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公开(公告)号:US20240105268A1
公开(公告)日:2024-03-28
申请号:US18529897
申请日:2023-12-05
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Seungyeon Kim , Daeseok Byeon , Pansuk Kwak , Hongsoo Jeon
Abstract: A memory device includes: a memory cell array including a first memory block and a second memory block adjacently disposed in a first direction, driving signal lines respectively corresponding to vertically stacked word lines, and a pass transistor circuit including an odd number of pass transistor groups and connected between the driving signal lines and the memory cell array. One of the odd number of pass transistor groups includes a first pass transistor connected between a first word line of the first memory block and a first driving signal line among the driving signal lines, and a second pass transistor connected between a first word line of the second memory block and the first driving signal line adjacently disposed to the first pass transistor in a second direction.
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32.
公开(公告)号:US11901001B2
公开(公告)日:2024-02-13
申请号:US17569786
申请日:2022-01-06
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jooyong Park , Pansuk Kwak , Daeseok Byeon
CPC classification number: G11C13/0059 , G11C5/063 , G11C13/004 , G11C13/0028 , G11C13/0038 , G11C13/0069
Abstract: Provided are memory devices and memory systems. The memory device includes a memory cell array in a first semiconductor layer and including word lines stacked in a first direction, and channel structures passing through the word lines in the first direction; a control logic circuit in a second semiconductor layer located below the first semiconductor layer in the first direction; and a physical unclonable function (PUF) circuit including a plurality of through electrodes passing through the first semiconductor layer and the second semiconductor layer, and configured to generate PUF data according to resistance values of the plurality of through electrodes, and generate the PUF data based on a node voltage between through electrodes connected in series, among the plurality of through electrodes.
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33.
公开(公告)号:US20230317655A1
公开(公告)日:2023-10-05
申请号:US18328359
申请日:2023-06-02
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jooyong PARK , Chanho Kim , Pansuk Kwak , Daeseok Byeon
IPC: H01L23/00 , H01L21/66 , H01L25/065 , H01L25/18 , H01L25/00
CPC classification number: H01L24/08 , H01L22/20 , H01L24/80 , H01L25/0657 , H01L25/18 , H01L25/50 , H01L2224/08145 , H01L2224/80895 , H01L2224/80896 , H01L2224/80908 , H01L2225/06596 , H01L2924/1431 , H01L2924/14511
Abstract: A memory device includes a memory chip including a memory cell array connected to first word lines and first bit lines, first word line bonding pads respectively connected to the first word lines, and first bit line bonding pads respectively connected to the first bit lines, and a peripheral circuit chip, wherein the peripheral circuit chip includes a test cell array connected to second word lines and second bit lines, second word line bonding pads respectively connected to the first word line bonding pads, second bit line bonding pads respectively connected to the first bit line bonding pads, and a peripheral circuit connected to the second word line bonding pads and the second word lines or the second bit line bonding pads and the second bit lines.
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公开(公告)号:US20230267975A1
公开(公告)日:2023-08-24
申请号:US18104533
申请日:2023-02-01
Applicant: Samsung Electronics Co., Ltd.
Inventor: Seungyeon Kim , Daeseok Byeon
CPC classification number: G11C7/1039 , G11C7/1069 , G11C5/063
Abstract: A non-volatile memory device includes a first semiconductor layer including a first cell region in which a first memory cell array is disposed, a second cell region in which a second memory cell array is disposed, wherein the first memory cell array and the second memory cell array each include a plurality of word lines, a plurality of memory cells, and a plurality of bit lines, and a second semiconductor layer including a page buffer circuit region in which a page buffer circuit connected to the first memory cell array and the second memory cell array is disposed, wherein the page buffer circuit region overlaps a boundary region between the first cell region and the second cell region when viewed from the vertical direction.
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35.
公开(公告)号:US11721655B2
公开(公告)日:2023-08-08
申请号:US17381782
申请日:2021-07-21
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jooyong Park , Chanho Kim , Pansuk Kwak , Daeseok Byeon
IPC: H01L25/065 , H01L23/00 , H01L21/66 , H01L25/18 , H01L25/00
CPC classification number: H01L24/08 , H01L22/20 , H01L24/80 , H01L25/0657 , H01L25/18 , H01L25/50 , H01L2224/08145 , H01L2224/80895 , H01L2224/80896 , H01L2224/80908 , H01L2225/06596 , H01L2924/1431 , H01L2924/14511
Abstract: A memory device includes a memory chip including a memory cell array connected to first word lines and first bit lines, first word line bonding pads respectively connected to the first word lines, and first bit line bonding pads respectively connected to the first bit lines, and a peripheral circuit chip, wherein the peripheral circuit chip includes a test cell array connected to second word lines and second bit lines, second word line bonding pads respectively connected to the first word line bonding pads, second bit line bonding pads respectively connected to the first bit line bonding pads, and a peripheral circuit connected to the second word line bonding pads and the second word lines or the second bit line bonding pads and the second bit lines.
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公开(公告)号:US11709629B2
公开(公告)日:2023-07-25
申请号:US17455037
申请日:2021-11-16
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Yonghyuk Choi , Jaeduk Yu , Sangwan Nam , Sangwon Park , Daeseok Byeon , Bongsoon Lim
CPC classification number: G06F3/0659 , G06F3/0604 , G06F3/0679 , G11C16/0483 , G11C16/08 , G11C16/24 , H10B41/27 , H10B43/27
Abstract: A nonvolatile memory device includes a first semiconductor layer including an upper substrate in which word-lines extending in a first direction and bit-lines extending in a second direction are disposed and a memory cell array, a second semiconductor layer, a control circuit, and a pad region. The memory cell array includes a vertical structure on the upper substrate, and the vertical structure includes memory blocks. The second semiconductor layer includes a lower substrate that includes address decoders and page buffer circuits. The vertical structure includes via areas in which one or more through-hole vias are provided, and the via areas are spaced apart in the second direction. The memory cell array includes mats corresponding to different bit-lines of the bit-lines. At least two of the mats include a different number of the via areas according to a distance from the pad region in the first direction.
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公开(公告)号:US11637077B2
公开(公告)日:2023-04-25
申请号:US17218230
申请日:2021-03-31
Applicant: Samsung Electronics Co., Ltd.
Inventor: Changbum Kim , Sunghoon Kim , Daeseok Byeon
IPC: H01L21/00 , H01L23/60 , H01L23/528 , H01L27/092
Abstract: A semiconductor device includes a gate line extending in a first direction, parallel to an upper surface of a semiconductor substrate; a first active region including a first channel region disposed below the gate line and including a first conductivity-type impurity; a second active region disposed to be separated from the first active region in the first direction, including a second channel region disposed below the gate line, and including the first conductivity-type impurity; and a plurality of metal wirings disposed at a first height level above the semiconductor substrate, wherein at least one metal wiring, among the plurality of metal wirings, is directly electrically connected to the first active region, no metal wirings at the first height level are electrically connected to the second active region, and at least one metal wiring, among the plurality of metal wirings, is connected to receive a signal applied to the gate line.
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公开(公告)号:US11513730B2
公开(公告)日:2022-11-29
申请号:US16892574
申请日:2020-06-04
Applicant: Samsung Electronics Co., Ltd.
Inventor: Taehong Kwon , Daeseok Byeon , Chanho Kim , Taehyo Kim
Abstract: A memory device includes a first memory area including a first memory cell array having a plurality of first memory cells each for storing N-bit data according to an M-bit data access scheme, where N is a natural number, and a first peripheral circuit for controlling the first memory cells and disposed below the first memory cell array, a second memory area including a second memory cell array having a plurality of second memory cells each for storing M-bit data according to an M-bit data access scheme, where M is a natural number greater than N, and a second peripheral circuit for controlling the second memory cells and disposed below the second memory cell array, the first memory area and the second memory area are included in a single semiconductor chip and share an input and output interface, and a controller configured to generate calculation data by applying a weight stored in the first memory area to sensing data in response to receiving the sensing data obtained by an external sensor, and store the calculation data in one of the first memory area or the second memory area according to the weight.
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公开(公告)号:US11462275B2
公开(公告)日:2022-10-04
申请号:US17227501
申请日:2021-04-12
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Seungyeon Kim , Daeseok Byeon , Pansuk Kwak , Hongsoo Jeon
IPC: G11C16/24 , G11C5/06 , G11C16/26 , H01L27/11556 , H01L27/11582
Abstract: A memory device includes; a memory cell array including a first memory block and a second memory block adjacently disposed in a first direction, driving signal lines respectively corresponding to vertically stacked word lines, and a pass transistor circuit including an odd number of pass transistor groups and connected between the driving signal lines and the memory cell array. One of the odd number of pass transistor groups includes a first pass transistor connected between a first word line of the first memory block and a first driving signal line among the driving signal lines, and a second pass transistor connected between a first word line of the second memory block and the first driving signal line adjacently disposed to the first pass transistor in a second direction.
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公开(公告)号:US11456317B2
公开(公告)日:2022-09-27
申请号:US17023053
申请日:2020-09-16
Applicant: Samsung Electronics Co., Ltd.
Inventor: Chanho Kim , Daeseok Byeon , Dongku Kang
IPC: H01L27/11573 , H01L27/11582 , G11C8/14 , H01L23/522 , H01L23/528 , H01L27/11526 , H01L27/11519 , H01L27/11556 , H01L27/11565
Abstract: A memory device includes a peripheral circuit region comprising a first substrate, a plurality of metal layers over the first substrate, and a first metal pad, a cell region comprising a second substrate, a plurality of gate lines over the second substrate, a plurality of upper interconnection layers in the second substrate, and a second metal pad, wherein the cell region is vertically connected to the peripheral circuit region by the first metal pad and the second metal pad, a common source line between the second substrate and the plurality of gate lines, the common source line comprising a through hole, and a word line cut region extending across the plurality of gate lines and extending through the through hole of the common source line to be connected to a first upper interconnection layer from among the plurality of upper interconnection layers.
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