储器,微处理器,全球定位单元和收发器或发射器; 围绕主机存储器和事件存储器的辐射屏蔽; 辐射检测存储器,所述辐射检测存储器响应于α辐射并且包括两个或更多个SRAM阵列,包括通过不同值电容器耦合到字线的交叉耦合的反相器; 转换装置,其包括能够将中子和/或γ辐射转换为α辐射的材料; 以及事件检测电路,被配置为检测并存储相对于所述辐射检测存储器对所述α辐射事件的检测的数据; 将数据存储在事件存储器中; 以及在所述网络的读取设备中检索存储在所述事件存储器中的数据。

    Thin film transistor and multilayer film structure and manufacturing method of same
    40.
    发明授权
    Thin film transistor and multilayer film structure and manufacturing method of same 失效
    薄膜晶体管和多层膜结构及其制造方法相同

    公开(公告)号:US06791144B1

    公开(公告)日:2004-09-14

    申请号:US09604430

    申请日:2000-06-27

    IPC分类号: H01L2701

    摘要: The present invention is directed to a thin film transistor (and related multilayer structures) that includes: source and drain electrodes 14 and 15 disposed at a specified interval above an insulating substrate 11 and formed by printing-and-plating; an a-Si-film 16 disposed for the source and drain electrodes 14 and 15; a gate insulating film 17 laminated on the a-Si film 16; and a gate electrode 18 laminated on the gate insulating film 17 and formed by printing-and-plating. The a-Si film 16 and the gate insulating film 17 have an offset region 20 that uniformly extends beyond the dimensions of the gate electrode 18.

    摘要翻译: 本发明涉及一种薄膜晶体管(及相关的多层结构),其包括:以绝缘基板11上方的特定间隔设置并通过印刷和电镀形成的源极和漏极14和15; 为源极和漏极14和15设置的a-Si膜16; 层叠在a-Si膜16上的栅极绝缘膜17; 以及层叠在栅极绝缘膜17上并通过印刷和电镀形成的栅电极18。 a-Si膜16和栅极绝缘膜17具有均匀地延伸超过栅电极18的尺寸的偏移区域20。