摘要:
A semiconductor device may include plugs disposed in a zigzag pattern, interconnections electrically connected to the plugs and a protection pattern which is interposed between the plugs and the interconnections to selectively expose the plugs. The interconnections may include a connection portion which is in contact with plugs selectively exposed by the protection pattern. A method of manufacturing a semiconductor device includes, after forming a molding pattern and a mask pattern, selectively etching a protection layer using the mask pattern to form a protection pattern exposing a plug.
摘要:
An apparatus and method of controlling emission of a laser beam in an image forming apparatus. The method includes generating a first reference voltage and a second reference voltage corresponding to a normal mode and a toner save mode, supplying one of the first reference voltage and the second reference voltage corresponding to a mode selection signal in a switching manner, generating a first control voltage and second control voltage to control emission of the laser beam, and supplying a drive current corresponding to one of the generated first and second control voltages to a laser diode to control intensity of the laser beam according to the selection mode.
摘要:
The present invention relates to a method for fabricating a capacitor of a semiconductor device. The method includes the steps of: forming a first amorphous silicon layer doped with an impurity in a predetermined first doping concentration suppressing dopants from locally agglomerating; forming an impurity undoped second amorphous silicon layer on the first amorphous silicon layer in an in-situ condition; forming a storage node by patterning the first amorphous silicon layer and the second amorphous silicon layer; forming silicon grains on a surface of the storage node; and doping the impurity to the storage node and the silicon grains until reaching a second predetermined concentration for providing conductivity required by the storage node.
摘要:
The present invention relates to a method for fabricating a capacitor of a semiconductor device. The method includes the steps of: forming a first amorphous silicon layer doped with an impurity in a predetermined first doping concentration suppressing dopants from locally agglomerating; forming an impurity undoped second amorphous silicon layer on the first amorphous silicon layer in an in-situ condition; forming a storage node by patterning the first amorphous silicon layer and the second amorphous silicon layer; forming silicon grains on a surface of the storage node; and doping the impurity to the storage node and the silicon grains until reaching a second predetermined concentration for providing conductivity required by the storage node.
摘要:
Disclosed is an apparatus and a method for displaying images or videos in a telecommunication terminal having a rotatable display. When the display has been rotated, images or videos are displayed as they are and, when the display has not been rotated, target regions are chosen from the images or videos based on the screen size and are displayed.
摘要:
Self-seeding method and apparatus for a dual cavity type tunable laser utilizing a diffraction grating are disclosed, in which first diffracted beams and 0th diffracted beams are utilized. The self-seeding method and apparatus for a dual cavity type tunable laser are constituted such that two oscillators are internally provided by utilizing a diffraction grating and by making a single medium shared, so that the respective oscillators would serve as a master oscillator and a slave oscillator, thereby making it possible to save optical devices. Further, in the present invention, only one partially reflecting mirror is disposed on the output portion of a GIM (grazing incidence with tuning mirror) type oscillator, so that a self-seeding would occur, and that the laser output would be greatly amplified with the oscillation linewidth maintained without variations.
摘要:
A semiconductor device includes first, second, and third conductive lines, each with a respective line portion formed over a substrate and extending in a first direction and with a respective branch portion extending from an end of the respective line portion in a direction different from the first direction. The branch portion of a middle conductive line is disposed between and shorter than the respective branch portions of the outer conductive lines such that contact pads may be formed integral with such branch portions of the conductive lines.
摘要:
Methods of forming memory devices are provided. The methods may include forming a pre-stacked gate structure including a lower structure and a first polysilicon pattern on the substrate. The methods may also include forming an insulation layer covering the pre-stacked gate structure. The methods may further include forming a trench in the insulation layer by removing a portion of the first polysilicon pattern. The methods may additionally include forming a metal film pattern in the trench on the first polysilicon pattern. The methods may also include forming a first metal silicide pattern by performing a first thermal treatment on the first polysilicon pattern and the metal film pattern. The methods may further include forming a second polysilicon pattern in the trench. The methods may additionally include forming a second metal silicide pattern by performing a second thermal treatment on the second polysilicon pattern and the first metal silicide pattern.
摘要:
A battery pack includes: a bare cell; a protection circuit module electrically connected to the bare cell; a thermistor configured to sense a temperature of the bare cell and electrically coupled to the protection circuit module, the thermistor having a lead, the lead having a lead end portion adjacent to the protection circuit module, the lead end portion having a first side facing the protection circuit module; and a support between the first side of the lead end portion and the protection circuit module.
摘要:
Size-controlled immobilization of metal nano-clusters onto particles or nanoparticles is achieved using a polyol process. Polyol processing makes it possible to use thiol groups as a chemical protocol to functionalize the surface of particles, such as silica and polystyrene nanoparticles. Metal nano-clusters, such as silver, gold, platinum and palladium, nucleate and grow on the surface of the particles. The metal nano-clusters may be synthesized in a one-pot process from metal salts, nitrates, nitrites, sulfates, sulfites and the like. Any source of metal ions compatible with the polyol suspension and selected particles may be used. The size of immobilized metal nano-clusters may be controlled by additions of a poly(vinylpyrrolidone) or other polymer capable of regulating the metal ion reduction and nucleation process and by controlling concentration of metal ions, the nucleation and/or growth temperatures, and processing time.