Abstract:
It is an object to form different identifying marks without using a lot of pattern forming plates for forming identifying marks, while forming identifying marks on print-circuit boards. A print-circuit board 5 which has a conductor layer 2 and a resist layer 3 is formed by the first step of forming patterns composing identifying marks on the conductor layer 2 and the second step of forming patterns composing identifying marks on the resist layer 3. At the first step, the patterns having patterns 2a and 2b are formed on the conductor layer 2. At the second step, the patterns having patterns 3a, 3b, 3c and 3d are formed on the resist layer 3. The patterns 2a and 3a and the patterns 2b and 3c compose one identifying mark for identifying the print-circuit board 5. Another patterns 3b and 3d are also formed on the resist layer. The patterns 3b and 3d are formed as patterns for composing the other identifying mark.
Abstract:
A nonvolatile semiconductor memory device including a first bit line commonly coupling drain sides memory cells; a word line commonly coupling control gates of memory cell transistors; a column decoder coupled to a second bit line; a row decoder coupled to a word line; a first transistor having a source coupled to the first bit line and having a drain electrically coupled to the column decoder via the second bit line; and a first control unit for controlling potential of a gate of the first transistor, the memory cell transistor being formed over a first well, the first transistor being formed over a second well electrically isolated from the first well, a film thickness of a gate insulation film of the first transistor being smaller than that of a gate insulation film of a second transistor formed in the row decoder and coupled to the word line.
Abstract:
A nonvolatile semiconductor memory device including a memory cell array of memory cells arranged in a matrix, each of which includes a selecting transistor and a memory cell transistor; a column decoder controlling the potential of bit lines; a voltage application circuit controlling the potential of the first word lines; a first row decoder controlling the potential of the second word lines; and a second row decoder controlling the potential of the source line. The column decoder is formed of a circuit whose withstand voltage is lower than the voltage application circuit and the second row decoder.
Abstract:
A nonvolatile semiconductor memory device including a memory cell array of memory cells arranged in a matrix, each of which includes a selecting transistor and a memory cell transistor; a column decoder controlling the potential of bit lines; a voltage application circuit controlling the potential of the first word lines; a first row decoder controlling the potential of the second word lines; and a second row decoder controlling the potential of the source line. The column decoder is formed of a circuit whose withstand voltage is lower than the voltage application circuit and the second row decoder.
Abstract:
A memory system is provided including forming a memory gate stack having a charge trap layer over a semiconductor substrate, forming a protection layer to cover the memory gate stack, and forming a protection enclosure for the charge trap layer with the protection layer and the memory gate stack.
Abstract:
A SONOS memory cell, formed within a semiconductor substrate, includes a bottom dielectric disposed on the semiconductor substrate, a charge trapping material disposed on the bottom dielectric, and a top dielectric disposed on the charge trapping material. Furthermore, the SONOS memory cell includes a word-line gate structure disposed on the top dielectric and at least one bit-line gate for inducing at least one inversion bit-line within the semiconductor substrate.
Abstract:
A SONOS memory cell, formed within a semiconductor substrate, includes a bottom dielectric disposed on the semiconductor substrate, a charge trapping material disposed on the bottom dielectric, and a top dielectric disposed on the charge trapping material. Furthermore, the SONOS memory cell includes a word-line gate structure disposed on the top dielectric and at least one bit-line gate for inducing at least one inversion bit-line within the semiconductor substrate.
Abstract:
Systems and methods of fabricating a U-shaped memory device with a recessed channel and a segmented/separated ONO layer are provided. Multibit operation is facilitated by a separated ONO layer, which includes a charge trapping region on sidewalls of polysilicon gate structures adjacent to source/drain regions. Programming and erasing of the memory cells is facilitated by the relatively short distance between acting source regions and the gate. Additionally, short channel effects are mitigated by a relatively long U-shaped channel region that travels around the recessed polysilicon gate thereby adding a depth dimension to the channel length.
Abstract:
A memory device may include a substrate, a dielectric layer formed on the substrate and a charge storage element formed on the dielectric layer. The memory device may also include an inter-gate dielectric formed on the charge storage element, a barrier layer formed on the inter-gate dielectric and a control gate formed on the barrier layer. The barrier layer prevents reaction between the control gate and the inter-gate dielectric.
Abstract:
A printed circuit board, which is guaranteed to be free of defective soldering in mounting and connecting electric or electronic parts or devices to the printed circuit, has a circuit pattern printed on its substrate, and an anti-soldering layer is laid on the circuit pattern to prevent soldering material from sticking to the circuit pattern and silk-screen printing areas are laid on the anti-soldering layer to indicate where selected electric or electronic parts or devices are to be mounted. Each silk-screen printing area has terminal holes made therein. The board has a substrate-exposed zone traversing the silk-screen printing area to leave its opposite extensions open to the surrounding atmosphere, thereby allowing heated air and gases to escape from the interspace between the bottom of the electric or electronic part or device and the exposed substrate.