摘要:
The present invention achieves the enhancement of a manufacturing yield factor and the reduction of manufacturing cost in a manufacturing method of a semiconductor device having a hetero junction bipolar transistor (HBT), a Schottky diode and a resistance element. The present invention is directed to the manufacturing method of a semiconductor device in which respective semiconductor layers which become a sub collector layer, a collector layer, a base layer, a wide gap emitter layer and an emitter layer are sequentially formed over one surface of a semiconductor substrate and, thereafter, respective semiconductor layers are processed to form the hetero junction bipolar transistor, the Schottky diode and the resistance element in a monolithic manner. An emitter electrode of the hetero junction bipolar transistor, a Schottky electrode of the Schottky diode and a resistance film of the resistance element are simultaneously formed using a same material (for example, WSiN). Accordingly, the man-hours can be reduced and the manufacturing cost of the semiconductor device can be reduced.
摘要:
A method for directly and accurately estimating friction coefficient of a road surface independently from the slip rate is disclosed. The method measures tangential and vertical forces acting on an elastic body 3 of an elastic wheel 1, and calculates the friction coefficient of a road surface based on the measured values of these forces and angular rate of the wheel 1.
摘要:
This invention discloses a heterojunction type field effect transistor such as 2DEG-FET and a heterojunction type bipolar transistor such as 2DEG-HBT. The former is fabricated by applying to the formation of its source and drain regions a technique which causes the disorder of the heterojunction by introduction of an impurity such as by ion implantation or a technique which causes the disorder of the heterojunction by forming a film made of at least one kind of material selected from insulators, metals and semiconductors which have a different linear coefficient of thermal expansion from that of the material of a semiconductor substrate on the heterojunction semiconductor region which is to be disordered. The latter is fabricated by applying either of the techniques described above to a base ohmic contact region. These semiconductor devices can reduce the source-gate resistance and the parasitic base resistance. The invention discloses also the structure of the ohmic contact layer which has a trench on the surface thereof and is particularly effective for reducing the source-gate parasitic resistance.
摘要:
A brake device for use in an arm of a robot or manipulator cmprises a brake drum, a lever pivotally supported at its intermediate portion, a brake shoe provided on the lever between its pivotally supported point and its one end, a pneumatic actuator axially contractible upon applying internal pressure thereinto and having a movable end connected to the one end or the other end of the lever, and a spring connected to one end of the lever not connected to the actuator so as to operate to elongate the actuator. This brake device is remarkably small-sized and of light-weight and consumes only small amount of fluid pressure to contribute economy of energy in comparison with prior art brake devices. The brake device according to the invention is applicable to a robot arm comprising a rotating member connected to the brake drum so as to rotate together, and two elastic actuators whose one ends are connected to a stationary member and the other are connected to each other through the rotating member in a manner to rotate the rotating member by contraction of the one actuator and simultaneous extension of the other actuator. At least one of the actuators is a pneumatic actuator axially contractible upon applying internal pressure thereinto.
摘要:
A thermochromic writing instrument contains a thermochromic ink, wherein a writing body is accommodated in a barrel movably in a longitudinal direction, an operation portion is provided on the outer surface of the barrel, a pen tip of the writing body is constituted so as to be projectable/retractable from/into a front-end hole of the barrel by operating the operation portion, the thermochromic ink is contained in the inside of the writing body, the pen tip capable of ejecting the thermochromic ink is provided at the front end of the writing tool, and a friction portion capable of thermally changing the color of the handwriting of the thermochromic ink by the frictional heat generated when the handwriting is rubbed with the friction portion is provided on the outer surface of the barrel.
摘要:
A thermochromic writing instrument contains a thermochromic ink, wherein a writing body is accommodated in a barrel movably in a longitudinal direction, an operation portion is provided on the outer surface of the barrel, a pen tip of the writing body is constituted so as to be projectable/retractable from/into a front-end hole of the barrel by operating the operation portion, the thermochromic ink is contained in the inside of the writing body, the pen tip capable of ejecting the thermochromic ink is provided at the front end of the writing tool, and a friction portion capable of thermally changing the color of the handwriting of the thermochromic ink by the frictional heat generated when the handwriting is rubbed with the friction portion is provided on the outer surface of the barrel.
摘要:
A thermochromic writing instrument contains a thermochromic ink, wherein a writing body 8 is accommodated in a barrel 2 movably in a longitudinal direction, an operation portion 5 is provided on the outer surface of the barrel 2, and a pen tip 81 of the writing body 8 is constituted so as to be projectable/retractable from/into a front-end hole 31 of the barrel 2 by operating the operation portion 5. The thermochromic ink 83 is contained in the inside of the writing body 8, the pen tip 81 capable of ejecting the thermochromic ink 83 is provided at the front end of the writing tool, and a friction portion 4 capable of thermally changing the color of the handwriting of the thermochromic ink 83 by the frictional heat generated when the handwriting is rubbed with the friction portion 4 is provided on the outer surface of the barrel 2.
摘要:
Provided is a technique of improving the properties of a bipolar transistor. Described specifically, upon formation of a collector electrode around a base mesa by the lift-off method, a resist film is formed over connection portions between the outer periphery of a region OA1 and a region in which the base mesa 4a is formed, followed by successive formation of gold germanium (AuGe), nickel (Ni) and Au in the order of mention over the entire surface of a substrate so that the stacked film of them will not become an isolated pattern. As a result, the stacked film over the base mesa 4a is connected to a stacked film at the outer periphery of the region OA1, facilitating peeling of the stacked film over the base mesa 4a. In addition, generation of side etching upon formation of a via hole extending from the back side of the substrate to a backside via electrode is reduced by forming the backside via electrode using a material such as WSi which hardly reacts with an n type GaAs layer or n type InGaAs layer.
摘要:
Provided is a technique of improving the properties of a bipolar transistor. Described specifically, upon formation of a collector electrode around a base mesa by the lift-off method, a resist film is formed over connection portions between the outer periphery of a region OA1 and a region in which the base mesa 4a is formed, followed by successive formation of gold germanium (AuGe), nickel (Ni) and Au in the order of mention over the entire surface of a substrate so that the stacked film of them will not become an isolated pattern. As a result, the stacked film over the base mesa 4a is connected to a stacked film at the outer periphery of the region OA1, facilitating peeling of the stacked film over the base mesa 4a. In addition, generation of side etching upon formation of a via hole extending from the back side of the substrate to a backside via electrode is reduced by forming the backside via electrode using a material such as WSi which hardly reacts with an n type GaAs layer or n type InGaAs layer.
摘要:
The present invention achieves the enhancement of a manufacturing yield factor and the reduction of manufacturing cost in a manufacturing method of a semiconductor device having a hetero junction bipolar transistor (HBT), a Schottky diode and a resistance element. The present invention is directed to the manufacturing method of a semiconductor device in which respective semiconductor layers which become a sub collector layer, a collector layer, a base layer, a wide gap emitter layer and an emitter layer are sequentially formed over one surface of a semiconductor substrate and, thereafter, respective semiconductor layers are processed to form the hetero junction bipolar transistor, the Schottky diode and the resistance element in a monolithic manner. An emitter electrode of the hetero junction bipolar transistor, a Schottky electrode of the Schottky diode and a resistance film of the resistance element are simultaneously formed using a same material (for example, WSiN). Accordingly, the man-hours can be reduced and the manufacturing cost of the semiconductor device can be reduced.