公开(公告)号：US06583431B2

公开(公告)日：2003-06-24

申请号：US10105257

申请日：2002-03-26

申请人： Hiroyuki Ito ,  Yasunari Sohda ,  Yasuhiro Someda ,  Yoshinori Nakayama ,  Masahide Okumura ,  Hidetoshi Satoh

发明人： Hiroyuki Ito ,  Yasunari Sohda ,  Yasuhiro Someda ,  Yoshinori Nakayama ,  Masahide Okumura ,  Hidetoshi Satoh

IPC分类号： H01J37304

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31776

摘要： In order to provide a high-speed and high accuracy cell projection exposure apparatus which increases a pattern projection number extremely, a plurality of stencil masks mounting a transferal aperture and a transmission aperture are provided and are positioned by a drive stage, the electron beam passes through a transmission aperture of other stencil masks while selecting the aperture on a stencil mask with a beam deflection device, the transmission aperture is provided for a mask transfer direction in succession, the stencil mask is moved while being transmitted with the beam, and other stencil mask transfer is executed when specified stencil mask aperture group is exposed. These operations are repeated so that all exposure processes are performed.

公开(公告)号：US06262428B1

公开(公告)日：2001-07-17

申请号：US09621577

申请日：2000-07-21

申请人： Hiroyuki Ito ,  Yasunari Sohda ,  Yasuhiro Someda ,  Yoshinori Nakayama ,  Masahide Okumura ,  Hidetoshi Satoh

发明人： Hiroyuki Ito ,  Yasunari Sohda ,  Yasuhiro Someda ,  Yoshinori Nakayama ,  Masahide Okumura ,  Hidetoshi Satoh

IPC分类号： H01J37304

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31776

摘要： In order to provide a high-speed and high accuracy cell projection exposure apparatus which increases a pattern projection number extremely, a plurality of stencil masks mounting a transferal aperture and a transmission aperture are provided and are positioned by a drive stage, the electron beam passes through a transmission aperture of other stencil masks while selecting the aperture on a stencil mask with a beam deflection device, the transmission aperture is provided for mask transfer direction in succession, the stencil mask is moved while being transmitted with the beam, and other stencil mask transfer is executed when specified stencil mask aperture group is exposed. These operations are repeated so that all exposure processes are performed.

摘要翻译： 为了提供极大地增加图案投影数的高速和高精度的单元投影曝光装置，提供了安装传送孔和传输孔的多个模板掩模，并且通过驱动级定位，电子束通过 通过其他模板掩模的透射孔，同时用光束偏转装置选择在模板掩模上的孔，传送孔被连续地用于掩模传送方向，模板掩模在与梁一起传播的同时移动，而其它模板掩模 当指定的模板掩模孔组被曝光时执行传送。 重复这些操作，以便执行所有曝光处理。

公开(公告)号：US5396077A

公开(公告)日：1995-03-07

申请号：US213737

申请日：1994-03-16

申请人： Yasunari Sohda ,  Hiroyuki Itoh ,  Yasuhiro Someda ,  Yoshinori Nakayama ,  Hidetoshi Satoh ,  Genya Matsuoka

发明人： Yasunari Sohda ,  Hiroyuki Itoh ,  Yasuhiro Someda ,  Yoshinori Nakayama ,  Hidetoshi Satoh ,  Genya Matsuoka

IPC分类号： H01L21/027 ,  H01J37/244 ,  H01J37/26 ,  H01J37/317 ,  H01J37/304

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/30455

摘要： An electron beam apparatus used in a cell projection method has a system for correcting the electron optics. A figured electron beam that has been passed through a cell having a complex figure shape is directed onto a stage on which a substrate is positioned. A fine hole is formed in the substrate and an electron detector is positioned underneath the fine hole to receive the electrons that pass through the fine hole. The output signal of the electron detector is processed to provide a representation of the degree of focus and astigmatism correction of the electron optics. When a line and space pattern is used to shape the electron beam, the output signal from the electron detector has a series of peak intensity values that, when maximized, indicate an optimum correction of the electron optics. Optionally, a limited aperture is positioned between the substrate having a fine hole and the electron detector to limit the detection of scattered electrons that have not passed through the fine hole.

摘要翻译： 在电池投影方法中使用的电子束装置具有用于校正电子光学的系统。 已经通过具有复杂图形形状的单元的图形电子束被引导到其上定位有基板的台上。 在基板中形成细孔，电子检测器位于细孔下方，以接收穿过细孔的电子。 处理电子检测器的输出信号以提供电子光学的聚焦和像散校正的表示。 当使用线和空间图案来形成电子束时，来自电子检测器的输出信号具有一系列峰值强度值，当最大化时，其表示电子光学的最佳校正。 可选地，有限孔被定位在具有细孔的基板和电子检测器之间，以限制未通过细孔的散射电子的检测。

公开(公告)号：US09261360B2

公开(公告)日：2016-02-16

申请号：US13580875

申请日：2011-02-22

申请人： Nobuhiro Okai ,  Yasunari Sohda ,  Junichi Tanaka

发明人： Nobuhiro Okai ,  Yasunari Sohda ,  Junichi Tanaka

IPC分类号： G01B15/00 ,  H01J37/285 ,  G01B15/04 ,  H01J37/28

CPC分类号： G01B15/00 ,  G01B15/04 ,  H01J37/28 ,  H01J2237/2067 ,  H01J2237/221 ,  H01J2237/24578 ,  H01J2237/2817

摘要： Disclosed is a charged particle beam microscope which can obtain information about pattern materials and stereostructure without lowering throughput of pattern dimension measurement. To achieve this, the charged particle beam microscope acquires a plurality of frame images by scanning the field of view of the sample (S304, 305), adds the images together (S307), computes the dimensions of the pattern formed on the sample (308) and at the same time acquires pattern information (314) using components of a frame image, such as a single frame image or subframe image, as a separated image (309, 310).

摘要翻译： 公开了一种带电粒子束显微镜，其可以获得关于图案材料和立体结构的信息，而不降低图案尺寸测量的生产率。 为了实现这一点，带电粒子束显微镜通过扫描样本的视场来获取多个帧图像（S304,305），将图像相加在一起（S307），计算在样本（308）上形成的图案的尺寸 ），并且同时使用诸如单帧图像或子帧图像的帧图像的分量作为分离图像（309,310）获取图案信息（314）。

公开(公告)号：US09230775B2

公开(公告)日：2016-01-05

申请号：US13451596

申请日：2012-04-20

申请人： Takeyoshi Ohashi ,  Yasunari Sohda ,  Makoto Ezumi ,  Muneyuki Fukuda ,  Noritsugu Takahashi

发明人： Takeyoshi Ohashi ,  Yasunari Sohda ,  Makoto Ezumi ,  Muneyuki Fukuda ,  Noritsugu Takahashi

IPC分类号： H01J37/00 ,  H01J37/28 ,  H01J37/26

CPC分类号： H01J37/28 ,  H01J37/265 ,  H01J2237/1532 ,  H01J2237/1536 ,  H01J2237/2811

摘要： A charged particle instrument including a controlling and operating unit for controlling a charged particle source, deflecting means, and focus changing means and making a data for an image by an electric signal detected by a detector, and a recording unit for preserving a correction coefficient registered at each image-acquisition, in which the controlling and operating unit acquires plural images while changing a focus, and controls an optical condition such that a landing angle of a charged particle beam becomes perpendicular when an image for measurement is acquired on the basis of a position shift amount of a mark in the image and a correction coefficient registered to the recording unit.

摘要翻译： 一种带电粒子仪器，包括用于控制带电粒子源的控制和操作单元，偏转装置和聚焦改变装置，以及通过由检测器检测的电信号为图像提供数据;以及记录单元，用于保持记录的校正系数 在每次图像获取期间，控制和操作单元在改变焦点的同时获取多个图像，并且控制光学条件，使得当基于以下步骤获得用于测量的图像时，带电粒子束的着陆角变为垂直 图像中的标记的位置偏移量和登记到记录单元的校正系数。

公开(公告)号：US20130026361A1

公开(公告)日：2013-01-31

申请号：US13386540

申请日：2010-07-26

申请人： Yasunari Sohda ,  Takeyoshi Ohashi ,  Muneyuki Fukuda ,  Toru Yamanashi

发明人： Hiromasa Yamanashi ,  Yasunari Sohda ,  Takeyoshi Ohashi ,  Muneyuki Fukuda

IPC分类号： H01J37/26 ,  H01J37/20

CPC分类号： H01J37/28 ,  G06T7/74 ,  G06T2207/10061 ,  G06T2207/30148 ,  G06T2207/30204 ,  H01J37/1478 ,  H01J2237/24578 ,  H01J2237/2611 ,  H01J2237/2817

摘要： An amount of pattern position displacement between observation images acquired by irradiating from two different directions is changed depending on beam deflection for moving an image acquisition position. In a pattern evaluation method that measures astigmatic difference or focus position displacement having a small amount of dose at a high speed using parallax caused by the tilted beam, a correction value obtained in advance by measurement is reflected in an amount of pattern position displacement between observation images obtained by irradiating from at least two different directions and generated in accordance with the amount of beam deflection for moving an image acquisition position. A processing unit calculates an amount of correction of an amount of pattern position displacement depending on beam deflection of a beam deflecting unit for moving an image acquisition position on the sample at a high speed.

摘要翻译： 通过从两个不同方向照射获取的观察图像之间的图案位置位移量根据用于移动图像获取位置的光束偏转而改变。 在使用由倾斜光束引起的视差来高速度地测量具有少量剂量的散光差异或聚焦位置位移的图案评估方法中，通过测量预先获得的校正值反映在观察之间的图案位置位移量 通过从至少两个不同方向照射而产生的并且根据用于移动图像获取位置的光束偏转量而产生的图像。 处理单元计算取决于用于在高速下移动样本上的图像获取位置的光束偏转单元的光束偏转的图案位置位移量的校正量。

公开(公告)号：US20120217393A1

公开(公告)日：2012-08-30

申请号：US13505951

申请日：2010-11-01

申请人： Nobuhiro Okai ,  Yasunari Sohda

发明人： Nobuhiro Okai ,  Yasunari Sohda

IPC分类号： H01J37/26

CPC分类号： H01J37/04 ,  H01J37/026 ,  H01J37/14 ,  H01J37/145 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/004 ,  H01J2237/0044 ,  H01J2237/121 ,  H01J2237/153

摘要： A scanning electron microscope suppresses a beam drift by reducing charging on a sample surface while suppressing resolution degradation upon observation of an insulator sample. An electron microscope includes an electron source and an objective lens that focuses an electron beam emitted from the electron source, which provides an image using a secondary signal generated from the sample irradiated with the electron beam. A magnetic body with a continuous structure and an inside diameter larger than an inside diameter of an upper pole piece that forms the objective lens is provided between the objective lens and the sample.

摘要翻译： 扫描电子显微镜通过减少对样品表面的充电而抑制光束偏移，同时在观察绝缘体样品时抑制分辨率劣化。 电子显微镜包括电子源和物镜，其聚焦从电子源发射的电子束，其使用从照射电子束的样品产生的二次信号来提供图像。 在物镜和样品之间设置具有连续结构且内径大于形成物镜的上极片的内径的磁体。

公开(公告)号：US20110274341A1

公开(公告)日：2011-11-10

申请号：US13142316

申请日：2010-01-13

申请人： Kaori Shirahata ,  Yoshinori Nakayama ,  Keiichiro Hitomi ,  Muneyuki Fukuda ,  Yasunari Sohda

发明人： Kaori Shirahata ,  Yoshinori Nakayama ,  Keiichiro Hitomi ,  Muneyuki Fukuda ,  Yasunari Sohda

IPC分类号： G06K9/00

CPC分类号： G01B15/00 ,  H01J37/153 ,  H01J37/21 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/1532 ,  H01J2237/216 ,  H01L22/12

摘要： In order to provide a charged beam device capable of obtaining a precise image of a sample surface pattern while improving the accuracy of automatic focus/astigmatism correction, there are provided an electron gun (1), a deflection control portion (8) which allows an electron beam to scan, a focus control portion (10) and an astigmatism correction portion (3) for the electron beam, an image processing portion (11), and a switching portion (9) which switches scan conditions when obtaining pattern information of the sample (1001) surface and scan conditions when performing the automatic focus/astigmatism correction, and a scan speed and scan procedures are switched between when obtaining the pattern information and when performing the automatic focus/astigmatism correction.

摘要翻译： 为了提供能够获得样品表面图案的精确图像的带电束装置，同时提高自动聚焦/像散校正的精度，提供了一种电子枪（1），偏转控制部分（8），其允许 电子束扫描，用于电子束的聚焦控制部分（10）和像散校正部分（3），图像处理部分（11）和切换部分（9），当获得图像信息 进行自动聚焦/像散校正时的样品（1001）表面和扫描条件，并且在获得图案信息和执行自动聚焦/散光校正时切换扫描速度和扫描程序。

公开(公告)号：US20110249110A1

公开(公告)日：2011-10-13

申请号：US13139315

申请日：2009-11-24

申请人： Nobuhiro Okai ,  Yasunari Sohda

发明人： Nobuhiro Okai ,  Yasunari Sohda

IPC分类号： H04N7/18

CPC分类号： G01B15/00 ,  H01J37/222 ,  H01J37/28

摘要： Provided is a scanning electron microscope including: an image recording unit (112) which stores a plurality of acquired frame images; a correction analyzing handling unit (113) which calculates a drift amount between frame images and a drift amount between a plurality of field images constituting a frame image; and a data handling unit (111) which corrects positions of respective field images constituting the plurality of fields images according to the drift amount between the field images and superimposes the field images on one another so as to create a new frame image. This provides a scanning electron microscope which can obtain a clear frame image even if an image drift is caused during observation of a pattern on a semiconductor substrate or an insulating object.

摘要翻译： 提供一种扫描电子显微镜，包括：图像记录单元，其存储多个获取的帧图像; 校正分析处理单元，其计算帧图像之间的漂移量和构成帧图像的多个场图像之间的漂移量; 以及数据处理单元（111），其根据场图像之间的漂移量校正构成多个场图像的各个场图像的位置，并将场图像彼此叠加，从而创建新的帧图像。 这提供了即使在观察半导体衬底或绝缘物体上的图案时引起图像漂移，也可以获得清晰的帧图像的扫描电子显微镜。

公开(公告)号：US07943903B2

公开(公告)日：2011-05-17

申请号：US12320574

申请日：2009-01-29

申请人： Shinji Okazaki ,  Shoji Hotta ,  Yasunari Sohda ,  Yoshinori Nakayama

发明人： Shinji Okazaki ,  Shoji Hotta ,  Yasunari Sohda ,  Yoshinori Nakayama

IPC分类号： H01J37/153 ,  G01N23/00

CPC分类号： H01L22/12 ,  G06T7/0006 ,  G06T7/001 ,  G06T2207/10056 ,  G06T2207/30148 ,  H01L2924/0002 ,  H01L2924/00

摘要： A method for enabling management of fatal defects of semiconductor integrated patterns easily, the method enables storing of design data of each pattern designed by a semiconductor integrated circuit designer, as well as storing of design intent data having pattern importance levels ranked according to their design intents respectively. The method also enables anticipating of defects to be generated systematically due to the characteristics of the subject exposure system, etc. while each designed circuit pattern is exposed and delineated onto a wafer in a simulation carried out beforehand and storing those defects as hot spot information. Furthermore, the method also enables combining of the design intent data with hot spot information to limit inspection spots that might include systematic defects at high possibility with respect to the characteristics of the object semiconductor integrated circuit and shorten the defect inspection time significantly.

摘要翻译： 一种能够容易地管理半导体集成图案的致命缺陷的方法，该方法能够存储由半导体集成电路设计者设计的每个图案的设计数据，以及存储具有根据其设计意图排列的图案重要性级别的设计意图数据 分别。 该方法还可以预测由于目标曝光系统等的特性而系统地产生的缺陷，同时在预先进行的模拟中将每个设计的电路图案暴露并描绘到晶片上，并将这些缺陷存储为热点信息。 此外，该方法还能够将设计意图数据与热点信息组合，以限制可能包括关于对象半导体集成电路的特性的高可能性的系统缺陷的检查点，并显着缩短缺陷检查时间。