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31.发明授权(Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it 有权（甲基）丙烯酸酯衍生物，具有内酯结构的聚合物和光致抗蚀剂组合物，以及通过使用其形成图案的方法公开(公告)号：US07186495B2
公开(公告)日：2007-03-06
申请号：US09750116
申请日：2000-12-29
IPC分类号： G03F7/004 , G03C5/00 , C07D307/00 , C08F10/00 , C08F118/02 , C08F24/00
CPC分类号： C08F222/14 , C07D307/93 , C08F20/28 , C08F120/28 , C08F220/32 , G03F7/004 , G03F7/0045 , G03F7/038 , G03F7/0382 , G03F7/039 , Y10S430/111
摘要： There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R1, R2, R3 and R5 are each a hydrogen atom or a methyl group; R4 is an acid-labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has an acid labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group, or a hydrocarbon group having 3 to 13 carbon atoms, which has an epoxy group; R6 is a hydrogen atom, a hydrocarbon group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group; x, y and z are optional values which meet x+y+z=1, 0
摘要翻译： 这里公开了使用220nm以下的光进行光刻的光致抗蚀剂材料，其包含至少由下式（2）表示的聚合物和通过曝光产生酸的光酸发生剂：其中R 1 R 2，R 3，R 5和R 5各自为氢原子或甲基; R 4是酸不稳定基团，具有7-13个碳原子的脂环族烃基，其具有酸不稳定基团，具有7至13个碳原子的脂环族烃基，其具有羧基 ，或具有3〜13个碳原子的烃基，具有环氧基; R 6是氢原子，具有1〜12个碳原子的烃基或具有7〜13个碳原子的脂环族烃基，其具有羧基; x，y和z是满足x + y + z = 1,0,0
是氢原子或甲基，R 9是具有脂环族内酯结构的7-16个碳原子的烃基。 -
32.发明授权Photoacid generator containing two kinds of sulfonium salt compound, chemically amplified resist containing the same and pattern transfer method 失效含有两种锍盐化合物的光酸发生剂，含有相同的化学放大抗蚀剂和图案转移法公开(公告)号：US06638685B2
公开(公告)日：2003-10-28
申请号：US09987424
申请日：2001-11-14
IPC分类号： G03C7038
CPC分类号： C07D311/22 , C07C381/12 , G03F7/0045 , G03F7/0382 , G03F7/0397
摘要： A chemically amplified photo-resist contains a photoacid generator for changing the solubility of resin after exposure to 130-220 nanometer wavelength light, and the photoacid generator contains two kinds of sulfonium salt compound expressed by general formulae [1] and [2] so that the chemically amplified photo-resist is improved in resolution, sensitivity and smoothness on side surfaces of a transferred pattern.
摘要翻译： 化学放大型光致抗蚀剂含有用于在暴露于130-220纳米波长的光之后改变树脂的溶解度的光致酸发生剂，并且光酸产生剂含有通式[1]和[2]所表示的两种锍盐化合物，使得 化学放大光电抗蚀剂在转印图案的侧表面的分辨率，灵敏度和平滑度方面得到改善。
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33.发明授权(Meth)acrylate, polymer photoresist composition, and pattern forming process making use of the composition 有权（甲基）丙烯酸酯，聚合物光致抗蚀剂组合物和使用组合物的图案形成方法公开(公告)号：US06391529B2
公开(公告)日：2002-05-21
申请号：US09811398
申请日：2001-03-20
IPC分类号： G03F7039
CPC分类号： C08F220/28 , G03F7/0045 , G03F7/039 , Y10S430/111
摘要： A photoresist composition contains a photoacid generator and a polymer represented by the following formula: wherein R4, R6 and R9 each represents a hydrogen atom or a methyl group, R5 and R7 each represents a C17-23 divalent hydrocarbon group containing a bridged cyclic hydrocarbon group, R8 represents an acid-decomposable group, R10 represents a hydrogen atom or a C1-12 hydrocarbon group, x+y+z equals to 1, and x, y and z stand for 0 to 1, 0 to 1, and 0 to 0.9, respectively, and having a weight average molecular weight of from 1,000 to 500,000. According to the present invention, a chemical modification photoresist composition having high transparency to radiation of 220 nm and shorter and improved in etching resistance can be provided.
摘要翻译： 光致抗蚀剂组合物含有光酸产生剂和由下式表示的聚合物：其中R4，R6和R9各自表示氢原子或甲基，R5和R7各自表示含有桥连环状烃基的C17-23二价烃基 R8表示酸分解基团，R10表示氢原子或C1-12烃基，x + y + z等于1，x，y和z表示0至1,0，...，0至 0.9，重均分子量为1,000〜500,000。 根据本发明，可以提供对220nm以下的放射线的透明度高，耐腐蚀性提高的化学改性光致抗蚀剂组合物。
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34.发明授权(Meth)acrylate, polymer, photoresist composition, and pattern forming process making use of the composition 失效（甲基）丙烯酸酯，聚合物，光致抗蚀剂组合物和使用组合物的图案形成方法公开(公告)号：US06248499B1
公开(公告)日：2001-06-19
申请号：US09058349
申请日：1998-04-10
IPC分类号： G03F7004
CPC分类号： C08F220/28 , G03F7/0045 , G03F7/039 , Y10S430/111
摘要： A photoresist composition contains a photoacid generator and a polymer represented by the following formula: wherein R4, R6 and R9 each represents a hydrogen atom or a methyl group, R5 and R7 each represents a C17-23 divalent hydrocarbon group containing a bridged cyclic hydrocarbon group, R8 represents an acid-decomposable group, R10 represents a hydrogen atom or a C1-12 hydrocarbon group, x+y+z equals to 1, and x, y and z stand for 0 to 1, 0 to 1, and 0 to 0.9, respectively, and having a weight average molecular weight of from 1,000 to 500,000. According to the present invention, a chemical modification photoresist composition having high transparency to radiation of 220 nm and shorter and improved in etching resistance can be provided.
摘要翻译： 光致抗蚀剂组合物含有光酸产生剂和由下式表示的聚合物：其中R4，R6和R9各自表示氢原子或甲基，R5和R7各自表示含有桥连环状烃基的C17-23二价烃基 R8表示酸分解基团，R10表示氢原子或C1-12烃基，x + y + z等于1，x，y和z表示0至1,0，...，0至 0.9，重均分子量为1,000〜500,000。 根据本发明，可以提供对220nm以下的放射线的透明度高，耐腐蚀性提高的化学改性光致抗蚀剂组合物。
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35.发明申请(METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVING LACTONE STRUCTURE, AND METHOD FOR FORMING PATTERN BY USING IT 审中-公开（METH）丙烯酸衍生物，具有结构的聚合物和光催化组合物，以及使用其形成图案的方法公开(公告)号：US20120178023A1
公开(公告)日：2012-07-12
申请号：US13336450
申请日：2011-12-23
CPC分类号： C08F222/14 , C07D307/93 , C08F20/28 , C08F120/28 , C08F220/32 , G03F7/004 , G03F7/0045 , G03F7/038 , G03F7/0382 , G03F7/039 , Y10S430/111
摘要： Photoresist material for lithography using a light of 220 nm or less comprising at least a polymer represented by following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R1, R2, R3 and R5, each a hydrogen atom or a methyl group; R4, an acid-labile group or one of a specified subset of alicyclic hydrocarbon groups, alicyclic hydrocarbon groups, or hydrocarbon groups; R6, a hydrogen atom, a specified subset of hydrocarbon groups or alicyclic hydrocarbon groups; x, y and z are optional values which meet x+y+z=1, 0
摘要翻译： 使用220nm以下的光的光刻胶材料，至少含有下述式（2）所示的聚合物和通过曝光产生酸的光酸发生剂，其中R1，R2，R3和R5分别为氢原子 或甲基; R4，酸不稳定基团或脂环族烃基，脂环族烃基或烃基的特定子集之一; R6，氢原子，烃基或脂环族烃基的特定子集; x，y和z是满足x + y + z = 1,0,0
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36.发明申请PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR CONTROL OF REFRACTIVE INDEX, AND OPTICAL WAVEGUIDE AND OPTICAL COMPONENT USING THE SAME 审中-公开光敏性树脂组合物，用于控制折射率的方法和使用其的光学波长和光学组分公开(公告)号：US20100329616A1
公开(公告)日：2010-12-30
申请号：US12440007
申请日：2007-08-29
申请人： Ning-Juan Chen , Shinji Ando , Kaichiro Nakano , Katsumi Maeda
发明人： Ning-Juan Chen , Shinji Ando , Kaichiro Nakano , Katsumi Maeda
CPC分类号： G03F7/0387 , G02B6/1221 , G02B6/138 , G03F7/0045
摘要： Provided are: a resin composition for the formation of an optical waveguide, which shows low transmission loss and high heat stability and enables to form a waveguide pattern at high shape accuracy and at low cost; an optical waveguide; a method of forming an optical waveguide; and an optical element using the method. A photosensitive resin composition is used, which includes a polyamic acid represented by a general formula (I) or a polyamic acid ester (A), a compound (B) having an epoxy group, and a compound (C) which generates an acid by being exposed to light.
摘要翻译： 提供：用于形成光波导的树脂组合物，其表现出低的传输损耗和高的热稳定性，并且能够以高的形状精度和低成本形成波导图案; 光波导; 形成光波导的方法; 以及使用该方法的光学元件。 使用感光性树脂组合物，其包含由通式（I）表示的聚酰胺酸或聚酰胺酸酯（A），具有环氧基的化合物（B）和通过以下方式产生酸的化合物（C）： 被曝光。
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37.发明申请(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it 有权（甲基）丙烯酸酯衍生物，具有内酯结构的聚合物和光致抗蚀剂组合物，以及通过使用其形成图案的方法公开(公告)号：US20090023878A1
公开(公告)日：2009-01-22
申请号：US12230485
申请日：2008-08-29
IPC分类号： C08F224/00
CPC分类号： C08F222/14 , C07D307/93 , C08F20/28 , C08F120/28 , C08F220/32 , G03F7/004 , G03F7/0045 , G03F7/038 , G03F7/0382 , G03F7/039 , Y10S430/111
摘要： There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R1, R2, R3 and R5 are each a hydrogen atom or a methyl group; R4 is an acid-labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has an acid labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group, or a hydrocarbon group having 3 to 13 carbon atoms, which has an epoxy group; R6 is a hydrogen atom, a hydrocarbon group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group; x, y and z are optional values which meet x+y+z=1, 0
摘要翻译： 这里公开了使用220nm以下的光的光刻胶材料，该光致抗蚀剂材料至少包含由下式（2）表示的聚合物和通过曝光产生酸的光酸发生剂：其中R1，R2，R3 和R 5各自为氢原子或甲基; R4是酸不稳定基团，具有7〜13个碳原子的脂环族烃基，其具有酸不稳定基团，具有7〜13个碳原子的脂环族烃基，其具有羧基或具有3〜 13个碳原子，其具有环氧基; R6为氢原子，碳原子数1〜12的烃基或碳原子数为7〜13的脂环族烃基，具有羧基; x，y和z是满足x + y + z = 1,0,0
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38.发明授权公开(公告)号：US07232639B2
公开(公告)日：2007-06-19
申请号：US10505799
申请日：2003-02-25
申请人： Katsumi Maeda , Kaichiro Nakano
发明人： Katsumi Maeda , Kaichiro Nakano
CPC分类号： C07C43/317 , C07C43/313 , C07C69/653 , C07C69/753 , C07C2602/42 , C07C2603/62 , C07C2603/74 , C07C2603/86 , G03F7/0046 , G03F7/0392 , G03F7/0395 , G03F7/0397 , Y10S430/108 , Y10S430/111
摘要： As a polymer exhibiting improved transparency which is suitable for a resist resin used in a chemical-amplification-type resist being applicable for photolithography using exposure light at 180 nm or shorter, this invention provides a polymer comprising a repeating unit resulting from polymerization of a monomer exhibiting a polymerization activity, wherein the monomer has a fluorine-containing acetal or ketal structure represented by general formula (1): wherein R represents an atomic group containing a carbon-carbon double bond exhibiting polymerization activity; at least one of R1 and R2 is fluorinated alkyl group or fluorinated aryl group having 1 to 20 carbon atoms; and R3 represents a radical selected from the group consisting of hydrogen atom, alkyl group, alkoxy-substituted alkyl group, fluorinated alkyl group, aryl group, fluorinated aryl group, aralkyl group and fluorinated aralkyl group having 1 to 20 carbon atoms.
摘要翻译： 作为适用于化学放大型抗蚀剂中使用的抗蚀剂树脂的聚合物，其可应用于使用180nm以下的曝光光的光刻法，作为聚合物，其具有提高的透明性，提供了包含由单体聚合得到的重复单元的聚合物 表现出聚合活性，其中所述单体具有由通式（1）表示的含氟缩醛或缩酮结构：其中R表示含有表现出聚合活性的碳 - 碳双键的原子团; R 1和R 2中的至少一个是具有1至20个碳原子的氟化烷基或氟化芳基; R 3表示选自氢原子，烷基，烷氧基取代的烷基，氟化烷基，芳基，氟化芳基，芳烷基和含氟芳烷基的基团 至20个碳原子。
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39.发明申请Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern 失效苯乙烯衍生物，苯乙烯聚合物，感光性树脂组合物和形成图案的方法公开(公告)号：US20070134586A1
公开(公告)日：2007-06-14
申请号：US10590804
申请日：2005-02-25
申请人： Katsumi Maeda , Kaichiro Nakano
发明人： Katsumi Maeda , Kaichiro Nakano
IPC分类号： G03C1/00
CPC分类号： G03F7/0233 , C08F212/32 , C08K5/08 , G03F7/038 , G03F7/0382 , G03F7/0392 , C08L25/18 , C08F212/08 , C08F220/10
摘要： There is disclosed a photosensitive resin composition for interlayer insulating films, surface protection films or the like, which exhibits excellent resolution and can be developed with an aqueous alkaline solution. The photosensitive resin composition is prepared using a polymer at least having a constitutional repeating unit represented by general formula II: wherein R1 represents hydrogen atom or methyl group; R2 to R9 independently represent hydrogen atom, halogen atom or alkyl group having 1 to 4 carbon atoms; X represents —CH═N—, —CONH—, —(CH2)n—CH═N— or —(CH2)n—CONH— and the N atom in X is bonded to a carbon atom in the benzene ring having AO— at an o-position; A represents hydrogen atom or a group being decomposed by an acid; and n represents a positive integer of 1 to 3.
摘要翻译： 公开了一种用于层间绝缘膜，表面保护膜等的感光性树脂组合物，其表现出优异的分辨率并且可以用碱性水溶液显影。 感光性树脂组合物使用至少具有由通式II表示的结构重复单元的聚合物制备，其中R 1表示氢原子或甲基; R 9至R 9独立地表示氢原子，卤素原子或具有1至4个碳原子的烷基; X表示-CH-N-，-CONH-， - （CH 2）n-CH-N-或 - （CH 2）n -CONH-，X中的N原子与位于AO的苯环中的碳原子键合; A表示氢原子或被酸分解的基团; n表示1〜3的正整数。
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40.发明授权Photoacid generators, photoresist compositions containing the same and pattering method with the use of the compositions 失效光酸产生剂，含有其的光致抗蚀剂组合物和使用组合物的图案化方法公开(公告)号：US06849384B2
公开(公告)日：2005-02-01
申请号：US10333579
申请日：2001-07-23
IPC分类号： C07C381/12 , C07D333/46 , C07D335/02 , C08K5/36 , C08L101/00 , G03F7/004 , G03F7/038 , G03F7/039 , G03F7/20 , H01L21/027 , G03F7/031 , C07D319/00 , C07D321/00 , C07D409/00
CPC分类号： G03F7/0045 , C07C381/12 , C07D333/46 , G03F7/0397 , Y10S430/115 , Y10S430/122 , Y10S430/123
摘要： Photoacid generators comprising sulfonium salt compounds represented by the following general formula (2) wherein R1 and R2 represent each an alkyl group optionally having oxo, or R1 and R2 may be cyclized together to form an alkylene group optionally having oxo; R3, R4 and R5 represent each hydrogen or a linear, branched, monocyclic, polycyclic or crosslinked cyclic alkyl group; and Y− represents a counter ion.
摘要翻译： 包含下列通式（2）表示的锍盐化合物的光酸产生剂，其中R 1和R 2各自表示任选具有氧代的烷基，或R 1和R 2可以一起环化形成 任选具有氧代的亚烷基; R 3，R 4和R 5各自表示氢或直链，支链，单环，多环或交联的环状烷基; 而Y - 代表抗衡离子。
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