公开(公告)号：US07852460B2

公开(公告)日：2010-12-14

申请号：US11482147

申请日：2006-07-07

申请人： Levinus Pieter Bakker ,  Jeroen Jonkers ,  Frank Jeroen Pieter Schuurmans ,  Hugo Matthieu Visser

发明人： Levinus Pieter Bakker ,  Jeroen Jonkers ,  Frank Jeroen Pieter Schuurmans ,  Hugo Matthieu Visser

IPC分类号： G03B27/54

CPC分类号： B82Y10/00 ,  G02B17/004 ,  G02B17/006 ,  G02B27/0043 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70891 ,  G03F7/70916

摘要： A lithographic projection apparatus includes a reflector assembly, the reflector assembly includes a first and a second reflector extending in a direction of an optical axis, the first and second reflector each having a reflective surface, a backing surface and an entry section at respectively a first and a second distance from the optical axis, the first distance being larger than the second distance, rays deriving from a point on the optical axis being cut off by the entry sections of the first and second reflectors and being reflected on the reflective surface of the first reflector and defining a high radiation intensity zone and a low radiation intensity zone between the reflectors; a radial support member configured to support the reflectors extending in the low radiation intensity zone, wherein the radial support member creates a shade in a downstream direction of the optical axis and a virtual shade in an upstream direction of the optical axis; and a structure placed in the virtual shade.

摘要翻译： 光刻投影设备包括反射器组件，反射器组件包括沿光轴方向延伸的第一和第二反射器，第一和第二反射器各自具有反射表面，背衬表面和入口部分分别为第一 并且与所述光轴的距离为第二距离，所述第一距离大于所述第二距离，从所述光轴上的点导出的光线被所述第一反射器和所述第二反射器的入射部分切断并且在所述光轴的反射表面上被反射 第一反射器并且在反射器之间限定高辐射强度区域和低辐射强度区域; 径向支撑构件，构造成支撑在低辐射强度区域中延伸的反射器，其中径向支撑构件在光轴的下游方向上产生阴影，并在光轴的上游方向上产生虚拟阴影; 以及放置在虚拟阴影中的结构。

公开(公告)号：US07714306B2

公开(公告)日：2010-05-11

申请号：US11512432

申请日：2006-08-30

申请人： Johannes Hubertus Josephina Moors ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

发明人： Johannes Hubertus Josephina Moors ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G21K5/10

CPC分类号： G03F7/70916 ,  G03F7/70983

摘要： A lithographic apparatus includes a radiation source configured to emit radiation to form a radiation beam, the radiation being of a type which can create plasma in a low pressure environment in the apparatus, and an optical component configured to condition the radiation beam, impart the conditioned radiation beam with a pattern in its cross-section to form a patterned radiation beam, project the patterned radiation beam onto a target portion of a substrate, and/or to detect radiation. The optical component is provided with a plasma quenching structure, the plasma quenching structure being configured to provide electron-ion recombination in, on and/or near the optical component.

摘要翻译： 光刻设备包括被配置为发射辐射以形成辐射束的辐射源，该辐射是能够在该设备中的低压环境中产生等离子体的类型，以及被配置为调节辐射束的光学部件， 辐射束在其横截面上具有图案以形成图案化的辐射束，将图案化的辐射束投影到衬底的目标部分上和/或检测辐射。 光学部件设置有等离子体淬火结构，等离子体淬火结构被配置为在光学部件的内部和/或附近提供电子 - 离子复合。

公开(公告)号：US20090284814A1

公开(公告)日：2009-11-19

申请号：US12294258

申请日：2007-03-29

申请人： Frank Jeroen Pieter Schuurmans ,  Levinus Pieter Bakker

发明人： Frank Jeroen Pieter Schuurmans ,  Levinus Pieter Bakker

IPC分类号： G03H1/04

CPC分类号： G11B7/0065 ,  G03H1/16 ,  G03H2210/22 ,  G03H2223/13 ,  G03H2225/55 ,  G11B7/1367

摘要： The present invention relates to a setup for storing data in a holographic storage medium, said setup comprising a spatial light modulator (SLM) (18) and a phase plate (50), the spatial light modulator having a first pixel structure, the phase plate having a second pixel structure, and the first and the second pixel structures being aligned with each other, wherein a pitch of the second pixel structure is an integer multiple of a pitch of the first pixel structure, the integer multiple being strictly greater than 1.

摘要翻译： 本发明涉及用于在全息存储介质中存储数据的设置，所述设置包括空间光调制器（SLM）（18）和相位板（50），所述空间光调制器具有第一像素结构，所述相位板 具有第二像素结构，并且第一和第二像素结构彼此对准，其中第二像素结构的间距是第一像素结构的间距的整数倍，整数倍严格地大于1。

公开(公告)号：US07592610B2

公开(公告)日：2009-09-22

申请号：US10968471

申请日：2004-10-20

申请人： Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

发明人： Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G21K1/06 ,  G02B1/10 ,  G03F7/20

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F7/70166 ,  G03F7/70316 ,  G03F7/70916 ,  G03F7/70958 ,  G21K1/06

摘要： A top layer of a predetermined metal is provided on a mirror for use in a lithographic apparatus having source to provide radiation of a desired wavelength. The source generates a stream of undesired metal particles that are deposited to form smaller and larger nuclei on the mirror. The top layer may interdiffuse in a predetermined temperature range with nuclei of the metal deposition. An additional layer of an alloy of the metal particles and the metal of the top layer is formed that has a higher reflectivity than a layer only comprising the metal particles would have.

摘要翻译： 预定金属的顶层设置在用于具有源以提供期望波长的辐射的光刻设备的反射镜上。 源产生不想要的金属颗粒流，其沉积以在反射镜上形成更小和更大的核。 顶层可以在与金属沉积的核的预定温度范围内相互扩散。 形成金属颗粒和顶层金属的合金的附加层，其具有比仅包含金属颗粒将具有的层更高的反射率。

公开(公告)号：US07485881B2

公开(公告)日：2009-02-03

申请号：US11319199

申请日：2005-12-28

申请人： Arnoud Cornelis Wassink ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

发明人： Arnoud Cornelis Wassink ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G02B5/08 ,  G03B27/54 ,  G21G5/00

CPC分类号： G03F7/70916

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system for filtering debris particles out of the radiation beam. The filter system includes a plurality of foils for trapping the debris particles, a support for holding the plurality of foils, and a cooling system having a surface that is arranged to be cooled. The cooling system and the support are positioned with respect to each other such that a gap is formed between the surface of the cooling system and the support. The cooling system is further arranged to inject gas into the gap.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统，配置成将辐射束投影到衬底上的投影系统，以及用于将碎屑颗粒从辐射束中过滤的过滤系统。 过滤器系统包括用于捕集碎片颗粒的多个箔，用于保持多个箔的支撑件，以及具有布置成要冷却的表面的冷却系统。 冷却系统和支撑件相对于彼此定位，使得在冷却系统的表面和支撑件之间形成间隙。 冷却系统还被布置成将气体注入到间隙中。

公开(公告)号：US07468521B2

公开(公告)日：2008-12-23

申请号：US11319190

申请日：2005-12-28

申请人： Derk Jan Wilfred Klunder ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Frank Jeroen Pieter Schuurmans ,  Dominik Vaudrevange ,  Maarten Marinus Johannes Wilhelmus Van Herpen

发明人： Derk Jan Wilfred Klunder ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Frank Jeroen Pieter Schuurmans ,  Dominik Vaudrevange ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC分类号： G21G5/00 ,  G01J3/10 ,  G03B27/52

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70166

摘要： A lithographic apparatus includes a radiation system for providing a beam of radiation. The radiation system includes at least one of a contaminant trap for trapping material emanating from the radiation source and a collector for collecting the beam of radiation. The at least one of the contaminant trap and the collector includes an element arranged in the path of the radiation beam on which the material emanating from the radiation source can deposit during propagation of the radiation beam in the radiation system. At least a part of the element disposed in the path of the radiation beam has a surface that has a highly specular grazing incidence reflectivity to reduce the absorption of the radiation beam in a direction of propagation of the radiation beam substantially non-parallel to the surface of the element, so that a thermal load experienced by the element is reduced.

摘要翻译： 光刻设备包括用于提供辐射束的辐射系统。 辐射系统包括用于捕获从辐射源发出的材料的污染物阱和用于收集辐射束的收集器中的至少一个。 污染物捕集阱和收集器中的至少一个包括布置在辐射束的路径中的元件，在辐射束的辐射束在辐射系统中的传播期间，从辐射源发出的材料可以沉积。 设置在辐射束的路径中的元件的至少一部分具有表面，该表面具有高镜面的掠入射反射率，以减少辐射束在基本上不平行于表面的辐射束的传播方向上的吸收 的元件，使得元件经历的热负荷降低。

公开(公告)号：US20090268203A1

公开(公告)日：2009-10-29

申请号：US11912342

申请日：2006-04-26

申请人： Natallia Uzunbajakava ,  Aleksey Kolesnychenko ,  Antonius Theodorus Martinus Van Gogh ,  Gert 'T Hooft ,  Frank Jeroen Pieter Schuurmans

发明人： Natallia Uzunbajakava ,  Aleksey Kolesnychenko ,  Antonius Theodorus Martinus Van Gogh ,  Gert 'T Hooft ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G01N21/31

CPC分类号： G01J3/32 ,  G01J3/02 ,  G01J3/0213 ,  G01J3/0229 ,  G01J3/0264 ,  G01J3/0272 ,  G01J3/28 ,  G01J2003/1282 ,  G01N21/274

摘要： The invention relates to a multivariate calibration which can be used when the optical system used for that method does not comprise a multi-channel detector such as a CCD sensor or a line array of photodiodes. An optical system without a multi-channel detector doesn't allow to carry out preprocessing steps. Thus there is the need to carry out these preprocessing steps in another way. It is suggested to partially replace the preprocessing step by a measurement of the optical signal, whereby the measurement comprises transmitting or reflecting the optical signal by an optical element, thereby weighing the optical signal by a spectral weighing function. The advantage of the invention is to teach how such an optical system without a bulky and expensive CCD sensor can be used to carry out a multivariate calibration and preprocessing steps.

摘要翻译： 本发明涉及当用于该方法的光学系统不包括诸如CCD传感器或光电二极管的线阵列的多通道检测器时可以使用的多变量校准。 没有多通道检测器的光学系统不允许执行预处理步骤。 因此，需要以另一种方式执行这些预处理步骤。 建议通过光信号的测量部分地代替预处理步骤，由此测量包括通过光学元件发送或反射光信号，从而通过光谱称重功能称量光信号。 本发明的优点是教导如何不使用庞大且昂贵的CCD传感器的这种光学系统来执行多变量校准和预处理步骤。

公开(公告)号：US20090015819A1

公开(公告)日：2009-01-15

申请号：US10596563

申请日：2004-12-13

申请人： Michael Cornelis Van Beek ,  Bernardus Leonardus Bakker ,  Wouter Harry Jacinth Rensen ,  Frank Jeroen Pieter Schuurmans

发明人： Michael Cornelis Van Beek ,  Bernardus Leonardus Bakker ,  Wouter Harry Jacinth Rensen ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G01N33/48

CPC分类号： G01N21/31 ,  G01J3/28 ,  G01N21/274 ,  G01N21/64 ,  G01N21/6445 ,  G01N21/65 ,  G01N2021/3196 ,  G01N2021/6417 ,  G01N2021/655

摘要： The optical analysis system (20) is arranged to determine an amplitude of a principal component of an optical signal. The optical analysis system (20) comprises a multivariate optical element (5, 6) for weighing the optical signal by a spectral weighing function and a detector (7, 8) for detecting the weighed optical signal. The optical signal comprises the principal component and a further component which was not accounted for when designing the spectral weighing function. Therefore, the detected weighed optical signal comprises a part relating to the amplitude of the principal component and a further part relating to a further amplitude of the further component. The optical analysis system (20) further comprises a modulator element (13) for modulating the detected weighed optical signal. The difference between the modulated detected weighed optical signal and the detected weighed optical signal relates to the amplitude of the principal component and thus allows for determining the amplitude of the principal component in an accurate way. The blood analysis system (40) comprises such an optical analysis system (20). The method of determining an amplitude of an principal component makes use of the optical analysis system (20).

摘要翻译： 光学分析系统（20）被布置成确定光信号的主分量的幅度。 光学分析系统（20）包括用于通过光谱称重功能称量光信号的多元光学元件（5,6）和用于检测加权光信号的检测器（7,8）。 光信号包括主分量和另外的分量，在设计光谱称重功能时不考虑。 因此，检测到的加权光信号包括与主分量的振幅有关的部分，以及与另一分量的另一幅度相关的另一部分。 光学分析系统（20）还包括用于调制检测到的称重光信号的调制器元件（13）。 调制检测到的称重光信号与检测到的称重光信号之间的差异与主分量的振幅有关，因此允许以准确的方式确定主分量的振幅。 血液分析系统（40）包括这样的光学分析系统（20）。 确定主成分的振幅的方法利用光学分析系统（20）。

公开(公告)号：US20080298404A1

公开(公告)日：2008-12-04

申请号：US11719951

申请日：2005-11-23

申请人： Gert 'T Hooft ,  Johannes Joseph Hubertina Barbara Schleipen ,  Frank Jeroen Pieter Schuurmans ,  Teunis Willem Tukker

发明人： Gert 'T Hooft ,  Johannes Joseph Hubertina Barbara Schleipen ,  Frank Jeroen Pieter Schuurmans ,  Teunis Willem Tukker

IPC分类号： H01S3/10 ,  H01S3/1055

CPC分类号： G11B7/0065 ,  G02B19/0028 ,  G02B19/0052 ,  G11B7/1362 ,  G11B7/1376 ,  G11B7/1381 ,  G11B7/1398 ,  H01S5/005 ,  H01S5/0656 ,  H01S5/141 ,  H01S2302/00

摘要： For optical data storage applications, for example, for holographic storage applications, a radiation beam (12) with a flat intensity profile is needed. The radiation source device (1) of the invention comprises a beam shaper element (5) and a collimating element (7) between a semiconductor laser (3) and an output coupler (9) and provides such a radiation beam (12) with an increased efficiency. An external resonator is thereby provided. Further, a relatively fast tuning of the wavelength of the output radiation beam (12) can be provided.

摘要翻译： 对于光学数据存储应用，例如，对于全息存储应用，需要具有平坦强度分布的辐射束（12）。 本发明的辐射源装置（1）包括在半导体激光器（3）和输出耦合器（9）之间的光束整形元件（5）和准直元件（7），并且提供这样的辐射束（12） 提高效率。 由此提供外部谐振器。 此外，可以提供输出辐射束（12）的波长的相对快速调谐。

公开(公告)号：US07167232B2

公开(公告)日：2007-01-23

申请号：US10747613

申请日：2003-12-30

申请人： Vadim Yevgenyevich Banine ,  Johannes Peterus Henricus De Kuster ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans ,  Lucas Henricus Johannes Stevens

发明人： Vadim Yevgenyevich Banine ,  Johannes Peterus Henricus De Kuster ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans ,  Lucas Henricus Johannes Stevens

IPC分类号： G03B27/42

CPC分类号： G03F7/70908 ,  G03F7/70916

摘要： A lithographic apparatus is disclosed. The lithographic apparatus includes a radiation source that produces EUV radiation, an illumination system that provides a beam of the EUV radiation produced by the radiation source, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The radiation source includes a debris-mitigation system that mitigates debris particles which are formed during production of EUV radiation. The debris-mitigation system is configured to provide additional particles for interacting with the debris particles.

摘要翻译： 公开了一种光刻设备。 光刻设备包括产生EUV辐射的辐射源，提供由辐射源产生的EUV辐射束的照明系统和支持图案形成结构的支撑结构。 图案形成结构被配置为在其横截面中赋予辐射束图案。 该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。 辐射源包括减轻在生成EUV辐射期间形成的碎片颗粒的碎片减轻系统。 碎片减轻系统被配置为提供用于与碎屑颗粒相互作用的附加颗粒。