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31.发明授权公开(公告)号：US08476167B2
公开(公告)日：2013-07-02
申请号：US13020399
申请日：2011-02-03
申请人： Hubert Adriaan Van Mierlo , Erik Leonardus Ham , Hendricus Johannes Maria Meijer , Hendrik Antony Johannes Neerhof , Joost Jeroen Ottens , Johannes Adrianus Petrus Leijtens , Marco Le Kluse , Jan Hopman , Johannes Hubertus Josephina Moors
发明人： Hubert Adriaan Van Mierlo , Erik Leonardus Ham , Hendricus Johannes Maria Meijer , Hendrik Antony Johannes Neerhof , Joost Jeroen Ottens , Johannes Adrianus Petrus Leijtens , Marco Le Kluse , Jan Hopman , Johannes Hubertus Josephina Moors
IPC分类号： H01L21/311
CPC分类号： H01L21/6831 , G03F7/70708 , Y10T29/49117
摘要： The invention relates to a method of manufacturing an electrostatic clamp configured to electrostatically clamp an article to an article support in a lithographic apparatus. The method includes providing a first layer of material, etching a recess in the first layer of material, and disposing an electrode in the recess of the first layer of material.
摘要翻译： 本发明涉及一种制造静电夹具的方法，所述静电夹具被配置为将制品静电地夹持在光刻设备中的制品支撑件上。 该方法包括提供第一层材料，蚀刻第一层材料中的凹槽，以及将电极设置在第一层材料的凹槽中。
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32.发明授权Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权平版印刷设备，器件制造方法和由此制造的器件公开(公告)号：US07528935B2
公开(公告)日：2009-05-05
申请号：US11312654
申请日：2005-12-21
申请人： Koen Jacobus Johannes Maria Zaal , Tjarko Adriaan Rudolf Van Empel , Hendricus Johannes Maria Meijer , Joost Jeroen Ottens , Marco Le Kluse , Jan Hopman
发明人： Koen Jacobus Johannes Maria Zaal , Tjarko Adriaan Rudolf Van Empel , Hendricus Johannes Maria Meijer , Joost Jeroen Ottens , Marco Le Kluse , Jan Hopman
CPC分类号： G03F7/707 , G03F7/70708 , G03F7/70783
摘要： A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an article to be placed in a beam path of the beam of radiation. The protrusions are generally spaced apart equidistantly at a first distance. The article holder also includes a pair of electrodes for clamping the article to the holder. The electrodes are disposed in substantially the same plane above or below the protrusions, and are spaced apart from one another by a gap. Neighboring protrusions within the plurality of protrusions that are located on opposite sides of the gap are spaced apart by a second distance that is greater than the first distance.
摘要翻译： 公开了一种光刻投影装置。 该装置包括用于调节辐射束的照明器和物品保持器。 物品保持器包括多个突出部，其布置成提供基本平坦的支撑平面，用于支撑待放置在辐射束的光束路径中的物品。 这些突起通常在第一距离处等距离间隔开。 物品保持器还包括用于将物品夹持到保持器的一对电极。 电极设置在突起上方或下方的基本上相同的平面中，并且通过间隙彼此间隔开。 位于间隙的相对侧上的多个突起内的相邻突起被间隔开大于第一距离的第二距离。
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33.发明授权Method of generating a photolithography patterning device, computer program, patterning device, method of determining the position of a target image on or proximate a substrate, measurement device, and lithographic apparatus 有权产生光刻图案形成装置的方法，计算机程序，图案形成装置，确定基板上或附近的目标图像的位置的方法，测量装置和光刻装置公开(公告)号：US07960074B2
公开(公告)日：2011-06-14
申请号：US11345629
申请日：2006-02-02
CPC分类号： G03F7/70433 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F7/70283 , G03F7/70666 , G03F9/7003 , G03F9/7076 , G03F9/7088
摘要： A method of generating a photolithography patterning device for transferring a pattern formed in the patterning device onto a substrate utilizing a lithographic projection apparatus includes defining features within the pattern formed in the device, wherein the features have dimensions and orientations chosen to create a desired image on the substrate during pattern transfer; and adjusting the dimensions of the features to compensate the desired image for displacement and dimension errors introduced by the effective shadow angle of the radiation on the features during pattern transfer or correlated to the position of the features within the exposure slit during pattern transfer. A measurement device for determining the position of a target image on or proximate a substrate in a lithographic projection apparatus, wherein the target image is formed by features on a patterning device, includes a detector configured to measure the position of the target image on or proximate the substrate, wherein the detector compensates the measured position of the target image for displacement and dimension errors introduced by the effective shadow angle of the radiation on the features of the patterning device during pattern transfer or correlated to the position of the features within the exposure slit during pattern transfer. A lithographic apparatus includes a measurement device.
摘要翻译： 使用光刻投影装置产生用于将形成在图案形成装置中的图案转印到基板上的光刻图案形成装置的方法包括限定在所述装置中形成的图案内的特征，其中所述特征具有选择的尺寸和取向以在 图案转印时的基板; 并且调整特征的尺寸以补偿在图案转印期间由辐射对特征的有效阴影角度引入的位移和尺寸误差所需的图像，或者与图案转印期间的曝光缝隙内的特征位置相关。 一种测量装置，用于在光刻投影设备中确定目标图像在基板上或其附近的位置，其中所述目标图像由图案形成装置上的特征形成，所述测量装置包括检测器，所述检测器被配置为测量所述目标图像在或近似的位置 所述基板，其中所述检测器补偿所述目标图像的测量位置，并且通过所述辐射的有效阴影角度在所述图案转印期间对所述图案形成装置的特征引入的尺寸误差或与所述曝光缝隙内的所述特征的位置相关联 在图案转移期间。 光刻设备包括测量装置。
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公开(公告)号：US20080170210A1
公开(公告)日：2008-07-17
申请号：US11654037
申请日：2007-01-17
IPC分类号： G03B27/52
CPC分类号： G03F7/70933 , G03F7/70841 , G03F7/70858
摘要： A device manufacturing method includes bringing pressure within a vacuum chamber of a lithographic projection apparatus to a temperature stabilizing pressure range; keeping the pressure within the vacuum chamber within the temperature stabilizing pressure range for a period of time so as to stabilize the temperature in the vacuum chamber; decreasing the pressure within the vacuum chamber to a production pressure range; generating a beam of radiation with a radiation system; patterning the beam of radiation; and projecting the patterned beam of radiation through the vacuum chamber onto a target portion of a layer of radiation-sensitive material on a substrate.
摘要翻译： 一种装置的制造方法，其特征在于，使光刻投影装置的真空室内的压力达到温度稳定化压力范围; 将真空室内的压力保持在温度稳定压力范围内一段时间，以稳定真空室中的温度; 将真空室内的压力降低到生产压力范围; 用辐射系统产生辐射束; 图案化辐射束; 并将图案化的辐射束通过真空室投射到基底上的辐射敏感材料层的目标部分上。
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35.发明授权Illumination system for illuminating a patterning device and method for manufacturing an illumination system 失效用于照射图案形成装置的照明系统和用于制造照明系统的方法公开(公告)号：US07889321B2
公开(公告)日：2011-02-15
申请号：US11730751
申请日：2007-04-03
CPC分类号： G03F7/70833 , B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/702 , G03F7/70808
摘要： An illumination system includes a housing, and an optical system located within the housing. The optical system includes at least one optical element. The optical system is constructed and arranged to illuminate a patterning device with a radiation beam diverging from an intermediate focus. The intermediate focus is located at a position substantially at the same level or below a bottom portion of the illumination system.
摘要翻译： 照明系统包括壳体和位于壳体内的光学系统。 光学系统包括至少一个光学元件。 光学系统被构造和布置成用从中间焦点分散的辐射束照射图案形成装置。 中间焦点位于基本上在照明系统的底部的相同水平或低于底部的位置处。
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公开(公告)号：US07514186B2
公开(公告)日：2009-04-07
申请号：US11167560
申请日：2005-06-28
IPC分类号： G03F1/00
CPC分类号： G03F7/70941 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/38 , G03F1/40 , G03F7/707 , G03F7/70708 , G21K2201/06
摘要： A reticle includes an area provided with a conductive metal-based compound coating for electrically grounding the reticle. The reticle is suitable for use with a lithography apparatus whereby the reticle pattern is imaged using extreme ultra violet radiation. One or more conducting pins, held at zero potential, may be pressed against the conductive coating for electrically grounding the reticle either during patterning the reticle by electron beam writing or during use in the lithographic apparatus. The areas coated with the metal-based compounds are wear resistant which reduces the occurrence of particles due to damage caused by mechanical contact between the conducting pins and the conductive coating.
摘要翻译： 掩模版包括设置有用于将掩模版电接地的导电金属基复合涂层的区域。 掩模版适用于光刻设备，由此使用极紫外辐射对掩模版图案进行成像。 保持在零电位的一个或多个导电引脚可以被压靠在导电涂层上，以在通过电子束写入或在光刻设备中的使用期间在掩模版图案化期间将掩模版电接地。 涂覆有金属基化合物的区域是耐磨的，其减少由于导电引脚和导电涂层之间的机械接触而引起的损伤的发生。
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37.发明申请Illumination system for illuminating a pattering device and method for manufacturing an illumination system 失效用于照明图案装置的照明系统和用于制造照明系统的方法公开(公告)号：US20080246940A1
公开(公告)日：2008-10-09
申请号：US11730751
申请日：2007-04-03
CPC分类号： G03F7/70833 , B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/702 , G03F7/70808
摘要： An illumination system includes a housing, and an optical system located within the housing. The optical system includes at least one optical element. The optical system is constructed and arranged to illuminate a patterning device with a radiation beam diverging from an intermediate focus. The intermediate focus is located at a position substantially at the same level or below a bottom portion of the illumination system.
摘要翻译： 照明系统包括壳体和位于壳体内的光学系统。 光学系统包括至少一个光学元件。 光学系统被构造和布置成用从中间焦点分散的辐射束照射图案形成装置。 中间焦点位于基本上在照明系统的底部的相同水平或低于底部的位置处。
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38.发明申请公开(公告)号：US20100265484A1
公开(公告)日：2010-10-21
申请号：US12809730
申请日：2008-12-22
申请人： Peter Gerhardus Wilhelmus Bussink , Anastasius Jacobus Anicetus Bruinsma , Hendricus Johannes Maria Meijer
发明人： Peter Gerhardus Wilhelmus Bussink , Anastasius Jacobus Anicetus Bruinsma , Hendricus Johannes Maria Meijer
IPC分类号： G03B27/72
CPC分类号： G03F9/7034 , G03F9/7003
摘要： A lithographic apparatus configured to project a patterned radiation beam onto a substrate. The apparatus includes a support configured to hold a patterned object, and a measurement system configured to detect orientations and/or densities of user area structures that are present on a user area of the patterned object.
摘要翻译： 一种光刻设备，被配置为将图案化的辐射束投影到基底上。 该装置包括被配置为保持图案化物体的支撑件和被配置为检测存在于图案化物体的用户区域上的用户区域结构的取向和/或密度的测量系统。
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公开(公告)号：US07426015B2
公开(公告)日：2008-09-16
申请号：US11654037
申请日：2007-01-17
CPC分类号： G03F7/70933 , G03F7/70841 , G03F7/70858
摘要： A device manufacturing method includes bringing pressure within a vacuum chamber of a lithographic projection apparatus to a temperature stabilizing pressure range; keeping the pressure within the vacuum chamber within the temperature stabilizing pressure range for a period of time so as to stabilize the temperature in the vacuum chamber; decreasing the pressure within the vacuum chamber to a production pressure range; generating a beam of radiation with a radiation system; patterning the beam of radiation; and projecting the patterned beam of radiation through the vacuum chamber onto a target portion of a layer of radiation-sensitive material on a substrate.
摘要翻译： 一种装置的制造方法，其特征在于，使光刻投影装置的真空室内的压力达到温度稳定化压力范围; 将真空室内的压力保持在温度稳定压力范围内一段时间，以稳定真空室中的温度; 将真空室内的压力降低到生产压力范围; 用辐射系统产生辐射束; 图案化辐射束; 并将图案化的辐射束通过真空室投射到基底上的辐射敏感材料层的目标部分上。
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40.发明授权Lithographic apparatus, method for levelling an object, and lithographic projection method 有权平版印刷设备，用于调平物体的方法和光刻投影方法公开(公告)号：US08514368B2
公开(公告)日：2013-08-20
申请号：US12809730
申请日：2008-12-22
申请人： Peter Gerhardus Wilhelmus Bussink , Anastasius Jacobus Anicetus Bruinsma , Hendricus Johannes Maria Meijer
发明人： Peter Gerhardus Wilhelmus Bussink , Anastasius Jacobus Anicetus Bruinsma , Hendricus Johannes Maria Meijer
CPC分类号： G03F9/7034 , G03F9/7003
摘要： A lithographic apparatus configured to project a patterned radiation beam onto a substrate. The apparatus includes a support configured to hold a patterned object, and a measurement system configured to detect orientations and/or densities of user area structures that are present on a user area of the patterned object.
摘要翻译： 一种光刻设备，被配置为将图案化的辐射束投影到基底上。 该装置包括被配置为保持图案化物体的支撑件和被配置为检测存在于图案化物体的用户区域上的用户区域结构的取向和/或密度的测量系统。
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