公开(公告)号：US08395756B2

公开(公告)日：2013-03-12

申请号：US12190308

申请日：2008-08-12

Applicant: Johannes Wangler ,  Heiko Siekmann ,  Kenneth Weible ,  Ralf Scharnweber ,  Manfred Maul ,  Markus Deguenther ,  Michael Layh ,  Axel Scholz ,  Uwe Spengler ,  Reinhard Voelkel

Inventor： Johannes Wangler ,  Heiko Siekmann ,  Kenneth Weible ,  Ralf Scharnweber ,  Manfred Maul ,  Markus Deguenther ,  Michael Layh ,  Axel Scholz ,  Uwe Spengler ,  Reinhard Voelkel

IPC: G03B27/32 ,  G03B27/42 ,  G03B27/54 ,  G03B27/72

CPC classification number: G03F7/70191 ,  G02B3/0056 ,  G02B27/0911 ,  G03F7/70058 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70158

Abstract: Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.

公开(公告)号：US20130038850A1

公开(公告)日：2013-02-14

申请号：US13587077

申请日：2012-08-16

Applicant: Heiko Feldmann ,  Erik Matthias Sohmen ,  Joachim Stuehler ,  Oswald Gromer ,  Ulrich Mueller ,  Michael Layh ,  Markus Schwab

Inventor： Heiko Feldmann ,  Erik Matthias Sohmen ,  Joachim Stuehler ,  Oswald Gromer ,  Ulrich Mueller ,  Michael Layh ,  Markus Schwab

IPC: G03B27/54

CPC classification number: G03F7/70091 ,  G01N21/956 ,  G01N2021/95676 ,  G03F1/84

Abstract: An illumination system and a projection objective of a mask inspection apparatus are provided. During operation of the mask inspection apparatus, the illumination system illuminates a mask with an illumination bundle of rays having a centroid ray that has a direction dependent on the location of the incidence of the illumination bundle of rays on the mask.

Abstract translation: 提供了一种面罩检查装置的照明系统和投影物镜。 在掩模检查装置的操作期间，照明系统用具有取决于掩模上的照射光束的入射位置的方向的质心射线的照射束照射掩模。

公开(公告)号：US20120293784A1

公开(公告)日：2012-11-22

申请号：US13556408

申请日：2012-07-24

Applicant: Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Andras G. Major ,  Manfred Maul ,  Johannes Eisenmenger ,  Damian Fiolka ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Johannes Wangler ,  Michael Layh

Inventor： Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Andras G. Major ,  Manfred Maul ,  Johannes Eisenmenger ,  Damian Fiolka ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Johannes Wangler ,  Michael Layh

IPC: G03B27/54

CPC classification number: G03F7/70258 ,  G01B11/002 ,  G01B11/272 ,  G01M11/30 ,  G01N21/55 ,  G02B26/0833 ,  G03F7/70058 ,  G03F7/70116 ,  G03F7/70133 ,  G03F7/702 ,  G03F7/70291 ,  G03F7/70516 ,  G03F7/7085 ,  G05B13/048 ,  Y10S359/904

Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.

Abstract translation: 微光刻照明系统包括单独驱动的元件以可变地照亮系统的光瞳表面。 每个元件基于施加到元件的控制信号偏离入射光束。 该系统还包括提供测量信号的仪器，以及基于模型的状态估计器，被配置为基于测量信号为每个元件计算估计状态向量。 估计状态向量表示由元件引起的光束的偏差; 和偏差的时间导数。 照明系统还包括调节器，其被配置为针对每个元件接收：a）估计的状态矢量; 和b）目标值：i）由偏差元素引起的光束的偏差; 和ii）偏差的时间导数。

公开(公告)号：US20120153189A1

公开(公告)日：2012-06-21

申请号：US13352725

申请日：2012-01-18

Applicant: Johannes Wangler ,  Michael Layh ,  Markus Zenzinger ,  Holger Muenz

Inventor： Johannes Wangler ,  Michael Layh ,  Markus Zenzinger ,  Holger Muenz

IPC: B01J19/12

CPC classification number: G02B27/0927 ,  B23K26/0608 ,  B23K26/0676 ,  B23K26/0732 ,  B23K26/0738

Abstract: An optical system for generating a light beam for treating a substrate arranged in a substrate plane is disclosed. The optical system includes first and second optical arrangements.

Abstract translation: 公开了一种用于产生用于处理布置在基板平面中的基板的光束的光学系统。 光学系统包括第一和第二光学装置。

公开(公告)号：US07880969B2

公开(公告)日：2011-02-01

申请号：US12186365

申请日：2008-08-05

Applicant: Oliver Wolf ,  Heiko Siekmann ,  Eva Kalchbrenner ,  Siegfried Rennon ,  Johannes Wangler ,  Andre Bresan ,  Michael Gerhard ,  Nils Haverkamp ,  Axel Scholz ,  Ralf Scharnweber ,  Michael Layh ,  Stefan Burkart

Inventor： Oliver Wolf ,  Heiko Siekmann ,  Eva Kalchbrenner ,  Siegfried Rennon ,  Johannes Wangler ,  Andre Bresan ,  Michael Gerhard ,  Nils Haverkamp ,  Axel Scholz ,  Ralf Scharnweber ,  Michael Layh ,  Stefan Burkart

IPC: G02B27/10

CPC classification number: G03F7/70958 ,  G03F7/70075 ,  Y10T83/0304 ,  Y10T83/04

Abstract: The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems.

Abstract translation: 本发明涉及一种被配置为在微光刻投影曝光装置的照明系统中产生多个次级光源的光学积分器。 本公开还涉及制造用于这种照明系统的细长微透镜阵列的方法。 细长微透镜的数组经常被包含在这种照明系统的光学积分器或散射板中。

公开(公告)号：US20100283984A1

公开(公告)日：2010-11-11

申请号：US12818501

申请日：2010-06-18

Applicant: Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

Inventor： Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

IPC: G03B27/54

CPC classification number: G03F7/702 ,  G02B5/09 ,  G02B26/105 ,  G03F7/70116 ,  G03F7/7055 ,  G03F7/70583

Abstract: A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(γ) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points. The illumination optics further contain at least one optical system to temporally stabilize the illumination of the multi-mirror array so that, for each object field point, the intensity distribution in the associated exit pupil deviates from a desired intensity distribution in the associated exit pupil in the case of a centroid angle value sin(β) by less than 2% expressed in terms of the greatest marginal angle value sin(γ) of the associated exit pupil and/or, in the case of ellipticity by less than 2%, and/or in the case of a pole balance by less than 2%.

公开(公告)号：US20100265482A1

公开(公告)日：2010-10-21

申请号：US12795014

申请日：2010-06-07

Applicant: Erich Schubert ,  Alexander Kohl ,  Gerhard-Wilhelm Ziegler ,  Michael Patra ,  Markus Deguenther ,  Michael Layh

Inventor： Erich Schubert ,  Alexander Kohl ,  Gerhard-Wilhelm Ziegler ,  Michael Patra ,  Markus Deguenther ,  Michael Layh

IPC: G03B27/32

CPC classification number: G03F7/70083 ,  G03F7/70116 ,  G03F7/70191 ,  G03F7/70433

Abstract: An illumination system of a micro-lithographic projection exposure apparatus is provided, which is configured to illuminate a mask positioned in a mask plane. The system includes a pupil shaping optical subsystem and illuminator optics that illuminate a beam deflecting component. For determining a property of the beam deflecting component, an intensity distribution in a system pupil surface of the illumination system is determined. Then the property of the beam deflecting component is determined such that the intensity distribution produced by the pupil shaping subsystem in the system pupil surface approximates the intensity distribution determined before. At least one of the following aberrations are taken into account in this determination: (i) an aberration produced by the illuminator optics; (ii) an aberration produced by the pupil shaping optical subsystem; (iii) an aberration produced by an optical element arranged between the system pupil surface and the mask plane.

Abstract translation: 提供微光刻投影曝光装置的照明系统，其被配置为照亮位于掩模平面中的掩模。 该系统包括光束成形光学子系统和照射光束偏转部件的照明器光学器件。 为了确定光束偏转分量的特性，确定照明系统的系统光瞳表面中的强度分布。 然后确定光束偏转分量的特性，使得瞳孔成形子系统在系统光瞳表面中产生的强度分布近似于之前确定的强度分布。 在该确定中考虑以下像差中的至少一个：（i）由照明器光学器件产生的像差; （ii）由光瞳成形光学子系统产生的像差; （iii）由布置在系统光瞳表面和掩模平面之间的光学元件产生的像差。