公开(公告)号：US06656017B2

公开(公告)日：2003-12-02

申请号：US10132095

申请日：2002-04-24

申请人： David P. Jackson

发明人： David P. Jackson

IPC分类号： B24C312

CPC分类号： H01L21/67051 ,  B08B7/0092 ,  B08B15/00 ,  B24C1/003 ,  B24C3/12 ,  B24C9/00

摘要： The present invention is a method and apparatus for providing a low-cost and less complex micro-environment for treating a substrate using an impingement cryogenic or steam spray jet. A substrate and fixture is contained within an open-architecture prophylactic or cleaning cell whereupon the substrate and fixture is continuously bathed in a regenerated and re-circulating stream of filtered, inert, dry, heated and ionized atmosphere which bathes both the entire substrate and fixture. This prevents the intrusion of contaminating ambient atmospheres onto critical surfaces. The cleaning cavity is constantly regenerated and re-circulated through the cleaning cell to maintain a majority of the clean atmosphere wherein the clean cavity is pressurized slightly with a small volume of clean dry air or inert gas to prevent the intrusion of ambient atmosphere into the cleaning cell. A small exhaust duct removes the partial pressure of atmosphere from the open regions of the cleaning cavity, capturing the escaping cavity atmosphere. The exemplary spray cleaning applicator of the present invention provides a majority of the make-up atmosphere required to operate the cleaning cell. The treated surface is thus isolated and protected from the ambient atmosphere and contaminants contained therein prior to, during and following application of a treatment spray. The present invention allows for the simultaneous application of a variety of conventional surface treatment agents such as dry steam or snow to a critical surface. Finally, the present invention controls and maintains the quality of the environment immediately within the vicinity of the substrate being treated, and the ambient atmosphere.

公开(公告)号：US20180280998A1

公开(公告)日：2018-10-04

申请号：US15945698

申请日：2018-04-04

申请人： David P. Jackson

发明人： David P. Jackson

IPC分类号： B05B5/03 ,  B05B5/025 ,  B05B5/16

摘要： An electrostatic spray application apparatus and method for producing an electrostatically charged and homogeneous CO2 composite spray mixture containing an additive and simultaneously projecting at a substrate surface. The spray mixture is formed in the space between CO2 and additive mixing nozzles and a substrate surface. The spray mixture is a composite fluid having a variably-controlled aerial and radial spray density comprising pressure- and temperature-regulated propellant gas (compressed air), CO2 particles, and additive particles. There are two or more circumferential and high velocity air streams containing passively charged CO2 particles which are positioned axis-symmetrically and coaxially about an inner and lower velocity injection air stream containing one or more additives to form a spray cluster. The axis-symmetrical CO2 particle-air streams are passively tribocharged during formation, and the spray clustering arrangement creates a significant electrostatic field and Coanda air mass flow between and surrounding the coaxial flow streams.

公开(公告)号：US09381574B1

公开(公告)日：2016-07-05

申请号：US14335875

申请日：2014-07-18

申请人： David P. Jackson

发明人： David P. Jackson

IPC分类号： B23B27/10 ,  B24B37/00 ,  B24B55/03 ,  B26D7/08

CPC分类号： B23B27/10 ,  B23B2250/12 ,  B23Q11/1053 ,  B23Q11/1061 ,  B24B37/00 ,  B24B55/03 ,  B26D7/088

摘要： An apparatus and method for machining a superhard substrate comprising: a means for pre-cooling a non-aqueous cutting fluid at a temperature below 20 degrees C. and at atmospheric pressure to form a subcooled cutting fluid; a capillary tube injector, which saturates said subcooled cutting fluid with the solid and gas carbon dioxide; an inline static mixer for combining said subcooled cutting fluid and said solid and gas carbon dioxide; a spray application tool for applying said carbon dioxide saturated subcooled cutting fluid to the superhard substrate during a machining process; and a recovering apparatus for collecting said residual cutting fluid from the machined superhard substrate; said recovering apparatus can comprise a carbon dioxide spray cleaning, a liquid carbon dioxide immersion cleaning, or a supercritical carbon dioxide cleaning.

摘要翻译： 一种用于加工超硬基材的设备和方法，包括：用于在低于20摄氏度和大气压下预冷非非水性切削液的装置，以形成过冷的切削液; 毛细管注射器，其使固体和气体二氧化碳使所述过冷切削液饱和; 用于组合所述过冷切削液和所述固体和气体二氧化碳的在线静态混合器; 用于在加工过程中将所述二氧化碳饱和过冷切削液施加到所述超硬基体的喷涂施加工具; 以及用于从所述被加工的超硬基材收集所述剩余切削液的回收装置; 所述回收装置可以包括二氧化碳喷雾清洗，液体二氧化碳浸没清洗或超临界二氧化碳清洗。

公开(公告)号：US08926858B2

公开(公告)日：2015-01-06

申请号：US13103852

申请日：2011-05-09

申请人： David P. Jackson

发明人： David P. Jackson

IPC分类号： C09K5/00 ,  B23Q11/10 ,  C09K5/04

CPC分类号： B23Q11/1053 ,  B23Q11/1061 ,  C09K5/041

摘要： A method of forming a machining spray for treating a surface of a substrate during a machining process includes providing a first component containing solid carbon dioxide particles. A second provided component is derived from an inert gas having a temperature range from 305 K to about 477 K prior to being mixed with the solid carbon dioxide particles. The first component and the second component are combined to form the cryogenic fluid composition prior to contacting the substrate. An optional additive may be mixed with the solid carbon dioxide particles or the inert gas. The cryogenic fluid composition exhibits synergistically enhanced physicochemical properties of each component not observed prior to the combination thereof, wherein the fluid imparts enhanced cooling, heating or lubrication effects.

摘要翻译： 在加工过程中形成用于处理基材表面的机加工喷雾的方法包括提供含有固体二氧化碳颗粒的第一组分。 第二提供的组分源自在与固体二氧化碳颗粒混合之前具有305K至约477K的温度范围的惰性气体。 组合第一组分和第二组分以在接触底物之前形成低温流体组合物。 任选的添加剂可以与固体二氧化碳颗粒或惰性气体混合。 低温液体组合物在其组合之前未观察到每种组分的协同增强的物理化学性质，其中流体赋予增强的冷却，加热或润滑效果。

公开(公告)号：US08197603B2

公开(公告)日：2012-06-12

申请号：US11465775

申请日：2006-08-18

申请人： David P. Jackson

发明人： David P. Jackson

IPC分类号： B08B7/04 ,  B08B7/00

CPC分类号： H01L21/02052 ,  B08B7/0021 ,  B08B7/0035 ,  B08B2203/005 ,  C23C16/0227 ,  C23G5/00 ,  H01J37/3244 ,  H01J2237/335 ,  H01L21/02164 ,  H01L21/02216 ,  H01L21/02274 ,  H01L21/312 ,  H01L21/3121 ,  H01L21/31612 ,  H01L21/76814 ,  H01L21/76826

摘要： The present invention is a method, process and apparatus for selective cleaning, drying, and modifying substrate surfaces and depositing thin films thereon using a dense phase gas solvent and admixtures within a first created supercritical fluid anti-solvent. Dense fluids are used in combination with sub-atmospheric, atmospheric and super-atmospheric plasma adjuncts (cold and thermal plasmas) to enhance substrate surface cleaning, modification, precision drying and deposition processes herein. Moreover, conventional wet cleaning agents such as hydrofluoric acid and ammonium fluoride may be used with the present invention to perform substrate pre-treatments prior to precision drying and cleaning treatments described herein. Finally, dense fluid such as solid phase carbon dioxide and argon may be used as a follow-on treatment or in combination with plasmas to further treat a substrate surface.

摘要翻译： 本发明是一种用于选择性清洗，干燥和改性基材表面并在其上沉积薄膜的方法，方法和设备，其中使用密相相气体溶剂和第一制备的超临界流体抗溶剂中的混合物。 密集流体与次大气压，大气压和超大气压等离子体辅助装置（冷和热等离子体）结合使用，以增强本文中的基材表面清洁，改性，精密干燥和沉积工艺。 此外，本发明可以使用常规的湿式清洁剂如氢氟酸和氟化铵来在本文所述的精密干燥和清洁处理之前进行基材预处理。 最后，诸如固相二氧化碳和氩的致密流体可以用作后续处理或与等离子体组合以进一步处理基底表面。

公开(公告)号：USD521911S1

公开(公告)日：2006-05-30

申请号：US29228298

申请日：2005-04-21

申请人： Peter W. Gillett ,  David P. Jackson ,  Gavin McKinnell

设计人： Peter W. Gillett ,  David P. Jackson ,  Gavin McKinnell

公开(公告)号：US5269850A

公开(公告)日：1993-12-14

申请号：US583911

申请日：1990-08-27

申请人： David P. Jackson

发明人： David P. Jackson

IPC分类号： C11D3/39 ,  C23G1/14 ,  H05K3/26 ,  C23G1/00

CPC分类号： C23G1/14 ,  C11D3/3942 ,  C11D3/3947 ,  H05K3/26

摘要： A composition for removing organic contaminants, such a flux residues, from a solid substrate comprises: (a) hydrogen peroxide in the amount of about 3 to 5 percent by weight of the composition; (b) an alkaline compound in sufficient amount to provide a pH of at least 10.5 in the composition; (c) about 0.1 to 0.3 percent by weight of a chosen wetting agent which is unreactive with the hydrogen peroxide and the alkaline compound; and (d) purified water as the balance of the composition. Optionally, the composition may further comprise about 0.5 to 2.0 percent by weight of a chosen metal protective agent.The solid substrate having organic contaminants thereon is exposed to the above noted composition whereby the organic contaminants are removed from the substrate and are converted into non toxic and non-hazardous products. Thus, negative environmental impact is avoided by the present process. In an alternative embodiment, the organic contaminant removal is further enhanced by exposing the composition and the organic contaminants on the substrate to ultraviolet radiation.

摘要翻译： 用于从固体基质除去有机污染物（例如助焊剂残留物）的组合物包括：（a）按组合物重量计约3至5重量％的量的过氧化氢; （b）足以提供组合物中至少10.5的pH的碱性化合物; （c）约0.1至0.3重量％的与过氧化氢和碱性化合物不反应的选择的润湿剂; 和（d）净化水作为组合物的余量。 任选地，组合物还可以包含约0.5至2.0重量％的选择的金属保护剂。 其上具有有机污染物的固体基质暴露于上述组合物中，由此从基材中除去有机污染物并将其转化为无毒和无危险的产品。 因此，本方法避免了对环境的负面影响。 在替代实施例中，通过将基底上的组合物和有机污染物暴露于紫外线辐射来进一步增强有机污染物去除。

公开(公告)号：US5236602A

公开(公告)日：1993-08-17

申请号：US646129

申请日：1991-01-28

申请人： David P. Jackson

发明人： David P. Jackson

IPC分类号： C02F1/32 ,  B08B3/12 ,  B08B7/00 ,  B08B7/04 ,  C02F11/08 ,  C23G5/00 ,  H01L21/00 ,  H01L21/304 ,  H01L21/308 ,  H05K3/26

CPC分类号： H01L21/67023 ,  B08B3/12 ,  B08B7/0021 ,  B08B7/0057 ,  C23G5/00 ,  H05K3/26 ,  Y10S210/908

摘要： A process for removing undesired material from a chosen substrate by exposing the substrate simultaneously to ultraviolet radiation and a selected dense fluid, wherein the radiation produces a photochemical reaction that removes the undesired material from the substrate and the dense fluid enhances the removal of the undesired material. In an alternative embodiment, a reactive agent may additionally be used. The process may be used to remove contaminants from a substrate, etch a substrate surface, or destroy toxic organic material in industrial wastes.

摘要翻译： 一种用于通过将衬底同时暴露于紫外线辐射和选定的致密流体从所选择的衬底去除不需要的材料的方法，其中所述辐射产生光学化学反应，其从衬底去除不需要的材料，并且致密的流体增强不需要的材料的去除 。 在替代实施方案中，另外可以使用反应剂。 该方法可用于从基底去除污染物，蚀刻底物表面或破坏工业废物中的有毒有机物质。

公开(公告)号：US5213619A

公开(公告)日：1993-05-25

申请号：US443471

申请日：1989-11-30

申请人： David P. Jackson ,  Michael A. Lepp

发明人： David P. Jackson ,  Michael A. Lepp

IPC分类号： A61L2/025 ,  A61L2/18 ,  B08B3/12 ,  B08B6/00 ,  B08B7/00

CPC分类号： A61L2/025 ,  A61L2/18 ,  B08B3/12 ,  B08B6/00 ,  B08B7/0021 ,  B08B2203/002

摘要： An environmentally safe process for pre-cleaning, sterilizing, preserving, and enhancing performance characteristics of materials used in critical environments with stringent end-product cleanliness and sterilization requirements in a single process using high energy dense fluids. One or more dense fluids are mixed with one or more chemical agents and are simultaneously subjected to a non-uniform electrostatic field and high powered acoustic radiation to remove, in a process called acoustic-electroextraction, deeply recessed contaminants from internal and external surfaces of intricately arranged or formulated materials such as biomaterials, surgical tools, or dental implants. Subsequently, the cleaned materials are than subjected to a high energy dense fluid oxidizing environment to provide for deep material penetration and sterilization and removal of biological contaminants. Finally, the cleaned and sterilized materials may be implanted with chemical agents using an acoustic deposition process to provide for long term preservation. In an alternative embodiment of the present invention, chemical agents may be implanted in materials to provide new and improved material properties such as increased electrical insulation. Finally, the entire process may be performed on materials which are prepackaged in semi-permeable membranes, preventing recontamination of the clean, sterile, or implanted materials.

摘要翻译： 在使用高能量致密流体的单个过程中，在严格的最终产品清洁度和灭菌要求的关键环境中预先清洁，消毒，保存和增强材料的性能特征的环境安全过程。 将一种或多种致密流体与一种或多种化学试剂混合，同时经受非均匀的静电场和高功率声辐射，以在称为声电萃取的过程中，从复杂的内外表面去除深度凹陷的污染物 布置或配制的材料，例如生物材料，手术工具或牙科植入物。 随后，清洁的材料比经受高能量致密的流体氧化环境以提供深物质渗透和灭菌和除去生物污染物。 最后，清洁和灭菌的材料可以使用声学沉积方法植入化学试剂以提供长期保存。 在本发明的替代实施例中，化学试剂可以植入材料中以提供新的和改进的材料性质，例如增加的电绝缘。 最后，整个过程可以对预先包装在半透膜中的材料进行，防止清洁，无菌或植入材料的再污染。

公开(公告)号：US5068040A

公开(公告)日：1991-11-26

申请号：US332124

申请日：1989-04-03

申请人： David P. Jackson

发明人： David P. Jackson

IPC分类号： C02F1/32 ,  B08B3/12 ,  B08B7/00 ,  B08B7/04 ,  C02F11/08 ,  C23G5/00 ,  H01L21/00 ,  H01L21/304 ,  H01L21/308 ,  H05K3/26

CPC分类号： H01L21/67023 ,  B08B3/12 ,  B08B7/0021 ,  B08B7/0057 ,  C23G5/00 ,  H05K3/26 ,  Y10S210/908

摘要： A process for removing undesired material from a chosen substrate by exposing the substrate simultaneously to ultraviolet radiation and a selected dense fluid, wherein the radiation produces a photochemical reaction that removes the undesired material from the substrate and the dense fluid enhances the removal of the undesired material. In an alternative embodiment, a reactive agent may additionally be used. The process may be used to remove contaminants from a substrate, etch a substrate surface, or destroy toxic organic material in industrial wastes.