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公开(公告)号：US06495004B1
公开(公告)日：2002-12-17
申请号：US09555650
申请日：2000-06-29
申请人： Fumio Kuriyama , Naoaki Ogure , Akihisa Hongo
发明人： Fumio Kuriyama , Naoaki Ogure , Akihisa Hongo
IPC分类号： C25D1700
CPC分类号： H01L21/67161 , C23C18/1632 , C25D7/123 , C25D17/001 , H01L21/67173 , H01L21/6723
摘要： A substrate plating apparatus forms a plating layer on the surface of a substrate and stores the substrate until the next process in a way that the substrate is not exposed to the atmosphere. The substrate plating apparatus is not only capable of introducing semiconductor wafers continuously one by one into the plating apparatus without loading the wafers into cassettes, but is also capable of preventing particle contamination and the formation of oxidized film on the surface of the wafers, thus reducing the number of process and reducing the installation area required for the apparatus. The substrate plating apparatus includes a plating process section (20) for plating a substrate, a washing process section (10) for washing the substrate after the plating process, and a storage vessel (16) containing a storing solution in which the substrate is immersed after having been plated and washed. A substrate conveyor is provided in the substrate plating apparatus for loading substrates into the substrate plating apparatus and discharging substrates out of the substrate plating apparatus, or for performing at least one of the loading or discharging operations, such that the substrates are loaded into the substrate plating apparatus one at a time, plated in the plating process section, washed in the washing process section, and subsequently discharged one at a time from the substrate plating apparatus.
摘要翻译： 基板电镀装置在基板的表面上形成镀层，并以基板不暴露于大气的方式将基板存储到下一工序。 基板电镀装置不仅可以将半导体晶片连续地引入电镀装置，而且不将晶片装载到盒中，而且还能够防止颗粒污染和在晶片表面上形成氧化膜，从而减少 过程的数量和减少设备所需的安装面积。 基板电镀设备包括用于电镀基板的电镀处理部分（20），用于在电镀工艺之后洗涤基板的洗涤处理部分（10），以及储存容器（16），所述储存容器包含浸没所述基板的储存溶液 经过电镀和洗涤。 基板输送机设置在基板电镀装置中，用于将基板装载到基板电镀装置中，并将基板从基板镀敷装置中排出，或者进行至少一个装载或放电操作，使得基板被装入基板 电镀装置一次，镀在电镀处理部分中，在洗涤工序部分洗涤，然后一次从基板镀敷装置中排出。
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公开(公告)号：US4926648A
公开(公告)日：1990-05-22
申请号：US318206
申请日：1989-03-03
CPC分类号： F04B37/06 , F04D19/046 , Y10S417/901
摘要： A turbomolecular pump having a rotor provided with a plurality of rotor blades and a spacer provided with a plurality of stator blades so that gas molecules are sucked in from a suction port, compressed and discharged from an exhaust port. The pump further has a heat exchanger provided inside the suction port, the heat exchanger being connected to a refrigerator through a refrigerant pipe and a gate valve provided on the upstream side of the suction port. Gases having low molecular weights, particularly water vapor, are freeze-trapped on the heat exchanger. Thus, it is possible to efficiently exhaust gases having low molecular weights, particularly water vapor, and hence to obtain a high vacuum of good quality. In addition, it is easy to start and suspend operation of the system and possible to run it on a continuous basis.
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公开(公告)号：US08877030B2
公开(公告)日：2014-11-04
申请号：US12458260
申请日：2009-07-07
申请人： Yasuhiko Endo , Fumio Kuriyama , Masaaki Kimura
发明人： Yasuhiko Endo , Fumio Kuriyama , Masaaki Kimura
CPC分类号： C25D17/00 , C25D5/006 , C25D17/001 , C25D17/12
摘要： A magnetic film plating apparatus employs a dip method that allows relatively good escape of bubbles and does not require a wide footprint and, even when a ferromagnetic material is used for an anode, can form a magnetic film on a substrate surface while minimizing the influence of the anode on the uniformity of magnetic anisotropy in the magnetic film. The magnetic film plating apparatus includes a plating tank for holding a plating solution, an anode vertically disposed in the plating tank at a position to be immersed in the plating solution, a substrate holder for holding a substrate W and positioning the substrate W opposite the anode, and a magnetic field generator, disposed outside the plating tank, for generating a magnetic field around the substrate W held by the substrate holder and positioned opposite the anode.
摘要翻译： 磁性膜电镀装置采用允许气泡相对较好逸出并且不需要宽的占地面积的浸渍方法，并且即使当铁磁材料用于阳极时，也可以在基板表面上形成磁性膜，同时最小化 阳极对磁性膜中磁各向异性的均匀性。 磁性镀膜设备包括用于保持电镀液的镀槽，在镀槽中垂直设置在待浸入镀液中的位置的阳极，用于保持衬底W并将衬底W定位在阳极对面的衬底保持器 以及设置在镀槽外部的磁场发生器，用于在由衬底保持器保持并且与阳极相对定位的衬底W周围产生磁场。
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公开(公告)号：US06294059B1
公开(公告)日：2001-09-25
申请号：US09154895
申请日：1998-09-17
申请人： Akihisa Hongo , Naoaki Ogure , Hiroaki Inoue , Norio Kimura , Fumio Kuriyama , Manabu Tsujimura , Kenichi Suzuki , Atsushi Chono
发明人： Akihisa Hongo , Naoaki Ogure , Hiroaki Inoue , Norio Kimura , Fumio Kuriyama , Manabu Tsujimura , Kenichi Suzuki , Atsushi Chono
IPC分类号： C25D1700
CPC分类号： H01L21/67167 , C25D17/001 , H01L21/2885 , H01L21/67051 , H01L21/67126 , H01L21/67161 , H01L21/67173 , H01L21/6719 , H01L21/67219 , H01L21/6723 , H01L21/76849 , H01L21/76877 , Y10S134/902
摘要： A substrate plating apparatus forms an interconnection layer on an interconnection region composed of a fine groove and/or a fine hole defined in a substrate. The substrate plating apparatus includes a plating unit for forming a plated layer on a surface of the substrate including the interconnection region, a chemical mechanical polishing unit for chemically mechanically polishing the substrate to remove the plated layer from the surface of the substrate leaving a portion of the plated layer in the interconnection region, a cleaning unit for cleaning the substrate after the plated layer is formed or the substrate is chemically mechanically polished, a drying unit for drying the substrate after the substrate is cleaned, and a substrate transfer unit for transferring the substrate to and from each of the first plating unit, the first chemical mechanical polishing unit, the cleaning unit, and the drying unit. The first plating unit, the first chemical mechanical polishing unit, the cleaning unit, the drying unit, and the substrate transfer unit are combined into a unitary arrangement.
摘要翻译： 基板电镀装置在由微细凹槽和/或限定在基板中的细孔构成的互连区域上形成布线层。 基板电镀装置包括用于在包括互连区域的基板的表面上形成镀层的电镀单元，用于对基板进行化学机械抛光以从基板的表面移除镀层的化学机械抛光单元， 互连区域中的镀层，用于在形成镀层之后对基板进行清洗或基板进行化学机械抛光的清洁单元，用于在清洁基板之后使基板干燥的干燥单元，以及用于将基板转印 第一电镀单元，第一化学机械抛光单元，清洁单元和干燥单元中的每一个的基板。 第一电镀单元，第一化学机械抛光单元，清洁单元，干燥单元和基板转移单元组合成一体的布置。
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公开(公告)号：US06195504B1
公开(公告)日：2001-02-27
申请号：US08974512
申请日：1997-11-19
申请人： Kuniaki Horie , Hidenao Suzuki , Tsutomu Nakada , Fumio Kuriyama , Takeshi Murakami , Masahito Abe , Yuji Araki , Hiroyuki Ueyama
发明人： Kuniaki Horie , Hidenao Suzuki , Tsutomu Nakada , Fumio Kuriyama , Takeshi Murakami , Masahito Abe , Yuji Araki , Hiroyuki Ueyama
IPC分类号： A61H3306
CPC分类号： C23C16/45565 , C23C16/448 , C23C16/45561 , C23C16/4557
摘要： A compact vaporizer system is presented to produce a high quality vapor feed from a liquid feed to be delivered to a chemical vapor deposition processing chamber to produce thin film devices based on highly dielectric or ferroelectric materials such as BaTiO3, SrTiO3 and others such materials. The vaporization apparatus comprises a feed tank for storing the liquid feed; feed delivery means for transporting the liquid feed by way of a feed delivery path; a vaporizer section disposed in the delivery path comprising a high temperature heat exchanger having a capillary tube for transporting the liquid feed and a heat source for externally heating the capillary tube; and a vaporization prevention section disposed upstream of the vaporizer section for preventing heating effects of the vaporizer section to the liquid feed within the vaporization prevention section.
摘要翻译： 提供了一种紧凑的蒸发器系统，用于从液体进料产生高质量的蒸汽进料，以将其输送到化学气相沉积处理室，以产生基于高电介质或铁电材料如BaTiO 3，SrTiO 3等材料的薄膜器件。 蒸发装置包括用于储存液体进料的进料罐; 用于通过进料输送路径输送液体进料的进料输送装置; 设置在输送路径中的蒸发器部分包括具有用于输送液体进料的毛细管和用于外部加热毛细管的热源的高温热交换器; 以及蒸发防止部，其设置在所述蒸发部的上游侧，用于防止所述蒸发部对所述蒸发防止部内的所述液体进料的加热效果。
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公开(公告)号：US07507319B2
公开(公告)日：2009-03-24
申请号：US11490131
申请日：2006-07-21
申请人： Fumio Kuriyama , Masaaki Kimura
发明人： Fumio Kuriyama , Masaaki Kimura
IPC分类号： C25B9/02
摘要： An anode holder is used to hold an anode in a plating tank. The anode holder includes a bar having a conductive portion connected to a power source, a conductive anode shaft attached to the bar, and an anode connected to the conductive anode shaft. The conductive anode shaft includes an external thread portion provided at an end of the conductive anode shaft, an O-ring, and a step portion provided between the O-ring and the external thread portion. The step portion has a diameter larger than a diameter of the external thread portion but smaller than a diameter of the O-ring. The anode includes an internal thread hole to which the external thread portion of the conductive anode shaft is screwed. The anode also includes a receiving portion for receiving the step portion of the conductive anode shaft in a state such that the O-ring of the conductive anode shaft is brought into contact with an inner surface of the receiving portion.
摘要翻译： 阳极保持器用于将阳极保持在电镀槽中。 阳极保持器包括具有连接到电源的导电部分的杆，连接到杆的导电阳极轴和连接到导电阳极轴的阳极。 导电阳极轴包括设置在导电阳极轴的端部的外螺纹部分，O形环和设置在O形环和外螺纹部分之间的台阶部分。 台阶部分的直径大于外螺纹部分的直径，但小于O形环的直径。 阳极包括内螺纹孔，导电阳极轴的外螺纹部分被螺纹连接到该内螺纹孔。 阳极还包括用于接收导电阳极轴的台阶部分的接收部分，其状态使得导电阳极轴的O形环与接收部分的内表面接触。
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公开(公告)号：US20080017505A1
公开(公告)日：2008-01-24
申请号：US11490131
申请日：2006-07-21
申请人： Fumio Kuriyama , Masaaki Kimura
发明人： Fumio Kuriyama , Masaaki Kimura
摘要： An anode holder is used to hold an anode in a plating tank. The anode holder includes a bar having a conductive portion connected to a power source, a conductive anode shaft attached to the bar, and an anode connected to the conductive anode shaft. The conductive anode shaft includes an external thread portion provided at an end of the conductive anode shaft, an O-ring, and a step portion provided between the O-ring and the external thread portion. The step portion has a diameter larger than a diameter of the external thread portion but smaller than a diameter of the O-ring. The anode includes an internal thread hole to which the external thread portion of the conductive anode shaft is screwed. The anode also includes a receiving portion for receiving the step portion of the conductive anode shaft in a state such that the O-ring of the conductive anode shaft is brought into contact with an inner surface of the receiving portion.
摘要翻译： 阳极保持器用于将阳极保持在电镀槽中。 阳极保持器包括具有连接到电源的导电部分的杆，连接到杆的导电阳极轴和连接到导电阳极轴的阳极。 导电阳极轴包括设置在导电阳极轴的端部的外螺纹部分，O形环和设置在O形环和外螺纹部分之间的台阶部分。 台阶部分的直径大于外螺纹部分的直径，但小于O形环的直径。 阳极包括内螺纹孔，导电阳极轴的外螺纹部分被螺纹连接到该内螺纹孔。 阳极还包括用于接收导电阳极轴的台阶部分的接收部分，其状态使得导电阳极轴的O形环与接收部分的内表面接触。
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公开(公告)号：US06269221B1
公开(公告)日：2001-07-31
申请号：US09662897
申请日：2000-09-15
申请人： Kuniaki Horie , Hidenao Suzuki , Tsutomu Nakada , Fumio Kuriyama , Takeshi Murakami , Masahito Abe , Yuji Araki , Hiroyuki Ueyama
发明人： Kuniaki Horie , Hidenao Suzuki , Tsutomu Nakada , Fumio Kuriyama , Takeshi Murakami , Masahito Abe , Yuji Araki , Hiroyuki Ueyama
IPC分类号： F22B2906
CPC分类号： C23C16/45565 , C23C16/448 , C23C16/45561 , C23C16/4557
摘要： A compact vaporizer system is presented to produce a high quality vapor feed from a liquid feed to be delivered to a chemical vapor deposition processing chamber to produce thin film devices based on highly dielectric or ferroelectric materials such as BaTiO3, SrTiO3 and other such materials. The vaporization apparatus comprises a feed tank for storing the liquid feed; feed delivery means for transporting the liquid feed by way of a feed delivery path; a vaporizer section disposed in the delivery path comprising a high temperature heat exchanger having a capillary tube for transporting the liquid feed and a heat source for externally heating the capillary tube; and a vaporization prevention section disposed upstream of the vaporizer section for preventing effects of the vaporizer section to the liquid feed within the vaporization prevention section.
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公开(公告)号：US5062271A
公开(公告)日：1991-11-05
申请号：US519377
申请日：1990-05-04
CPC分类号： F04D19/046 , F04B37/06 , Y10S417/901
摘要： An evacuation apparatus and method using a turbomolecular pump having a rotor provided with a plurality of rotor blades and a spacer provided with a plurality of stator blades so that gas molecules are sucked in from a suction port, compressed and discharged from an exhaust port of the turbomolecular pump is disclosed. A heat exchanger is provided at the suction port side of the turbomolecular pump to freeze-trap gas molecules from being cooled by a helium refrigerator.The gate valve is disposed upstream of the heat exchanger and is provided in a suction pipe which extends between the vacuum vessel and the turbomolecular pump. In exhausting the vacuum vessel, the gate valve is opened and, in this state, the turbomolecular pump and the helium refrigerator are run. During regeneration, the gate valve is closed, the turbomolecular pump is run, and the heat exchanger is heated by means of a heater or by operation of the helium refrigator being suspended, thereby sublimating molecules freeze-trapped in the heat exchanger.
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