公开(公告)号：US20090106714A1

公开(公告)日：2009-04-23

申请号：US11876853

申请日：2007-10-23

Applicant: James A. Culp ,  Paul Chang ,  Dureseti Chidambarrao ,  Praveen Elakkumanan ,  Jason Hibbeler ,  Anda C. Mocuta

Inventor： James A. Culp ,  Paul Chang ,  Dureseti Chidambarrao ,  Praveen Elakkumanan ,  Jason Hibbeler ,  Anda C. Mocuta

IPC: G06F9/45

CPC classification number: G01R31/26 ,  G06F17/5045

Abstract: Impact on parametric performance of physical design choices for transistors is scored for on-current and off-current of the transistors. The impact of the design parameters are incorporated into parameters that measure predicted shift in mean on-current and mean off-current and parameters that measure predicted increase in deviations in the distribution of on-current and the off-current. Statistics may be taken at a cell level, a block level, or a chip level to optimize a chip design in a design phase, or to predict changes in parametric yield during manufacturing or after a depressed parametric yield is observed. Further, parametric yield and current level may be predicted region by region and compared with observed thermal emission to pinpoint any anomaly region in a chip to facilitate detection and correction in any mistakes in chip design.

Abstract translation: 对晶体管的导通电流和截止电流对晶体管的物理设计选择的参数性能的影响。 设计参数的影响被纳入测量平均电流和平均截止电流的预测偏差的参数以及测量导通电流和截止电流分布的偏差预测增加的参数。 可以在单元级别，块级或芯片级别进行统计，以在设计阶段优化芯片设计，或者在制造期间或在观察到抑制参数产量之后预测参数产量的变化。 此外，可以逐区域地预测参数产量和电流水平，并与观察到的热发射进行比较，以确定芯片中的任何异常区域，以便在芯片设计中的任何错误中进行检测和校正。

公开(公告)号：US07503028B2

公开(公告)日：2009-03-10

申请号：US11306750

申请日：2006-01-10

Applicant: Maharaj Mukherjee ,  James A. Culp ,  Lars Liebmann ,  Scott M. Mansfield

Inventor： Maharaj Mukherjee ,  James A. Culp ,  Lars Liebmann ,  Scott M. Mansfield

IPC: G06F17/50

CPC classification number: G03F1/36

Abstract: A method is provided for designing a mask layout for an integrated circuit that ensures proper functional interaction among circuit features by including functional inter-layer and intra-layer constraints on the wafer. The functional constraints used according to the present invention are applied among the simulated wafer images to ensure proper functional interaction, while relaxing or eliminating the EPE constraints on the location of the wafer images.

Abstract translation: 提供了一种用于设计用于集成电路的掩模布局的方法，其通过在晶片上包括功能层间和层内约束来确保电路特征之间的适当的功能交互。 根据本发明使用的功能约束应用于模拟晶片图像中，以确保正确的功能交互，同时放松或消除对晶片图像的位置的EPE约束。

公开(公告)号：US20080163153A1

公开(公告)日：2008-07-03

申请号：US11619320

申请日：2007-01-03

Applicant: Maharaj Mukherjee ,  James A. Culp ,  Scott M. Mansfield

Inventor： Maharaj Mukherjee ,  James A. Culp ,  Scott M. Mansfield

IPC: G06F17/50

CPC classification number: G03F1/36

Abstract: A method, system and computer program product for verifying printability of a mask layout for a photolithographic process are disclosed. A simulation of the photolithographic process for the designed mask layout is simulated using a simplified version of the mask layout with a lower accuracy to generate a lower accuracy simulated image. Where the lower accuracy simulated image is determined as potentially including an error, a further simulation of the designated portion of the mask layout with a higher accuracy will be performed.

Abstract translation: 公开了一种用于验证光刻工艺的掩模布局的可印刷性的方法，系统和计算机程序产品。 使用精度较低的掩模布局的简化版本来模拟设计的掩模布局的光刻工艺的模拟，以产生较低精度的模拟图像。 在将低精度模拟图像确定为潜在地包括错误的情况下，将执行具有更高精度的掩模布局的指定部分的进一步模拟。

公开(公告)号：US08470713B2

公开(公告)日：2013-06-25

申请号：US12966432

申请日：2010-12-13

Applicant: James A. Culp ,  John J. Ellis-Monaghan ,  Jeffrey P. Gambino ,  Kirk D. Peterson ,  Jed H. Rankin ,  Christa R. Willets

Inventor： James A. Culp ,  John J. Ellis-Monaghan ,  Jeffrey P. Gambino ,  Kirk D. Peterson ,  Jed H. Rankin ,  Christa R. Willets

IPC: H01L21/311

CPC classification number: H01L21/31116 ,  H01L21/28035 ,  H01L21/76237 ,  H01L21/823425 ,  H01L21/823468 ,  H01L21/823481 ,  H01L29/78

Abstract: A method of forming dielectric spacers including providing a substrate comprising a first region having a first plurality of gate structures and a second region having a second plurality of gate structures and at least one oxide containing material or a carbon containing material. Forming a nitride containing layer over the first region having a thickness that is less than the thickness of the nitride containing layer that is present in the second region. Forming dielectric spacers from the nitride containing layer on the first plurality the second plurality of gate structures. The at least one oxide containing material or carbon containing material accelerates etching in the second region so that the thickness of the dielectric spacers in the first region is substantially equal to the thickness of the dielectric spacers in the second region of the substrate.

Abstract translation: 一种形成电介质间隔物的方法，包括提供包括具有第一多个栅极结构的第一区域和具有第二多个栅极结构的第二区域和至少一种含氧化物的材料或含碳材料的衬底。 在第一区域上形成厚度小于存在于第二区域中的含氮化物层的厚度的含氮化物层。 在第一多个第二多个栅极结构上从氮化物含有层形成电介质间隔物。 所述至少一种含氧化物的材料或含碳材料加速了第二区域中的蚀刻，使得第一区域中的电介质间隔物的厚度基本上等于衬底的第二区域中的电介质间隔物的厚度。

公开(公告)号：US08381141B2

公开(公告)日：2013-02-19

申请号：US12914212

申请日：2010-10-28

Applicant: Stephen E. Fischer ,  James A. Culp ,  Robert T. Sayah

Inventor： Stephen E. Fischer ,  James A. Culp ,  Robert T. Sayah

IPC: G06F17/50

CPC classification number: G03F7/705

Abstract: A set of optical rule checker (ORC) markers are identified in a simulated lithographic pattern generated for a set of data preparation parameters and lithographic processing conditions. Each ORC marker identifies a feature in the simulated lithographic pattern that violates rules of the ORC. A centerline is defined in each ORC marker, and a minimum dimension region is generated around each centerline with a minimum width that complies with the rules of the ORC. A failure region is defined around each ORC marker by removing regions that overlap with the ORC marker from the minimum dimension region. The areas of all failure regions are added to define a figure of demerit, which characterizes the simulated lithographic pattern. The figure of demerit can be evaluated for multiple simulated lithographic patterns or iteratively decreased by modifying the set of data preparation parameters and lithographic processing conditions.

Abstract translation: 在为一组数据准备参数和光刻处理条件生成的模拟光刻图案中识别一组光学规则检查器（ORC）标记。 每个ORC标记识别模拟光刻图案中违反ORC规则的特征。 在每个ORC标记中定义一个中心线，并且在每个中心线周围生成最小尺寸区域，其最小宽度符合ORC的规则。 通过从最小尺寸区域去除与ORC标记重叠的区域，在每个ORC标记周围定义故障区域。 添加所有故障区域的区域以定义模拟光刻图案的特征。 可以通过修改数据准备参数和光刻处理条件的集合来评估多个模拟光刻图案或迭代降低的缺点。

公开(公告)号：US08336008B2

公开(公告)日：2012-12-18

申请号：US12569421

申请日：2009-09-29

Applicant: James A. Culp ,  Jerry D. Hayes ,  Ying Liu ,  Anthony D. Polson

Inventor： James A. Culp ,  Jerry D. Hayes ,  Ying Liu ,  Anthony D. Polson

IPC: G06F17/50

CPC classification number: G06F17/5036 ,  H01L22/34 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Mechanisms are provided for characterizing long range variability in integrated circuit manufacturing. A model derivation component tests one or more density pattern samples, which are a fabricated integrated circuits having predetermined pattern densities and careful placement of current-voltage (I-V) sensors. The model derivation component generates one or more empirical models to establish range of influence of long range variability effects in the density pattern sample. A variability analysis component receives an integrated circuit design and, using the one or more empirical models, analyzes the integrated circuit design to isolate possible long range variability effects in the integrated circuit design.

Abstract translation: 提供了用于表征集成电路制造中的长距离变化的机制。 模型推导部件测试一个或多个密度样本样本，其是具有预定图案密度的制造的集成电路和电流 - 电压（I-V）传感器的仔细放置。 模型推导组件产生一个或多个经验模型，以确定密度模式样本中长距离变异效应的影响范围。 可变性分析组件接收集成电路设计，并且使用一个或多个经验模型分析集成电路设计以隔离集成电路设计中的可能的长距离变化效应。

公开(公告)号：US08239790B2

公开(公告)日：2012-08-07

申请号：US13216362

申请日：2011-08-24

Applicant: James A. Culp ,  Paul Chang ,  Dureseti Chidambarrao ,  Praveen Elakkumanan ,  Jason Hibbeler ,  Anda C. Mocuta

Inventor： James A. Culp ,  Paul Chang ,  Dureseti Chidambarrao ,  Praveen Elakkumanan ,  Jason Hibbeler ,  Anda C. Mocuta

IPC: G06F17/50

CPC classification number: G01R31/26 ,  G06F17/5045

Abstract: Impact on parametric performance of physical design choices for transistors is scored for on-current and off-current of the transistors. The impact of the design parameters are incorporated into parameters that measure predicted shift in mean on-current and mean off-current and parameters that measure predicted increase in deviations in the distribution of on-current and the off-current. Statistics may be taken at a cell level, a block level, or a chip level to optimize a chip design in a design phase, or to predict changes in parametric yield during manufacturing or after a depressed parametric yield is observed. Further, parametric yield and current level may be predicted region by region and compared with observed thermal emission to pinpoint any anomaly region in a chip to facilitate detection and correction in any mistakes in chip design.

Abstract translation: 对晶体管的导通电流和截止电流对晶体管的物理设计选择的参数性能的影响。 设计参数的影响被纳入测量平均电流和平均截止电流的预测偏差的参数以及测量导通电流和截止电流分布的偏差预测增加的参数。 可以在单元级别，块级或芯片级别进行统计，以在设计阶段优化芯片设计，或者在制造期间或在观察到抑制参数产量之后预测参数产量的变化。 此外，可以逐区域地预测参数产量和电流水平，并与观察到的热发射进行比较，以确定芯片中的任何异常区域，以便在芯片设计中的任何错误中进行检测和校正。

公开(公告)号：US20120066657A1

公开(公告)日：2012-03-15

申请号：US12880228

申请日：2010-09-13

Applicant: Kerry Bernstein ,  James A. Culp ,  Leah M.P. Pastel ,  Kirk D. Peterson ,  Norman J. Rohrer

Inventor： Kerry Bernstein ,  James A. Culp ,  Leah M.P. Pastel ,  Kirk D. Peterson ,  Norman J. Rohrer

IPC: G06F17/50 ,  G06F9/455

CPC classification number: G06F17/5045 ,  G06F2217/12 ,  Y02P90/265

Abstract: Disclose are embodiments of an integrated circuit design method based on a combination of manufacturability, test coverage and, optionally, diagnostic coverage. Design-for manufacturability (DFM) modifications to the layout of an integrated circuit can be made in light of test coverage. Alternatively, test coverage of an integrated circuit can be established in light of DFM modifications. Alternatively, an iterative process can be performed, where DFM modifications to the layout of an integrated circuit are made in light of test coverage and then test coverage is altered in light of the DFM modifications. Alternatively, DFM modifications to the layout of an integrated circuit can be made in light of test coverage and also diagnostic coverage. In any case, after making DFM modifications and establishing test coverage, any unmodified and untested nodes (and, optionally, any unmodified and undiagnosable tested nodes) in the integrated circuit can be identified and tagged for subsequent in-line inspection.

Abstract translation: 披露是基于可制造性，测试覆盖和任选的诊断覆盖的组合的集成电路设计方法的实施例。 根据测试覆盖范围，可以对集成电路布局的可制造性（DFM）进行设计修改。 或者，可以根据DFM修改建立集成电路的测试覆盖。 或者，可以执行迭代处理，其中根据测试覆盖进行DFM对集成电路的布局的修改，然后根据DFM修改来改变测试覆盖。 或者，DFM可以根据测试覆盖范围和诊断覆盖范围对集成电路布局进行修改。 在任何情况下，在进行DFM修改和建立测试覆盖之后，可以识别和标记集成电路中的任何未修改和未测试的节点（以及可选地，任何未修改和不可判定的测试节点）以便随后的在线检查。

公开(公告)号：US20110098838A1

公开(公告)日：2011-04-28

申请号：US12603679

申请日：2009-10-22

Applicant: James A. Culp ,  John J. Ellis-Monaghan ,  Jeffrey P. Gambino ,  Kirk D. Peterson ,  Jed H. Rankin

Inventor： James A. Culp ,  John J. Ellis-Monaghan ,  Jeffrey P. Gambino ,  Kirk D. Peterson ,  Jed H. Rankin

IPC: G06F17/50

CPC classification number: G06F17/5068 ,  G06F2217/10

Abstract: Disclosed are a system and a method of correcting systematic, design-based, parametric variations on integrated circuit chips to minimize circuit limited yield loss. Processing information and a map of a chip are stored. The processing information can indicate an impact, on a given device parameter, of changes in a value for a specification associated with a given process step. The map can indicate regional variations in the device parameter (e.g., threshold voltage). Based on the processing information and using the map as a guide, different values for the specification are determined, each to be applied in a different region of the integrated circuit chip during the process step in order to offset the mapped regional parametric variations. A process tool can then be selectively controlled to ensure that during chip manufacturing the process step is performed accordingly and, thereby to ensure that the regional parametric variations are minimized.

Abstract translation: 公开了一种用于校正集成电路芯片上的系统的，基于设计的参数变化的系统和方法，以最小化电路限制的产量损失。 存储处理信息和芯片的映射。 处理信息可以指示给定设备参数对与给定过程步骤相关联的规范的值的变化的影响。 地图可以指示设备参数中的区域变化（例如，阈值电压）。 基于处理信息并使用该图作为指导，确定规范的不同值，每个值在处理步骤期间应用于集成电路芯片的不同区域，以便抵消映射的区域参数变化。 然后可以选择性地控制处理工具，以确保在芯片制造期间相应地执行工艺步骤，从而确保区域参数变化最小化。

公开(公告)号：US20110078641A1

公开(公告)日：2011-03-31

申请号：US12569421

申请日：2009-09-29

Applicant: James A. Culp ,  Jerry D. Hayes ,  Ying Liu ,  Anthony D. Polson

Inventor： James A. Culp ,  Jerry D. Hayes ,  Ying Liu ,  Anthony D. Polson

IPC: G06F17/50

CPC classification number: G06F17/5036 ,  H01L22/34 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Mechanisms are provided for characterizing long range variability in integrated circuit manufacturing. A model derivation component tests one or more density pattern samples, which are a fabricated integrated circuits having predetermined pattern densities and careful placement of current-voltage (I-V) sensors. The model derivation component generates one or more empirical models to establish range of influence of long range variability effects in the density pattern sample. A variability analysis component receives an integrated circuit design and, using the one or more empirical models, analyzes the integrated circuit design to isolate possible long range variability effects in the integrated circuit design.

Abstract translation: 提供了用于表征集成电路制造中的长距离变化的机制。 模型推导部件测试一个或多个密度样本样本，其是具有预定图案密度的制造的集成电路和电流 - 电压（I-V）传感器的仔细放置。 模型推导组件产生一个或多个经验模型，以确定密度模式样本中长距离变异效应的影响范围。 可变性分析组件接收集成电路设计，并且使用一个或多个经验模型分析集成电路设计以隔离集成电路设计中的可能的长距离变化效应。